Die tray with channels

Abstract

Representative implementations of devices and techniques provide a device and a technique for processing integrated circuit (IC) dies. The device comprises a die tray (such as a pick and place tray, for example) for holding the dies during processing. The die tray may include an array of pockets sized to hold individual dies. The technique can include loading dies on the die tray, cleaning the top and bottom surfaces of the dies, and ashing and activating both surfaces of the dies while on the die tray, eliminating the need to turn the dies over during processing.

Claims

1. An apparatus, comprising: a tray; one or more pockets within a surface of the tray, each pocket configured to hold a singulated microelectronic element die; a quantity of retaining posts disposed at the one or more pockets and arranged to laterally restrain dies loaded into the pockets; a quantity of mount posts disposed at the array of pockets and arranged to longitudinally restrain the dies loaded into the pockets; and one or more channels coupled to one or more of the pockets and arranged to direct fluids away from the one or more of the pockets.

2. The apparatus of claim 1, further comprising one or more longitudinal channels coupled to the one or more of the pockets and one or more latitudinal channels coupled to the one or more of the pockets, the one or more longitudinal channels and the one or more latitudinal channels arranged to direct fluids away from the one or more of the pockets.

3. The apparatus of claim 1, the pockets further comprising a cavity arranged to direct processing fluids during processing, the cavity coupled to the one or more channels.

4. The apparatus of claim 1, wherein the tray is comprised of a mesh.

5. The apparatus of claim 1, wherein the retaining posts, the mount posts, or the retaining posts and the mount posts comprise a spring device.

6. The apparatus of claim 1, wherein the one or more pockets comprises one or more arrays, having multiple pockets in each of the one or more arrays.

7. The apparatus of claim 1, wherein the tray is comprised of a plasma-resistant material or the tray includes a plasma-resistant layer.

8. The apparatus of claim 7, wherein the plasma-resistant material or the plasma-resistant layer comprises aluminum oxide, yttrium oxide, or yttrium fluoride.

9. (canceled)

10. (canceled)

11. An apparatus, comprising: a substantially planar tray; an array of support posts disposed at a surface of the tray, each post configured to support an element; a quantity of retaining posts disposed on a surface of the tray and arranged to laterally restrain the element loaded onto the support posts; a quantity of mount posts disposed on a surface of the tray and arranged to longitudinally restrain the element loaded onto the support; and one or more channels under the said element arranged to direct fluids away from the element.

12. The apparatus of claim 11, wherein one or more of the support posts of the array of support posts includes at least a portion with a contoured or elliptical surface.

13. An apparatus, comprising: a tray; an array of support posts disposed on a surface of the tray, the support posts configured to support an element; a plurality of lateral supporting posts disposed on a surface of the tray and arranged to laterally restrain the element loaded onto the support posts; a plurality of longitudinal supporting posts disposed on a surface of the tray and arranged to longitudinally restrain the element loaded onto the support posts.

14. The apparatus of claim 13, further comprising one or more channels under the element arranged to direct fluids away from the element.

15. The apparatus of claim 13, wherein at least a portion of one or more of the support posts includes an elliptical surface.

16. The apparatus of claim 13, wherein a portion of one or more of the support posts includes an opening arranged to move fluids away from a surface of the element.

17. The apparatus of claim 13, wherein one or more of the support posts comprises a first portion comprising a lateral or longitudinal restraining post and a second portion comprising an element mounting post.

18. The apparatus of claim 17, wherein the first portion is disposed above the second portion.

19. The apparatus of claim 17, wherein at least a portion of one or more surfaces of the second portion comprise a contoured or elliptical surface.

20. The apparatus of claim 13, further comprising a clearance gap disposed between the element and at least one of the lateral or longitudinal restraining support posts.

21. The apparatus of claim 13, wherein the array of support posts comprises a first set of supporting posts and a second set of supporting posts; wherein the first set of supporting posts is arranged to support the element at a different height with respect to the tray surface than the second set of supporting posts.

