Barrier layer for a turbocharger

Abstract

A system, in particular a turbocharger with a barrier layer for protecting against high temperature corrosion of parts and/or components of the system or turbocharger that are subjected to high temperatures, where the barrier layer includes at least one CrAlO layer.

Claims

1. A PVD-coated part or a PVD-coated component of a turbocharger, comprising: a PVD-coated substrate having an oxidation- and chemical barrier layer that includes at least one AlCrO layer, which at least partially has a corundum structure and shows at least reflections of a crystal structure of an AlCr intermetallic phase in an X-ray diffraction diagram, and wherein the substrate is a part or component of a turbocharger that is subjected to temperatures greater than 400 C., but not greater than 800 C., during operation of the turbocharger, and wherein a crystallite size of an oxide in the AlCrO layer is so small that oxide crystallites can no longer be detected with XRD and as a result, no oxide phase can be detected in the X-ray diffraction diagram.

2. The PVD-coated part or the PVD-coated component of a turbocharger according to claim 1, wherein the barrier layer includes a chromium nitride layer, which is situated between the substrate and the AlCrO layer.

3. The PVD-coated part or the PVD-coated component of a turbocharger according to claim 1, wherein the chemical composition of the AlCrO layer produces a composition of (Al,Cr).sub.2O.sub.3-y where y0.3.

4. The PVD-coated part or the PVD-coated component of a turbocharger according to claim 1, wherein the X-ray diffraction diagram shows the reflections of an (Al,Cr).sub.2O.sub.3 layer in a corundum structure.

5. The PVD-coated part or the PVD-coated component of a turbocharger according to claim 1, wherein the X-ray diffraction diagram shows the reflections of a crystal structure of an AlCr intermetallic phase.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) FIG. 1 shows a calotte-grinding measurement for evaluating the layer thickness of the layer 1 resulting from exemplary embodiment 1.

(2) FIG. 2 shows a calotte-grinding measurement for evaluating the layer thickness of the layer 2 resulting from exemplary embodiment 1.

(3) FIG. 3 is an x-ray diffraction diagram of an (Al,Cr).sub.2O.sub.3 layer, which was produced by an Al.sub.0.7Cr.sub.0.3 target and clearly shows the reflections for an (Al,Cr).sub.2O.sub.3 layer in a corundum structure.

(4) FIG. 4 is an x-ray diffraction diagram of an (Al,Cr).sub.2O.sub.3 layer, which was produced by an Al.sub.0.7Cr.sub.0.3 target and clearly shows the reflections of the crystal structure of the intermetallic phase Al.sub.8Cr.sub.5.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

(5) In the context of the present invention, the expression high temperatures is understood to mean temperatures greater than 400 C., in particular greater than 500 C.

(6) Barrier layers according to the present invention have turned out to be outstanding barriers against oxidation and chemical attacks, in particular for components in turbochargers that are subjected to temperatures of up to 600 C. and even up to 800 C. and more.

(7) Preferably, the layer is deposited according to the invention by means of a PVD process, preferably by means of reactive arc vaporization without a droplet filter.

(8) Preferably, the layer contains an interface layer of CrN and a functional layer of AlCrO.

(9) Other details of the invention will be described in conjunction with exemplary embodiments:

(10) In order to produce the layers according to two exemplary embodiments I and 2, the following process parameters were used (see Tables 1 and 2):

(11) TABLE-US-00001 TABLE 1 Process parameters in the deposition of the interface Discharge Pretreatment Interface current Substrate (etching (deposition Example Targets target temperature process) process) 1 2 Cr Cr: 140 A 450 C. Cr-metal ion CrN (at 3 Pa N2 etching (18 min) for 13 min) 2 2 Cr Cr: 140 A 450 C. Cr-metal ion CrN (at 3 Pa N2 etching (18 min) for 7 min)

(12) TABLE-US-00002 TABLE 2 Process parameters in the deposition of the functional layer Discharge current Substrate Example Targets target temperature Gas flow Functional layer 1 2 AlCr AlCr: 200 A 450 C. 400 sccm O2 AlCrO (for 60 min 2 2 AlCr AlCr: 200 A 450 C. 400 sccm O2 AlCrO (for 30 min)

