MASS SPECTROMETRY DEVICE
20180174811 ยท 2018-06-21
Inventors
Cpc classification
International classification
H01J49/04
ELECTRICITY
Abstract
The mass spectrometry device includes: a sample container for containing a sample; a heater for heating the sample container; an ion source for ionizing the sample vaporized in the sample container by being heated by the heater; an introduction unit that includes a valve, and that introduces the vaporized sample in the sample container into the ion source; a mass spectrometry unit that includes a vacuum chamber, and to which ions generated in the ion source are introduced; a vacuometer for measuring a degree of vacuum of the vacuum chamber; and a controller that controls the valve to intermittently introduce the vaporized sample in the sample container into the ion source. The controller controls an open time of the valve according to the degree of vacuum of the vacuum chamber that varies as a result of the ions being intermittently introduced into the mass spectrometry unit.
Claims
1. A mass spectrometry device comprising: a sample container for containing a sample; a first heater for heating the sample container; an ion source for ionizing the sample vaporized in the sample container by being heated by the first heater; an introduction unit that includes a valve, and that introduces the vaporized sample in the sample container into the ion source; a mass spectrometry unit that includes a vacuum chamber, and to which ions generated in the ion source are introduced; a vacuometer for measuring a degree of vacuum of the vacuum chamber; and a controller that controls the valve to intermittently introduce the vaporized sample in the sample container into the ion source, the controller controlling an open time of the valve according to the degree of vacuum of the vacuum chamber that varies as a result of the ions being intermittently introduced into the mass spectrometry unit.
2. The mass spectrometry device according to claim 1, wherein the ions generated in the ion source are introduced into the mass spectrometry unit according to a difference between the degree of vacuum of the ion source, and the degree of vacuum of the vacuum chamber, and wherein the controller leaves the valve open for a shorter time period when there is a decrease in the peak value of a waveform of the degree of vacuum of the vacuum chamber that varies as a result of the ions being intermittently introduced into the mass spectrometry unit, and leaves the valve open for a longer time period when there is an increase in the peak value of a waveform of the degree of vacuum of the vacuum chamber that varies as a result of the ions being intermittently introduced into the mass spectrometry unit.
3. The mass spectrometry device according to claim 1, wherein the device includes a second heater for maintaining a temperature of the introduction unit.
4. The mass spectrometry device according to claim 3, wherein the second heater is set to a temperature equal to or greater than a temperature of the first heater.
5. The mass spectrometry device according to claim 4, wherein the valve is an air-operated valve.
6. The mass spectrometry device according to claim 5, wherein the introduction unit includes a first tube through which an inert gas or air is introduced into the sample container at a predetermined pressure, a second tube that connects the sample container and the valve to each other, and a third tube that connects the valve and the ion source to each other.
7. The mass spectrometry device according to claim 6, wherein the mass spectrometry unit includes a mass separation unit and an ion detector inside the vacuum chamber, and wherein ions introduced into the mass separation unit are separated by the mass separation unit according to mass-to-charge ratio, and brought into the ion detector to determine components of the vaporized sample.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0017]
[0018]
[0019]
[0020]
[0021]
[0022]
[0023]
DESCRIPTION OF THE PREFERRED EMBODIMENTS
[0024] An embodiment of the invention is described below with reference to the accompanying drawings.
[0025]
[0026] An ion source 8 is configured from the glass tube 11 for accepting the introduced vaporized gas 4, tubular electrodes 9 disposed at two locations of the glass tube 11, and a high-frequency power supply 12. The high-frequency power supply 12 applies a high frequency of several hundred kilohertz and several kilovolts to the tubular electrodes 9 to generate an electromagnetic field inside the glass tube 11, and creates a barrier discharge 10. Closing the valve 6 after it was left open for a certain time period from a closed state causes the vaporized gas 4 to flow into the glass tube 11, and momentarily lowers the degree of vacuum in the glass tube 11. The degree of vacuum in the glass tube 11 increases again as the vaporized gas 4 flows out into the vacuum chamber 13 . The barrier discharge 10 stably generates when the degree of vacuum in the glass tube 11 ranges from several hundred to several thousand pascals (Pa), and ionizes the vaporized gas 4 in the discharge region. Specifically, the vaporized gas 4 that has flown into the vacuum chamber 13 is ionized by the barrier discharge 10, and introduced into a mass separation unit 14. Here, the mass separation unit 14 needs to have a high degree of vacuum to improve the performance of mass spectrometry. In order to create a vacuum difference, an orifice 15 having a small diameter of 1 mm or less is provided between the ion source 8 and a mass spectrometry unit.