22. (canceled)

23. (canceled)

24. (canceled)

25. (canceled)

26. (canceled)

27. (canceled)

28. (canceled)

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0012] The detailed description is set forth with reference to the accompanying figures. In the figures, the left-most digit(s) of a reference number identifies the figure in which the reference number first appears. The use of the same reference numbers in different figures indicates similar or identical items.

[0013] For this discussion, the devices and systems illustrated in the figures are shown as having a multiplicity of components. Various implementations of devices and/or systems, as described herein, may include fewer components and remain within the scope of the disclosure. Alternately, other implementations of devices and/or systems may include additional components, or various combinations of the described components, and remain within the scope of the disclosure.

[0014] FIG. 1 is a flow diagram illustrating an example die processing sequence using a spin plate.

[0015] FIGS. 2A and 2B show an example die after cleaning a front surface (FIG. 2A) and a back surface (FIG. 2B) of the die.

[0016] FIGS. 3A-3C show examples of dies with peripheral particles or defects. FIG. 3A shows a top view of such a die, FIG. 3B shows a profile view of such a die, and FIG. 3C shows a profile view of a stack of such dies.

[0017] FIG. 4 is an illustration of an example die tray, according to an implementation.

[0018] FIGS. 5A-5C show illustrations of example pockets, showing a comparison of example die retainers and spacers of a die tray, such as the die tray of FIG. 4, according to various implementations.

[0019] FIGS. 6A and 6B each show an example die after cleaning a front surface and a back surface of the dies.

[0020] FIGS. 7A-7C illustrate an example die tray, according to an embodiment. FIG. 7A shows a plan view, FIG. 7B shows a profile view according to a first embodiment, and FIG. 7C shows a profile view according to a second embodiment.

[0021] FIGS. 8A and 8B illustrate an example die tray, according to a third embodiment. FIG. 8A shows a plan view and FIG. 8B shows a profile view.

[0022] FIGS. 9A and 9B illustrate an example die tray, according to a fourth embodiment. FIG. 9A shows a plan view and FIG. 9B shows a profile view.

[0023] FIG. 10A is an illustration of an example die tray holding an array of dies. FIG. 10B is an illustration of multiple die trays within a process chamber, according to an embodiment.

[0024] FIGS. 11-13 are flow diagrams illustrating example processes for preparing and stacking dies, according to example implementations.

[0025] FIG. 14A is an illustration of a front surface and a back surface of a die before a brush cleaning process. FIG. 14 B is an illustration of an example die cleaning brush. FIG. 14C is an illustration of the front surface and the back surface of the die of FIG. 14A after the brush cleaning process.

DETAILED DESCRIPTION

Overview

[0026] Various embodiments of a device and a technique for processing integrated circuit (IC) dies are disclosed. The device comprises a die tray (such as a pick and place tray, for example) for holding the dies during processing. The die tray may include an array of pockets sized to hold individual dies.

[0027] The processing technique can include loading dies on the die tray, cleaning the top and bottom surfaces of the dies, and ashing and activating both surfaces of the dies while on the die tray (eliminating the need to turn the dies over during processing). The processing can prepare the dies to be bonded in stacked arrangements. After processing, the die tray may then be used for pick and place operations, including providing the dies for stacking and bonding.

[0028] In various embodiments, using the tray and the processing techniques can reduce die fabricating and processing costs and can reduce the complexity of fabricating electronic packages that include the dies. Dies to be stacked and bonded using direct bonding (e.g. ZIBOND available from Invensas Bonding Technologies, Inc.) or hybrid bonding (e.g. DBI available from Invensas Bonding Techniques, Inc.) techniques, which can be susceptible to particles and contaminants, can particularly benefit. Whether bonding two surfaces using a low temperature covalent bond between two corresponding semiconductor and/or insulator layers, the process known by Zibond, or whether also forming interconnections along with the bonding technique, the process commonly known as DBI, high levels of flatness and cleanliness are desirable across the bonding surface. Thus, removing particles between the bonding surfaces may dramatically improve yield and reliability.

