ANATASE-TYPE NIOBIUM OXYNITRIDE, METHOD FOR PRODUCING SAME, AND SEMICONDUCTOR STRUCTURE

Abstract

The present disclosure provides an anatase-type niobium oxynitride having an anatase-type crystal structure and represented by the chemical formula NbON. The present disclosure also provides a semiconductor structure (100) including: a substrate (110) having at least one principal surface composed of a perovskite-type compound having a perovskite-type crystal structure; and a niobium oxynitride (for example, an anatase-type niobium oxynitride film (120)) grown on the one principal surface of the substrate (110), the niobium oxynitride having an anatase-type crystal structure and being represented by the chemical formula NbON.

Claims

1. An anatase-type niobium oxynitride having an anatase-type crystal structure and represented by the chemical formula NbON.

2. The anatase-type niobium oxynitride according to claim 1, being a semiconductor.

3. The anatase-type niobium oxynitride according to claim 2, being an optical semiconductor.

4. The anatase-type niobium oxynitride according to claim 1, being oriented in a (001) plane.

5. A semiconductor structure comprising: a substrate having at least one principal surface composed of a perovskite-type compound having a perovskite-type crystal structure; and an anatase-type niobium oxynitride grown on the one principal surface of the substrate, wherein the anatase-type niobium oxynitride is as defined in claim 1.

6. The semiconductor structure according to claim 5, wherein the substrate is a lanthanum aluminate substrate or a lanthanum-strontium aluminum tantalate substrate.

7. The semiconductor structure according to claim 5, wherein the anatase-type niobium oxynitride is oriented in a (001) plane.

8. The semiconductor structure according to claim 5, wherein the perovskite-type compound of the substrate is oriented in a (001) plane.

9. An anatase-type niobium oxynitride production method for producing the anatase-type niobium oxynitride according to claim 1, the method comprising: preparing a substrate having at least one principal surface composed of a perovskite-type compound having a perovskite-type crystal structure; and growing a niobium oxynitride on the one principal surface of the substrate by epitaxial growth.

10. The anatase-type niobium oxynitride production method according to claim 9, wherein the epitaxial growth is carried out by sputtering.

11. The anatase-type niobium oxynitride production method according to claim 10, wherein the anatase-type niobium oxynitride is grown by performing sputtering using a sputtering target composed of niobium oxide in a mixed atmosphere of oxygen and nitrogen.

Description

BRIEF DESCRIPTION OF DRAWINGS

[0007] FIG. 1 shows three patterns of the crystal structure of an anatase-type niobium oxynitride.

[0008] FIG. 2 shows three patterns of the crystal structure of an anatase-type niobium oxynitride which are obtained by crystal structure optimization using first-principles calculation.

[0009] FIG. 3A shows a result of calculation of the band dispersion of a baddeleyite-type niobium oxynitride.

[0010] FIG. 3B shows a result of calculation of the band dispersion of an anatase-type niobium oxynitride having a crystal structure corresponding to that of anatase-type niobium oxynitride (1) shown in FIG. 2.

[0011] FIG. 3C shows a result of calculation of the band dispersion of an anatase-type niobium oxynitride having a crystal structure corresponding to that of anatase-type niobium oxynitride (2) shown in FIG. 2.

[0012] FIG. 3D shows a result of calculation of the band dispersion of an anatase-type niobium oxynitride having a crystal structure corresponding to that of anatase-type niobium oxynitride (3) shown in FIG. 2.

[0013] FIG. 4 shows a cross-sectional view of a semiconductor structure according to an embodiment.

[0014] FIG. 5 shows an X-ray diffraction pattern obtained by X-ray diffraction measurement performed for a niobium oxynitride film of Example 1 according to a 2- scan method.

[0015] FIG. 6 shows a result of measurement of the light absorbance of the niobium oxynitride film of Example 1.

[0016] FIG. 7 shows an X-ray diffraction pattern obtained by X-ray diffraction measurement performed for a niobium oxynitride film of Example 2 according to a 2- scan method.

[0017] FIG. 8 shows a result of measurement of the light absorbance of the niobium oxynitride film of Example 2.

DESCRIPTION OF EMBODIMENTS

[0018] A first aspect of the present disclosure is an anatase-type niobium oxynitride having an anatase-type crystal structure and represented by the chemical formula NbON.

