PHYSICALLY DRYING NAIL POLISH COMPOSITION, THE APPLICATION METHOD THEREOF, AND KIT INCLUDING SUCH A COMPOSITION

Abstract

The invention relates to a nail polish composition containing at least one film-forming agent, a plasticizer, and a solvent. Said composition is characterized in that it also includes one or more oligomer(s) having a molar mass of 1500 g/mol and/or a glass transition temperature Tg greater than 25 C. Said oligomer has dual acrylic or methacrylic bonds available for reacting with groups without containing any agent for cross-linking the oligomer, such as a photoinitiator. The method for applying the nail polish includes consecutively applying such a photoinitiator-free composition and a similar photoinitiator-containing composition followed by visible-light cross-linking. The nail polish has longer-lasting sheen and better hardness than solvent-based nail polishes and also comes on and off much more quickly than a gel-based nail polish.

Claims

1. A nail polish composition comprising: at least a film-forming agent, a plasticizer and a solvent, wherein said composition also comprises one or more oligomer(s) of molecular weight above 1500 g/mol and/or whose glass transition temperature Tg is above 25 C., said oligomer possessing acrylic or methacrylic double bonds available for reaction with radicals, but does not contain a crosslinking agent of the oligomer, such as a photoinitiator.

2. The nail polish composition as claimed in claim 1, wherein the molecular weight of the oligomer is greater than or equal to 2000 g/mol, preferably greater than or equal to 3000 g/mol.

3. The nail polish composition as claimed in claim 1, wherein the oligomer has a glass transition temperature Tg above 30 C., preferably above 35 C., more preferably above 40 C.

4. The nail polish composition as claimed in claim 1, wherein the oligomer has a Persoz hardness of at least 60 s, preferably at least 80 s, more preferably at least 100 s, when it is applied on a glass plate at a thickness of 100 m when wet, and then dried for 24 h at 25 C. away from the light.

5. The nail polish composition as claimed in claim 1, wherein the oligomer is selected from: a (meth)acrylated poly(meth)acrylate, a (meth)acrylated polyester, a (meth)acrylated polyether, a (meth)acrylated urethane, a (meth)acrylated polyurethane or a (meth)acrylated epoxy, a (meth)acrylated silane-modified poly(meth)acrylate or a mixture thereof.

6. The nail polish composition as claimed in claim 1, wherein said composition contains a concentration of said oligomer between 0.1 and 30 wt %, preferably between 0.5 and 20 wt %, more preferably between 1 and 15 wt % of the total weight of the nail polish composition.

7. A method for applying polish on a nail comprising the following successive steps: i) applying a first composition A as claimed in claim 1 on the nail in the form of at least one film FA, composition A preferably containing a colored pigment and not containing a photoinitiator; followed by drying of said film FA; ii) applying, on the surface of the film FA formed by composition A, a second composition B, called a top coat, as claimed in any one of claims 1 to 6 and further comprising a photoinitiator, in the form of a film FB; said composition B containing a photoinitiator; iii) initiating the crosslinking of composition B in visible light, the crosslinking of the oligomers of composition B causing crosslinking of the oligomers present on the surface of film FA, inducing a strong bond between films FA and FB.

8. A nail polish kit according to claim 1, wherein comprises: a container CA, of the bottle type, containing a first nail polish composition A, a container CB, of the bottle type, containing a second nail polish composition B and further comprising a photoinitiator, instructions for use.

9. The kit as claimed in claim 8, wherein the photoinitiator of composition B is of the radical type capable of initiating crosslinking of the oligomer or oligomers (at least) in daylight.

10. The kit as claimed in claim 8, wherein the concentration of photoinitiator is between 0.1 and 10 wt %, preferably between 0.5 and 5 wt % of the total weight of the nail polish composition.

11. The kit as claimed in claim 8, wherein container CA has walls at least partially transparent so that the color of the colored polish of the first composition A is visible, when the latter is stored in said container CA.