[0029] In an implementation, large batches of dies can be processed at a time, using multiple die trays. For example, multiple trays of dies may be loaded into a batch processing chamber, or the like, increasing manufacturing throughput.

[0030] In some embodiments, several process steps can be eliminated, lowering manufacturing complexity and costs, while improving the overall cleanliness of the dies (e.g., reducing the occurrence of particles, contaminants, residue, etc.). Reduced handling of the dies can also minimize particle generation.

[0031] Various implementations and arrangements are discussed with reference to electrical and electronics components and varied carriers. While specific components (i.e., wafers, integrated circuit (IC) chip dies, etc.) are mentioned, this is not intended to be limiting, and is for ease of discussion and illustrative convenience. The techniques and devices discussed with reference to a wafer, die, or the like, are applicable to any type or number of electrical components, circuits (e.g., integrated circuits (IC), mixed circuits, ASICS, memory devices, processors, etc.), groups of components, packaged components, structures (e.g., wafers, panels, boards, PCBs, etc.), and the like. Each of these different components, circuits, groups, packages, structures, and the like, can be generically referred to as a microelectronic element. For simplicity, such components will also be referred to herein as a die.

[0032] Implementations are explained in more detail below using a plurality of examples. Although various implementations and examples are discussed here and below, further implementations and examples may be possible by combining the features and elements of individual implementations and examples.

[0033] Referring to FIG. 1, a flow diagram illustrating an example die processing sequence using a spin plate is shown. At blocks 1-4 the process begins with preparing a wafer by applying protective coatings, singulating the wafer into dies (i.e., a first set of dies) on a dicing sheet, exposing the dies and dicing sheet to UV radiation and stretching the dicing sheet, and transferring the dies to a spin plate, with the dies face up. At blocks 5-9 the process includes the steps of plasma ashing the top surface of the dies, cleaning the dies, plasma activating the top surface of the dies, and re-cleaning the top surface of the dies.

[0034] At block 10, the dies are transferred from the spin plate to a flip plate, to position the dies face down (the bottom surfaces of the dies are up). At block 11, the dies are transferred to a pick and place station, where (at block 12) the dies are attached to a wafer surface, with the dies face down. At block 13, the dies on the wafer are thermally treated.

[0035] At blocks 14-18 the wafer and the exposed surface of the dies is cleaned, plasma ashed, re-cleaned, plasma activated, and cleaned again. At block 19 a second set of dies (with the top surface previously prepared as described at blocks 1-11) is attached to the first set of dies, forming a stacked die arrangement. In an example, the top (prepared) surface of the second dies is attached to the exposed (bottom) surface of the first dies. At block 20, the wafer with the first and second dies is thermally treated. For additional dies to be added to the stacked die arrangement (e.g., third or more dies), at block 21, the process is looped back to block 14, and continues until the desired quantity of dies has been added to each stack.

[0036] In various examples, the manufacturing process as described with reference to FIG. 1 can use approximately 13+7(n1); n>0 steps to complete (where n=the desired quantity of dies in the stack).

[0037] In some cases, in spite of the numerous cleaning steps included in the process, the dies are left with some contamination or particles on one or more surfaces of the dies. FIGS. 2A and 2B show dies 202 loaded into an example spin plate 204 for cleaning, with the front surface up. As shown in FIGS. 2A and 2B, the top or front surface of the die 202 may be cleaned free of contamination (FIG. 2A) while the bottom or back surface of the die 202 may be left with particles or contamination, for example residues of the protective layer used in the singulation step. (FIG. 2B). In some examples, the contamination can be the result of poor mass transfer, including stagnant processing materials that are trapped at various locations during the processing steps. As shown in FIG. 2B, often these locations can be associated with contact regions between the die 202 and the spin plate 204 or between the die 202 and a die mount 206 on the spin plate 204.

[0038] Additionally, as shown in FIGS. 3A-3C, extensive handling of the dies 202 during the multiple processing steps can add particles or contaminants to the dies 202, including after the dies 202 have been cleaned. The location of the particles or defects can determine whether the particles or defects can be potentially problematic for a stacked arrangement 302. For instance, some particles and defects can cause poor bonding between dies 202, and the like, as shown in FIG. 3C. Poor bonding can lead to stacked arrangements 302 that fail initially (reducing manufacturing yield), or have early infant failure (resulting in high unreliability of the manufactured components).

