SILVER-PLATED PRODUCT AND METHOD FOR PRODUCING SAME

Abstract

A silver-plated product having a higher hardness and more excellent wear resistance than those of conventional silver-plated products, and a method for producing the same. In a method for producing a silver-plated product by forming a surface layer of silver on a base material by electroplating at a current density in a silver-plating solution which is an aqueous solution containing silver potassium cyanide or silver cyanide, potassium cyanide or sodium cyanide, and a benzimidazole (such as 2-mercaptobenzmimidazole or 2-mercaptobenzimidazole sulfonic acid sodium salt dihydrate), the ratios of the concentrations of silver potassium cyanide or silver cyanide, potassium cyanide or sodium cyanide, and the imidazole to the current density during the silver-plating (or the ratios of the concentrations of silver potassium cyanide or silver cyanide and the imidazole to the current density during the silver plating, and the concentration of potassium cyanide or sodium cyanide) are set to be predetermined ranges, respectively.

Claims

1. A method for producing a silver-plated product, the method comprising the steps of: preparing a silver-plating solution which is an aqueous solution containing silver potassium cyanide, potassium cyanide and a benzimidazole, the concentration of potassium cyanide being 30 to 80 (g/L); and forming a surface layer of silver on a base material by electroplating at a current density in the silver-plating solution so as to satisfy A/D≥30 (g.Math.dm.sup.2/L.Math.A) and C/D≥1.2 (g.Math.dm.sup.2/L.Math.A) assuming that a concentration of silver potassium cyanide in the silver-plating solution is A (g/L), that the concentration of potassium cyanide in the silver-plating solution is B (g/L), that a concentration of the benzimidazole in the silver-plating solution is C (g/L) and that the current density during the electroplating is D (A/dm.sup.2).

2. A method for producing a silver-plated product, the method comprising the steps of: preparing a silver-plating solution which is an aqueous solution containing silver potassium cyanide, potassium cyanide and a benzimidazole; and forming a surface layer of silver on a base material by electroplating at a current density in the silver-plating solution so as to satisfy A/D≥30 (g.Math.dm.sup.2/L.Math.A), B/D≤100 (g.Math.dm.sup.2/L.Math.A) and C/D≥1.2 (g.Math.dm.sup.2/L.Math.A) assuming that a concentration of silver potassium cyanide in the silver-plating solution is A (g/L), that a concentration of potassium cyanide in the silver-plating solution is B (g/L), that a concentration of the benzimidazole in the silver-plating solution is C (g/L) and that the current density during the electroplating is D (A/dm.sup.2).

3. A method for producing a silver-plated product, the method comprising the steps of: preparing a silver-plating solution which is an aqueous solution containing silver cyanide, sodium cyanide and a benzimidazole, the concentration of sodium cyanide being 30 to 80 (g/L); and forming a surface layer of silver on a base material by electroplating at a current density in the silver-plating solution so as to satisfy A/D≥15 (g.Math.dm.sup.2/L.Math.A) and C/D≥1.2 (g.Math.dm.sup.2/L.Math.A) assuming that a concentration of silver cyanide in the silver-plating solution is A (g/L), that the concentration of sodium cyanide in the silver-plating solution is B (g/L), that a concentration of the benzimidazole in the silver-plating solution is C (g/L) and that the current density during the electroplating is D (A/dm.sup.2).

4. A method for producing a silver-plated product, the method comprising the steps of: preparing a silver-plating solution which is an aqueous solution containing silver cyanide, sodium cyanide and a benzimidazole; and forming a surface layer of silver on a base material by electroplating at a current density in the silver-plating solution so as to satisfy A/D≥15 (g.Math.dm.sup.2/L.Math.A), B/D≤150 (g.Math.dm.sup.2/L.Math.A) and C/D≥1.2 (g.Math.dm.sup.2/L.Math.A) assuming that a concentration of silver cyanide in the silver-plating solution is A (g/L), that a concentration of sodium cyanide in the silver-plating solution is B (g/L), that a concentration of the benzimidazole in the silver-plating solution is C (g/L) and that the current density during the electroplating is D (A/dm.sup.2).

5. A method for producing a silver-plated product as set forth in claim 2, wherein the concentration of potassium cyanide or sodium cyanide in the silver-plating solution is 30 to 80 g/L.

6. A method for producing a silver-plated product as set forth in claim 1, wherein said benzimidazole is 2-mercaptobenzimidazole or 2-mercaptobenzimidazole sulfonic acid sodium salt dihydrate.

7. A method for producing a silver-plated product as set forth in claim 1, wherein the concentration of the benzimidazole in the silver-plating solution is 0.5 to 50 g/L.

8. A method for producing a silver-plated product as set forth in claim 1, wherein said silver-plating solution contains 30 g/L or less of potassium carbonate.

9. A method for producing a silver-plated product as set forth in claim 1, wherein said electroplating is carried out at a liquid temperature of 10 to 50° C.

10. A method for producing a silver-plated product as set forth in claim 1, wherein said electroplating is carried out at a current density of 0.2 to 2.0 A/dm.sup.2.

11. A method for producing a silver-plated product as set forth in claim 1, wherein said base material is made of copper or a copper alloy.

12. A method for producing a silver-plated product as set forth in claim 1, wherein an underlying layer of nickel is formed between said base material and said surface layer.

13. A silver-plated product comprising: a base material; and a surface layer of silver which is formed on the base material, the surface layer having an average crystallite size of not greater than 25 nm and having a Vickers hardness HV of not less than 150, the amount of antimony in the surface layer being 0.1% by weight or less.

14. A silver-plated product as set forth in claim 13, wherein said surface layer is made of silver of 90 to 99% by weight.

15. A silver-plated product as set forth in claim 13, wherein said surface layer contains 1 to 10% by weight of carbon.

16. A silver-plated product as set forth in claim 13, wherein said Vickers hardness HV is not less than 160.

17. A silver-plated product as set forth in claim 13, wherein said base material is made of copper or a copper alloy.

18. A silver-plated product as set forth in claim 13, wherein an underlying layer of nickel is formed between said base material and said surface layer.

19. A method for producing a silver-plated product as set forth in claim 4, wherein the concentration of potassium cyanide or sodium cyanide in the silver-plating solution is 30 to 80 g/L.

Description

EXAMPLES

[0027] Examples of a silver-plated product and a method for producing the same according to the present invention will be described below in detail.

Example 1

[0028] First, a rolled sheet of oxygen-free copper (C1020 ½H) having a size of 67 mm×50 mm×0.3 mm was prepared as a base material (a material to be plated). As the pretreatment of the material, the material and a SUS plate were put in an alkali degreasing solution to be used as a cathode and an anode, respectively, to carry out electrolytic degreasing at 5 V for 30 seconds. The material thus electrolytic-degreased was washed with water, and then, pickled for 15 seconds in a 3% sulfuric acid.

[0029] Then, the material thus pretreated and a nickel electrode plate were used as a cathode and an anode, respectively, to electroplate (dull-nickel-plate) the material at a liquid temperature of 55° C. and at a current density of 5 A/dm.sup.2 for 80 seconds in an aqueous dull-nickel-plating solution containing 540 g/L of nickel sulfamate tetrahydrate, 25 g/L of nickel chloride and 35 g/L of boric acid, while stirring the solution at 500 rpm by means of a stirrer. After a dull-nickel-plating film was thus formed as an underlying plating film, the thickness of the substantially central portion of the dull-nickel-plating film was measured by means of an X-ray fluorescent analysis thickness meter (SFT-110A produced by Hitachi High-Tech Science Corporation). As a result, the thickness was 1 μm.

[0030] Then, the material having the underlying plating film and a titanium electrode plate coated with platinum were used as a cathode and an anode, respectively, to electroplate the material at a room temperature (25° C.) and at a current density of 2.0 A/dm.sup.2 for 10 seconds in an aqueous silver strike plating solution containing 3 g/L of silver potassium cyanide (KAg(CN).sub.2) and 90 g/L of potassium cyanide (KCN), while stirring the solution at 500 rpm by means of a stirrer. After a silver strike plating film was thus formed, the silver-strike-plated material was washed with water for sufficiently washing away the silver strike plating solution.

