Pump Assisted Chemical Feeder

Abstract

A pump assisted chemical feeder for the treatment of pressurized water systems. There are various methods to dispense chemicals into pressurized water systems, including typical configurations of venturis, slug feeders, and electronic metering pumps. The described invention includes the use of adjustable bypass loops, pumps, and pressure differentials, to provide a reliable and adjustable means of introducing chemicals into a pressurized water system.

Claims

1. A chemical injection system comprising: a pressurized chemical dispensing tank; a continuous conduit forming a first flow circuit between said dispensing tank and a remote water pipe; a second continuous conduit forming a second flow circuit appurtenant to said first flow circuit; wherein a pump is installed within said second flow circuit.

2. A chemical injection system according to claim 1 wherein said pump is a centrifugal pump.

3. A chemical injection system according to claim 1 wherein said pump is a positive displacement pump.

4. A chemical injection system according to claim 3 wherein a pressure reducing valve is installed before said positive displacement pump.

5. A chemical injection system according to claim 1 wherein an adjustable restriction valve is installed within said second flow circuit to change the flow rate within said first circuit.

6. A chemical injection system according to claim 5 wherein said adjustable restriction valve installed within said second flow circuit is electronically controlled to change the flow rate within said first circuit.

7. A chemical injection system according to claim 1 wherein a flowmeter is used to electronically regulate the pumping rate of said pump.

8. A chemical injection system comprising: a pressurized chemical dispensing tank; a continuous conduit forming a first flow circuit between said dispensing tank and a remote water pipe; a flow restriction in said remote water pipe between inlet and outlet taps at said remote water pipe that is part of said first flow circuit; a second continuous conduit forming a second flow circuit appurtenant to said first flow circuit; wherein a pump is installed within said second flow circuit.

9. A chemical injection system according to claim 8 wherein said flow restriction within said remote water pipe is an adjustable restriction valve.

10. A chemical injection system according to claim 8 wherein said flow restriction within said remote water pipe is a venturi.

11. A chemical injection system according to claim 8 wherein said flow restriction within said remote water pipe is a pitot tube.

12. A chemical injection system according to claim 11 wherein said pitot tube is configured to produce a ram pressure.

13. A chemical injection system according to claim 8 wherein said pump is a centrifugal pump.

14. A chemical injection system according to claim 8 wherein said pump is a positive displacement pump.

15. A chemical injection system according to claim 14 wherein a pressure reducing valve is installed before said positive displacement pump.

16. A chemical injection system according to claim 8 wherein an adjustable restriction valve is installed within said second flow circuit to change the flow rate within said first circuit.

17. A chemical injection system according to claim 16 wherein said adjustable restriction valve installed within said second flow circuit is electronically controlled to change the flow rate within said first circuit.

18. A chemical injection system according to claim 8 wherein a flowmeter is used to electronically regulate the pumping rate of said pump.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0007] FIG. 1 chows the typical layout of an installed water treatment system with a preferred embodiment of the Invention.

[0008] FIG. 2 shows a more detailed layout of the multiple flow loops used in the invention.

DETAILED DESCRIPTION

[0009] With reference to FIGS. 1 and 2, the chemical injection system and its preferred features and functions are illustrated.

[0010] FIG. 1 shows the preferred layout of an installed water treatment system with a preferred embodiment of the invention, along with other ancillary components.. The first component in the piping scheme layout is the pipeline (1) itself with a main water flow (2) that is to be treated with a chemical injection system. The preferred embodiment of the invention is shown enclosed in an enclosure assembly (3), and contains a pump (4) and flow loops. In addition to the pump (4) are valves (5) (6) that are installed on each of the two flow loops. The two flow loops located within the enclosure assembly (3), labelled A and B in FIG. 2, are described in mnre detail in FIG. 2.

[0011] Connected to the pipeline (1) are two piping taps, including a supply tap (7) and a return tap (8). Both the supply tap (7) and the return tap (8) are fluidly connected to the enclosure assembly (3) by a supply pipe (9) and a return pipe (10). A bypass chemical dispenser (11) is located within the return pipe (10) between the enclosure assembly (3) and the return tap (8).

[0012] Ancillary components shown in the preferred embodiment shown in FIG. 1 include a flow sensor (12) and a flow controller (13) and the associated wiring (14) between the mentioned components and the pump (4).

[0013] The preferred embodiment as configured in FIG. 1 results in a flow circuit pattern with controllable flow rates in various sections, including the flow streams (15), (16), (17), (18), and (19), which are shown in mule detail in FIG. 2. FIG. 2 shows a preferred embodiment of the invention, with additional description of the components within the enclosure assembly (3) shown in FIG. 1; along with more detail of the flow characteristics.

[0014] FIG. 2 shows two flow circuit loops labelled Loop A (20) and Loop B (21). Examination of Loop A (20) shows that the water flow rate within Loop A (20), comprising of flow rates in each of the legs labelled (17), (18), and (19), can be altered by changing the pumping rate of the pump (4) or by changing the restriction of flow at Valve A (5) or Valve B (6).

[0015] Examination of Loop B (21) shows that the water flow rate within Loop B (21), comprising of flow rates in each leg labelled 15, 16, and 19, can be altered by changing the pumping rate of the pump (4), or by changing the restriction of the flow rate at Valve A (5) or Valve B (6).

[0016] Examination of the influence of the main water flow (2) at return tap (8) area shows that the proper adjustment of the pump (4) and restrictions at Valve A (5) and Valve B (6), assuming the main water flow if flowing at a reasonable rate, will result in a dispensing of a saturated chemical flow (22) from the chemical dispenser (11), which will flow downstream away from the return tap (8) area. When a saturated chemical flow (22) exits from the return pipe (10) and flows downstream of the return tap (8), to maintain a mass balance within Loop A and Loop B, there must be en equal volume of make-up water flow (23) into the supply pipe (9).

[0017] The rate of saturated chemical flow (22) into the pipe can be configured to be proportional to the main water flow (2) in the pipeline (1) using electronic flow meter and pump speed control. In the case where there is no main water flow (2), the pump (4) would be turned off if electronical controlled with flowmeter, or, the saturated chemical flow (22) would flow in the direction of a quasi-saturated chemical flow (24) back to the supply tap (7) area and into the supply pipe (9).

[0018] Further adjustments to this phenomenon can be made the use of a flow restrictor (25) installed in the pipeline (1) between the supply tap (7) and the return tap (8). In other embodiments of this invention, instead of a flow restrictor (25), any other means of creating a pressure differential between the supply tap (7) and the return tap (8) can be used, including venturis, pitot tubes, ram tubes, or valves. In the preferred embodiment of this invention, an air purge valve (26) would be located at the highest point to vent air from the piping system.

[0019] In compliance with the statute, the invention has been described in language more or less specific to structural or methodical features. It is to be understood that the Invention is not limited to specific features shown or described since the means herein described comprises preferred forms of putting the invention into effect. The invention is, therefore, claimed in any of its forms or modifications within the proper scope of the description and claims appropriately interpreted by those skilled in the art.