[0019] The anatase-type niobium oxynitride as set forth in the first aspect has an anatase-type crystal structure and is a novel material which has hitherto been unknown. This anatase-type niobium oxynitride is capable of absorbing longer-wavelength light than the hitherto existing niobium oxynitride which has a baddeleyite-type crystal structure. Additionally, this anatase-type niobium oxynitride features excellent electron mobility, electron diffusion length, hole mobility, and hole diffusion length and has the advantageous property of permitting easy movement of electrons and holes generated by photoexcitation. The most stable crystal structure for niobium oxynitrides is of the baddeleyite type. The anatase-type niobium oxynitride as set forth in the first aspect of the present disclosure has a metastable crystal structure and cannot be obtained by any common known process for producing niobium oxynitrides. Hitherto, the anatase-type crystal structure has not even been considered as a crystal structure that niobium oxynitrides can have instead of the baddeleyite-type crystal structure.

[0020] According to a second aspect, for example, the anatase-type niobium oxynitride as set forth in the first aspect may be a semiconductor.

[0021] The anatase-type niobium oxynitride as set forth in the second aspect can be used as a semiconductor in various technical fields.

[0022] According to a third aspect, for example, the anatase-type niobium oxynitride as set forth in the second aspect may be an optical semiconductor.

[0023] The anatase-type niobium oxynitride as set forth in the third aspect can be used as an optical semiconductor in various technical fields.

[0024] According to a fourth aspect, for example, the anatase-type niobium oxynitride as set forth in any one of the first to third aspects may be oriented in a (001) plane.

[0025] The anatase-type niobium oxynitride as set forth in the fourth aspect can exhibit higher performance in terms of light absorption and ease of movement of electrons and holes.

[0026] A fifth aspect of the present disclosure is a semiconductor structure including: a substrate having at least one principal surface composed of a perovskite-type compound having a perovskite-type crystal structure; and an anatase-type niobium oxynitride grown on the one principal surface of the substrate, wherein the anatase-type niobium oxynitride is as defined in any one of the first to fourth aspects.

[0027] In the semiconductor structure as set forth in the fifth aspect, the anatase-type niobium oxynitride as set forth in any one of the first to fourth aspects is provided on the substrate. Thus, the semiconductor structure as set forth in the fifth aspect is capable of absorbing longer-wavelength light than semiconductor structures provided with a hitherto known niobium oxynitride, and has the advantageous property of permitting easy movement of electrons and holes generated by photoexcitation.

[0028] According to a sixth aspect, for example, in the semiconductor structure as set forth in the fifth aspect, the substrate may be a lanthanum aluminate substrate or a lanthanum-strontium aluminum tantalate substrate.

[0029] In the semiconductor structure as set forth in the sixth aspect, the anatase-type niobium oxynitride grown on the substrate can exhibit higher performance in terms of light absorption and ease of movement of electrons and holes.

[0030] According to a seventh aspect, for example, in the semiconductor structure as set forth in the fifth or sixth aspect, the anatase-type niobium oxynitride may be oriented in a (001) plane.

[0031] In the semiconductor structure as set forth in the seventh aspect, the anatase-type niobium oxynitride grown on the substrate can exhibit higher performance in terms of light absorption and ease of movement of electrons and holes.

[0032] According to an eighth aspect, for example, in the semiconductor structure as set forth in any one of the fifth to seventh aspects, the perovskite-type compound of the substrate may be oriented in a (001) plane.

[0033] In the semiconductor structure as set forth in the eighth aspect, the anatase-type niobium oxynitride grown on the substrate can exhibit higher performance in terms of light absorption and ease of movement of electrons and holes.

[0034] A ninth aspect of the present disclosure is an anatase-type niobium oxynitride production method for producing the anatase-type niobium oxynitride as set forth in any one of the first to fourth aspects, the method including: preparing a substrate having at least one principal surface composed of a perovskite-type compound having a perovskite-type crystal structure; and growing an anatase-type niobium oxynitride on the one principal surface of the substrate by epitaxial growth.

[0035] The production method as set forth in the ninth aspect is capable of producing the anatase-type niobium oxynitride as set forth in any one of the first to fourth aspects.

[0036] According to a tenth aspect, for example, in the production method as set forth in the ninth aspect, the epitaxial growth may be carried out by sputtering.