[0031] Then, the silver-strike-plated material and a silver electrode plate were used as a cathode and an anode, respectively, to electroplate (silver-plate) the material at a liquid temperature of 25° C. and at a current density of 0.5 A/dm.sup.2 for 18 minutes in an aqueous silver-plating solution containing 40 g/L of silver potassium cyanide (KAg(CN).sub.2), 39 g/L of potassium cyanide (KCN) and 1 g/L of 2-mercaptobenzimidazole (2-MBI), while stirring the solution at 500 rpm by means of a stirrer. The silver-plating film thus formed was washed with water, and then, dried with wind pressure by means of an air gun to obtain a silver-plated product. The thickness of the substantially central portion of the silver-plating film of the silver-plated product was measured by means of the above-described X-ray fluorescent analysis thickness meter. As a result, the thickness was 5 μm. Furthermore, assuming that the concentrations of silver potassium cyanide (KAg(CN).sub.2), potassium cyanide (KCN) and 2-mercaptobenzmimidazole (2-MBI) in the silver-plating solution during the formation of the silver-plating film of the silver-plated product were A (g/L), B (g/L) and C (g/L), respectively and that the current density during the electroplating was D (A/dm.sup.2), A/D=80 (g.Math.dm.sup.2/L.Math.A), B/D =78 (g.Math.dm.sup.2/L.Math.A) and C/D =2.0 (g.Math.dm.sup.2/L.Math.A).

[0032] The Vickers hardness HV of the silver-plated product thus obtained was measured in accordance with JIS Z2244 by applying a measuring load of 10 gf for 10 seconds using a micro-hardness testing machine (HM-221 produced by Mitutoyo Corporation). As a result, the Vickers hardness HV was 171.1.

[0033] Two silver-plated products, each of which was the same as the above-described silver-plated product, were prepared, one of the silver-plated products being indented (Inside R=1.5 mm) to be used as an indenter, and the other of the silver-plated products being used as a plate-shaped evaluation sample. Then, the wear resistance of the evaluation sample was evaluated by carrying out an abrasion test for confirming the abrasion status of the evaluation sample by observing the central portion of the sliding scratch of the evaluation sample at a magnification of 100 by means of a microscope (VHX-1000 produced by Keyence Corporation) when the reciprocating sliding movement (sliding distance=5 mm, sliding speed=1.67 mm/s) was continued until the base material was exposed while the indenter was pushed against the evaluation sample at a constant load (5N) by means of a precision sliding testing apparatus (CRS-G2050-DWA produced by Yamasaki-Seiki Laboratory Co., Ltd.). As a result, it was confirmed that the base material was not exposed after the reciprocating sliding movement was repeated 1,000 times, so that it was found that the wear resistance thereof was good. Before and after the sliding abrasion test, the contact resistance of the evaluation sample was measured at a measuring current of 10 mA while the indenter was pushed against the evaluation sample at a constant load (5N). As a result, the initial contact resistance before the sliding test was 0.32 mΩ, and the contact resistance after the sliding test was 0.13 mΩ.

[0034] The crystallite sizes in vertical directions to each crystal plane of (111), (200), (220) and (311) planes of the silver-plating film of the silver-plated product were calculated by the Scherrer's equation from the full-width at half maximum of each of peaks ((111) peak appearing at about 38°, (200) peak appearing at about 44°, (220) peak appearing at about 64° and (311) peak appearing at about)77° on the crystal planes on an X-ray diffraction pattern (XRD pattern) obtained by means of an X-ray diffractometer (Full-Automatic Multi-Purpose Horizontal X-ray diffractometer, Smart Lab produced by RIGAKU Corporation). The calculated crystallite sizes were weighted on the basis of the orientation ratio of each of the crystal planes to calculate an average crystallite size by the weighted average of the crystallite sizes on the crystal planes. As a result, the average crystallite size of the silver-plating film was 127.78 angstrom (12.778 nm). Furthermore, as the above-described orientation ratio, there was used a value (corrected intensity) which was corrected by dividing each of the X-ray diffraction peak intensities (the intensities at X-ray diffraction peaks) on the (111), (200), (220) and (311) planes of the silver-plating film by each of the relative intensity ratios (the relative intensity ratios during the measurement of powder) described on JCPDS card No.40783 ((111):(200):(220):(311)=100:40:25:26), the X-ray diffraction peak intensities being obtained from the X-ray diffraction pattern obtained by scanning in a scanning field 2θ/θ using a Cu tube and a K β filter method by means of an X-ray diffractometer (XRD) (Full-Automatic Multi-Purpose Horizontal X-ray diffractometer, Smart Lab produced by RIGAKU Corporation).

[0035] The surface analysis of the silver-plating film of the silver-plated product was carried out by the quantitative analysis based on the ZAP method, at an applied voltage of 15 kV and at an illumination current of 3.0×10.sup.−8 A in an analysis area of 50 μm square by means of an electron probe microanalyzer (EPMA) (JXA8200 produced by JEOL Ltd.). As a result, the silver-plating film was a film containing 4.1% by weight of carbon, 2.7% by weight of oxygen, 0.6% by weight of potassium and the balance being silver. Other elements (such as antimony and tin) were not detected in the silver-plating film, and the contents thereof were less than 0.1% by weight.

Example 2

[0036] A silver-plated product was produced by the same method as that in Example 1, except that the electroplating (silver-plating) for forming the silver-plating film was carried out at a current density of 0.7 A/dm.sup.2 for 13 minutes. The thickness of the substantially central portion of the silver-plating film of the silver-plated product was measured by the same method as that in Example 1, so that the thickness was 5 μm. Furthermore, in the formation of the silver-plating film of the silver-plated product, A/D=57 (g.Math.dm.sup.2/L.Math.A), B/D=56 (g.Math.dm.sup.2/L.Math.A) and C/D=1.4 (g.Math.dm.sup.2/L.Math.A).

[0037] With respect to the silver-plated product thus obtained, the measurement of the Vickers hardness HV of the silver-plating film, the evaluation of the wear resistance thereof and the calculation of the crystallite sizes thereof were carried out by the same methods as those in Example 1. As a result, the Vickers hardness HV was 187.7. It was confirmed that the base material was not exposed after the reciprocating sliding movement was repeated 1,000 times, so that it was found that the wear resistance thereof was good. The average crystallite size of the silver-plating film was 147.34 angstrom (14.734 nm).

[0038] The surface analysis of the silver-plating film of the silver-plated product was carried out by the same method as that in Example 1, so that the silver-plating film was a film containing 3.6% by weight of carbon and the balance being silver. Other elements (such as antimony and tin) were not detected in the silver-plating film, and the contents thereof were less than 0.1% by weight.

Example 3

[0039] A silver-plated product was produced by the same method as that in Example 1, except that the amount of 2-mercaptobenzmimidazole (2-MBI) in the silver-plating solution was 2 g/L. The thickness of the substantially central portion of the silver-plating film of the silver-plated product was measured by the same method as that in Example 1, so that the thickness was 5 μm. Furthermore, in the formation of the silver-plating film of the silver-plated product, A/D=80 (g.Math.dm.sup.2/L.Math.A), B/D=78 (g.Math.dm.sup.2/L.Math.A) and C/D=4.0 (g.Math.dm.sup.2/L.Math.A).

[0040] With respect to the silver-plated product thus obtained, the measurement of the Vickers hardness HV of the silver-plating film, the evaluation of the wear resistance thereof and the calculation of the crystallite sizes thereof were carried out by the same methods as those in Example 1. As a result, the Vickers hardness HV was 165.6.

[0041] It was confirmed that the base material was not exposed after the reciprocating sliding movement was repeated 1,000 times, so that it was found that the wear resistance thereof was good. The average crystallite size of the silver-plating film was 143.70 angstrom (14.370 nm).

[0042] The surface analysis of the silver-plating film of the silver-plated product was carried out by the same method as that in Example 1. As a result, the silver-plating film was a film containing 5.3% by weight of carbon, 0.6% by weight of sulfur and the balance being silver. Other elements (such as antimony and tin) were not detected in the silver-plating film, and the contents thereof were less than 0.1% by weight.

Example 4

[0043] A silver-plated product was produced by the same method as that in Example 1, except that the amount of silver potassium cyanide (KAg(CN).sub.2) in the silver-plating solution was 100 g/L. The thickness of the substantially central portion of the silver-plating film of the silver-plated product was measured by the same method as that in Example 1, so that the thickness was 5 μm. Furthermore, in the formation of the silver-plating film of the silver-plated product, A/D=200 (g dm.sup.2/L.Math.A), B/D=78 (g.Math.dm.sup.2/L.Math.A) and C/D=2.0 (g.Math.dm.sup.2/L.Math.A).

