Method for forming CNT (carbon nanotube) film

Abstract

There is disclosed a method for forming a CNT film. In the method, the CNT film is formed by applying a dispersion liquid including CNT and a silica colloid onto a base material and drying the dispersion liquid.

Claims

1. A method for forming a CNT (Carbon Nanotube) film, comprising: applying a dispersion liquid including a CNT and a silica colloid and a solvent onto a base material; and drying the dispersion liquid, wherein the CNT film has a thickness after 50 to 400 times applying and drying of the dispersion liquid, wherein the silica colloid is removed from the CNT film by using an alkali water solution or a hydrofluoric acid, wherein a concentration of the silica colloid in the dispersion liquid is within a range from 0.01 to 0.11% by weight, and wherein a concentration of the CNT in the dispersion liquid is within a range from 110.sup.5 to 0.01% by weight.

2. The method for forming the CNT film according to claim 1, wherein the alkali water solution is a sodium hydroxide solution or a potassium hydroxide solution.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) FIG. 1 is a picture showing a dispersion property of a dispersion liquid.

MODE FOR CARRYING OUT THE INVENTION

(2) Hereinafter, an embodiment for carrying out the present invention will be described.

(3) 1. Preparation of Dispersion Liquid Including CNT and Silica Colloid

(4) (1-1) Sodium silicate solution No. 5 (SiO.sub.2: 25.5% by weight; mole ratio: 3.7) was diluted by ion-exchange water, such that a concentration of the SiO.sub.2 is 5% by weight. After that, silica colloid solution was prepared by using a cation-exchange resin. The silica colloid solution was diluted by mixed solution of the ion-exchange water and THF, whereby there were prepared, respectively, the silica colloid solution having a SiO.sub.2 concentration of 0.001% by weight, the silica colloid solution having a SiO.sub.2 concentration of 0.005% by weight, the silica colloid solution having a SiO.sub.2 concentration of 0.01% by weight, the silica colloid solution having a SiO.sub.2 concentration of 0.05% by weight, and the silica colloid solution having a SiO.sub.2 concentration of 0.1% by weight.

(5) (1-2) Single-walled CNT (manufactured by Unidym) was added to each of five types of the silica colloid solutions that were prepared in (1-1), and then an ultrasonic treatment was applied to each of the same solutions. Consequently, five types of the dispersion liquid each including the CNT and the silica colloid were prepared. Hereinafter, five types of the prepared dispersion liquid will be referred to as follows.

(6) A dispersion liquid A1: the dispersion liquid prepared by using the silica colloid solution having the SiO.sub.2 concentration of 0.001% by weight.

(7) A dispersion liquid A2: the dispersion liquid prepared by using the silica colloid solution having the SiO.sub.2 concentration of 0.005% by weight.

(8) A dispersion liquid A3: the dispersion liquid prepared by using the silica colloid solution having the SiO.sub.2 concentration of 0.01% by weight.

(9) A dispersion liquid A4: the dispersion liquid prepared by using the silica colloid solution having the SiO.sub.2 concentration of 0.05% by weight.

(10) A dispersion liquid A5: the dispersion liquid prepared by using the silica colloid solution having the SiO.sub.2 concentration of 0.1% by weight.

(11) Compositions of the dispersion liquid A1 to A5 are indicated as follows.

(12) <The Dispersion Liquid A1>

(13) Single-walled CNT: 0.01% by weight Silica: 0.001% by weight Water: 21.939% by weight THF: 78.05% by weight
<The Dispersion Liquid A2> Single-walled CNT: 0.01% by weight Silica: 0.005% by weight Water: 21.935% by weight THF: 78.05% by weight
<The Dispersion Liquid A3> Single-walled CNT: 0.01% by weight Silica: 0.01% by weight Water: 21.930% by weight THF: 78.05% by weight
<The Dispersion Liquid A4> Single-walled CNT: 0.01% by weight Silica: 0.05% by weight Water: 21.89% by weight THF: 78.05% by weight
<The Dispersion Liquid A5> Single-walled CNT: 0.01% by weight Silica: 0.11% by weight Water: 21.83% by weight THF: 78.05% by weight

(14) As shown in a right side picture of FIG. 1, the CNT was stably dispersed and a precipitate was not formed in the dispersion liquid A4 even after the same A4 had been left at rest for a long time. The dispersion liquid A1 to A3 and A5 showed a similar result as the dispersion liquid A4. In contrast, as shown in a left side picture of FIG. 1, a precipitate did result in a short time in the dispersion liquid of the CNT, in which the silica colloid was not included. Therefore, such dispersion liquid of the CNT could not be used to be applied onto the CNT film, which is to be described hereinafter.