[0037] The production method as set forth in the tenth aspect is capable of easily producing an anatase-type niobium oxynitride that exhibits higher performance in terms of light absorption and ease of movement of electrons and holes.

[0038] According to an eleventh aspect, for example, in the production method as set forth in the tenth aspect, the anatase-type niobium oxynitride may be grown by performing sputtering using a sputtering target composed of niobium oxide in a mixed atmosphere of oxygen and nitrogen.

[0039] The production method as set forth in the eleventh aspect is capable of easily producing an anatase-type niobium oxynitride that exhibits higher performance in terms of light absorption and ease of movement of electrons and holes.

[0040] Hereinafter, embodiments of the present disclosure will be described in detail with reference to the drawings. The embodiments described below are only illustrative, and the present disclosure is not limited to the embodiments.

[0041] (Anatase-Type Niobium Oxynitride)

[0042] Crystal structures of an anatase-type niobium oxynitride (which may hereinafter be referred to as a-NbON) are shown in FIG. 1. As shown in FIG. 1, possible crystal structures of the anatase-type niobium oxynitride are the three patterns, a-NbON (1), a-NbON (2), and a-NbON (3), which differ in the positions of niobium atoms, oxygen atoms, and nitrogen atoms. The crystal structure of a baddeleyite-type niobium oxynitride (which may hereinafter be referred to as b-NbON) and the crystal structures of a-NbON (1), a-NbON (2), and a-NbON (3) shown in FIG. 1 were subjected to crystal structure optimization using first-principles calculation. First-principles band calculation was also carried out for b-NbON, a-NbON (1), a-NbON (2), and a-NbON (3) subjected to the crystal structure optimization. The first-principles calculation was performed using projector augmented wave (PAW) method on the basis of the density functional theory. In this calculation, a functional called GGA-PBE was used to describe the electron density representing the exchange-correlation term associated with interaction between electrons. The crystal structures of a-NbON (1), a-NbON (2), and a-NbON (3) resulting from the crystal structure optimization are shown in FIG. 2. Table 1 shows space groups, lattice constants, and band gaps (denoted by EG in Table 1) for b-NbON, a-NbON (1), a-NbON (2), and a-NbON (3) resulting from the crystal structure optimization. Band dispersion curves obtained by first-principles calculation for b-NbON, a-NbON (1), a-NbON (2), and a-NbON (3) are shown in FIGS. 3A to 3D, respectively.

TABLE-US-00001 TABLE 1 Space group a [] b [] c [] b-NbON P2.sub.1/c 4.955 5.014 5.157 a-NbON (1) I-4m2 3.881 3.881 10.22 a-NbON (2) Imma 3.782 4.071 10 a-NbON (3) I4.sub.1md 3.893 3.893 10.26 [] [] [] EG [eV] b-NbON 90 99.73 90 1.8 a-NbON (1) 90 90 90 0.65 a-NbON (2) 90 90 90 0.65 a-NbON (3) 90 90 90 1.3

[0043] As seen from FIGS. 3B to 3D, it is suggested that a-NbON (1), a-NbON (2), and a-NbON (3) are all semiconductors having a band gap. Additionally, as shown in Table 1, the band gaps calculated for a-NbON (1), a-NbON (2), and a-NbON (3) are lower than that calculated for b-NbON. This suggests the possibility that a-NbON (1), a-NbON (2), and a-NbON (3) are semiconductors capable of absorbing longer-wavelength light than b-NbON. Based on the band dispersion curves shown in FIGS. 3A to 3D, the effective mass of electrons and the effective mass of holes can be determined from the curvature of the bottom of the conduction band and the curvature of the top of the valence band, respectively. Table 2 shows, for b-NbON, a-NbON (1), a-NbON (2), and a-NbON (3), the ratio between the effective mass and rest mass of electrons (electron effective mass/electron rest mass, denoted by me*/m0 in Table 2) and the ratio between the effective mass of holes and the rest mass of electrons (hole effective mass/hole rest mass, denoted by mh*/m0 in Table 2) in various directions. In Table 2, the term VBM refers to the valence band maximum.

