Large numerical aperture phase-shifting dual pinhole diffraction interferometer and its test method

Abstract

A diffraction interferometer includes a reference light passage, a test light passage and a pinhole substrate. The pinhole substrate includes a test pinhole and a reference pinhole. The diffracted wavefront emitted from the test pinhole is reflected by the optical component to be tested adjacent to the pinhole substrate and a converge adjacent to the reference pinhole. The diffracted wavefront includes surface shape information of an optical component to be tested that is reflected by the pinhole substrate. Interference with the diffracted wavefront is emitted by the reference pinhole and forms interference fringes. The large numerical aperture phase-shifting dual pinhole diffraction interferometer adopts a dual pinhole substrate and a illumination manner with two converged light paths to enable the separation of the reference light and test light, to prevent disturbance between the two light paths, which would induce the change of interferogram status during phase-shifting.

Claims

1. A large numerical aperture phase-shifting dual pinhole diffraction interferometer, comprising: a laser source, a splitting prism, a first expanding lens, a first reflective mirror, a first convergent lens, a second expanding lens, a wedge mechanism for shifting phase of light, a second reflective mirror, a second convergent lens and a substrate, said substrate includes a first pinhole and a second pinhole, wherein light emitted by the first laser source is split into a first beam and a second beam by the splitting prism, wherein the first beam sequentially passes through the first expanding lens, the first reflective mirror and the first convergent lens, and illuminates the first pinhole on the substrate, wherein the second beam sequentially passes through the second expanding lens, the wedge mechanism for shifting phase of light, the second reflective mirror and the second convergent lens, and illuminates the second pinhole on the substrate, wherein a first diffracted light is emitted from the first pinhole and reflected by an optical component to be tested adjacent to the first pinhole, and then the first diffracted light converges adjacent to the second pinhole of the substrate and is reflected by the substrate, said first diffracted light containing surface figure information of the optical component to be tested, wherein a second diffracted light is emitted from the second pinhole, and the first diffracted light reflected by the substrate interferes with the second diffracted light emitted by the second pinhole, forming interference fringes, wherein an interferogram is obtained according to said interference fringes, wherein multiple interferograms with different phase-shifting are obtained by adjusting the wedge mechanism, and wherein surface figure deviations of the optical component to be tested are obtained by analyzing said multiple interferograms.

2. The large numerical aperture phase-shifting dual pinhole diffraction interferometer according to claim 1, further comprising an attenuating mechanism for light intensity, wherein, by adjusting said attenuating mechanism, a contrast of the interference fringes is achieved.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) These and other features and advantages of the various embodiments disclosed herein will be better understood with respect to the following description and drawings, in which:

(2) The FIGURE illustrates the light path structure of large numerical aperture phase-shifting dual pinhole diffraction interferometer of the present invention.

(3) The numbers in the FIGURE are as below:

(4) 1. work laser source;

(5) 2. calibration laser source;

(6) 3. refraction-reflection-transmission splitting prism;

(7) 4. calibration laser source shutter;

(8) 5. work laser source shutter;

(9) 6. reference beam expanding system;

(10) 7. wedge phase-shifting mechanism;

(11) 8. reference beam reflective mirror;

(12) 9. light intensity attenuating mechanism;

(13) 10. reference beam convergent system;

(14) 11. test beam expanding system;

(15) 12. test beam reflective mirror;

(16) 13. test beam convergent system;

(17) 14. pinhole substrate;

(18) 15. calibration and observation optical imaging system;

(19) 16. bright spot image optical acquisition system;

(20) 17. small field interferogram optical imaging system;

(21) 18. interferogram photo-electric acquisition system;

(22) 19. optical component to be tested;

(23) 20. orientation calibration mechanism of the optical component to be tested;

(24) 21. reference light passage (path);

(25) 22. test light passage (path);

(26) 23. reference pinhole;

(27) 24. test pinhole;

(28) 25. computer.

