SINGLE PHOTON SOURCE
20230101210 ยท 2023-03-30
Assignee
Inventors
- Urcan Guler (Avon, CT, US)
- Alexander Kildishev (West Lafayette, IN, US)
- Vladimir M. Shalaev (West Lafayette, IN)
- Alexei S. Lagutchev (West Lafayette, IN, US)
- Andrey N. Smolyaninov (Chimki, RU)
Cpc classification
Y10S977/949
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
B82Y20/00
PERFORMING OPERATIONS; TRANSPORTING
Y10S977/95
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10S977/701
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
International classification
Abstract
A method for producing a single photon source includes lithographically patterning a polymer on top of a plasmonic thin film, functionalizing top surfaces of the plasmonic thin film and the polymer, removing the polymer to form patterned functionalized sites on the top surface of the plasmonic thin film surface, and depositing nanodiamond particles to the patterned functionalized sites.
Claims
1. A method for producing a single photon source, comprising: (a) lithographically patterning a polymer on top of a plasmonic thin film; (b) functionalizing top surfaces of the plasmonic thin film and the polymer; (c) removing the polymer to form patterned functionalized sites on the top surface of the plasmonic thin film; and (d) targeting nanodiamond particles to the patterned functionalized sites.
2. The method of claim 1, further comprising: addressing individually by an excitation laser each color center in the nanodiamond particles thereby producing a single photon emission.
3. The method of claim 1, wherein targeting nanodiamond particles to the patterned functionalized sites includes chemically bonding the nanodiamond particles to the patterned functionalized sites.
4. The method of claim 1, wherein targeting nanodiamond particles to the patterned functionalized sites includes electrostatically bonding the nanodiamond particles to the patterned functionalized sites.
5.-15. (canceled)
16. The method of claim 1, further comprising: depositing a dielectric material layer over the nanodiamond particles.
17. The method of claim 16, further comprising: depositing a second plasmonic thin film over the dielectric material layer.
18. The method of claim 1, wherein lithographically patterning a polymer on top of a plasmonic thin film includes at least one of photolithography, electron beam lithography, nanoimprint lithography, or soft lithography.
19. A method for producing a single photon source, comprising: (a) depositing a plurality of nanodiamond particles onto a first plasmonic film layer; (b) depositing a dielectric material layer over the nanodiamond particles; and (c) depositing a second plasmonic film layer over the dielectric material layer.
20. The method of claim 19, further comprising: directing an excitation laser toward a color center of at least one nanodiamond particle thereby producing a single photon emission.
21. The method of claim 19, wherein prior to depositing a plurality of nanodiamond particles onto a first plasmonic film layer, the method further comprising: (a) patterning a polymer on a top surface of the first plasmonic film layer; (b) functionalizing the top surfaces of the first plasmonic film layer and the polymer; and (c) removing the polymer to form patterned functionalized sites on the top surface of the first plasmonic film layer.
22. The method of claim 21, wherein patterning a polymer on top of the first plasmonic film layer include lithographically patterning the polymer on top of the first plasmonic film layer.
23. The method of claim 22, wherein lithographically patterning the polymer on top of the first plasmonic film layer includes at least one of photolithography, electron beam lithography, nanoimprint lithography, or soft lithography.
24. The method of claim 21, further comprising: after removing the polymer to form patterned functionalized sites on the top surface of the first plasmonic film layer, depositing nanodiamond particles onto the patterned functionalized sites.
25. The method of claim 24, wherein depositing nanodiamond particles onto the patterned functionalized sites includes chemically bonding the nanodiamond particles to the patterned functionalized sites.
26. The method of claim 24, wherein depositing nanodiamond particles onto the patterned functionalized sites includes electrostatically bonding the nanodiamond particles to the patterned functionalized sites.
27. A method for producing a single photon source, comprising: (a) patterning a polymer on top of a first plasmonic film; (b) functionalizing top surfaces of the first plasmonic film and the polymer; (c) removing the polymer to form patterned functionalized sites on the top surface of the first plasmonic film; (d) depositing nanodiamond particles onto the patterned functionalized sites; (e) depositing a dielectric material layer over the nanodiamond particles; and (f) depositing a second plasmonic film over the dielectric material layer.
28. The method of claim 27, wherein depositing nanodiamond particles onto the patterned functionalized sites includes chemically bonding the nanodiamond particles to the patterned functionalized sites.
29. The method of claim 27, wherein depositing nanodiamond particles onto the patterned functionalized sites includes electrostatically bonding the nanodiamond particles to the patterned functionalized sites.
30. The method of claim 27, further comprising: directing an excitation laser toward a color center of at least one of the nanodiamond particles thereby producing a single photon emission.
31. The method of claim 27, wherein patterning a polymer on top of the first plasmonic film includes at least one of photolithography, electron beam lithography, nanoimprint lithography, or soft lithography.
Description
BRIEF DESCRIPTION OF DRAWINGS
[0010]
[0011]
[0012]
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT
[0013] A colloidal assembly of a nanodiamond combined with a surface functions as substrate/nanoparticle system. A lithographic patterning is used for controlled staging of the nanodiamond. A surface functionalization is achieved by surfactants with different functional groups at the boundary of substrate and particles. The attachment is of chemical or electrostatic nature.
[0014]
[0015] Coupling of an electromagnetic wave to the nanodiamond is achieved via several variations of routines. One of the methods described here is the design of a metal/insulator/metal waveguide structure encapsulating the nanoparticle.
[0016] The scheme described in
[0017] In this design, it is possible to increase the pump coupling efficiency or emitted photon efficiency by means of parameters including but not limited to the metallic or dielectric materials, layer thicknesses, light wavelengths, nanostructure shapes and dimensions etc.
[0018]
[0019] The description of a preferred embodiment of the invention has been presented for purposes of illustration and description. It is not intended to be exhaustive or to limit the invention to the precise forms disclosed. Obviously, many modifications and variations will be apparent to practitioners skilled in this art. It is intended that the scope of the invention be defined by the following claims and their equivalent.