Example Implementations

[0039] FIG. 4 is an illustration of a die tray 402, according to an example implementation. Dies 202 are loaded into pockets 404 (pockets are also shown in FIG. 5) of the die tray 402 and are processed while within the pockets 404 of the die tray 402. For example, the die tray 402 may rotate during some processing steps. In some implementations, the pockets 404 are arranged in an array, or another convenient pattern. This allows multiple dies 202 to be processed at the same time. Pockets 404 may be configured to hold the dies 202 at an angle (as shown in FIG. 2) to facilitate fluid material runoff during cleaning and other processes.

[0040] The example die tray 402 illustrated in FIG. 4 includes four portions (first, second, third, and fourth). This is for illustration and discussion purposes. In various implementations, a die tray 402 may include a different arrangement of pockets 404 or portions. For instance, a die tray 402 may include a single pocket 404 design, or multiple pocket 404 designs as shown in FIG. 4.

[0041] Referring to FIGS. 4, 5A, and 5B, the first and third portions of the die tray 402 (see FIG. 4) illustrate a pocket 404 design (which is also shown at FIG. 5A and FIG. 5B) having retaining strips 406 arranged to hold dies 202 laterally, and mounts 408 to hold dies 202 longitudinally. The mounts 408 may include one or more steps 502, and are arranged to support one or more edges of the die 202 in the pocket 404. The mounts 408 can help position the dies 202 at an angle within the pockets 404, as shown in FIG. 2, by holding one of the edges of the die 202 higher than an opposite edge of the die 202.

[0042] The second and fourth portions of the die tray 402 (see FIG. 4) illustrate a pocket 404 design (also shown at FIG. 5C) having retaining posts 410 arranged to hold the dies 202 laterally and mount posts 504 arranged to hold the dies 202 longitudinally. The mount posts 504 may also include one or more steps (not shown), and are arranged to support one or more edges of the die 202 in the pocket 404. In various embodiments, the retaining posts 410 and the mount posts 504 may have various shapes, designs and configurations. In the embodiments, the retaining posts 410 and/or the mount posts 504 may be designed to have minimal contact with the die 202. For example, the retaining posts 410 and/or the mount posts 504 may include a die-contact surface with minimal area. In another example, the retaining posts 410 and/or the mount posts 504 may include an elliptical or spherical shaped die-contact surface to minimize contact with the die 202. In one example, the die-contact is less than 10-20% of the edge length or width of the die 202.

[0043] In some embodiments, one or more of the retaining posts 410 and/or the mount posts 504 may comprise a spring device such as a compression spring, a conical spring, or the like. For example, one or more of the retaining posts 410 and/or the mount posts 504 may be comprised of a spring material and/or have a spring-like construction. The spring-like construction includes gaps in the structure of the retaining posts 410 and/or the mount posts 504, which allows fluids, such as cleaning fluids, for example, to pass through and to circulate freely around the die 202 during the cleaning process. In some embodiments, one or more clips or the like (e.g., some form of torsion springs, etc.) may contact a portion of the surface of the die 202 to prevent the dies from sliding around on the die tray 402. It is preferable the surface of the spring devices be chemical and plasma resistant. For example, metallic springs may be used as retaining posts 410 and mounting posts 504. To enhance the chemical and plasma resistance of the retaining posts 410 and the mounting posts 504, the retaining posts 410 and the mounting posts 504 may be coated with a chemical and plasma resistant layer, for example, an aluminum oxide or yttrium oxide layer or yttrium fluoride or combinations of the above amongst others.

[0044] Similarly, the die tray 402 may be fabricated from metallic or polymeric material. In one embodiment, the die tray 402 may be coated with one or more chemical and plasma resistant layers, for example, an aluminum oxide or yttrium oxide layer or yttrium fluoride or combinations of both amongst others. In other embodiments, the die tray 402 may be fabricated from a ceramic or glass-ceramic material, for example aluminum oxide. It is practical that the die tray 402 does not release or emit particulates that will contaminate the bonding surface of the cleaned dies 202.