DETAILED DESCRIPTION

(29) The inventive principle of the invention is:

(30) The large numerical aperture phase-shifting dual pinhole diffraction interferometer of present invention adopts a dual pinhole substrate and an illuminating manner of two converged light paths, enabling the separation of reference light passage and test light passage, to prevent the disturbance between the two light paths, which would induce the change of interferogram status during phase-shifting. The small field interferogram optical imaging system is merely aligned with the reference light path/passage to image, so it can avoid the influence of the test light passage to the image, and achieve a large numerical aperture test in a phase-shifting manner. Meanwhile, it adopts multistep optical phase-shifting plate, and changes the thickness of the optical phase-shifting plate within the reference light passage via the lateral movement of the wedge phase-shifting plate, thereby changing the optical path difference between the reference light and the test light, reducing the requirement for accuracy of phase-shifting mechanism. The present invention adopts 632.8 nm helium-neon laser source as work laser source, with long interference length, so it can achieve a large dynamic range test. The features of the present invention includes: high test accuracy, large test numerical aperture, and wide test range.

(31) The large numerical aperture phase-shifting dual pinhole diffraction interferometer of the present invention comprises calibration and observation optical system, so as to adjusting the position of the optical component to be tested quickly and easily, so that the converging light point of the test light can easily return and align with the pinhole substrate. For now the development of the test device of the present invention has been completed, and the device has a small size, wherein, the device can be used no matter the axis is in horizontal state or in vertical state, and can achieve the ultra-high-precision test of the tested mirror in its working state.

(32) Below, with reference to the drawing, the present invention will be described in detail.

(33) As the FIGURE illustrates, the large numerical aperture phase-shifting dual pinhole diffraction interferometer comprises:

(34) a reference light passage 21, a test light passage 22, a pinhole substrate 14; a calibration and observation optical imaging system 15, a bright spot image optical acquisition system 16, a small field interferogram optical imaging system 17, an interferogram photo-electric acquisition system 18; an orientation calibrating mechanism 20 of optical component to be tested for calibrating optical component to be tested 19; laser sources including work laser source 1 and calibration laser source 2. Said work laser source 1 is a high-stability laser source, and suitable for long-time stably working; said calibration laser source 2 is a high-power laser source, suitable for light path calibrating and testing.

(35) There is a refraction-reflection-transmission splitting prism 3 located at said laser source, which includes work laser source 1 and calibration laser source 2. A test pinhole 24 and a reference pinhole 23 are arranged on/in said pinhole substrate 14.

(36) Via said test light passage 22, light emitted by the laser sources can sequentially approach the test beam expanding system 11 and test beam convergent system 13, then reach the test pinhole 24 on the pinhole substrate 14.

(37) Via said reference light passage 21, light emitted by the laser source can sequentially approach the reference beam expanding system 6, the wedge phase-shifting mechanism 7 and the reference laser convergent system 10, then reach the reference pinhole 23 on the pinhole substrate 14. Multiple phase-shifting interferograms can be obtained by controlling the position of wedge phase-shifting mechanism 7.

(38) The diffracted wavefront emitted at the test pinhole 24 would be reflected by the optical component to be tested 19 near pinhole substrate 14 and converge near the reference pinhole 23. Said diffracted wavefront would comprise surface shape information of the optical component to be tested 19, be reflected by pinhole substrate 14 and interfere with the diffracted wavefront emitted by the reference pinhole 23, thereby forming interference fringes. Said reference light passage 21 is further provided with a light intensity attenuating mechanism 9, by adjusting said light intensity attenuating mechanism 9, the best contrast of interference fringes can be achieved.

(39) In the working process of the large numerical aperture phase-shifting dual pinhole diffraction interferometer of the present invention, it makes use of the light from work laser source 1, which is transmitted and reflected by the refraction-reflection-transmission splitting prism 3, to provide the light for the reference light passage 21 and test light passage 22 respectively. The light of the two light paths pass through reference beam expanding system 6, wedge phase-shifting mechanism 7, reference beam reflective mirror 8, light intensity attenuating mechanism 9, reference beam convergent system 10, test beam expanding system 11, test beam reflective mirror 12, test beam convergent system 13 sequentially, and then converge and align with the reference pinhole 23 and test pinhole 24 on the pinhole substrate 14 respectively, and diffracted.

