Structures for reducing and avoiding stresses on the seal bottom side during laser reseal
10023460 ยท 2018-07-17
Assignee
Inventors
- Achim Breitling (Reutlingen, DE)
- Frank Reichenbach (Wannweil, DE)
- Jochen Reinmuth (Reutlingen, DE)
- Julia Amthor (Reutlingen, DE)
Cpc classification
B81C1/00293
PERFORMING OPERATIONS; TRANSPORTING
B81C2203/0145
PERFORMING OPERATIONS; TRANSPORTING
B81B7/0051
PERFORMING OPERATIONS; TRANSPORTING
B81B7/02
PERFORMING OPERATIONS; TRANSPORTING
B81C1/00325
PERFORMING OPERATIONS; TRANSPORTING
International classification
G01L9/00
PHYSICS
B81B7/02
PERFORMING OPERATIONS; TRANSPORTING
B81C1/00
PERFORMING OPERATIONS; TRANSPORTING
Abstract
A method for manufacturing a micromechanical component including a substrate and including a cap, which is connected to the substrate and, together with the substrate, encloses a first cavity, a first pressure prevailing and a first gas mixture having a first chemical composition being enclosed in the first cavity. An access opening connecting the first cavity to surroundings of the micromechanical component is formed in the substrate or in the cap. The first pressure and/or the first chemical composition is adjusted in the first cavity. The access opening is sealed by introducing energy or heat via laser into an absorbing part of the substrate or the cap. During the step for forming the access opening, a first access opening section is formed generally perpendicularly to a surface of the substrate or the cap, and a second access opening section is formed generally perpendicularly to and in parallel to the surface.
Claims
1. A method for manufacturing a micromechanical component including a substrate, and a cap which is connected to the substrate and, together with the substrate, encloses a first cavity, a first pressure prevailing and a first gas mixture having a first chemical composition being enclosed in the first cavity, the method comprising: in a first step, forming an access opening connecting the first cavity to surroundings of the micromechanical component in the substrate or in the cap; in a second step, adjusting at least one of the first pressure and the first chemical composition in the first cavity; in a third step, sealing the access opening by introducing energy or heat into an absorbing part of the substrate or the cap, with the aid of a laser; in a first sub-step during the first step, forming a first access opening section perpendicularly to a surface of the substrate or the cap; and in a second sub-step during the first step, forming a second access opening section in parallel to the surface to relieve mechanical stresses occurring when the access opening is sealed.
2. The method as recited in claim 1, wherein the cap, together with the substrate, encloses a second cavity, a second pressure prevailing and a second gas mixture having a second chemical composition being enclosed in the second cavity.
3. The method as recited in claim 1, further comprising: in a third sub-step during the first step, a third access opening section is formed perpendicularly to the surface.
4. The method as recited in claim 3, wherein at least one of: the first access opening section is formed with the aid of anisotropic etching; the second access opening section is formed with the aid of isotropic etching; and the third access opening section is formed with the aid of anisotropic etching.
5. The method as recited in claim 1, wherein the second access opening section is configured in such a way that a first distance, extending perpendicularly to the surface, between the second access opening section and the surface is at a maximum twice as large as a second distance, extending perpendicularly to the surface, between a maximum extension of the absorbing part and the surface.
6. The method as recited in claim 1, wherein the second access opening section is configured in such a way that a ratio between a depth extending perpendicularly from the surface to where the second access opening section begins and a distance, extending perpendicularly to the surface, between the surface and a maximum extension of the absorbing part, is at most 2.
7. The method as recited in claim 1, wherein the second access opening section is configured in such a way that a ratio between a width of the second access opening section extending in parallel to the surface and a third distance, extending perpendicularly to the surface, between the second access opening section and a maximum extension of the absorbing part, is equal to or greater than 1.
8. The method as recited in claim 1, wherein the second access opening section is configured in such a way that the absorbing part of the substrate or of the cap and the material of the substrate or of the cap surrounding the second access opening section at least partially overlap.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
(1)
(2)
(3)
(4)
(5)
DETAILED DESCRIPTION OF EXAMPLE EMBODIMENTS
(6) Identical parts are denoted by the same reference numerals in the various figures and are therefore generally also cited or mentioned only once.
(7)
(8) For example, a first pressure prevails in first cavity 5, in particular when access opening 11 is sealed, as shown in
(9) It is provided, for example, that the first pressure in first cavity 5 is lower than the second pressure in the second cavity. It is also provided, for example, that a first micromechanical sensor unit for rotation rate measurement, which is not shown in
(10)
(11) Chronologically after third method step 103, it is possible for mechanical stresses to occur in a lateral area 15, shown by way of example in
(12)
(13) For this purpose, for example, in a first method sub-step during first method step 101 for forming access opening 11 shown in
(14) Furthermore, for example, first access opening section 401 is formed with the aid of anisotropic etching, second access opening section 403 is formed with the aid of isotropic etching, and third access opening section 405 is formed with the aid of anisotropic etching. In other words, a narrow access channel is created in the cap wafer or in the sensor wafer through the substrate to the MEMS cavity, preferably with the aid of anisotropic etching. Thereafter, the process is switched to an isotropic etching, for example at a defined etching depth, so that a local widening 403 of the access channel 11 takes place. Thereafter, the access channel is finished, for example with the aid of anisotropic etching.
(15) The etching depth at which the widening begins, or a distance, running essentially perpendicularly to surface 19, between surface 19 and second access opening section 403 corresponds at a maximum to twice the fusion depth, or a further distance, running essentially perpendicularly to surface 19, between surface 19 and a maximum extension of absorbing part 21, and advantageously is 1.5 times the fusion depth.
(16) Furthermore, a ratio between a widening width 409 of second access opening 403, shown in
(17)
(18) Finally,
(19) For example, it is also provided that second access opening section 403 or widening 403 or recess is combined with structures for stress relief. In other words, the structure of the micromechanical component according to the present invention may optionally also be combined with stress relief structures outside fusion area 21.