[0044] With respect to the silver-plated product thus obtained, the measurement of the Vickers hardness HV of the silver-plating film, the evaluation of the wear resistance thereof and the calculation of the crystallite sizes thereof were carried out by the same methods as those in Example 1. As a result, the Vickers hardness HV was 181.2. It was confirmed that the base material was not exposed after the reciprocating sliding movement was repeated 1,000 times, so that it was found that the wear resistance thereof was good. The average crystallite size of the silver-plating film was 231.46 angstrom (23.146 nm).

Example 5

[0045] A silver-plated product was produced by the same method as that in Example 1, except that the amount of silver potassium cyanide (KAg(CN).sub.2) in the silver-plating solution was 100 g/L, that the amount of 2-mercaptobenzmimidazole (2-MBI) in the silver-plating solution was 2 g/L and that the electroplating (silver-plating) was carried out at a current density of 1.5 A/dm.sup.2 for 6 minutes. The thickness of the substantially central portion of the silver-plating film of the silver-plated product was measured by the same method as that in Example 1, so that the thickness was 5 μm. Furthermore, in the formation of the silver-plating film of the silver-plated product, A/D=67 (g.Math.dm.sup.2/L.Math.A), B/D=26 (g.Math.dm.sup.2/L.Math.A) and C/D=1.3 (g.Math.dm.sup.2/L.Math.A).

[0046] With respect to the silver-plated product thus obtained, the measurement of the Vickers hardness HV of the silver-plating film, the evaluation of the wear resistance thereof and the calculation of the crystallite sizes thereof were carried out by the same methods as those in Example 1. As a result, the Vickers hardness HV was 165.5. It was confirmed that the base material was not exposed after the reciprocating sliding movement was repeated 1,000 times, so that it was found that the wear resistance thereof was good. The average crystallite size of the silver-plating film was 100.15 angstrom (10.015 nm).

Example 6

[0047] A silver-plated product was produced by the same method as that in Example 1, except that an aqueous silver-plating solution containing 40 g/L of silver potassium cyanide (KAg(CN).sub.2), 39 g/L of potassium cyanide (KCN), 1 g/L of 2-mercaptobenzimidazole (2-MBI) and 20 g/L of potassium carbonate (K.sub.2CO.sub.3) was used as the silver-plating solution. The thickness of the substantially central portion of the silver-plating film of the silver-plated product was measured by the same method as that in Example 1, so that the thickness was 5 μm. Furthermore, in the formation of the silver-plating film of the silver-plated product, A/D=80 (g.Math.dm.sup.2/L.Math.A) , B/D=78 (g.Math.dm.sup.2/L.Math.A) and C/D=2.0 (g.Math.dm.sup.2/L.Math.A).

[0048] With respect to the silver-plated product thus obtained, the measurement of the Vickers hardness HV of the silver-plating film, the evaluation of the wear resistance thereof and the calculation of the crystallite sizes thereof were carried out by the same methods as those in Example 1. As a result, the Vickers hardness HV was 188.6. It was confirmed that the base material was not exposed after the reciprocating sliding movement was repeated 1,000 times, so that it was found that the wear resistance thereof was good. The average crystallite size of the silver-plating film was 166.07 angstrom (16.607 nm).

Example 7

[0049] A silver-plated product was produced by the same method as that in Example 1, except that the dull-nickel-plating film was not formed. The thickness of the substantially central portion of the silver-plating film of the silver-plated product was measured by the same method as that in Example 1, so that the thickness was 5 μm. Furthermore, in the formation of the silver-plating film of the silver-plated product, A/D=80 (g.Math.dm.sup.2/L.Math.A), B/D=78 (g.Math.dm.sup.2/L.Math.A) and C/D=2.0 (g.Math.dm.sup.2/L.Math.A).

[0050] With respect to the silver-plated product thus obtained, the measurement of the Vickers hardness HV of the silver-plating film, the evaluation of the wear resistance thereof and the calculation of the crystallite sizes thereof were carried out by the same methods as those in Example 1. As a result, the Vickers hardness HV was 175.7. It was confirmed that the base material was not exposed after the reciprocating sliding movement was repeated 1,000 times, so that it was found that the wear resistance thereof was good. The average crystallite size of the silver-plating film was 156.82 angstrom (15.682 nm).

Example 8

[0051] A silver-plated product was produced by the same method as that in Example 7, except that the electroplating (silver-plating) for forming the silver-plating film was carried out at a current density of 1 A/dm.sup.2 for 9 minutes. The thickness of the substantially central portion of the silver-plating film of the silver-plated product was measured by the same method as that in Example 1, so that the thickness was 5 μm. Furthermore, in the formation of the silver-plating film of the silver-plated product, A/D=40 (g.Math.dm.sup.2/L.Math.A), B/D=39 (g.Math.dm.sup.2/L.Math.A) and C/D=2.0 (g.Math.dm.sup.2/L.Math.A).

[0052] With respect to the silver-plated product thus obtained, the measurement of the Vickers hardness HV of the silver-plating film, the evaluation of the wear resistance thereof and the calculation of the crystallite sizes thereof were carried out by the same methods as those in Example 1. As a result, the Vickers hardness HV was 170.4. It was confirmed that the base material was not exposed after the reciprocating sliding movement was repeated 1,000 times, so that it was found that the wear resistance thereof was good. The average crystallite size of the silver-plating film was 156.82 angstrom (15.682 nm).

Example 9

[0053] A silver-plated product was produced by the same method as that in Example 1, except that the electroplating (silver-plating) for forming the silver-plating film was carried out at a liquid temperature of 18° C. The thickness of the substantially central portion of the silver-plating film of the silver-plated product was measured by the same method as that in Example 1, so that the thickness was 5 μm. Furthermore, in the formation of the silver-plating film of the silver-plated product, A/D=80 (g.Math.dm.sup.2/L.Math.A) , B/D=78 (g.Math.dm.sup.2/L.Math.A) and C/D=2.0 (g.Math.dm.sup.2/L.Math.A).

[0054] With respect to the silver-plated product thus obtained, the measurement of the Vickers hardness HV of the silver-plating film, the evaluation of the wear resistance thereof and the calculation of the crystallite sizes thereof were carried out by the same methods as those in Example 1. As a result, the Vickers hardness HV was 194.1. It was confirmed that the base material was not exposed after the reciprocating sliding movement was repeated 1,000 times, so that it was found that the wear resistance thereof was good. The average crystallite size of the silver-plating film was 105.03 angstrom (10.503 nm).

Example 10

[0055] A silver-plated product was produced by the same method as that in Example 1, except that the electroplating (silver-plating) for forming the silver-plating film was carried out at a liquid temperature of 35° C. The thickness of the substantially central portion of the silver-plating film of the silver-plated product was measured by the same method as that in Example 1, so that the thickness was 5 μm. Furthermore, in the formation of the silver-plating film of the silver-plated product, A/D=80 (g.Math.dm.sup.2/L.Math.A) , B/D=78 (g.Math.dm.sup.2/L.Math.A) and C/D=2.0 (g.Math.dm.sup.2/L.Math.A).

[0056] With respect to the silver-plated product thus obtained, the measurement of the Vickers hardness HV of the silver-plating film, the evaluation of the wear resistance thereof and the calculation of the crystallite sizes thereof were carried out by the same methods as those in Example 1. As a result, the Vickers hardness HV was 185.8. It was confirmed that the base material was not exposed after the reciprocating sliding movement was repeated 1,000 times, so that it was found that the wear resistance thereof was good. The average crystallite size of the silver-plating film was 168.56 angstrom (16.856 nm).

Example 11

[0057] A silver-plated product was produced by the same method as that in Example 3, except that the electroplating time for forming the silver-plating film was 7.2 minutes. The thickness of the substantially central portion of the silver-plating film of the silver-plated product was measured by the same method as that in Example 1, so that the thickness was 2 μm. Furthermore, in the formation of the silver-plating film of the silver-plated product, A/D=80 (g.Math.dm.sup.2/L.Math.A) , B/D=78 (g.Math.dm.sup.2/L.Math.A) and C/D=4.0 (g.Math.dm.sup.2/L.Math.A).

