LAMINATE

Abstract

The present application relates to a laminate, a method for preparing same and a use of the laminate. The present application can provide a method for forming a film, which comprises a self-assembled block copolymer, to have excellent uniformity in thickness even when the film is formed over a large area, a laminate comprising a polymer film formed by means of the method, and a use of same.

Claims

1. A laminate having a substrate; and a polymer film formed on one surface of said substrate and comprising a block copolymer, containing a first block and a second block different from said first block, in a self-assembled state, wherein a thickness deviation of said polymer film is 100 nm or less.

2. The laminate according to claim 1, wherein the polymer film has an area of 20,000 mm.sup.2 or more.

3. The laminate according to claim 1, wherein the self-assembled structure of the block copolymer is a sphere, cylinder, gyroid or lamellar structure.

4. The laminate according to claim 1, wherein the self-assembled block copolymer is vertically oriented.

5. The laminate according to claim 1, wherein the polymer film has a thickness in a range of 30 nm to 500 nm.

6. The laminate according to claim 1, wherein the block copolymer is polystyrene-b-polymethyl methacrylate, polystyrene-b-polyvinyl pyridine, polystyrene-b-polydimethylsiloxane, polystyrene-b-polyethylene oxide or polystyrene-polyisoprene.

7. The laminate according to claim 1, wherein the substrate is a rigid substrate or a flexible substrate.

8. The laminate according to claim 1, further comprising a neutral layer between the substrate and the polymer film.

9. A method for manufacturing a laminate comprising a step of coating on a substrate a coating liquid comprising a block copolymer dissolved in a solvent having a boiling point in a range of 90 C. to 200 C. at a speed of 10 mm/sec to 100 mm/sec.

10. The method for manufacturing a laminate according to claim 9, wherein the solvent is toluene, xylene, PGMEA, cyclopentanone, DMF, DMSO, anisole or 1,2,4-trichlorobenzene.

11. The method for manufacturing a laminate according to claim 9, wherein the block copolymer in the solvent has a concentration in a range of 2% by weight to 30% by weight.

12. The method for manufacturing a laminate according to claim 9, wherein the coating is performed by a comma coating method, a gravure coating method, a bar coating method or a lip coating method.

13. The method for manufacturing a laminate according to claim 9, wherein the coating is performed using a bar having a wet film thickness in a range of 0.5 m to 18 m.

14. The method for manufacturing a laminate according to claim 9, wherein the coating is performed in a roll-to-roll manner.

15. The method for manufacturing a laminate according to claim 9, further performing a step of forming a neutral layer on a surface of the substrate.

16. The method for manufacturing a laminate according to claim 9, further performing a step of annealing the film formed by the coating.

17. A method for forming a pattern comprising a step of selectively removing any one block of the block copolymer from the polymer film of the laminate according to claim 1.

Description

BRIEF DESCRIPTION OF DRAWINGS

[0042] FIG. 1 is a photograph of a polymer film comprising the self-assembled block copolymer formed by Example 1.

MODE FOR INVENTION

[0043] Hereinafter, the present application will be described in detail by way of examples according to the present application and comparative examples, but the scope of the present application is not limited by the following examples.

[0044] 1. Thickness Measurement

[0045] The thickness of the polymer film formed in Examples or Comparative Examples was evaluated according to the manufacturer's manual using Ellipsometry (manufacturer: Ellipso Technology, name: Spectroscopic Ellipsometry (Elli-SE-U)).

[0046] 2. Measurement of Thickness Deviation

[0047] The thickness deviation was measured with respect to the polymer film formed from a point about 10 cm away from the coating start point. In the polymer film, 15 to 20 random points were selected, and the thickness of each point was measured in the manner described above, and the thickness deviation was measured through +, deviation of the film thickness at each point with respect to the average value.

Example 1

[0048] Through the roll-to-roll process, the neutral layer and the polymer film were sequentially formed as follows.

[0049] Formation of Neutral Layer

[0050] A thermally cross-linkable neutral layer was formed on a silicon substrate (8 inch wafer). The neutral layer was formed using a Meyer bar coater equipped with a Meyer bar capable of forming a wet film of about 1.5 m. The coating liquid for neutral layer formation was prepared by dissolving a neutral layer material in a solvent (anisole) to a concentration of about 2% by weight. As the neutral layer material, a random copolymer obtained by randomly copolymerizing styrene (ST) and methyl methacrylate (MMA) in a molar ratio (ST:MMA) of about 6:4 was used. The coating liquid was coated on the substrate at a Meyer bar moving speed of about 80 mm/sec to a thickness of about 10 nm to 30 nm using the coater, and then heat-treated at a temperature of about 150 C. to 200 C. or so to form a neutral layer.

[0051] Formation of Polymer Film

[0052] The polymer film was formed by using a block copolymer in which polystyrene blocks having a number average molecular weight of about 50,000 g/mol and polymethyl methacrylate blocks having a number average molecular weight of about 48,000 g/mol are linked by covalent bonds. The block copolymer was dissolved in toluene (boiling point: about 110.8 C.) to a concentration of about 10% by weight to prepare a coating liquid. The coating liquid was coated on the neutral layer of the substrate that the neutral layer is formed on the surface to a thickness of about 100 nm or so by controlling a Meyer bar moving speed to about 80 mm/sec in a coater equipped with a Meyer bar having a wet film thickness of about 2 m or so. Thereafter, the substrate was heat-treated at 200 C. for about 1 hour to form a vertically oriented plate-like self-assembled structure. FIG. 1 is a photograph of a polymer film comprising the self-assembled block copolymer formed by Example 1.

Example 2

[0053] A polymer film was formed in the same manner as in Example 1, except that the concentration of the block copolymer was changed to about 5% by weight in the coating liquid applied upon forming the polymer film.

Example 3

[0054] A polymer film was formed in the same manner as in Example 1, except that the Meyer bar moving speed was changed to about 50 mm/sec upon forming the polymer film.

Example 4

[0055] A polymer film was formed in the same manner as in Example 1, except that anisole (boiling point: about 155 C.) was used as a solvent upon preparing the coating liquid for production of the polymer film.

Comparative Example 1

[0056] A polymer film was formed in the same manner as in Example 1, except that the Meyer bar moving speed was changed to about 5 mm/sec upon forming the polymer film.

Comparative Example 2

[0057] A polymer film was formed in the same manner as in Example 1, except that 1,2,4-trichlorobenzene (boiling point: about 215 C.) was used as a solvent upon preparing the coating liquid for production of the polymer film.

[0058] The average thicknesses and thickness deviations of the polymer films measured for the polymer films of Examples 1 to 4 and Comparative Examples 1 and 2 were summarized and described in Table 1 below.

TABLE-US-00001 TABLE 1 Average Thickness Thickness Deviation (unit: nm) (unit: nm) Example 1 95 20 Example 2 60 15 Example 3 150 30 Example 4 200 25 Comparative Example 1 300 120 Comparative Example 2 250 110

[0059] From the results shown in Table 1, it can be confirmed that, by controlling the boiling point of the solvent in the coating liquid solvent and the coating speed during the coating process, films having a uniform thickness and comprising the self-assembled block copolymer can be formed.