REDUCTION OF METAL/SEMI-METAL OXIDES
20180201513 ยท 2018-07-19
Inventors
Cpc classification
C01P2004/61
CHEMISTRY; METALLURGY
B22F9/30
PERFORMING OPERATIONS; TRANSPORTING
B22F9/20
PERFORMING OPERATIONS; TRANSPORTING
C01B33/023
CHEMISTRY; METALLURGY
B22F2304/10
PERFORMING OPERATIONS; TRANSPORTING
International classification
C01B33/023
CHEMISTRY; METALLURGY
Abstract
This invention is concerned with the reduction of metal and/or semi-metal oxides. More particularly the invention relates to a method and apparatus adapted to produce silicon by reduction of silicon oxides. The inventor has determined that the reaction between a strong oxidiser and a reducer can provide sufficient energy for metallothermic reduction of silicon oxides to silicon to be completed at relatively low temperatures, such as less than 580 deg C., and that the reduction can be effected with no or minimal dwell time even at such a maximum temperature. The method can be simple, quick, and efficient without producing greenhouse gases. This method can also be used for reduction of other metal or semi-metal oxides such as for example only Ta.sub.2O.sub.5, Nb.sub.2O.sub.5WO.sub.3 and MoO.sub.2; and also used in the co-reduction of two or more metal or semi-metal oxides to produce alloys and composites of them.
Claims
1. A method of reducing one or more single or mixed oxides of metal and/or semimetal other than titanium, which involves use of an initial reaction at a temperature of less than 580 C. between a strong oxidising agent with a reducing agent to effect reduction of said oxide(s); wherein the oxide(s) to be reduced comprises one or more of the following, namely: oxide of silicon, tantalum, niobium, tungsten, molybdenum, germanium, hafnium or zirconium; wherein the initial reaction proceeds at a temperature in the range of 350 C. to less than 580 C., with no mandatory dwell time.
2. The method as claimed in claim 1, wherein the said oxide(s) to be reduced is admixed with said oxidising and reducing agents.
3. The method of reducing as claimed in claim 2, wherein the oxide(s) of metal and/or semi metal catalyse the reaction between the oxidising agent and reducing agent.
4. The method of reducing as claimed in claim 1 wherein the oxide particle size ranges from micrometers to nanometers.
5. The method as claimed in claim 1, in which the initial reaction proceeds at a temperature in the range of 360 C. to 550 C.
6. The method as claimed in claim 1, in which the initial reaction proceeds preferably at a temperature in the range of 370 C. to 530 C.
7. The method as claimed in claim 1, wherein the reduction reaction process produces the elemental metal and/or semi-metal and/or reaction product comprising the said elemental metal or semi-metal and the said reducing agent.
8. The method as claimed in claim 6 wherein said reaction product forms and is subsequently converted to the said elemental metal and/or semi-metal.
9. The method as claimed in claim 7 in which the said conversion is effected subsequently by acid washing or by treatment with an ammonium agent.
10. The method as claimed in claim 1, wherein the oxide comprises or consists of silica.
11. The method as claimed in claim 1, wherein the oxide has a particle size of 100 to 600 microns, or mainly consists of particles less than 100 microns in size.
12. The method as claimed in claim 1, wherein the reduction reaction is effected within a vacuum or an inert gaseous atmosphere.
13. The method as claimed in claim 12, in which the atmosphere is of Argon or Nitrogen.
14. The method as claimed in claim 1, wherein the oxidising agent comprises one or more of: perchlorate, chlorate, chromate, oxalate, chlorite, dinitramide or the metal halide comprises iron trichloride.
15. The method as claimed in claim 14 in which the oxidising agent consists of perchlorate.
16. The method as claimed in claim 1, wherein the reducing agent comprises or consists of a metal more reactive in the electrochemical series than the metal and/or semi-metal(s) of the oxide(s) being reduced.
17. The method as claimed in claim 16 in which the metal reducing agent is selected from an alkali metal or alkaline earth metal or aluminium.
18. The method as claimed in claim 17 in which the reducing metal is one or more of Mg, Ca, or Al but preferably Mg, which may be in the form of chips with a mesh size of 4 to 30 mesh.
19. The method as claimed in claim 1, in which the oxide is silica, which has optionally been ball-milled, and preferably includes nano-particles.
20. The method as claimed in claim 1, in which the dwell time is in the range of 0 to 30 minutes.
21. The method as claimed in claim 1, in which the oxide to be reduced is silica and the obtained silicon is in powder form with agglomerates of fine particles, which are less than 100 microns in size, and containing portions of nano-sheets.
22. The method as claimed in claim 1, in which the core of particles of the oxide(s) is reduced together with the surface of the particles.
23. The method as claimed in claim 1, wherein the reduction reaction process carried out in the presence of an inert salt as a reaction dampener. wherein the inert salt is sodium chloride followed by its removal from the reaction product(s).