[0058] With respect to the silver-plated product thus obtained, the measurement of the Vickers hardness HV of the silver-plating film, the evaluation of the wear resistance thereof and the calculation of the crystallite sizes thereof were carried out by the same methods as those in Example 1. As a result, the Vickers hardness HV was 154.3. It was confirmed that the base material was not exposed after the reciprocating sliding movement was repeated 800 times, so that it was found that the wear resistance thereof was good. The average crystallite size of the silver-plating film was 209.40 angstrom (20.940 nm).

Comparative Example 1

[0059] A silver-plated product was produced by the same method as that in Example 1, except that an aqueous silver-plating solution containing 40 g/L of silver potassium cyanide (KAg(CN).sub.2) and 39 g/L of potassium cyanide (KCN) was used as the silver-plating solution. The thickness of the substantially central portion of the silver-plating film of the silver-plated product was measured by the same method as that in Example 1, so that the thickness was 5 μm. Furthermore, in the formation of the silver-plating film of the silver-plated product, A/D=80 (g.Math.dm.sup.2/L.Math.A) , B/D=78 (g.Math.dm.sup.2/L.Math.A) and C/D=0 (g.Math.dm.sup.2/L.Math.A).

[0060] With respect to the silver-plated product thus obtained, the measurement of the Vickers hardness HV of the silver-plating film, the evaluation of the wear resistance thereof and the calculation of the crystallite sizes thereof were carried out by the same methods as those in Example 1. As a result, the Vickers hardness HV was 105.8. It was confirmed that the base material was exposed after the reciprocating sliding movement was repeated 60 times, so that it was found that the wear resistance thereof was not good. The average crystallite size of the silver-plating film was 434.98 angstrom (43.498 nm).

Comparative Example 2

[0061] A silver-plated product was produced by the same method as that in Comparative Example 1, except that the electroplating (silver-plating) for forming the silver-plating film was carried out at a current density of 1.5 A/dm.sup.2 for 6 minutes. The thickness of the substantially central portion of the silver-plating film of the silver-plated product was measured by the same method as that in Example 1, so that the thickness was 5 μm. Furthermore, in the formation of the silver-plating film of the silver-plated product, A/D=27 (g.Math.dm.sup.2/L.Math.A), B/D=26 (g.Math.dm.sup.2/L.Math.A) and C/D=0 (g.Math.dm.sup.2/L.Math.A).

[0062] With respect to the silver-plated product thus obtained, the measurement of the Vickers hardness HV of the silver-plating film and the calculation of the crystallite sizes thereof were carried out by the same methods as those in Example 1. As a result, the Vickers hardness HV was 112.7, and the average crystallite size of the silver-plating film was 625.39 angstrom (62.539 nm). Furthermore, the sliding abrasion test for the silver-plated product was not carried out since uneven appearance was observed on the surface of the silver-plating film.

Comparative Example 3

[0063] A silver-plated product was produced by the same method as that in Example 1, except that the electroplating (silver-plating) for forming the silver-plating film was carried out at a current density of 1 A/dm.sup.2 for 9 minutes. The thickness of the substantially central portion of the silver-plating film of the silver-plated product was measured by the same method as that in Example 1, so that the thickness was 5 μm. Furthermore, in the formation of the silver-plating film of the silver-plated product, A/D=40 (g.Math.dm.sup.2/L.Math.A), B/D=39 (g.Math.dm.sup.2/L.Math.A) and C/D=1.0 (g.Math.dm.sup.2/L.Math.A).

[0064] With respect to the silver-plated product thus obtained, the measurement of the Vickers hardness HV of the silver-plating film and the calculation of the crystallite sizes thereof were carried out by the same methods as those in Example 1. As a result, the Vickers hardness HV was 131.2, and the average crystallite size of the silver-plating film was 160.06 angstrom (16.006 nm). Furthermore, the sliding abrasion test for the silver-plated product was not carried out since uneven appearance was observed on the surface of the silver-plating film.

Comparative Example 4

[0065] A silver-plated product was produced by the same method as that in Example 3, except that the electroplating (silver-plating) for forming the silver-plating film was carried out at a current density of 1.5 A/dm.sup.2 for 6 minutes. The thickness of the substantially central portion of the silver-plating film of the silver-plated product was measured by the same method as that in Example 1, so that the thickness was 5 μm. Furthermore, in the formation of the silver-plating film of the silver-plated product, A/D=27 (g.Math.dm.sup.2/L.Math.A), B/D=26 (g.Math.dm.sup.2/L.Math.A) and C/D=1.3 (g.Math.dm.sup.2/L.Math.A).

[0066] With respect to the silver-plated product thus obtained, the measurement of the Vickers hardness HV of the silver-plating film, the evaluation of the wear resistance thereof and the calculation of the crystallite sizes thereof were carried out by the same methods as those in Example 1. As a result, the Vickers hardness HV was 131.1. It was confirmed that the base material was exposed after the reciprocating sliding movement was repeated 100 times, so that it was found that the wear resistance thereof was not good. The average crystallite size of the silver-plating film was 105.20 angstrom (10.520 nm).

Comparative Example 5

[0067] A silver-plated product was produced by the same method as that in Example 1, except that the amount of potassium cyanide (KCN) in the silver-plating solution was 99 g/L and that the electroplating (silver-plating) was carried out at a current density of 1.5 A/dm.sup.2 for 6 minutes. The thickness of the substantially central portion of the silver-plating film of the silver-plated product was measured by the same method as that in Example 1, so that the thickness was 5 μm. Furthermore, in the formation of the silver-plating film of the silver-plated product, A/D=27 (g.Math.dm.sup.2/L.Math.A), B/D=66 (g.Math.dm.sup.2/L.Math.A) and C/D=0.7 (g.Math.dm.sup.2/L.Math.A).

[0068] With respect to the silver-plated product thus obtained, the measurement of the Vickers hardness HV of the silver-plating film and the calculation of the crystallite sizes thereof were carried out by the same methods as those in Example 1. As a result, the Vickers hardness HV was 118.6, and the average crystallite size of the silver-plating film was 318.16 angstrom (31.816 nm). Furthermore, the sliding abrasion test for the silver-plated product was not carried out since uneven appearance was observed on the surface of the silver-plating film.

Comparative Example 6

[0069] A silver-plated product was produced by the same method as that in Example 3, except that the amount of potassium cyanide (KCN) in the silver-plating solution was 99 g/L. The thickness of the substantially central portion of the silver-plating film of the silver-plated product was measured by the same method as that in Example 1, so that the thickness was 5 μm. Furthermore, in the formation of the silver-plating film of the silver-plated product, A/D=80 (g.Math.dm.sup.2/L.Math.A) , B/D=198 (g.Math.dm.sup.2/L.Math.A) and C/D=4.0 (g.Math.dm.sup.2/L.Math.A).

[0070] With respect to the silver-plated product thus obtained, the measurement of the Vickers hardness HV of the silver-plating film, the evaluation of the wear resistance thereof and the calculation of the crystallite sizes thereof were carried out by the same methods as those in Example 1. As a result, the Vickers hardness HV was 121.3. It was confirmed that the base material was exposed after the reciprocating sliding movement was repeated 80 times, so that it was found that the wear resistance thereof was not good. The average crystallite size of the silver-plating film was 736.65 angstrom (73.665 nm).

Comparative Example 7

[0071] A silver-plated product was produced by the same method as that in Example 4, except that the electroplating (silver-plating) for forming the silver-plating film was carried out at a current density of 1 A/dm.sup.2 for 9 minutes. The thickness of the substantially central portion of the silver-plating film of the silver-plated product was measured by the same method as that in Example 1, so that the thickness was 5 μm. Furthermore, in the formation of the silver-plating film of the silver-plated product, A/D=100 (g.Math.dm.sup.2/L.Math.A), B/D=39 (g.Math.dm.sup.2/L.Math.A) and C/D=1.0 (g.Math.dm.sup.2/L.Math.A).

[0072] With respect to the silver-plated product thus obtained, the measurement of the Vickers hardness HV of the silver-plating film, the evaluation of the wear resistance thereof and the calculation of the crystallite sizes thereof were carried out by the same methods as those in Example 1. As a result, the Vickers hardness HV was 138.4. It was confirmed that the base material was exposed after the reciprocating sliding movement was repeated 200 times, so that it was found that the wear resistance thereof was not good. The average crystallite size of the silver-plating film was 205.78 angstrom (20.578 nm).