[0045] As shown in FIGS. 4, 5A, 5B, and 5C, the pockets 404 and the die tray 402 may include one or more channels 408 arranged to carry fluids to and away from the dies 202 during processing. For example, the pockets 404 may include a cavity 506 or space below the die 202 for cleaning materials or other processing materials or waste materials to collect, and the cavity 506 may be coupled to one or more channels 408 arranged to direct the materials away from the dies 202.

[0046] In some implementations, the channels 408 are arranged to extend longitudinally from the pockets 202, as shown in FIG. 4 at the first and third portions of the die tray 402, and in the example pockets illustrated at FIGS. 5A and 5B. In other implementations, additional channels 408 are also arranged to extend laterally from the pockets 404, as shown in FIG. 4 at the second and fourth portions, and in FIG. 5C. In the implementations, the material collecting in the under-die cavity 506 is directed away from the die pockets 404 by the arrangement of channels 408. In another embodiment, as shown in FIG. 5A, drain holes 508 may also be included in the under die cavity 506 to further direct material from the die pocket 404.

[0047] In embodiments where the retaining posts 410 and/or the mounting posts 504 are comprised of spring devices (or have gaps, such as with a spring-like construction) one or more of the under die cavity 506 or the channels 408 may not be needed or may not be present on the die tray 402. In such an embodiment, the die 202 is restrained peripherally by arrangement of spring devices and the cleaning fluid or fluids flows with minimal restraints around and under the die 202 through the various gaps in the coils of the spring devices and the gaps between the spring devices.

[0048] FIG. 6A shows front and back surfaces of a die 202 after cleaning in a die tray 402 using die pockets 404 having retaining strips 406 and mounts 408, and longitudinal channels 408, as shown in FIG. 4 at the first and third portions, and in FIGS. 5A and 5B. The front surface of the die 202 appears clean and the back surface shows an improvement in cleanliness over the back surface of the die 202 from FIG. 2B. However, some contaminates are still showing on the back surface of the die 202 of FIG. 6A.

[0049] FIG. 6B shows front and back surfaces of a die 202 after cleaning in a die tray 404 using die pockets 404 having retaining posts 410 and mount posts 504, and longitudinal and lateral channels 408, as shown in FIG. 4 at the second and fourth portions, and in FIG. 5C. The front and back surfaces of the die 202 appear clean, a significant improvement over the back surface of the die 202 from FIG. 2B, as well as an improvement over the back surface of the die 202 from FIG. 6A. In various implementations, minimal contact of the retaining posts 410 and mount posts 504 to the die 202 and the use of lateral as well as longitudinal channels 408 from the pockets 404 results in the least amount of particles and contaminates remaining on the front and back surfaces of a die 202 (if any) after cleaning. This is due to minimizing stagnant fluid collecting under the die 202, by efficiently channeling the fluid away from the pocket 404 as well as minimizing contact with the die 202 surfaces.

[0050] FIGS. 7A-7C illustrate another example die tray 402 arrangement for front and backside wet and dry cleaning of multiple dies 202. FIG. 7A shows a partial view of a die tray array 702 (an array portion of a die tray 402, carrying multiple dies 202). As shown in FIG. 7A, the retaining posts 410 and mount posts 504 (lateral and longitudinal die support posts) have a minimal surface area in contact with the dies 202, due to their minimal dimensions and elliptical contact surfaces. The minimal contact with the dies 202 can help prevent contaminants from being transferred to the die 202 surfaces.

[0051] FIG. 7B shows a cross-sectional view of the example die tray 402 according to a first embodiment having a closed tray cavity 506, and FIG. 7C shows a cross-sectional view of the example die tray 402 according to a second embodiment having an open tray cavity 506. The tray cavities 506 give a place for cleaning materials and other waste materials to collect and be directed away from the dies 202. For example, lateral and/or longitudinal channels 408 coupled to the tray cavities 506 can direct the fluids away from the dies 202. The open tray cavity 506 design can potentially have more waste fluid draining capability in some cases.