24. An apparatus for carrying into effect a method as claimed in claim 1, which apparatus is substantially as described and/or as illustrated and/or as exemplified herein.
25. The apparatus as claimed in claim 24 comprising a filling and/or covering above the reaction mixture of an inert salt as a reaction dampener, wherein the inert salt is sodium chloride.
26. A method of converting a metallic and/or semi-metallic silicide to elemental silicon which comprises acid washing of the silicide.
27. The method as claimed in claim 26 wherein the metallic silicide is Mg.sub.2Si.
28. A reaction product obtained from a method as claimed in claim 1 which comprises Mg.sub.2Si and MgO.
29. (canceled)
30. (canceled)
Description
[0046] In order that the invention may be illustrated, more easily appreciated and readily carried into effect by those skilled in the art, embodiments of the invention will now be described purely by way of non-limiting example with reference to the accompanying drawings, graphs and photomicrographs, wherein:
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[0067] Referring to the drawings, graphs and photomicrographs, the reactor used for the reduction of SiO.sub.2 is shown in
[0068] The presence of a reaction dampener, such as an inert salt, for example NaCl powder above the reaction mixture and between the crucible and steel container is desirable to damp the shock generated by the reactions in the alumina crucible. It also further protects the reactive mixture and the products from the environment. It is easy to remove, (e.g. by simple aqueous washing) after the reaction has completed without deleterious effect upon the recovered silicon or silicide.
[0069] The steel container is placed in a retort furnace equipped with gas inlet and outlet. An argon flow is passed through the steel retort as the retort was heated in a resistance pot furnace, and the temperature was recorded by a thermocouple.
EXAMPLE 1
[0070] 1.1 Low Temperature Conversion of SiO.sub.2 to Mg.sub.2Si
[0071] 37 g SiO.sub.2 nanoparticles (Sigma Aldrich 637238, 10-20 nm), 51 g Mg chips (Sigma Aldrich 254118, 4-30 mesh), and 4.5 g KClO.sub.4 powder (Sigma Aldrich 241830) was mixed and loaded into the reactor shown in
[0072] After completion of the reaction, the furnace was turned off and the reactor was left to cool to room temperature. Then, the alumina crucible was removed from the retort and its content was washed with distilled water to remove NaCl and then vacuum filtered. The material obtained (which is called the as-synthesised product) was subjected to x-ray diffraction analysis (XRD).
[0073] It should be noted that heating of the as-synthesised product to 630 deg C. in air leads to the formation of Mg.sub.2Si and MgO composite powder which is useful in its own right.
1.2. Conversion of Mg.SUB.2.Si to Si
[0074] Ten gram of the as-synthesised material was gradually added to 100 mL HNO.sub.3 (70%) at 50 deg C. while the solution was stirred by a magnet, which led to the release of gas. After 1 h stirring, the solution was diluted by distilled water and vacuum filtered, and then further washed with distilled water. The filtrate (3.8 g) was dried at 50 deg C. overnight. The final product which was 1.8 g light yellowish powder was subjected to XRD analysis, and the result is presented in
[0075] The Raman spectrum of the silicon product taken using 633 nm laser excitation wavelength is shown in
[0076] The surface properties of the silicon product was studied through the nitrogen adsorption-desorption technique.
[0077] SEM and bright field TEM micrograph of the Si powder produced is shown in
EXAMPLE 2
[0078] 12.82 g SiO.sub.2 (Sigma Aldrich, 0.5-10 m, 80% 1-5 m), 16.44 g Mg chips (Sigma Aldrich 254118, 4-30 mesh) and 3.01 g KClO.sub.4 powder (Sigma Aldrich 241830) was mixed and the mixture was placed in an alumina crucible.
[0079] The mixture was heated to 530 deg C., and then the reactor was allowed to cool down. Then, the material inside the crucible was aqueously leached with distilled water, to remove NaCl which might be mixed with the product, and filtered. The XRD result of the material obtained is shown in
[0080] The filtrate was dried at 30 deg C., and washed with H.sub.2SO.sub.4 (95%) and HNO.sub.3 (70%). For acid washing, first 250 ml of H.sub.2SO.sub.4 acid was transferred in a 1 L beaker and that beaker was placed in a 2 L beaker. Then, the empty space between the two beakers was filled with ice. The acid was stirred by an application of a magnet stirring system and the as-synthesised product containing Mg.sub.2Si and MgO was gradually added to the acid. This addition of the Mg.sub.2SiMgO mixture to the acid solution causes small sparks. The application of an ice bath leads to the control of the temperature and thus minimises any oxidation of silicon produced.
[0081]
EXAMPLE 3
[0082] A sample of sand was collected from the beach of Winterton-On-Sea (a village in the English county of Norfolk).