Comparative Example 8

[0073] A silver-plated product was produced by the same method as that in Example 4, except that the electroplating (silver-plating) for forming the silver-plating film was carried out at a current density of 1.5 A/dm.sup.2 for 6 minutes. The thickness of the substantially central portion of the silver-plating film of the silver-plated product was measured by the same method as that in Example 1, so that the thickness was 5 μm. Furthermore, in the formation of the silver-plating film of the silver-plated product, A/D=67 (g.Math.dm.sup.2/L.Math.A), B/D=26 (g.Math.dm.sup.2/L.Math.A) and C/D=0.7 (g.Math.dm.sup.2/L.Math.A).

[0074] With respect to the silver-plated product thus obtained, the measurement of the Vickers hardness HV of the silver-plating film and the calculation of the crystallite sizes thereof were carried out by the same methods as those in Example 1. As a result, the Vickers hardness HV was 130.8, and the average crystallite size of the silver-plating film was 318.46 angstrom (31.846 nm). Furthermore, the sliding abrasion test for the silver-plated product was not carried out since uneven appearance was observed on the surface of the silver-plating film.

Comparative Example 9

[0075] A silver-plated product was produced by the same method as that in Example 1, except that the electroplating (silver-plating) was carried out at a current density of 1.5 A/dm.sup.2 for 6 minutes in an aqueous silver-plating solution containing 100 g/L of silver potassium cyanide (KAg(CN).sub.2), 99 g/L of potassium cyanide (KCN) and 1 g/L of 2-mercaptobenzmimidazole (2-MBI). The thickness of the substantially central portion of the silver-plating film of the silver-plated product was measured by the same method as that in Example 1, so that the thickness was 5 μm. Furthermore, in the formation of the silver-plating film of the silver-plated product, A/D=67 (g.Math.dm.sup.2/L.Math.A) , B/D=66 (g.Math.dm.sup.2/L.Math.A) and C/D=0.7 (g.Math.dm.sup.2/L.Math.A).

[0076] With respect to the silver-plated product thus obtained, the measurement of the Vickers hardness HV of the silver-plating film and the calculation of the crystallite sizes thereof were carried out by the same methods as those in Example 1. As a result, the Vickers hardness HV was 120.1, and the average crystallite size of the silver-plating film was 381.93 angstrom (38.193 nm). Furthermore, the sliding abrasion test was not carried out since uneven appearance was observed on the surface of the silver-plating film.

Comparative Example 10

[0077] A silver-plated product was produced by the same method as that in Example 3, except that the amounts of silver potassium cyanide (KAg(CN).sub.2) and potassium cyanide (KCN) in the silver-plating solution were 100 g/L and 99 g/L, respectively. The thickness of the substantially central portion of the silver-plating film of the silver-plated product was measured by the same method as that in Example 1, so that the thickness was 5 μm. Furthermore, in the formation of the silver-plating film of the silver-plated product, A/D=200 (g.Math.dm.sup.2/L.Math.A), B/D=198 (g.Math.dm.sup.2/L.Math.A) and C/D=4.0 (g.Math.dm.sup.2/L.Math.A).

[0078] With respect to the silver-plated product thus obtained, the measurement of the Vickers hardness HV of the silver-plating film, the evaluation of the wear resistance thereof and the calculation of the crystallite sizes thereof were carried out by the same methods as those in Example 1. As a result, the Vickers hardness HV was 121.4. It was confirmed that the base material was exposed after the reciprocating sliding movement was repeated 70 times, so that it was found that the wear resistance thereof was not good. The average crystallite size of the silver-plating film was 391.48 angstrom (39.148 nm).

Comparative Example 11

[0079] A silver-plated product was produced by the same method as that in Example 1, except that the electroplating (silver-plating) was carried out at a current density of 2 A/dm.sup.2 for 5 minutes in an aqueous silver-plating solution containing 115 g/L of silver potassium cyanide (KAg(CN).sub.2), 60 g/L of potassium cyanide (KCN) and 40 mg/L of selenium. The thickness of the substantially central portion of the silver-plating film of the silver-plated product was measured by the same method as that in Example 1, so that the thickness was 5 μm. Furthermore, in the formation of the silver-plating film of the silver-plated product, A/D=58 (g.Math.dm.sup.2/L.Math.A), B/D=30 (g.Math.dm.sup.2/L.Math.A) and C/D=0 (g.Math.dm.sup.2/L.Math.A).

[0080] With respect to the silver-plated product thus obtained, the measurement of the Vickers hardness HV of the silver-plating film, the evaluation of the wear resistance thereof and the calculation of the crystallite sizes thereof were carried out by the same methods as those in Example 1. As a result, the Vickers hardness HV was 118.9.

[0081] It was confirmed that the base material was exposed after the reciprocating sliding movement was repeated 100 times, so that it was found that the wear resistance thereof was not good. The average crystallite size of the silver-plating film was 635.73 angstrom (63.573 nm).

Comparative Example 12

[0082] A silver-plated product was produced by the same method as that in Example 1, except that the electroplating (silver-plating) was carried out at a liquid temperature of 16° C. and at a current density of 8 A/dm.sup.2 for 80 seconds (1.3 minutes) in an aqueous silver-plating solution containing 148 g/L of silver potassium cyanide (KAg(CN).sub.2), 140 g/L of potassium cyanide (KCN) and 8 mg/L of selenium. The thickness of the substantially central portion of the silver-plating film of the silver-plated product was measured by the same method as that in Example 1, so that the thickness was 5 μm. Furthermore, in the formation of the silver-plating film of the silver-plated product, A/D=19 (g.Math.dm.sup.2/L.Math.A), B/D=18 (g.Math.dm.sup.2/L.Math.A) and C/D=0 (g.Math.dm.sup.2/L.Math.A).

[0083] With respect to the silver-plated product thus obtained, the measurement of the Vickers hardness HV of the silver-plating film, the evaluation of the wear resistance thereof and the calculation of the crystallite sizes thereof were carried out by the same methods as those in Example 1. As a result, the Vickers hardness HV was 82.4. It was confirmed that the base material was exposed after the reciprocating sliding movement was repeated 50 times, so that it was found that the wear resistance thereof was not good. The average crystallite size of the silver-plating film was 749.72 angstrom (74.972 nm).

Comparative Example 13

[0084] A silver-plated product was produced by the same method as that in Example 1, except that the electroplating (silver-plating) was carried out at a liquid temperature of 18° C. and at a current density of 5 A/dm.sup.2 for 2 minutes in an aqueous silver-plating solution containing 175 g/L of silver potassium cyanide (KAg(CN).sup.2), 95 g/L of potassium cyanide (KCN) and 70 mg/L of selenium. The thickness of the substantially central portion of the silver-plating film of the silver-plated product was measured by the same method as that in Example 1, so that the thickness was 5 μm. Furthermore, in the formation of the silver-plating film of the silver-plated product, A/D=35 (g.Math.dm.sup.2/L.Math.A), B/D=19 (g.Math.dm.sup.2/L.Math.A) and C/D=0 (g.Math.dm.sup.2/L.Math.A).

[0085] With respect to the silver-plated product thus obtained, the measurement of the Vickers hardness HV of the silver-plating film, the evaluation of the wear resistance thereof and the calculation of the crystallite sizes thereof were carried out by the same methods as those in Example 1. As a result, the Vickers hardness HV was 133.8. It was confirmed that the base material was exposed after the reciprocating sliding movement was repeated 80 times, so that it was found that the wear resistance thereof was not good. The average crystallite size of the silver-plating film was 278.25 angstrom (27.825 nm).

Comparative Example 14

[0086] A silver-plated product was produced by the same method as that in Example 1, except that the electroplating (silver-plating) was carried out at a current density of 1 A/dm.sup.2 for 9 minutes in an aqueous silver-plating solution containing 40 g/L of silver potassium cyanide (KAg(CN).sub.2), 39 g/L of potassium cyanide (KCN), 1 g/L of 2-mercaptobenzmimidazole (2-MBI) and 20 g/L of potassium carbonate (K.sub.2CO.sub.3). The thickness of the substantially central portion of the silver-plating film of the silver-plated product was measured by the same method as that in Example 1, so that the thickness was 5 μm. Furthermore, in the formation of the silver-plating film of the silver-plated product, A/D=40 (g.Math.dm.sup.2/L.Math.A), B/D=39 (g.Math.dm.sup.2/L.Math.A) and C/D=1.0 (g.Math.dm.sup.2/L.Math.A).