[0052] In an implementation, the die tray 402 may be comprised of a mesh material. For example, the mesh material may allow the die tray 402 to have additional fluid draining capability.

[0053] FIGS. 8A and 8B illustrate another example die tray 402 arrangement for front and backside (first and second die 202 surfaces) wet and dry cleaning of a die 202. FIG. 8A shows a plan view (top view) of an example pocket 404 of a die tray 402 and FIG. 8B shows a profile view, according to an embodiment. As shown in FIGS. 8A and 8B, the die 202 is supported off of a surface of the tray 402 by multiple element supporting posts 802 (four are shown, however, other quantities of supporting posts 802 may be used). In some implementations, the element supporting posts 802 may have different heights, (e.g., the first supporting posts 802 may be taller than the second supporting posts 802, for instance) so that the die 202 is held at an angle.

[0054] The die 202 is also held in place by retaining posts 410 and mount posts 504, which have a minimal surface area in contact with the dies 202, due to their minimal dimensions and elliptical contact surfaces. The minimal contact with the dies 202 can help prevent contaminants from being transferred to the surfaces of the die 202. As shown in FIGS. 8A and 8B, the retaining posts 410 and mount posts 504 may be positioned on the tray so that there is a preselected clearance gap 804 between the die 202 and the retaining posts 410 and mount posts 504. This positioning can also help to minimize contaminant transfer from the posts (410, 504) to the die 202, by reducing contact with the die 202 edges.

[0055] FIGS. 9A and 9B illustrate a further example die tray 402 and pocket 404 arrangement for front and backside wet and dry cleaning of a die 202. FIG. 9A shows a plan view (top view) of an example pocket 404 of a die tray 402 and FIG. 9B shows a profile view of the same, according to an embodiment. As shown in FIGS. 9A and 9B, the die 202 is supported off the surface of the tray 402 by multiple element supporting posts 902 (four are shown, however, other quantities of supporting posts 902 may be used). In some implementations, the element supporting posts 902 may have different heights, (e.g., the supporting posts 902 at one end may be taller than the supporting posts 902 at an opposite end, for instance) so that the die 202 is held at an angle. In one embodiment, the shorter supporting posts 902 may comprise the surface of the tray 402.

[0056] In an implementation as shown, the supporting posts 902 can include a mounting portion 904 and a restraining portion 906. The mounting portion 904 includes a shelf or rest for the die 202, which supports the die 202 off the surface of the tray 402. The restraining portion 906 includes a back-stop, guide or the like, protruding above the mounting portion to hold the die 202 in place in the pocket 404. In various embodiments, the pocket 404 includes lateral and longitudinal restraining portions 906, to hold the die 202 in the pocket 404 during processing, much like the retaining posts 410 and mount posts 504.

[0057] The mounting portions 904 and the restraining portions 906 can have a minimal surface area in contact with the dies 202, based on their construction with minimal dimensions and contact surfaces. The restraining portions 906 may be formed and placed so that there is an opening or gap 908 between the lateral and longitudinal restraining portions 906, further minimizing contact with the die 202. In an embodiment, the opening or gap 908 at the restraining portions 906 can provide a channel for fluids to be directed away from or off of the die 202, so that the fluid does not collect on the surface of the die 202.

[0058] As shown in FIG. 9B, the restraining portions 906 may also be positioned so that there is a preselected clearance gap 910 between the die 202 and the restraining portions 906. This positioning can also help to minimize contaminant transfer from the posts 902 to the die 202, by reducing contact with the die 202 edges.

[0059] Any of the surfaces, such as 402, 401, 504, 902, etc., may be rounded or tapered to limit the area or region of contact with dies 202.

