METHOD FOR MAKING A BODY WITH ARRANGED PARTICLES USING ACOUSTIC WAVES
20180186107 ยท 2018-07-05
Inventors
Cpc classification
B29C70/66
PERFORMING OPERATIONS; TRANSPORTING
B29C70/62
PERFORMING OPERATIONS; TRANSPORTING
B29C70/26
PERFORMING OPERATIONS; TRANSPORTING
International classification
B29C70/62
PERFORMING OPERATIONS; TRANSPORTING
B29C70/66
PERFORMING OPERATIONS; TRANSPORTING
Abstract
The present disclosure relates to a method for manufacturing a body comprising a particle structure fixated in a matrix material, said method comprising the steps of: providing a mixture of a viscous matrix material and particles, subjecting said particles to an acoustic standing wave, so as to arrange at least portion of said particles in a pressure node and/or a pressure antinode of the acoustic standing wave thereby creating a particle structure In said viscous matrix material and fixating said viscous matrix material so as to fixate said particle structure In said matrix material. The disclosure also relates to a body obtained by said method, and to the use of said method in various applications.
Claims
1. A method for manufacturing a film comprising a particle structure fixated in a matrix material, the method comprising the steps of: providing a mixture of a viscous matrix material and particles; subjecting the particles to an acoustic standing wave, so as to arrange at least a portion of the particles in at least one of the group consisting of a pressure node and a pressure antinode of the acoustic standing wave thereby creating a particle structure in the viscous matrix; and fixating the viscous matrix so as to fixate the particle structure in the matrix material.
2. The method of claim 1, further comprising the step of contacting the mixture with a first support and a second support.
3. The method of claim 2, wherein a pressure node is formed at an interface between the mixture and at least one of the group consisting of the first support and a pressure node is formed within the mixture.
4. The method of claim 2, wherein a pressure antinode is formed at an interface between the mixture and at least one of the group consisting of the first support and a pressure antinode is formed within the mixture.
5. The method of claim 2, further comprising a step of removal of at least one of the group consisting of the first support and the second support.
6. The method of claim 5, wherein the removal involves exposure of at least part of the particle structure.
7. The method of claim 1, wherein the body has the shape of a film with width: 0.01-100 m, thickness: 0.01-10 mm, length: 0.0001-100 km.
8. The method of claim 1, wherein the particles are selected from at least one of a group consisting of metal particles, air bubbles, oil droplets, polymer particles, carbonaceous particles, ceramic particles, bioactive particles, bacteria, viruses, archaea, fungi, sand particles, glass particles, and colloidal particles.
9. The method of claim 1, wherein the particles have substantially the same size.
10. The method of claim 1, wherein the viscous matrix material comprises or consists of a polymer.
11. The method of claim 1, wherein the viscous matrix is fixated by curing.
12. The method of claim 1, wherein the particle assemblies are further subjected to at least one of the group consisting of an electric field and a magnetic field.
13. The method of claim 1, wherein the method is used in combination with at least one of a group consisting of roll-to-roll processing, extrusion processes, 3D printing, electric and magnetic fields, optical trapping and manipulation, and printed electronics technology.
14. A body comprising a particle structure fixated in a matrix material, wherein the body is obtainable according to claim 1.
15. An article comprising or consisting of a body according to claim 13, the article being selected from at least one of a group consisting of packaging materials, printed electronics, laminated materials, textiles, paper, and containers.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0054] The disclosure will now be further illustrated with reference to exemplary embodiments, with reference to the enclosed drawings, wherein:
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[0083] It should be noted that the drawings have not been drawn to scale and that the dimensions of certain features have been exaggerated for the sake of clarity.
DEFINITIONS
[0084] Nanometer is abbreviated nm.
[0085] Micrometer is abbreviated m.
[0086] Node is used interchangeably with pressure node.
[0087] Antinode is used interchangeably with pressure antinode.
[0088] AFS is used as abbreviation for acoustophoresis.