TABLE-US-00002 TABLE 2 Crystal structure me*/m0 mh*/m0 b-NbON Direction B.fwdarw. B.fwdarw.A VBM.fwdarw.Y VBM.fwdarw. Calculated value 1.2 1.1 3.5 4.6 a-NbON (1) Direction .fwdarw.Z .fwdarw.X .fwdarw.P .fwdarw.N VBM.fwdarw. VBM.fwdarw.X Calculated value 3.0 0.18 0.22 0.24 0.53 0.53 a-NbON (2) Direction .fwdarw.T .fwdarw.T Calculated value 0.34 0.15 a-NbON (3) Direction .fwdarw.Z .fwdarw.X .fwdarw.P .fwdarw.N Z.fwdarw. Calculated value 2.2 0.32 0.30 0.27 1.0

[0044] The data shown in Table 2 lead to the expectation that a-NbON (1), a-NbON (2), and a-NbON (3) have a smaller electron effective mass and a smaller hole effective mass than b-NbON. This suggests the possibility that a-NbON is a material having excellent electron mobility and hole mobility and being able to absorb long-wavelength light as described above and therefore that a-NbON can serve as a useful optical semiconductor capable of, for example, highly efficient use of sunlight.

[0045] (Semiconductor Structure)

[0046] FIG. 4 shows a cross-sectional view of a semiconductor structure 100 which is an embodiment of the semiconductor structure of the present disclosure. The semiconductor structure 100 includes a substrate 110 and an a-NbON film 120 disposed on one principal surface of the substrate 110. The a-NbON film 120 is composed of a niobium oxynitride represented by the chemical formula NbON. The a-NbON film 120 has an anatase-type crystal structure. The a-NbON film 120 may be oriented in a particular direction such as the [001] direction. In other words, the a-NbON film 120 may have a particular orientation plane such as the (001) plane.

[0047] The substrate 110 is a substrate having at least one principal surface (the principal surface on which the a-NbON film 120 is to be disposed) composed of a perovskite-type compound having a perovskite-type crystal structure. The perovskite-type compound of the substrate 110 may be oriented in the (001) plane. Examples of the substrate 110 include:

[0048] (1) a substrate composed of a perovskite-type compound with (001) orientation; and

[0049] (2) a substrate having a layer composed of a perovskite-type compound with (001) orientation, the layer forming at least one principal surface of the substrate.

[0050] Examples of the perovskite-type compound include lanthanum aluminate (which may be referred to as LaAlO.sub.3 hereinafter) and lanthanum-strontium aluminum tantalate (which may be referred to as LSAT hereinafter). That is, a LaAlO.sub.3 substrate or a LSAT substrate can be used as the substrate 110. The lanthanum aluminate is represented by the chemical formula LaAlO.sub.3, and the lanthanum-strontium aluminum tantalate is represented, for example, by the chemical formula (LaAlO.sub.3).sub.0.3(SrAl.sub.0.5Ta.sub.0.5O.sub.3).sub.0.7. Examples of the LaAlO.sub.3 substrate include:

[0051] (1) a substrate composed of LaAlO.sub.3 with (001) orientation; and

[0052] (2) a substrate having a layer composed of LaAlO.sub.3 with (001) orientation, the layer forming at least one principal surface of the substrate.

[0053] That is, the LaAlO.sub.3 substrate encompasses those obtained by forming a layer composed of LaAlO.sub.3 with (001) orientation on a surface of a given substrate. The same applies to the LSAT substrate.

[0054] (Method for Producing a-NbON Film)

[0055] First, a substrate having at least one principal surface composed of a perovskite-type compound is prepared. That is, the substrate 110 described above is prepared. Next, a niobium oxynitride is grown by epitaxial growth on that principal surface of the substrate 110 which is composed of a perovskite-type compound. The epitaxial growth can be carried out, for example, by a technique such as sputtering, molecular-beam epitaxy, pulsed laser deposition, or organometallic vapor phase epitaxy. When sputtering is employed to carry out the epitaxial growth, it is conceivable, for example, to grow the niobium oxynitride by performing sputtering using a sputtering target composed of niobium oxide in a mixed atmosphere of oxygen and nitrogen.

EXAMPLES

[0056] Hereinafter, the anatase-type niobium oxynitride and semiconductor structure of the present disclosure will be described in more detail with examples.