[0087] With respect to the silver-plated product thus obtained, the measurement of the Vickers hardness HV of the silver-plating film, the evaluation of the wear resistance thereof and the calculation of the crystallite sizes thereof were carried out by the same methods as those in Example 1. As a result, the Vickers hardness HV was 134.4. It was confirmed that the base material was exposed after the reciprocating sliding movement was repeated times of less than 10, so that it was found that the wear resistance thereof was not good. The average crystallite size of the silver-plating film was 192.83 angstrom (19.283 nm).

Comparative Example 15

[0088] A silver-plated product was produced by the same method as that in Example 1, except that the dull-nickel-plating film was formed by electroplating at a liquid temperature of 50° C. and at a current density of 4 A/dm.sup.2 for 140 seconds, that the silver strike plating film was formed by electroplating at a current density of 2.0 A/dm.sup.2 for 30 second and that the silver-plating film was formed by electroplating (silver-plating) at a liquid temperature of 18° C. and at a current density of 3 A/dm.sup.2 for 500 seconds (8.3 minutes) in an Ag—Sb plating solution (a plating solution prepared by adding Nissin Bright N (produced by Nissin Kasei Co., Ltd.) to a silver-plating solution (Na bath) produced by Nissin Kasei Co., Ltd.). The thickness of the substantially central portion of the dull-nickel-plating film of the silver-plated product was measured by the same method as that in Example 1, so that the thickness was 1 μm. The thickness of the substantially central portion of the silver-plating film of the silver-plated product was measured by the same method as that in Example 1, so that the thickness was 5 μm. Furthermore, in the formation of the silver-plating film of the silver-plated product, B/D=0 (g.Math.dm.sup.2/L.Math.A) and C/D=0 (g.Math.dm.sup.2/L.Math.A).

[0089] With respect to the silver-plated product thus obtained, the measurement of the Vickers hardness HV of the silver-plating film, the evaluation of the wear resistance thereof and the calculation of the crystallite sizes thereof were carried out by the same methods as those in Example 1. As a result, the Vickers hardness HV was 170.4. It was confirmed that the base material was exposed after the reciprocating sliding movement was repeated 150 times, so that it was found that the wear resistance thereof was not good. The average crystallite size of the silver-plating film was 126.11 angstrom (12.611 nm).

[0090] The surface analysis of the silver-plating film of the silver-plated product was carried out by the same method as that in Example 1. As a result, the silver-plating film was a film containing 1.6% by weight of carbon, 2.9% by weight of antimony and the balance being silver.

Example 12

[0091] A silver-plated product was produced by the same method as that in Example 1, except that an aqueous silver-plating solution containing 100 g/L of silver potassium cyanide (KAg(CN).sup.2), 39 g/L of potassium cyanide (KCN) and 20 g/L of 2-mercaptobenzimidazole sulfonic acid sodium salt dihydrate (2-MBIS) was used as the silver-plating solution and that the electroplating (silver-plating) was carried out at a current density of 0.7 A/dm.sup.2 for 13 minutes. The thickness of the substantially central portion of the silver-plating film of the silver-plated product was measured by the same method as that in Example 1, so that the thickness was 5 μm. Furthermore, assuming that the concentrations of silver potassium cyanide (KAg(CN).sup.2), potassium cyanide (KCN) and 2-mercaptobenzimidazole sulfonic acid sodium salt dihydrate (2-MBIS) in the silver-plating solution for forming the silver-plating film of the silver-plated product were A (g/L), B (g/L) and C (g/L), respectively and that the current density during the electroplating was D (A/dm.sup.2), A/D=143 (g.Math.dm.sup.2/L.Math.A), B/D=56 (g.Math.dm.sup.2/L.Math.A) and C/D=28.6 (g.Math.dm.sup.2/L.Math.A).

[0092] With respect to the silver-plated product thus obtained, the measurement of the Vickers hardness HV of the silver-plating film, the evaluation of the wear resistance thereof and the calculation of the crystallite sizes thereof were carried out by the same methods as those in Example 1. As a result, the Vickers hardness HV was 226. It was confirmed that the base material was not exposed after the reciprocating sliding movement was repeated 1,000 times, so that it was found that the wear resistance thereof was good. The average crystallite size of the silver-plating film was 97 angstrom (9.7 nm).

Example 13

[0093] A silver-plated product was produced by the same method as that in Example 12, except that the electroplating (silver-plating) for forming the silver-plating film was carried out at a current density of 1.0 A/dm.sup.2 for 9 minutes. The thickness of the substantially central portion of the silver-plating film of the silver-plated product was measured by the same method as that in Example 1, so that the thickness was 5 μm. Furthermore, in the formation of the silver-plating film of the silver-plated product, A/D=100 (g.Math.dm.sup.2/L.Math.A), B/D=39 (g.Math.dm.sup.2/L.Math.A) and C/D=20.0 (g.Math.dm.sup.2/L.Math.A).

[0094] With respect to the silver-plated product thus obtained, the measurement of the Vickers hardness HV of the silver-plating film, the evaluation of the wear resistance thereof and the calculation of the crystallite sizes thereof were carried out by the same methods as those in Example 1. As a result, the Vickers hardness HV was 175. It was confirmed that the base material was not exposed after the reciprocating sliding movement was repeated 1,000 times, so that it was found that the wear resistance thereof was good. The average crystallite size of the silver-plating film was 112 angstrom (11.2 nm).

Example 14

[0095] A silver-plated product was produced by the same method as that in Example 12, except that the electroplating (silver-plating) for forming the silver-plating film was carried out at a current density of 1.5 A/dm.sup.2 for 6 minutes. The thickness of the substantially central portion of the silver-plating film of the silver-plated product was measured by the same method as that in Example 1, so that the thickness was 5 μm. Furthermore, in the formation of the silver-plating film of the silver-plated product, A/D=67 (g.Math.dm.sup.2/L.Math.A), B/D=26 (g.Math.dm.sup.2/L.Math.A) and C/D=13.3 (g.Math.dm.sup.2/L.Math.A).

[0096] With respect to the silver-plated product thus obtained, the measurement of the Vickers hardness HV of the silver-plating film, the evaluation of the wear resistance thereof and the calculation of the crystallite sizes thereof were carried out by the same methods as those in Example 1. As a result, the Vickers hardness HV was 155. It was confirmed that the base material was not exposed after the reciprocating sliding movement was repeated 500 times, so that it was found that the wear resistance thereof was good. The average crystallite size of the silver-plating film was 138 angstrom (13.8 nm).

Example 15

[0097] A silver-plated product was produced by the same method as that in Example 1, except that an aqueous silver-plating solution containing 27 g/L of silver cyanide (AgCN), 39 g/L of sodium cyanide (NaCN) and 1 g/L of 2-mercaptobenzimidazole (2-MBI) was used as the silver-plating solution and that the electroplating (silver-plating) was carried out at a current density of 0.5 A/dm.sup.2 for 18 minutes. The thickness of the substantially central portion of the silver-plating film of the silver-plated product was measured by the same method as that in Example 1, so that the thickness was 5 μm. Furthermore, assuming that the concentrations of silver cyanide (AgCN), sodium cyanide (NaCN) and 2-mercaptobenzimidazole (2-MBI) in the silver-plating solution for forming the silver-plating film of the silver-plated product were A (g/L), B (g/L) and C (g/L), respectively and that the current density during the electroplating was D (A/dm.sup.2) , A/D=54 (g.Math.dm.sup.2/L.Math.A), B/D=78 (g.Math.dm.sup.2/L.Math.A) and C/D=2.0 (g.Math.dm.sup.2/L.Math.A).

[0098] With respect to the silver-plated product thus obtained, the measurement of the Vickers hardness HV of the silver-plating film, the evaluation of the wear resistance thereof and the calculation of the crystallite sizes thereof were carried out by the same methods as those in Example 1. As a result, the Vickers hardness HV was 166. It was confirmed that the base material was not exposed after the reciprocating sliding movement was repeated 1,000 times, so that it was found that the wear resistance thereof was good. The average crystallite size of the silver-plating film was 90 angstrom (9.0 nm).