[0083] 37 g sand of the same sample was dried at 100 C. and mixed with 51 g Mg chips (Sigma Aldrich 254118, 4-30 mesh) and 4.0 g KClO.sub.4 powder (Sigma Aldrich 241830). The mixture was placed in an alumina crucible and the powder mixture was further pounded by means of a mallet. The extra space left in the alumina crucible above the reaction mixture was filled with NaCl salt. The crucible was then sealed by means of a ceramic bung, and placed in a second alumina crucible and the gap between the two alumina crucibles until the bung level was filled with additional NaCl. Then a cylindrical copper weight was placed on the ceramic bung.
[0084] The alumina crucible was placed in a retort furnace equipped with gas inlet and outlet. An argon flow was passed through the steel retort as the retort was heated in a resistance pot furnace to 570 deg C. The retort was then left to cool down to room temperature, the alumina crucible was removed from the retort and its content was washed with distilled water to remove NaCl and then vacuum filtered. The material obtained was dried under vacuum at room temperature for 1 h. The dried material (which is called the as-synthesised product) was subjected to XRD analysis, and the result can be seen in
[0085] 5 g of the material obtained was washed with 100 mL H.sub.2SO.sub.4 with a concentration of 91% in an ice cooled container for 1 h. Then, the acid was diluted by adding distilled water to 20% H.sub.2SO.sub.4 causing an increase in temperature to 80 deg C. The solid material (with a yellow-dark brown colour) was subsequently washed with HNO.sub.3 with concentration of 67% at 50 deg C. Then, the solid material was filtered and the filtrate was dried under vacuum. The XRD result of the product is shown in the
EXAMPLE 4
[0086] A sample of sand from the same origin as Example 3 was ball milled for 72 h by a low energy rotating ball milling device using a plastic container and alumina balls with the ball:sand ratio of 10:1. The SEM morphology of the milled powder is shown in
[0087] 37 g ball milled sample was dried at 100 C. and mixed with 51 g Mg chips (Sigma Aldrich 254118, 4-30 mesh) and 4.1 g KClO.sub.4 powder (Sigma Aldrich 241830). The mixture was placed in an alumina crucible and the powder mixture was further pounded by means of a mallet. The extra space left in the alumina crucible above the reaction mixture was filled with NaCl salt. The crucible was then capped by means of a ceramic bung. The crucible was placed in a second alumina crucible and the gap between the two alumina crucibles up to the bung level was filled with additional NaCl. Then a cylindrical copper weight (about 1 kg) was placed on the ceramic bung.
[0088] The alumina crucible was placed in a steel retort equipped with gas inlet and outlet, and an argon gas flow was maintained through the retort, whilst it was heated in a resistance pot furnace with a heating rate of about 6 C. min.sup.1. The temperature was continuously recorded by the thermocouple attached to the ceramic bung. The temperature-time profile of the run is shown in
EXAMPLE 5
[0089] 12.00 g tantalum pentoxide (Ta.sub.2O.sub.5, particle sizes 5-10 m), 2.25 g Mg chips (Sigma Aldrich 254118, 4-30 mesh) and 0.71 g KClO.sub.4 powder (Sigma Aldrich 241830) were mixed and the mixture was loaded into an alumina crucible with a diameter of about 3 cm and height of about 8 cm. The crucible was filled with NaCl. Then the alumina crucible was covered by an alumina lid and loaded into a larger alumina crucible of 6 cm in diameter and 11 cm in height. The empty space inside the crucible was filled with NaCl, and the alumina crucible was closed by an alumina lid. The crucible was then loaded into an electric furnace, and heated to 620 C. with a heating rate of 6 C. min.sup.1. The furnace was immediately turned off at the maximum with no dwell time. At the room temperature, the content of the alumina crucible was washed in distilled water and vacuum filtered. The filtrate was dried at 50 C. under a vacuum of 10.sup.4 mbar. The x-ray diffraction pattern of the product is seen in
[0090] The processing conditions described in Examples 1-5 (a low processing temperature of 350-580 deg C. and no, or practically no, dwell time) provide an opportunity for large-scale production of metals using metal oxides. No vacuum condition, autoclave, or prolonged treatment is required, although in some embodiments a vacuum can be preferred.
[0091] Some preferred embodiments of the present invention: [0092] 1. A process for the production of Mg.sub.2Si and MgO by the reaction between SiO.sub.2, Mg and KClO.sub.4 with a reaction temperature of less than 580 C. with no dwelling time at the reaction temperature. [0093] 2. A process for the production of Si and MgO by the reaction between SiO.sub.2, Mg and KClO.sub.4 with a reaction temperature of less than 580 C. with no dwelling time at the reaction temperature. [0094] 3. A process for the production of Si by the reaction between acids and Mg.sub.2Si. [0095] 4. The same method can be used for the de-oxidation of other oxides like GeO.sub.2, Ta.sub.2O.sub.5, Nb.sub.2O.sub.5, WO.sub.2, MoO.sub.2, ZrO.sub.2 and HfO.sub.2; and their mixtures. [0096] 5. A product which comprises Mg.sub.2Si+Si+MgO
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