[0027] The mass spectrometry unit is configured from the mass separation unit 14 formed by four ion-trapping electrodes, an ion detector 16, and the vacuum chamber 13 surrounding these components . The ions generated in the ion source 8 pass through the orifice 15, and are incident on the mass separation unit 14. In the mass separation unit 14, the ions become accumulated in the space between the four ion-trapping electrodes by the confined electric field. By varying the amplitude or frequency of the auxiliary AC voltage superimposed on the ion-trapping electrodes, the ions are passed through the ion-trapping electrode slit situated in a direction orthogonal to the axial direction of the ion-trapping electrodes, according to their mass-to-charge ratio. With the ions entering the ion detector 16, the components of the vaporized gas 4 are determined. In an alternative process, only specific ions are kept in the ion-trapping region by an FNF (Filtered Noise Field) process, and decomposed into fragment ions by a CID (Collision Induced Dissociation) process. The fragment ions can then be introduced into the ion detector 16 for more accurate analysis of the components. The vacuum chamber 13 is evacuated with a primary vacuum pump 18, which may be a high-evacuation turbo-molecular pump. The downstream side of the primary vacuum pump 18 is vacuumed with a roughing vacuum pump 17, which may be a diaphragm pump having a relatively lower evacuation rate. Though not illustrated, the electrodes are connected to a high-voltage power supply, and the whole operation is controlled by a controller 40.
[0028] In the mass spectrometry device 100, size reduction and lightness are achieved by ionizing the vaporized gas 4 in pulses by the open/close operation of the valve 6 to reduce the amount of ions that generate at one time.
[0029] However, it was found that the sample temperature has large impact on the pressure of the introduced gas. When the sample contains moisture, a large expansion of water vapor occurs with temperature increase, and the amount of vaporized gas introduced into the vacuum chamber 13 decreases.
[0030] In the case of a sample containing no moisture, a phenomenon has been shown to occur in which the reachable pressure in the vacuum chamber 13 decreases (the degree of vacuum increases) with increase in sample temperature.
[0031] In actual practice, analyzed samples are often mixtures of more than one substance, and the presence of substances having different boiling points results in the composition of the vaporized gas being changed by temperature changes. For quantitative analysis of a trace vaporized gas, it is accordingly required to maintain the sample temperature constant throughout the analysis. To this end, a heater 21 is provided for the tubes 5 and the valve 6 in the mass spectrometry device 100. The temperature of the heater 21 is set by the controller 40. By maintaining the temperature of the vaporized gas 4 constant throughout the analysis, it is possible to prevent the sample of the previous analysis from mixing into the current sample (carry-over), which may occur when the vaporized gas liquefies with decreasing temperatures, or when the sample deposits inside the tubes 5. Accordingly, the heater 21 is set to a temperature equal to or greater than the temperature set for the heater 3.
[0032] For low-volatile components, a sample may need to be heated to about 200 C. to 300 C. However, with a conventionally used solenoid valve, the operation becomes unstable when the valve-controlling winding portion reaches a temperature of about 105 C. or higher, and the valve becomes inoperable. To avoid this, an air-operated valve is used as the valve 6 in the embodiment.