12. The kit as claimed in claim 8, wherein container CB has walls that are opaque to visible light and to UV, and able to prevent crosslinking of the polish of the second composition B containing the photoinitiator, when the latter is stored in said container CB.

13. The kit as claimed in claim 8, wherein said kit comprises a container containing a nail polish remover suitable for removing the layers of polish A and B from the nail.

Description

EXAMPLES

[0056] Various nail polish compositions were tested, according to the present invention and compared with compositions of the prior art.

[0057] All the percentages stated below are percentages by weight.

[0058] Among the tests performed on the nail polishes obtained: [0059] Gloss was measured (on a scale of 100) with a Minolta 268 glossmeter (angle of incidence 60) for application (100 m wet) on a card of the LENETA type. [0060] The wet abrasion test consists of measuring the resistance to wear caused by a brush after to-and-fro movements of the latter on the surface of the film. For this, one or more films of 100 m when wet are applied on an aluminum plate. After drying for 12 h at room temperature, the gloss of this system is measured. This is the value 0 to-and-fro movement. The system is then tested and the gloss is measured every 2000 to-and-fro movements. The higher the gloss, the more resistant the film. [0061] Hardness was measured using a Persoz pendulum on the dry film formed by applying a layer of the composition, with thickness of 100 m when wet, on a glass plate, and dried for 24 h at room temperature (25 C.); the value is expressed in seconds. [0062] Adherence was measured by carrying out the Cross Hatch Test on the dry film formed by applying a layer of the composition, with thickness of 100 m when wet, on a glass plate and dried overnight at 25 C. A score of 0 corresponds to no loss of adhesion. A score of 5 corresponds to total loss of adhesion.

Comparative Example 1

Conventional Solvent-Based Polish

[0063] This polish was obtained by applying two layers of colored composition and one layer of top coat. The respective compositions were as follows:

[0064] Colored Composition:

TABLE-US-00002 Butyl acetate 38 Ethyl acetate 20.7 Nitrocellulose 18 Acetyl tributyl citrate 9 Adipic acid/neopentylglycol/trimellitic anhydride 12 copolymer Stearalkonium bentonite 1.5 Pigment Red 7 Lake 0.8 TOTAL 100

[0065] Composition of Top Coat:

TABLE-US-00003 Butyl acetate 20 Ethyl acetate 46 Cellulose acetate butyrate 16 Isopropyl alcohol 10 Adipic acid/neopentylglycol/trimellitic anhydride 5 copolymer Acetyl tributyl citrate 3 TOTAL 100

[0066] This polish displays physical drying, i.e. we observe drying of the polish by evaporation of the solvent, and hardening in the air and in visible light after a few minutes.

Comparative Example 2

Gel Polish of the Prior Art

[0067] This gel polish, marketed under the name SHELLAC, from the company Creative Nail Design, comprises a set of three compositions: a basic composition, applied in a single layer directly on the nail and crosslinked under UV, two layers of a colored composition that are crosslinked under UV and a top-coat layer of a final composition covering the preceding layers, also crosslinked under UV. These three compositions contain a high proportion (between 40 and 60%) of an oligomer of the polyurethane acrylate type such as the Di Hema trimethylhexyl dicarbamate of molecular weight 470 g/mol, in the presence of other (meth)acrylates with molecular weight below 1000 g/mol (WO2011/011304). None of these compounds displays physical drying in the sense of the definition given in the introduction. However, these acrylated compounds polymerize rapidly under ultraviolet radiation to form a strong film on the nail. It is therefore essential to have a UV lamp for carrying out the successive polymerization/crosslinking of the various layers applied.