(15) 2. Formation of CNT Film

(16) (2-1) By using the dip coating method, the dispersion liquid (any one of the dispersion liquid A1 to A5) was applied onto a PET film having a thickness of 100 m, and the same liquid was dried. Applying and drying of the dispersion liquid was repeated predetermined number of times (any one of fifty times, one hundred times, two hundred times, or four hundred times). In the above-described process, the CNT film (before the removal of the silica) was formed.

(17) A resistance value of the CNT film (before the removal of the silica) was measured by using a four-terminal resistivity meter (i.e., Loresta GP manufactured by Mitsubishi Chemical Corporation.) Further, a transmissivity of the CNT film (before the removal of the silica) was measured by using a spectrophotometer (i.e., V-670 manufactured by JASCO Corporation.) The results of such measurements will be indicated in Table 1.

(18) TABLE-US-00001 TABLE 1 Applying and Drying Dispersion Liquid (number of times) A2 A3 A4 A5 50 >10.sup.8 5.7 10.sup.7 >10.sup.8 >10.sup.8 87.3 87.7 85.1 90 100 >10.sup.8 1.1 10.sup.6 6.0 10.sup.7 >10.sup.8 85.6 75.5 73.7 71 200 8.0 10.sup.6 2.5 10.sup.4 2.2 10.sup.6 8.0 10.sup.6 83.2 56.6 48.8 49.7 400 3.6 10.sup.4 2.2 10.sup.3 1.7 10.sup.4 1.4 10.sup.5 50.2 24.1 25 29.2

(19) In each column of Table 1, an upper numerical value shows the resistance value () and a lower numerical value shows the transmissivity (%).

(20) (2-2) Among the CNT films (before the removal of the silica) that were formed in (2-1), a removing process of the silica colloid was implemented on the CNT film (before the removal of the silica) on which the dispersion liquid A4 used as the dispersion liquid were applied and dried two hundred times. Consequently, the CNT film (after the removal of the silica) was formed.

(21) As the removing process of the silica colloid, implemented was either one of three types of processes to be described as follows. A first process was a process in which the silica colloid was removed by soaking the CNT film (before the removal of the silica) into a sodium hydroxide solution, whose concentration was 1 mol/l, for thirty minutes. A second process was a process in which the silica colloid was removed by soaking the CNT film (before the removal of the silica) into a potassium hydroxide solution, whose concentration was 1 mol/l, for thirty minutes. A third process was a process in which the silica colloid was removed by soaking the CNT film (before the removal of the silica) into a hydrofluoric acid, whose concentration was 1 mol/l, for thirty minutes.

(22) A resistance value () of the CNT film (after the removal of the silica) was measured by using the four-terminal resistivity meter (Loresta GP manufactured by Mitsubishi Chemical Corporation). The result of this measurement will be indicated in Table 2. In addition, in Table 2, the resistance value () of the CNT film, on which the removing process of the silica colloid has not yet been implemented, will be also indicated.

(23) TABLE-US-00002 TABLE 2 NaOH KOH HF After After After implementing implementing implementing the the the removing removing removing Before implementing process for process for process for the removing process thirty minutes thirty minutes thirty minutes 1.4 10.sup.5 2.2 10.sup.4 3.4 10.sup.4 1.8 10.sup.4

(24) (2-3) A removing process of the silica colloid was implemented on the CNT films (before the removal of the silica) that were formed in (2-1). Consequently, the CNT film (after the removal of the silica) was formed. The removing process of the silica colloid was a process in which the CNT film was soaked into the sodium hydroxide solution for a predetermined time. In Table 3, there will be shown combinations of types of the CNT films (before the removal of the silica), (i.e., types of the dispersion liquid used for forming the CNT film), and conditions of the removing process of the silica colloid (concentrations of the sodium hydroxide solution and soaking time). The number of each of applying and drying the dispersion liquid in the formation of the CNT film was two hundred times.