(40) The diffracted wavefront emitted by the reference pinhole 23 is used as reference wavefront for the test; the diffracted wavefront emitted by the test pinhole 24 would be reflected by the optical component to be tested 19 and converge near the reference pinhole 23, wherein said diffracted wavefront would comprise surface figure information of the optical component to be tested 19, be reflected by pinhole substrate 14 and interference with the diffracted wavefront emitted by reference pinhole 23, forming the interference fringes. Then, the small field interferogram optical imaging system 17 and interferogram photo-electric acquisition system 18 are used to get interference images; the light intensity attenuating mechanism 9 is used to adjust the contrast of the interference fringes; the wedge phase-shifting mechanism 7 is used to collect multiple phase-shifting interferograms; the high-precision surface figure deviation of optical component to be tested 19 is obtained by analyzing the information of said interferograms.

(41) The test method of the present invention by using large numerical aperture phase-shifting dual pinhole diffraction interferometer comprises the steps of:

(42) Step 1, turning on the mainframe power switch of phase-shifting point diffraction interferometer, so that the work laser source 1 and calibration laser source 2 begin to emit light and get stabilized, respectively;

(43) Step 2, arranging the optical component to be tested 19 on the orientation calibrating mechanism 20 for the optical component to be tested;

(44) Step 3, under the control of the computer 25, turning on the calibration laser source shutter 4, so that the light emitted by calibration laser source 2 enters the interferometer system after being reflected by the refraction-reflection-transmission splitting prism 3;

(45) Step 4, using the computer 25 to control the servo motors, so as to make the calibration and observation optical imaging system 15 and the bright spot image optical acquisition system 16 aligned with the reference light passage 21, adjusting the orientation calibrating mechanism 20 of the optical component to be tested by observing the bright spot image of the bright spot image optical acquisition system 16, inducing the optical component to be tested 19 changes its position, so that for the diffracted light emitted by the test pinhole 24, after it is reflected by the optical component to be tested 19, its converging light point will illuminate on the pinhole substrate 14 near the reference pinhole 23;

(46) Step 5, under the control of the computer 25, turning off the calibration laser source shutter 4, and turning on the work laser source shutter 5, so that the light emitted by the work laser source 1 enter the interferometer system via the refraction-reflection-transmission splitting prism 3, thereby forming reference light in the reference light passage 21 and test light in the test light passage 22 in the meantime;

(47) Step 6, under the control of the computer 25, removing the calibration and observation optical imaging system 15 and the bright spot image optical acquisition system 16 out of the light path, and makes the small field interferogram optical imaging system 17 and interferogram photo-electric acquisition system 18 aligned with the reference light passage 21, so that the diffracted reference light from the reference pinhole 23 is interference with the test light which is reflected by the optical component to be tested 19 and converge near the reference pinhole 23;

(48) Via the small field interferogram optical imaging system 17 and interferogram photo-electric acquisition system 18, one can observe interference fringes. Via the orientation calibration mechanism 20 of the optical component to be tested, the position of the optical component to be tested 19 is refined/fine-tuned, so that one can observe interference fringes image meeting the requirements of gathering (with the number of interference fringes as few as possible) via interferogram photo-electric acquisition system 18 on the computer 25.

(49) Step 7, adjusting the light intensity attenuating mechanism 9, to get the best contrast of the interference fringes.

(50) Step 8, using computer 25 to control the cooperation of the wedge phase-shifting mechanism 7 with the small field interferogram optical imaging system 17 and interferogram photovoltaic collection system 18, so that multiple phase-shifting interferograms are collected;

(51) Step 9, using a phase-shifting interferogram processing software to achieve the high precision test of the optical component to be tested 19.

(52) Obviously, the above description is given by way of example, rather than limitation. Given the above disclosure, one skilled in the art could implement its variations that are within the scope and spirit of the invention disclosed herein. Herein, there is no need and impossible to provide all of the implementations or embodiments. Further, the various features of the embodiments disclosed herein can be used alone, or in varying combinations with each other and are not intend to be limited to the specific combination described herein. Thus, the scope of the claims is nor to be limited by the illustrated embodiments.