[0033] It has been confirmed that the degree of vacuum in the vacuum chamber 13 varies with time when a sample contains moisture, even when the sample is maintained at the same temperature. In the embodiment, the amount of vaporized gas introduced into the vacuum chamber 13 is controlled to improve accuracy. Specifically, a vacuometer 20 for measuring the degree of vacuum in the vacuum chamber 13 is provided, and the open time of the valve 6 is controlled according to the degree of vacuum of the vacuum chamber 13. As described above, the vaporized gas 4 is introduced in pulses, and as such the degree of vacuum of the vacuum chamber 13 shows large changes in a short time period. It is accordingly desirable that the vacuometer 20 is adapted to enable a high-speed measurement with a time lag of about 10 ms. In order to keep the vacuum chamber 13 air tight, the vacuometer 20 is connected to the vacuum chamber 13 via, for example, an O ring 19, and a joint.
[0034] The flow rate Q of the gas entering the vacuum chamber can be represented by the following mathematical formula (1).
QC(P.sub.1P.sub.2)C.sub.2(P.sub.2P.sub.3) Formula (1) [0035] C.sub.1: Conductance of orifice 15 [0036] C.sub.2: Conductance between vacuum chamber 13 and primary vacuum pump 18 [0037] P.sub.1: Degree of vacuum on the upstream side of glass tube 11 [0038] P.sub.2: Degree of vacuum of vacuum chamber 13 [0039] P.sub.3: Degree of vacuum of primary vacuum pump 18
[0040] Typically, the parameters C.sub.1 and C.sub.2 remain the same throughout the analysis, and the parameters P.sub.1, P.sub.2, P.sub.3 representing the degrees of vacuum are the same immediately before the valve 6 is opened. This is because the hole diameter of the sample introducing system, and the evacuation rate of the vacuum pump, which determine the conductance, do not change even when the sample solvent or sample temperature varies.
[0041] The pressure increase dP in the vacuum chamber 13 during the open time t of the valve 6 can be represented by the following mathematical formula (2).
dP=Q/Vt Formula (2) [0042] V: Volume of vacuum chamber 13
[0043] It follows from this that the pressure value P of the vacuum chamber 13 is represented by the following mathematical formula (3).
P=dPdt=(Q/Vt)dt Formula (3)
[0044] That is, it can be seen that the degree of vacuum of the vacuum chamber 13 is dependent on the open time t of the valve 6. In the embodiment, the pressure P is monitored by the vacuometer 20, and t is controlled to make the P constant. Specifically, the pressure P may be controlled to make t smaller when the degree of vacuum (peak value of the waveform) of the vacuum chamber 13 is low, that is when the degree of vacuum at the peak of the waveform of the degree of vacuum is low. On the other hand, the pressure P may be controlled to make t larger when the degree of vacuum (peak value of the waveform) of the vacuum chamber 13 is high, that is when the degree of vacuum at the peak of the waveform of the degree of vacuum is high. In this way, the amount of introduced sample can be accurately controlled, and the measurement repeatability can be improved even when the sample is intermittently introduced.
[0045] The control described above is performed by the controller 40. The controller 40 has a memory 41 storing a device adjusting program. The controller 40 monitors the degree of vacuum of the vacuum chamber 13 according to the device adjusting program, and the open time of the valve 6 is controlled according to the degree of vacuum of the vacuum chamber 13 monitored by the controller 40. The device adjusting program is used to control evacuation of the vacuum pump, and the discharge voltage and discharge time of the high-frequency power supply 12, in addition to the temperature control of the heater 21.
[0046]
[0047] With a straight glass tube, the vaporized gas 4 passes through the barrier discharge region, and the vaporized gas 4 directly reacts with high energy ions and electrons, and produces large numbers of fragment ions. One way of avoiding this problem is to supply the vaporized gas 4 to the downstream side, away from the barrier discharge region, using capillaries routed inside the glass tube, so that the reaction of the vaporized gas 4 with high-energy ions and electrons can be avoided. However, this complicates the structure.
[0048] With the structure shown in
[0049] The detailed descriptions of the embodiment above are given to help illustrate the present invention, and the invention is not necessarily limited to including all of the configurations described above.