[0060] In some implementations, the various lateral restraining portions for example 504 and 906, and the longitudinal restraining portions 410 and 906 (FIGS. 7B, 7C, 8A, 8B, 9A, and 9B) may be configured with spring materials, or may be comprised of spring devices, as discussed above. In embodiments where one or more of the restraining portions (410, 504, and 906) are comprised of spring devices (or have gaps, such as with a spring-like construction) one or more of the under die cavity 506 or the channels 408 may not be needed or may not be present on the die tray 402. In such an embodiment, the die 202 is restrained peripherally by arrangement of spring devices and the cleaning fluid or fluids flows with minimal restraints around and under the die 202 through the various gaps in the coils of the spring devices and the gaps between the spring devices.

[0061] Any of the die tray 402 and die pocket 404 designs discussed above, as well as other designs, may be incorporated into a tray array 702, as shown in FIG. 10A. In various embodiments, multiple trays 402 with arrays 702 of dies 202 can be loaded into a cleaning process chamber 1002, such as the one shown in FIG. 10B, or the like. As shown, multiple trays 402 of dies 202 can be cleaned and processed simultaneously, increasing manufacturing throughput.

[0062] FIGS. 11-13 are flow diagrams illustrating example processes for preparing and stacking dies 202, according to example implementations. The processes described in FIGS. 11-13 use die trays 402 as described above, to reduce process steps and complexity. The order in which the processes are described is not intended to be construed as a limitation, and any number of the described process blocks can be combined in any order to implement the processes, or alternate processes. Additionally, individual blocks may be deleted from the processes without departing from the spirit and scope of the subject matter described herein. Furthermore, the processes can be implemented in any suitable hardware, software, firmware, or a combination thereof, without departing from the scope of the subject matter described herein.

[0063] For example, at FIG. 11, blocks 1 and 2, an example process includes singulating a wafer into dies 202 and transferring the dies 202 to a die tray 402 (such as the die trays 402 described above). At blocks 3-7, both surfaces of the multiple dies 202 are cleaned simultaneously in trays 402 (potentially within a cleaning process chamber 1002, for example), both surfaces of the dies 202 are ashed in down-stream plasma, both surfaces of the dies 202 are cleaned again, both surfaces of the dies 202 are activated in down-stream plasma, and both surfaces of the dies 202 are cleaned yet again, all while remaining in the die trays 402.

[0064] At block 8, the trays 402 with the dies 202 are transferred to a pick and place station. At block 9, some of the dies 202 are attached to processed wafers as the first die 202 of a predetermined number of stacked die arrangements 302. At blocks 10-12, others of the dies 202 (which were processed in the die tray 402 also) are stacked to the first dies 202, with the stacking continuing until a desired quantity of dies 202 are stacked in each stacked arrangement 302.

[0065] In various examples, the manufacturing process as described with respect to FIG. 11 can use approximately 8+(n); n>0 steps to complete (where n=the desired quantity of dies 202 in the stack 302). This represents a significant reduction in manufacturing steps when compared to the process described with respect to FIG. 1: (13+7(n1)). Not only is manufacturing cost and complexity reduced by reducing process steps, but opportunities to contaminate the dies are also reduced, resulting in better quality and higher throughput with lower cost.

[0066] The flow diagram of FIG. 12 illustrates incorporating the process of FIG. 11 to form stacked die arrangements 302 using direct bonding techniques, hybrid bonding techniques, and the like. For instance, at blocks 1-4, a wafer is processed, including coating with resist, attaching to a dicing sheet, adding a low-temperature resist, and singulating the wafer into dies 202. At block 5, the side walls of the dies 202 are etched to remove particulates. At block 6, the dicing sheet is exposed to UV and stretched, and at block 7, the dies 202 are transferred to die trays 402, as discussed above with reference to FIG. 11.

[0067] At blocks 8-12, both surfaces of the dies 202 are cleaned, ashed, cleaned again, activated, and re-cleaned while in the die trays 402. At block 13, the dies 202 are stacked as desired to form stacked die arrangements 302 on processed substrate. At block 14, the stacked dies 202 are thermally treated.