Example 1

[0057] In Example 1, a semiconductor structure 100 as shown in FIG. 4 was fabricated. First, a LaAlO.sub.3 substrate 110 with (001) orientation (manufactured by Crystal GmbH) was prepared. An a-NbON film 120 with a thickness of 60 nanometers was formed on the LaAlO.sub.3 substrate 110 by reactive sputtering in a mixed atmosphere of oxygen and nitrogen while the LaAlO.sub.3 substrate 110 was heated to 650 C. The sputtering target was composed of niobium oxide represented by the chemical formula Nb.sub.2O.sub.5. The RF power supplied to the target electrode was set to 20 W. During the film formation, the pressure inside the chamber was 0.5 Pa, the oxygen partial pressure was 0.0085 Pa, and the nitrogen partial pressure was 0.49 Pa. The distance between the target and the substrate 110 was 100 mm.

[0058] The a-NbON film 120 thus formed was subjected to X-ray diffraction analysis according to a 2- scan method. FIG. 5 shows the result of the 2- scan measurement of the a-NbON film 120 obtained in Example 1. As shown in FIG. 5, there were observed four peaks which were respectively the peak of the (002) plane of LaAlO.sub.3, the peak of the (004) plane of LaAlO.sub.3, the peak of the (006) plane of LaAlO.sub.3, and the peak of the (004) plane attributed to a-NbON. The position (34.9) of the peak of the (004) plane of a-NbON approximately coincides with peak positions predicted by the first-principles calculation (a-NbON (1): 35.1, a-NbON (2): 35.9, a-NbON (3): 35.0). As described above, only the peak of the (004) plane attributed to a-NbON was observed, except for the three peaks attributed to the LaAlO.sub.3 substrate. This confirmed that, in the present example, an a-NbON film 120 with (001) orientation was epitaxially grown on the LaAlO.sub.3 substrate 110 with (001) orientation.

[0059] The light absorbance of the a-NbON film 120 of Example 1 was measured. The result of the measurement is shown in FIG. 6. As seen from FIG. 6, it was confirmed that the absorbance increases with decreasing wavelength below 600 nm. This confirmed that the a-NbON film 120 obtained in the present example is a semiconductor capable of absorbing visible light.

Example 2

[0060] In Example 2, a semiconductor structure 100 as shown in FIG. 4 was fabricated. First, a LSAT substrate 110 with (001) orientation (manufactured by MTI Corporation) was prepared. An a-NbON film 120 with a thickness of 60 nanometers was formed on the LSAT substrate 110 by reactive sputtering in a mixed atmosphere of oxygen and nitrogen while the LSAT substrate 110 was heated to 650 C. The sputtering target was composed of niobium oxide represented by the chemical formula Nb.sub.2O.sub.5. The RF power supplied to the target electrode was set to 20 W. During the film formation, the pressure inside the chamber was 0.5 Pa, the oxygen partial pressure was 0.013 Pa, and the nitrogen partial pressure was 0.49 Pa. The distance between the target and the substrate 110 was 100 mm.

[0061] The a-NbON film 120 thus formed was subjected to X-ray diffraction analysis according to a 2- scan method. FIG. 7 shows the result of the 2- scan measurement of the a-NbON film 120 obtained in Example 2. As shown in FIG. 7, there were observed four peaks which were respectively the peak of the (002) plane of LSAT, the peak of the (004) plane of LSAT, the peak of the (006) plane of LSAT, and the peak of the (004) plane attributed to a-NbON. The position (35.0) of the peak of the (004) plane of a-NbON approximately coincides with peak positions predicted by the first-principles calculation (a-NbON (1): 35.1, a-NbON (2): 35.9, a-NbON (3): 35.0). As described above, only the peak of the (004) plane attributed to a-NbON was observed, except for the three peaks attributed to the LSAT substrate. This confirmed that, in the present example, an a-NbON film 120 with (001) orientation was epitaxially grown on the LSAT substrate 110 with (001) orientation.

[0062] The light absorbance of the a-NbON film 120 of Example 2 was measured. The result of the measurement is shown in FIG. 8. As seen from FIG. 8, it was confirmed that the absorbance increases with decreasing wavelength below 600 nm. This confirmed that the a-NbON film 120 obtained in the present example is a semiconductor capable of absorbing visible light.

INDUSTRIAL APPLICABILITY

[0063] The anatase-type niobium oxynitride of the present disclosure is capable of absorbing long-wavelength light and has the advantageous property of permitting easy movement of electrons and holes generated by photoexcitation. The anatase-type niobium oxynitride is therefore applicable to various technical fields; for example, the anatase-type niobium oxynitride can be used as an optical semiconductor material in an application that requires high efficiency of use of sunlight.