Metallic wire grid polarizer and manufacturing method thereof
10048419 ยท 2018-08-14
Assignee
Inventors
Cpc classification
G02B5/3058
PHYSICS
C23F4/00
CHEMISTRY; METALLURGY
B29C59/022
PERFORMING OPERATIONS; TRANSPORTING
International classification
B29C59/02
PERFORMING OPERATIONS; TRANSPORTING
Abstract
The present invention provides a metallic wire grid polarizer and a manufacturing method thereof. The metallic wire grid polarizer of the present invention includes a base plate (10) and a plurality of metallic wire grids formed on the base plate (10). The metallic wire grids are divided into first wire lines (21) and second wire lines (22) having different heights so as to form a dual-period wire-grid structure for achieving better optical performance and exhibiting more global optimization parameters for making modulation of the optical performance thereof more scientific and more flexible. The manufacturing method of the metallic wire grid polarizer of the present invention may make a wire grid structure having layers of different heights and the manufacturing operation is simple.
Claims
1. A manufacturing method of a metallic wire grid polarizer, comprising the following steps: (1) providing a metal backing and coating a layer of optical resin on an upper surface of the metal backing; (2) providing an imprint mold plate and positioning the imprint mold plate on the optical resin to conduct nano-imprinting so as to make the optical resin that is located on the metal backing forming a plurality of first photoresist strips and a plurality of second photoresist strips in an alternate arrangement, wherein a height of the first photoresist strips is greater than a height of the second photoresist strips; (3) removing the imprint mold plate and conducting dry etching on the metal backing with the optical resin as a shielding layer so as to form a plurality of metallic wire grids on the metal backing, wherein the metallic wire grids are divided into first wire lines and second wire lines and wherein the first wire lines are formed as corresponding to the first photoresist strips and the second wire lines are formed as corresponding to the second photoresist strips so as to form a metallic wire grid polarizer that comprises the base plate and the plurality of metallic wire grids on the base plate; wherein a plurality of first wire lines and a plurality of second wire lines are alternately arranged on the base plate in a cyclic or periodic arrangement, the first wire lines having a first height H1, the second wire lines having a second height H2, the heights of the first wire lines and the second wire lines satisfying (H1H2)/H1>10%.
2. The manufacturing method of the metallic wire grid polarizer as claimed in claim 1, wherein the metallic wire grids have widths that are between 20-150 nm and a spacing distance between two adjacent metallic wire grids is between 20-150 nm.
3. The manufacturing method of the metallic wire grid polarizer as claimed in claim 1, wherein the plurality of metallic wire grids is arranged in an equally spaced manner on the base plate.
4. The manufacturing method of the metallic wire grid polarizer as claimed in claim 1, wherein each of the first wire lines is alternate with each of the second wire lines.
5. The manufacturing method of the metallic wire grid polarizer as claimed in claim 1, wherein the imprint mold plate provided in step (2) comprises a plurality of first grid grooves and a plurality of second grid grooves, wherein the first grid grooves have a depth that is greater than a depth of the second grid grooves and the first photoresist strips and the second photoresist strips are formed as respectively corresponding to the first grid grooves and the second grid grooves; and step (3) further comprises removing a remaining portion of the optical resin after the dry etching and coating a buffer layer on the plurality of metallic wire grids so formed so that the metallic wire grid polarizer so obtained also comprises the buffer layer that is arranged on the base plate and the plurality of metallic wire grids.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
(1) The features and technical contents of the present invention will be better understood by referring to the following detailed description and drawings of the present invention. However, the drawings are provided for the purpose of reference and illustration and are not intended to limit the scope of the present invention.
(2) In the drawing:
(3)
(4)
(5)
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DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
(8) To further expound the technical solution adopted in the present invention and the advantages thereof, a detailed description is given to a preferred embodiment of the present invention with reference to the attached drawings.