[0068] The flow diagram of FIG. 13 illustrates incorporating the process of FIG. 11 to form stacked die arrangements 302 using direct bonding (e.g. ZIBOND available from Invensas Bonding Technologies, Inc.) or hybrid bonding (e.g. DBI available from Invensas Bonding Techniques, Inc.) techniques, according to another embodiment, where the ashing step and the subsequent rinsing step is eliminated. For example, blocks 1-7 may be identical to blocks 1-7 of the process described with reference to FIG. 12. With the dies 202 loaded into the die trays 402, both surfaces of the dies 202 are cleaned using residue-free solvents (such as methanol, for example) at block 8, both surfaces of the dies 202 are activated at block 9, and both sides are cleaned at block 10.

[0069] At block 11, the dies 202 are stacked as desired to form stacked die arrangements 302 on processed substrate. At block 12, the stacked dies 202 are thermally treated. Thus, the process can be completed with two less steps.

[0070] In alternate implementations, other techniques may be included in the process in various combinations, and remain within the scope of the disclosure.

Additional Embodiment

[0071] In an embodiment, as shown in FIG. 14A, some particles, organic adhesive residues or contaminant may remain on one or more surfaces of a die 202 after the die 202 has been otherwise cleaned and bonded on a substrate. In the embodiment, a brush 1402 as shown in FIG. 14B may be used to remove the organic adhesive residues, particles, or contaminant from the die 202 surface and substrate.

[0072] In an implementation, as shown in FIG. 14B, the brush 1402 rotates, vibrates, or otherwise scrubs in one or a plurality of directions, as it contacts the exposed surface of the dies 202 and penetrates into the spaces between the dies 202, to clean the surfaces and the edges of the dies 202 and the surface of the substrate 1404. In various embodiments, the brush 1402 is used with a surfactant to assist the cleaning operation. In an example, the bristles 1406 of the brush 1402 are comprised of a soft, non-shedding durable polymer material, such as polypropylene, polyethylene, nylon, polyurethane, polyether, their various copolymer, or the like. In some applications the brush 1402 may comprise an ultrasonic or megasonic brush for simultaneously scrubbing and cleaning the back surface of the bonded dies 202, the exposed surface of the substrate 1402 (regions without bonded dies 202), and the edges of the bonded or stacked dies.

[0073] FIG. 14C shows the die 202 surfaces of FIG. 14A after cleaning using the brush 1402 described with reference to FIG. 14B. As shown, cleaning the surfaces with the brush 1402 results in a significant improvement in the cleanliness of the die 202 surfaces.

[0074] The techniques, components, and devices described herein are not limited to the illustrations of FIGS. 1-13, and may be applied to other designs, types, arrangements, and constructions including with other electrical components without departing from the scope of the disclosure. In some cases, additional or alternative components, techniques, sequences, or processes may be used to implement the techniques described herein.

[0075] For example, in some embodiments, after the various dies cleaning steps and die surface preparations described in the foregoing, the dies 202 may be transferred from the spin plate or cleaning tray 402 to a flip plate, to position the dies 202 face down (the bottom surfaces of the dies 202 are up). Referring again to FIG. 1, at block 11, the dies 202 are transferred to a pick and place station, where (at block 12) the dies 202 are attached to a wafer surface, with the dies 202 face down. At block 13, the dies 202 on the wafer are thermally treated.

[0076] The components and/or techniques may be arranged and/or combined in various combinations, while resulting in similar or approximately identical results.

[0077] Unless otherwise specified, additional or alternative components to those specifically mentioned may be used to implement the techniques described herein. In various implementations, a die 202 may be a stand-alone unit, or it may be a portion of a system, component, structure, or the like.

CONCLUSION

[0078] Although the implementations of the disclosure have been described in language specific to structural features and/or methodological acts, it is to be understood that the implementations are not necessarily limited to the specific features or acts described. Rather, the specific features and acts are disclosed as representative forms of implementing example devices and techniques.

[0079] Each claim of this document constitutes a separate embodiment, and embodiments that combine different claims and/or different embodiments are within the scope of the disclosure and will be apparent to those of ordinary skill in the art upon reviewing this disclosure.