Method for manufacturing a superhydrophobic surface, surface so obtained and use of it
09999901 ยท 2018-06-19
Assignee
Inventors
- Nicolas Boscher (Audun le Tiche, FR)
- David Duday (Luxembourg, LU)
- Patrick CHOQUET (Longeville Les Metz, FR)
- Stephane Verdier (Audun le Tiche, FR)
Cpc classification
B05D1/62
PERFORMING OPERATIONS; TRANSPORTING
Y10T428/24355
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
C09D5/1681
CHEMISTRY; METALLURGY
B05D5/00
PERFORMING OPERATIONS; TRANSPORTING
B05D5/08
PERFORMING OPERATIONS; TRANSPORTING
International classification
B05D5/08
PERFORMING OPERATIONS; TRANSPORTING
C09D5/00
CHEMISTRY; METALLURGY
B05D1/00
PERFORMING OPERATIONS; TRANSPORTING
B05D5/00
PERFORMING OPERATIONS; TRANSPORTING
Abstract
The invention is directed to a method for manufacturing a hydrophobic or superhydrophobic surface comprising the steps of: (a) providing a substrate with a surface roughness R.sub.a between 0.1 and 1.0 m and (b) exposing the substrate to a filamentary atmospheric pressure dielectric barrier discharge plasma which is fed by a reaction gas and siloxane-forming material in order to form a superhydrophobic siloxane layer over at least a portion of the surface of the substrate. Step (b) is operated with an electrical excitation frequency of 15,000 Hz to 35,000 Hz and a power density between 0.5 to 10 W.Math.cm.sup.2. The siloxane layer produced in step (b) shows thereby a micro-structure and a nano-structure with droplet sticking properties (high water sliding angle).
Claims
1. A method for manufacturing a superhydrophobic layer, said method comprising: (a) providing a substrate with a surface; (b) exposing the surface to a filamentary atmospheric pressure dielectric barrier discharge plasma which is fed by a gas flow comprising reaction gas and siloxane-forming material in order to form a superhydrophobic siloxane layer over at least a portion of the surface, wherein the surface of the substrate in step (a) has a roughness R.sub.a between 0.1 and 1.0 m, and wherein the filamentary atmospheric pressure dielectric barrier discharge plasma is operated with an electrical excitation frequency of 15,000 Hz to 35,000 Hz and a power density between 0.5 to 10 W.Math.cm.sup.2.
2. The method according to claim 1, wherein the concentration of the siloxane-forming material in the gas flow comprises between 50 and 10,000 ppm.
3. The method according to claim 2, wherein the superhydrophobic siloxane layer shows a micro-structure and a nano-structure.
4. The method according to claim 3, wherein the substrate is aluminum foil and the roughness R.sub.a between 0.1 and 1.0 m is achieved by cold-rolling.
5. The method according to claim 3, wherein the substrate comprises at least one of copper, steel, cardboard, wood, plastic, polypropylene fabric and glass.
6. The method according to claim 5, wherein the flow of gas comprises less than 500 ppm of oxygen.
7. The method according to claim 6, wherein the flow of gas comprises nitrogen.
8. The method according to claim 7, wherein the electrical excitation frequency is between 20,000 Hz to 30,000 Hz.
9. The method according to claim 8, wherein the siloxane-forming material is at least one of a organosilicon gas, vapour, liquid and aerosol.
10. The method according to claim 9, wherein the siloxane-forming material is selected from a group consisting of hexamethyldisiloxane, octamethylcyclotetrasiloxane, decamethylcyclopentasiloxane, dodecamethylcyclohexasiloxane, hexaethyldisiloxane, tetraethylorthosilicate, aminopropyltrimethoxysilane, tetramethyldisiloxane, pentamethylcyclopentasiloxane, octamethylcyclooctasiloxane, polydimethylsiloxane and its derivatives.
11. The method according to claim 10, wherein the siloxane layer comprises agglomerated particles having a size between 50 and 750 nm.
12. The method according to claim 11, wherein the filamentary atmospheric pressure dielectric barrier discharge plasma is operated with a power density between 1 to 5 W.Math.cm.sup.2.
Description
DRAWINGS
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DETAILED DESCRIPTION
(16)
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(18) A siloxane-forming material, like for example a hexamethyldisiloxane (HMDSO), is injected into the reactor using a classic bubbler system made of a cylinder and a frit (not illustrated). The respective flow rates of nitrogen through the process gas line and the HMDSO bubbler are kept constant to 19.5 L.Math.min-1 and 0.5 L.Math.min-1 (1000 ppm) respectively for all experiments. The siloxane-forming material, HMDSO, was obtained from Sigma-Aldrich and used without further purification (98%). Nitrogen (99.999%) gas can be obtained from Air Liquide. The deposition time is 60 seconds for all the experiments.