DETAILED DESCRIPTION OF EMBODIMENTS
[0089] The device for preparing an anisotropic and/or inhomogeneous polymer film using an acoustic wave may be referred to as an acoustic force applicator (piezo). The acoustic is force applicator may be utilized for this method in a continuous process. In one or more embodiments, a continuous process may include a roll to roll process, where a roll of polymer film is provided, the polymer film is unrolled and moved through the acoustic field application zone to induce orientation in the polymer film, and rerolled on a take-up roll down line from the acoustic field application zone. In some embodiments, a continuous process may be provided where the polymer film is prepared, for example by polymer film casting on one end of the acoustic field generator, the polymer film is then moved through the acoustic field application zone to induce structures in the polymer film, and rolled on take-up roll down line from the acoustic field application zone.
[0090] Suitable polymers that may be used to create anisotropic polymer films include UV curable polymers, thermally curable polymers, and polymers in solution. The polymers may be heteropolymers or copolymers.
[0091] In one or more embodiments, the polymer film may include a block copolymer. In one or embodiments, the block copolymer may be a di-block copolymer represented by the formula: A-B, where A represents a block of repeating units and B represents a second different block of repeating units. In one or embodiments, the block copolymer may be a tri-block copolymer represented by the formula: A-B-A or A-B-C, where A represents a block of repeating units, B represents a second different block of repeating units, and C represents a third different block of repeating units. In one or embodiments, the block copolymer may be a tetra-block copolymer represented by the formula: A-B-A-B, A-B-C-A, A-B-C-B, or A-B-C-D, where A represents a block of repeating units, B represents a second different block of repeating units, and C represents a third different block of repeating units, and D represents a fourth different block of repeating units.
[0092] In embodiment that use a polymer in solution useful solvents for dissolving the polymer include, N-methyl pyrrolidine (NMP), dimethylformamide (DMF). dimethylsulfide (DMS), dimethylsulfoxide (DMSO), dimethyl acetamide (DMAC), cyclohexane, pentane, cyclohexanone, acetone, methylene chloride, carbon to tetrachloride, ethylene dichloride, chloroform, ethanol, isopropyl alcohol (IPA), butanols, THF, MEK, MIBK, toluene, heptane, hexane, 1-pentanol, water, or suitable mixtures of two or more thereof. The solvents can be both aqueous or non-aqueous.
[0093] In one or more embodiments, the concentration of polymer in solvent in the polymer solution is from about 5 weight percent to about 50 weight percent, in other embodiments from about 10 weight percent to about 45 weight percent, in other embodiments from about 15 weight percent to about 40 weight percent, in other embodiments from about 20 weight percent to about 35 weight percent, in still other embodiments from about 25 weight percent to about 30 weight percent.
[0094] As noted above, the polymer film may include particles. Suitable particle for use in preparing anisotropic polymer films include conducting particles semiconducting particles or dielectric particles. It should be noted, that in certain embodiment, particularly where a semi-conducting or conducting particle is used, an insulating layer may be required between the polymer film and the electrodes.
[0095] Suitable conductive particles may be prepared from Co, Ni, CoPt, FePt, FeCo. Fe3O4, Fe2O3, and CoFe2O4. Suitable semiconductive particles may be prepared from ZnS, CdSe, CdS, CdTe, ZnO, Si, Go, GaN, GaP, GaAS, InP, and InAs. Additional particles that may be conductive or semiconductive include carbon based nanoparticles, carbon black, carbon nanotubes (single as well as multi-walled) as well as other inorganic and organic synthetic or natural nanoparticles.
[0096] In some of the various embodiments, the size of the particles are in the range of about 0.1 nm to about 500 micrometres. In some of the various embodiments, the body has the shape of a film with width in the range of: 0.01-100 m, preferably 0.1 to 10 m, thickness 0.01-10 mm, preferable 0.1 to 1 mm and length: 0.0001-100 km, preferable above 1 m. In a roll to roll production of film, the film could be continuous and as such have an indefinite length.
[0097] The embodiments are further illustrated by the figures discussed below:
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[0105] Imaging of AFS process in film. An inverted microscope is used to image the system. Changes in height can be observed by the change in the diffraction pattern of the particle. The images in
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