(9) Referring to
(10) The metallic wire grids are divided into first wire lines 21 and second wire lines 22, such that a plurality of first wire lines 21 and a plurality of second wire lines 22 are alternately arranged on the base plate 10 in a cyclic or periodic arrangement. The first wire lines 21 have a first height H1, and the second wire lines 22 have a second height H2. The heights of the first wire lines 21 and the second wire lines 22 satisfy (H1H2)/H1>10%.
(11) Specifically, the metallic wire grids have widths that are between 20-150 nm and a spacing distance between two adjacent metallic wire grids is between 20-150 nm.
(12) Specifically, the metallic wire grid polarizer further comprises a buffer layer 30 arranged on the base plate 10 and the plurality of metallic wire grids to protect the plurality of metallic wire grids on the metallic wire grid polarizer.
(13) Specifically, as shown in
(14) The present invention provides a metallic wire grid polarizer, which comprises metallic wire grids divided into first wire lines 21 and second wire lines 22 that have different heights so as to provide a dual-period wire-grid structure for achieving better optical performance and exhibiting 15 global optimization parameters for making modulation of the optical performance thereof more scientific and more flexible.
(15) Referring to
(16) Step 1: as shown in
(17) Step 2: as shown in
(18) Specifically, the imprint mold plate 500 provided in Step 2 comprises a plurality of first grid grooves 510 and a plurality of second grid grooves 520, wherein the first grid grooves 510 have a depth that is greater than a depth of the second grid grooves 520 and the first photoresist strips 310 and the second photoresist strips 310 are formed as respectively corresponding to the first grid grooves 510 and the second grid grooves 520.
(19) Step 3: as shown in
(20) The metallic wire grid polarizer comprises a base plate 10 and a plurality of metallic wire grids on the base plate 10, wherein a plurality of first wire lines 21 and a plurality of second wire lines 22 are alternately arranged on the base plate 10 in a cyclic or periodic arrangement. The first wire lines 21 have a first height H1, and the second wire lines 22 have a second height H2. The heights of the first wire lines 21 and the second wire lines 22 satisfy (H1H2)/H1>10%.
(21) Specifically, Step 3 further comprises removing a remaining portion of the optical resin 300 after the dry etching and coating a buffer layer 30 on the plurality of metallic wire grids so formed, as what shown in
(22) Specifically, the metallic wire grids have widths that are between 20-150 nm and a spacing distance between two adjacent metallic wire grids is between 20-150 nm.
(23) Particularly, each of the first wire lines 21 is alternate with each of the second wire lines 22 on the base plate 10. In other words, the plurality of first wire lines 21 and the plurality of second wire lines 22 are arranged in a cyclic or periodic manner according the sequence of high, low, high, low. The plurality of metallic wire grids is preferably arranged in an equally spaced manner on the base plate 10. Under this condition, a distance between two adjacent ones of the first wire lines 21 is equal to a distance between two adjacent ones of the second wire lines 22. In addition, the plurality of first wire lines 21 and the plurality of second wire lines 22 can be arranged in a cyclic or periodic manner according to different high-low alternating structure, such as a sequence of high, high, low, high, high, low, or a sequence of high, high, low, low, high, high, low, low.
(24) In summary, the present invention provides a metallic wire grid polarizer, which comprises a base plate and a plurality of metallic wire grids formed the base plate. The metallic wire grids are divided into first wire lines and second wire lines having different heights so as to form a dual-period wire-grid structure for achieving better optical performance and exhibiting more global optimization parameters for making modulation of the optical performance thereof more scientific and more flexible. The present invention provides a manufacturing method of a metallic wire grid polarizer, which makes a wire grid structure having layers of different heights and the manufacturing operation is simple.
(25) Based on the description given above, those having ordinary skills of the art may easily contemplate various changes and modifications of the technical solution and technical ideas of the present invention and all these changes and modifications are considered within the protection scope defined by the claims of the present invention.