(25) TABLE-US-00003 TABLE 3 Resistance Value () Conditions After Dispersion for the removal of Before the removal of the removal of Liquid Silica Silica Silica A2 1 mol/l 30 min 8.0 10.sup.6 1.7 10.sup.6 A3 1 mol/l 30 min 3.8 10.sup.4 1.2 10.sup.4 A4 0.4 mol/l 4 min 4.8 10.sup.5 1.0 10.sup.5 0.4 mol/l 6 min 3.6 10.sup.5 3.9 10.sup.4 0.7 mol/l 3 min 4.1 10.sup.5 9.7 10.sup.4 0.7 mol/l 5 min 3.3 10.sup.5 2.2 10.sup.4 1 mol/l 0.5 min 4.8 10.sup.5 1.3 10.sup.5 1 mol/l 1 min 3.6 10.sup.5 1.5 10.sup.5 1 mol/l 3 min 2.3 10.sup.5 3.4 10.sup.4 1 mol/l 10 min 3.0 10.sup.5 4.0 10.sup.4 1 mol/l 30 min 4.4 10.sup.5 2.8 10.sup.4 A5 1 mol/l 30 min 2.7 10.sup.6 3.3 10.sup.4 0.1 mol/l 5 min 3.9 10.sup.6 1.1 10.sup.5 0.1 mol/l 10 min 3.3 10.sup.6 2.9 10.sup.4 0.1 mol/l 30 min 3.0 10.sup.6 2.4 10.sup.4

(26) Then, a resistance value of the CNT film (after the removal of the silica) was measured by using the four-terminal resistivity meter (Loresta GP manufactured by Mitsubishi Chemical Corporation). The result of this measurement is indicated in Table 3 as above. In addition, in Table 3, the resistance value of the CNT film, to which the removing process of the silica colloid has not yet been implemented, is also indicated.

(27) If a concentration of the sodium hydroxide solution is c (mol/l) and soaking time is t (min), the properties of the CNT film are more improved within a range in which Formula 1 is satisfied.
C2.7exp(3.3t)Formula 1:

(28) 3. Effect of Method for Forming CNT Films

(29) (3-1) According to the above-described method for forming the CNT film, a defect is not generated on a surface of the CNT or the CNT itself is not cut because it is not necessary to treat the surface of the CNT by acid or plasma. Consequently, as shown in Tables 1 to 3 as above, the CNT film having excellent properties (an electric conducting property, a thermal conductivity, a mechanical strength, etc.) can be formed. Further, since it is not necessary to add a surface acting agent into the dispersion liquid of the CNT, the surface acting agent that is difficult to be removed does not remain in the CNT film. Consequently, as shown in Tables 1 to 3 as above, the CNT film having excellent properties (the electric conducting property, the thermal conductivity, the mechanical strength, etc.) can be formed.

(30) (3-2) Since the silica colloid had been removed from the CNT films that were formed in (2-2) and (2-3), the properties of the CNT films are more improved, as shown in Tables 2 and 3.

(31) (3-3) As shown in FIG. 1, the CNT can be stably dispersed in the dispersion liquid A1 to A5. As a result, the CNT film having homogenous properties can be formed.

(32) (3-4) The CNT films that were formed in (2-1), (2-2), and (2-3) have excellent heat resistance, and such CNT films are less likely to be influenced by humidity.

(33) The present invention should not be limited to the aforementioned embodiments, and can be implemented in various manners within a scope not departing from the spirit of the present invention.

(34) For example, the solvents of the dispersion liquid A1 to A5 can be water only (i.e., the THF is not included). In this case, substantially the same effect as the aforementioned embodiment can be achieved.

(35) The CNT film can be formed on a resin film other than a PET film, or on a base material made of glass. In this case, substantially the same effect as the aforementioned embodiment can be achieved.

(36) As a method for applying the dispersion liquid, other application methods (for example, a spray coating method, a spin coating method, and the like) can be used. In this case, substantially the same effect as the aforementioned embodiment can be achieved.

(37) After the silica colloid is removed, the CNT film can be compressed. By compressing the CNT film, the properties thereof are more improved

(38) As a process in which the silica colloid is removed, there can be used other processes than the process in which the CNT film is soaked into the alkali water solution or the hydrofluoric acid. For example, the alkali water solution or the hydrofluoric acid can be applied (or sprayed) onto the surface of the CNT film.