[0099] The surface analysis of the silver-plating film of the silver-plated product was carried out by the same method as that in Example 1. As a result, the silver-plating film was a film containing 6.1% by weight of carbon, 1.1% by weight of sulfur and the balance being silver. Other elements (such as antimony and tin) were not detected in the silver-plating film.

Example 16

[0100] A silver-plated product was produced by the same method as that in Example 15, except that the electroplating (silver-plating) for forming the silver-plating film was carried out at a current density of 0.7 A/dm.sup.2 for 13 minutes. The thickness of the substantially central portion of the silver-plating film of the silver-plated product was measured by the same method as that in Example 1, so that the thickness was 5 μm. Furthermore, in the formation of the silver-plating film of the silver-plated product, A/D=39 (g.Math.dm.sup.2/L.Math.A), B/D=56 (g.Math.dm.sup.2/L.Math.A) and C/D=1.4 (g.Math.dm.sup.2/L.Math.A).

[0101] With respect to the silver-plated product thus obtained, the measurement of the Vickers hardness HV of the silver-plating film, the evaluation of the wear resistance thereof and the calculation of the crystallite sizes thereof were carried out by the same methods as those in Example 1. As a result, the Vickers hardness HV was 176. It was confirmed that the base material was not exposed after the reciprocating sliding movement was repeated 1,000 times, so that it was found that the wear resistance thereof was good. The average crystallite size of the silver-plating film was 81 angstrom (8.1 nm).

Example 17

[0102] A silver-plated product was produced by the same method as that in Example 15, except that the electroplating (silver-plating) for forming the silver-plating film was carried out at a liquid temperature of 35° C. and at a current density of 0.5 A/dm.sup.2 for 18 minutes. The thickness of the substantially central portion of the silver-plating film of the silver-plated product was measured by the same method as that in Example 1, so that the thickness was 5 μm. Furthermore, in the formation of the silver-plating film of the silver-plated product, A/D=54 (g.Math.dm.sup.2/L.Math.A) , B/D=78 (g.Math.dm.sup.2/L.Math.A) and C/D=2.0 (g.Math.dm.sup.2/L.Math.A).

[0103] With respect to the silver-plated product thus obtained, the measurement of the Vickers hardness HV of the silver-plating film, the evaluation of the wear resistance thereof and the calculation of the crystallite sizes thereof were carried out by the same methods as those in Example 1. As a result, the Vickers hardness HV was 175. It was confirmed that the base material was not exposed after the reciprocating sliding movement was repeated 1,000 times, so that it was found that the wear resistance thereof was good. The average crystallite size of the silver-plating film was 109 angstrom (10.9 nm).

Example 18

[0104] A silver-plated product was produced by the same method as that in Example 15, except that the amount of 2-mercaptobenzmimidazole (2-MBI) in the silver-plating solution was 2 g/L and that the electroplating (silver-plating) for forming the silver-plating film was carried out at a current density of 1.5 A/dm.sup.2 for 6 minutes. The thickness of the substantially central portion of the silver-plating film of the silver-plated product was measured by the same method as that in Example 1, so that the thickness was 5 μm. Furthermore, in the formation of the silver-plating film of the silver-plated product, A/D=18 (g.Math.dm.sup.2/L.Math.A) , B/D=26 (g.Math.dm.sup.2/L.Math.A) and C/D=1.3 (g.Math.dm.sup.2/L.Math.A).

[0105] With respect to the silver-plated product thus obtained, the measurement of the Vickers hardness HV of the silver-plating film, the evaluation of the wear resistance thereof and the calculation of the crystallite sizes thereof were carried out by the same methods as those in Example 1. As a result, the Vickers hardness HV was 152. It was confirmed that the base material was not exposed after the reciprocating sliding movement was repeated 1,000 times, so that it was found that the wear resistance thereof was good. The average crystallite size of the silver-plating film was 72 angstrom (7.2 nm).

Example 19

[0106] A silver-plated product was produced by the same method as that in Example 1, except that an aqueous silver-plating solution containing 68 g/L of silver cyanide (AgCN), 64 g/L of sodium cyanide (NaCN) and 2 g/L of 2-mercaptobenzimidazole (2-MBI) was used as the silver-plating solution and that the electroplating (silver-plating) was carried out at a current density of 1.0 A/dm.sup.2 for 9 minutes. The thickness of the substantially central portion of the silver-plating film of the silver-plated product was measured by the same method as that in Example 1, so that the thickness was 5 μm. Furthermore, assuming that the concentrations of silver cyanide (AgCN), sodium cyanide (NaCN) and 2-mercaptobenzimidazole (2-MBI) in the silver-plating solution for forming the silver-plating film of the silver-plated product were A (g/L), B (g/L) and C (g/L), respectively and that the current density during the electroplating was D (A/dm.sup.2) , A/D=68 (g.Math.dm.sup.2/L.Math.A), B/D=64 (g.Math.dm.sup.2/L.Math.A) and C/D=2.0 (g.Math.dm.sup.2/L.Math.A).

[0107] With respect to the silver-plated product thus obtained, the measurement of the Vickers hardness HV of the silver-plating film, the evaluation of the wear resistance thereof and the calculation of the crystallite sizes thereof were carried out by the same methods as those in Example 1. As a result, the Vickers hardness HV was 161. It was confirmed that the base material was not exposed after the reciprocating sliding movement was repeated 1,000 times, so that it was found that the wear resistance thereof was good. The average crystallite size of the silver-plating film was 122 angstrom (12.2 nm).

Example 20

[0108] A silver-plated product was produced by the same method as that in Example 19, except that the electroplating (silver-plating) for forming the silver-plating film was carried out at a current density of 1.5 A/dm.sup.2 for 6 minutes. The thickness of the substantially central portion of the silver-plating film of the silver-plated product was measured by the same method as that in Example 1, so that the thickness was 5 μm. Furthermore, in the formation of the silver-plating film of the silver-plated product, A/D=45 (g.Math.dm.sup.2/L.Math.A), B/D=43 (g.Math.dm.sup.2/L.Math.A) and C/D=1.3 (g.Math.dm.sup.2/L.Math.A).

[0109] With respect to the silver-plated product thus obtained, the measurement of the Vickers hardness HV of the silver-plating film, the evaluation of the wear resistance thereof and the calculation of the crystallite sizes thereof were carried out by the same methods as those in Example 1. As a result, the Vickers hardness HV was 161. It was confirmed that the base material was not exposed after the reciprocating sliding movement was repeated 1,000 times, so that it was found that the wear resistance thereof was good. The average crystallite size of the silver-plating film was 87 angstrom (8.7 nm).

Example 21

[0110] A silver-plated product was produced by the same method as that in Example 19, except that the amount of sodium cyanide (NaCN) in the silver-plating solution was 74 g/L and that the electroplating (silver-plating) for forming the silver-plating film was carried out at a current density of 0.7 A/dm.sup.2 for 13 minutes. The thickness of the substantially central portion of the silver-plating film of the silver-plated product was measured by the same method as that in Example 1, so that the thickness was 5 μm. Furthermore, in the formation of the silver-plating film of the silver-plated product, A/D=97 (g.Math.dm.sup.2/L.Math.A) , B/D=106 (g.Math.dm.sup.2/L.Math.A) and C/D=2.9 (g.Math.dm.sup.2/L.Math.A).

[0111] With respect to the silver-plated product thus obtained, the measurement of the Vickers hardness HV of the silver-plating film, the evaluation of the wear resistance thereof and the calculation of the crystallite sizes thereof were carried out by the same methods as those in Example 1. As a result, the Vickers hardness HV was 166. It was confirmed that the base material was not exposed after the reciprocating sliding movement was repeated 1,000 times, so that it was found that the wear resistance thereof was good. The average crystallite size of the silver-plating film was 78 angstrom (7.8 nm).

Example 22

[0112] A silver-plated product was produced by the same method as that in Example 19, except that the amount of sodium cyanide (NaCN) in the silver-plating solution was 74 g/L and that the electroplating (silver-plating) for forming the silver-plating film was carried out at a current density of 1.0 A/dm.sup.2 for 9 minutes. The thickness of the substantially central portion of the silver-plating film of the silver-plated product was measured by the same method as that in Example 1, so that the thickness was 5 μm. Furthermore, in the formation of the silver-plating film of the silver-plated product, A/D=68 (g.Math.dm.sup.2/L.Math.A), B/D=74 (g.Math.dm.sup.2/L.Math.A) and C/D=2.0 (g.Math.dm.sup.2/L.Math.A).