(13) The layer thicknesses of the layers produced according to the invention according to exemplary embodiments 1 and 2 were measured with the aid of a layer thickness testing device using the calotte grinding process (see Table 3 and FIGS. 1 and 2):

(14) TABLE-US-00003 TABLE 3 Layer thickness of the layers 1 and 2 resulting from exemplary embodiments 1 and 2 Example Interface thickness Functional layer 1 0.5 m 4.0 m 2 0.3 m 1.9 m

(15) In order to produce AlCrO layers according to the present invention, preferably targets with an Al.sub.1-xCr.sub.x composition where 0.2x0.9 in atomic concentration are used. In general, these targets are produced by means of powder metallurgy so that any chemical compositions can be used in the indicated region.

(16) Preferably, the targets are vaporized in an oxygen atmosphere, as has already been indicated in the above-described exemplary embodiments I and 2. According to the invention, the targets can be operated with different discharge currents in order to control the vaporization rate.

(17) According to the invention, the chemical composition of the layers is preferably controlled so that the analysis of a layer produced in this way yields a composition of (Al,Cr).sub.2O.sub.3-y, where y0.3.

(18) Depending on the case, the coating temperature can be adapted to the substrate material that is to be coated and to the subsequent use. Typically, the coating temperatures are between 100 C. and 600 C.

(19) Since the substrates to be coated can have different shapes and sizes, the embodiment of the substrate holder with which they are secured during the coating in the system is adapted to the shape of the substrate.

(20) All of this results in the fact that in all cases, the above-described chemical composition is in fact retained, but other phase compositions of the oxide layer are produced for the different process parameters.

(21) The phases of the layer are usually measured using X-ray diffraction (XRD) methods. Consequently, the measured XRD spectrum in some cases can clearly show the reflections for an (Al,Cr).sub.2O.sub.3 layer in a corundum structure, as shown for example in FIG. 3. In this case, FIG. 3 shows the X-ray diffraction diagram of an (Al,Cr).sub.2O.sub.3 layer that was produced by an Al.sub.0.7Cr.sub.0.3 target.

(22) In the figure, the XRD reflections of the positions of the tungsten carbide substrate (thick dashed line) and the positions for the diffraction reflections of Cr.sub.2O.sub.3 in an eskolaite structure (solid line) and Al.sub.2O.sub.3 in a corundum structure (dashed line) are plotted. Between these two lines is the respective measured diffraction reflection for the synthesized (Al,Cr).sub.2O.sub.3 mixed crystal in a corundum structure, as is to be expected according to Vegard's law.

(23) But if the process conditions are changed as described above, then the crystallite size of the oxide can be so small that the crystallites can no longer be detected with XRD or it is also possible that the change in the process conditions causes the structure of the resulting oxide to even become amorphous.

(24) In such cases, the oxide can no longer be detected in the X-ray spectrum, but in almost every case, materially related compounds can be found, primarily intermetallic phases and metallic mixed crystals of the AlCrO layer. One such materially related compound, for example, is the intermetallic phase Al.sub.5Cr.sub.5.

(25) A corresponding X-ray diffraction diagram is shown in FIG. 4, which shows an X-ray spectrum measured in one layer, in which, although no oxide phase can be detected, the materially related intermetallic phase Al.sub.5Cr.sub.5 is clearly evident. This X-ray diffraction diagram once again illustrates the diffraction reflections for the tungsten carbide substrate (thick dashed line) and in addition, the diffraction reflections for the Al.sub.8Cr.sub.5 crystal structure (solid line), which clearly demonstrate the existence of this intermetallic compound in the oxide layer.

(26) In an entirely analogous fashion, under certain process conditions, XRD can be used in the oxide layer, whose chemical composition has been described above, to also detect Al.sub.4Cr.sub.1 or Al.sub.9Cr.sub.4, for example, or other AlCr intermetallic compounds or mixed crystals, individually or together.