(19) Deposition Experiments:
(20) The substrates in the following examples were foils of an aluminium alloy. The precise composition of the aluminium alloy foil is not critical for the invention.
(21) In these examples the aluminium alloy foil with a surface roughness Ra of 0.18 m was obtained by cold rolling, but many other methods well known to the skilled person could be used to obtain the same kind of surface roughness. Polished aluminium foil with a surface roughness Ra of 0.06 m was also used as a substrate to illustrate the effect of a smoother surface substrate.
(22) The films were deposited on the foil substrates by submitting the substrates to dielectric barrier discharge plasma operating at atmospheric pressure under filamentary regime, as described above in relation with
(23) TABLE-US-00001 TABLE 1 Sample Frequency Power density T R.sub.a [m] R.sub.z [m] WCA ID [Hz] [W .Math. cm.sup.2] [ C.] [a] [a] [] 1 10,000 1 20 0.06 [b] 0.40 [b] 98 2 10,000 1 20 0.18 0.89 112 3 10,000 1 80 0.18 0.89 103 4 22,500 1 20 0.06 [b] 0.40 [b] 103 5 22,500 1 21 0.18 0.89 151 6 22,500 0.9 80 0.18 0.89 155 7 30,000 1.5 21 0.18 0.89 150 8 40,000 1 21 0.18 0.89 102 [a] Measured by confocal microscopy [b] Polished aluminium foil Ra designates the arithmetic average of the absolute deviation from the mean line of all points of the profile. Rz designates the arithmetic average of the five largest maximum peak-to-valley heights.
(24) Samples 5 to 7 are in accordance with the invention whereas samples 1 to 4 and 8 are examples not being part of the invention.
(25) Samples 2 and 3 show an increase of the WCA compared to sample 1. Samples 5, 6 and 7 show a substantial increase of the WCA compared to sample 4. It results that the use of a rough substrate (Ra of 0.18 m) according to the invention increases the hydrophobic properties of the resulting surface.
(26) In samples 5 and 6, the WCA is lowest, i.e. 151, for the films formed at room temperature and slightly increased, i.e. to 155, for the film deposited at 80 C.
(27) Additionally, like rose petals, the superhydrophobic surfaces of samples 5 and 6 obtained by the method according the invention have high adhesive force to water. During tilting experiments, it was observed that the water droplets clung to the surface, as shown in
(28) Evaluation of the Surfaces:
(29) Scanning electron micrographs (SEM) of the aluminium foil substrates of sample 2 are shown in
(30) At low magnification, i.e. 1,000 in
(31) At a higher magnification, i.e. 10,000 in
(32) At even higher magnification, i.e. 100,000,
(33) Evaluation of the Composition
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(35) FTIR shows that the large difference observed in the measured WCA is not related to any chemical disparity between the films produced, whereas SEM reveals some large differences in the morphology of the PDMS deposited.
(36) Micron and Nanometer Length Scales of the Superhydrophobic Surfaces:
(37) The micrometer and nanometer scale roughnesses observed by SEM can be also identified by confocal microscopy and atomic force microscopy (AFM).
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(40) The arithmetic average of the absolute deviation from the mean line of all points of the profile (R.sub.a) and the arithmetic average of the five largest maximum peak-to-valley heights (R.sub.z) are given in Table 1. The size of the rolling lines (10-20 m wide and 1-1.5 m height) observed on the roughness profile of the films prepared on the cold-rolled aluminum foil (
(41)
(42) Confocal microscopy and AFM emphasis the importance of the dual-scale roughness as the superhydrophobic property was only achieved when nanometer scale features in addition of the micrometer features was constructed.
(43) Plasma Frequency and Formation of Rough PDMS Surfaces:
(44) A double-roughness surface is important to achieve the desired superhydrophobic effect. It is the mechanism of polymer agglomeration that occurs during the DBD process that is the key to yielding such specific rough surfaces. The relatively high concentration of HMDSO used (1000 ppm) is known to favor the formation of particles in the gas phase. The high concentration of precursor induces the formation of a large amount of condensable species by the reaction with the reactive species produced by each filament of the AP-DBD. The high concentration of condensable species leads to high local concentration of nucleated particles, which grow by condensation and coagulation. The number of formed particles in the gas phase and at the surface of the film is therefore related to the precursor concentration, but also to the density and energy of the filaments of the AP-DBD. The mean dissipated power density, which is known to influence the formation of particles, has been kept constant to 1.1 W.Math.cm.sup.2 for both frequencies studied. However the plasma gas current density as illustrated in
(45) The invention has been described above specifically in relation with an aluminum substrate. It is to be mentioned that the invention can also be applied on other type of substrates like copper, steel, cardboard, wood, polypropylene fabric and glass. Deposition tests have been successfully carried out on all these types of substrates and did all provide superhydrophobic properties with varying WSA going from 20 with substrates made of cardboard or wood to 90 (i.e. totally sticking) for a substrate made of electrodeposited copper foil.