[0113] With respect to the silver-plated product thus obtained, the measurement of the Vickers hardness HV of the silver-plating film, the evaluation of the wear resistance thereof and the calculation of the crystallite sizes thereof were carried out by the same methods as those in Example 1. As a result, the Vickers hardness HV was 162. It was confirmed that the base material was not exposed after the reciprocating sliding movement was repeated 1,000 times, so that it was found that the wear resistance thereof was good. The average crystallite size of the silver-plating film was 106 angstrom (10.6 nm).

[0114] The producing conditions and characteristics of the silver-plated products obtained in these examples and comparative examples are shown in Tables 1 through 9.

TABLE-US-00001 TABLE 1 Thick- ness of Ni- Plating Silver-Plating Solution Film KAg(CN).sub.2 KCN 2-MBI K.sub.2CO.sub.3 Se (μm) (g/L) (g/L) (g/L) (g/L) (mg/L) Ex. 1 1 40 39 1 — — Ex. 2 1 40 39 1 — — Ex. 3 1 40 39 2 — — Ex. 4 1 100 39 1 — — Ex. 5 1 100 39 2 — — Ex. 6 1 40 39 1 20 — Ex. 7 — 40 39 1 — — Ex. 8 1 40 39 2 — — Ex. 9 1 40 39 1 — — Ex. 10 1 40 39 1 — — Ex. 11 1 40 39 2 — — Comp. 1 1 40 39 — — — Comp. 2 1 40 39 — — — Comp. 3 1 40 39 1 — — Comp. 4 1 40 39 2 — — Comp. 5 1 40 99 1 — — Comp. 6 1 40 99 2 — — Comp. 7 1 100 39 1 — — Comp. 8 1 100 39 1 — — Comp. 9 1 100 99 1 — — Comp. 10 1 100 99 2 — — Comp. 11 1 115 60 — — 40 Comp. 12 1 148 140 — —  8 Comp. 13 1 175 95 — — 70 Comp. 14 1 40 39 1 20 — Comp. 15 1 — — — — —

TABLE-US-00002 TABLE 2 Silver-Plating Liquid Current (° C.) (A/dm.sup.2) Time A/D B/D C/D Temp. Density (min.) (g .Math. dm.sup.2/L .Math. A) Ex. 1 25 0.5 18 80 78 2.0 Ex. 2 25 0.7 13 57 56 1.4 Ex. 3 25 0.5 18 80 78 4.0 Ex. 4 25 0.5 18 200 78 2.0 Ex. 5 25 1.5 6 67 26 1.3 Ex. 6 25 0.5 18 80 78 2.0 Ex. 7 25 0.5 18 80 78 2.0 Ex. 8 25 1.0 9 40 39 2.0 Ex. 9 18 0.5 18 80 78 2.0 Ex. 10 35 0.5 18 80 78 2.0 Ex. 11 25 0.5 7.2 80 78 4.0 Comp. 1 25 0.5 18 80 78 0 Comp. 2 25 1.5 6 27 26 0 Comp. 3 25 1.0 9 40 39 1.0 Comp. 4 25 1.5 6 27 26 1.3 Comp. 5 25 1.5 6 27 66 0.7 Comp. 6 25 0.5 18 80 198 4.0 Comp. 7 25 1.0 9 100 39 1.0 Comp. 8 25 1.5 6 67 26 0.7 Comp. 9 25 1.5 6 67 66 0.7 Comp. 10 25 0.5 18 200 198 4.0 Comp. 11 25 2.0 5 58 30 0 Comp. 12 16 8.0 1.3 19 18 0 Comp. 13 18 5.0 2 35 19 0 Comp. 14 25 1.0 9 40 39 1.0 Comp. 15 18 3.0 8.3 — 0 0

TABLE-US-00003 TABLE 3 Thick- ness of Silver- Vickers Average Plating Hard- Number of Crystallite Film ness Durable Times Size (μm) HV (Number of Times) (nm) Ex. 1 5 171.1 not less than 1000 12.778 Ex. 2 5 187.7 not less than 1000 14.734 Ex. 3 5 165.6 not less than 1000 14.370 Ex. 4 5 181.2 not less than 1000 23.146 Ex. 5 5 165.5 not less than 1000 10.015 Ex. 6 5 188.6 not less than 1000 16.607 Ex. 7 5 175.7 not less than 1000 15.682 Ex. 8 5 170.4 not less than 1000 15.682 Ex. 9 5 194.1 not less than 1000 10.503 Ex. 10 5 185.8 not less than 1000 16.856 Ex. 11 2 154.3 not less than 800  20.940 Comp. 1 5 105.8 60 43.498 Comp. 2 5 112.7 — 62.539 Comp. 3 5 131.2 — 16.006 Comp. 4 5 131.1 100 10.520 Comp. 5 5 118.6 — 31.816 Comp. 6 5 121.3 80 73.665 Comp. 7 5 138.4 200 20.578 Comp. 8 5 130.8 — 31.846 Comp. 9 5 120.1 — 38.193 Comp. 10 5 121.4 70 39.148 Comp. 11 5 118.9 100 63.573 Comp. 12 5 82.4 50 74.972 Comp. 13 5 133.8 80 27.825 Comp. 14 5 134.4 less than 10 19.283 Comp. 15 5 170.4 150 12.611

TABLE-US-00004 TABLE 4 Thickness of Ni-Plating Silver-Plating Solution Film KAg(CN).sub.2 KCN 2-MBIS (μm) (g/L) (g/L) (g/L) Ex. 12 1 100 39 20 Ex. 13 1 100 39 20 Ex. 14 1 100 39 20

TABLE-US-00005 TABLE 5 Silver-Plating Liquid Current Temp. (A/dm.sup.2) Time A/D B/D C/D (° C.) Density (min.) (g .Math. dm.sup.2/L .Math. A) Ex. 12 25 0.7 13 143 56 28.6 Ex. 13 25 1.0  9 100 39 20.0 Ex. 14 25 1.5  6  67 26 13.3

TABLE-US-00006 TABLE 6 Thick- ness of Silver- Vickers Average Plating Hard- Number of Crystallite Film ness Durable Times Size (μm) HV (Number of Times) (nm) Ex. 12 5 226 not less than 1000 9.7 Ex. 13 5 175 not less than 1000 11.2 Ex. 14 5 155 not less than 500  13.8

TABLE-US-00007 TABLE 7 Thickness of Ni Plating Silver-Plating Solution Film AgCN NaCN 2-MBI (μm) (g/L) (g/L) (g/L) Ex. 15 1 27 39 1 Ex. 16 1 27 39 1 Ex. 17 1 27 39 1 Ex. 18 1 27 39 2 Ex. 19 1 68 64 2 Ex. 20 1 68 64 2 Ex. 21 1 68 74 2 Ex. 22 1 68 74 2

TABLE-US-00008 TABLE 8 Silver-Plating Liquid Current Temp. (A/dm.sup.2) Time A/D B/D C/D (° C.) Density (min.) (g .Math. dm.sup.2/L .Math. A) Ex. 15 25 0.5 18 54 78 2.0 Ex. 16 25 0.7 13 39 56 1.4 Ex. 17 35 0.5 18 54 78 2.0 Ex. 18 25 1.5 6 18 26 1.3 Ex. 19 25 1.0 9 68 64 2.0 Ex. 20 25 1.5 6 45 43 1.3 Ex. 21 25 0.7 13 97 106 2.9 Ex. 22 25 1.0 9 68 74 2.0

TABLE-US-00009 TABLE 9 Thick- ness of Silver- Vickers Average Plating Hard- Number of Crystallite Film ness Durable Times Size (μm) HV (Number of Times) (nm) Ex. 15 5 166 not less than 1000 9.0 Ex. 16 5 176 not less than 1000 8.1 Ex. 17 5 175 not less than 1000 10.9 Ex. 18 5 152 not less than 1000 7.2 Ex. 19 5 161 not less than 1000 12.2 Ex. 20 5 161 not less than 1000 8.7 Ex. 21 5 166 not less than 1000 7.8 Ex. 22 5 162 not less than 1000 10.6