Example 3

Invention

[0068] This polish comprises a colored composition and a finishing composition (top coat), with the formulations presented below:

[0069] Colored Composition (Designated 1st Composition):

TABLE-US-00004 Butyl acetate 31 Ethyl acetate 31.2 Nitrocellulose 15 Acetyl tributyl citrate 6 Adipic acid/neopentylglycol/trimellitic anhydride 12 copolymer Oligomer 2.5 Stearalkonium bentonite 1.5 Pigment Red 7 Lake 0.8 TOTAL 100

[0070] Finishing Composition (Designated 2nd Composition):

TABLE-US-00005 Butyl acetate 19.4 Ethyl acetate 46 Cellulose acetate butyrate 15 Isopropyl alcohol 10 Photoinitiator 2 Acetyl tributyl citrate 2.6 Oligomer 5 TOTAL 100

[0071] In this example, the photoinitiator is ethyl (-2,4,6-trimethylbenzoyl)phenylphosphinate (TPO I) from the company Rahn, the oligomer is the product Doublemer 347-1 from the company Double Bound and the pigment is Red 7 Lake, Unipur Red LC 3071 from the company Sensient.

[0072] In contrast to the Shellac polish of comparative example 2, the 1st composition, that composition in direct contact with the nail, does not comprise a photoinitiator, but dries on the nail in a few minutes, allowing it to be covered with the finishing composition. The finishing composition contains a photoinitiator for accelerating and effecting complete polymerization/crosslinking of the oligomer in visible light, without requiring the use of a UV lamp.

[0073] Gloss tests were performed on this polish, as well as the polishes of comparative examples 1 and 2. In the case of example 2, the comparative polish was passed under a 36 W UV lamp after application of the basic composition (10 seconds), the first colored layer (2 minutes), the second colored layer (2 minutes) and the top coat layer (4 minutes). The whole was then defatted with isopropanol as indicated in the manufacturer's instructions.

[0074] Gloss at t.sub.0

[0075] Example 1 (comp.)=82 UB

[0076] Example 2 (comp.)=85 UB

[0077] Example 3=88 UB

[0078] The results for the percentage loss of gloss as a function of the number of passes in the wet abrasion test are presented in Table 2 below.

TABLE-US-00006 TABLE 2 Polish 1 Polish 2 Polish 3 (Comp.) (Comp.) (invention) 0 pass 100 100 100 2000 passes 99.1 100 100 4000 passes 98.8 99.6 99.5 6000 passes 97.6 99.3 99.3 8000 passes 96.3 99 99.1 10000 passes 96.3 98.7 98.8

[0079] The loss of gloss of the polish according to the invention is minimal, of the same order of magnitude as that of the gel polish.

[0080] The make-up and make-up removal times were also noted, and are presented in Table 3 below.

TABLE-US-00007 TABLE 3 Polish Make-up time Make-up removal time Ex. 1 (Comp.) 5 minutes 5 minutes with nail polish remover based on ethyl acetate Ex. 2 (Comp.) 25 minutes 30 minutes with nail polish remover based on acetone Ex. 3 5 minutes 5 minutes with nail polish remover based on ethyl acetate

[0081] It can be seen that the times for make-up and make-up removal of the polish according to the invention are equivalent to those of a conventional solvent-based polish, and much lower than those of the gel polish, without requiring the use of an acetone-based solvent.

[0082] A test was performed on a panel of 20 people. A first group tested polish 1, a second group polish 2 and a third group polish 3.

[0083] These panellists gave their opinion on the durability of the gloss of the system applied. The averages of the replies are presented in Table 4 below.

TABLE-US-00008 TABLE 4 Polish Durability of the gloss Polish 1 (Comp.) 4 days Polish 2 (Comp.) 10 days Polish 3 8 days

[0084] It is noted that the durability of the gloss is doubled relative to the conventional solvent-based polish.

[0085] Measurements of hardness (Persoz) were also performed on the polishes of examples 1, 2 and 3 after drying: [0086] on the base polish (colored polish formed by applying two layers of 100 m when wet) [0087] on the preceding base polish, on which a top coat layer of 100 m when wet was applied.
The results are presented in Table 5 below.

TABLE-US-00009 TABLE 5 2 layers of colored 2 layers of colored polish + 1 layer of polish top coat Ex. 1 (comp.) 242 s 226 s Ex. 2 (comp.) 36 s 25 s Ex. 3 (invention) 267 s 251 s

[0088] Higher hardness is noted for the polish according to the invention before and after application of the finishing layer (top coat) even in the absence of photoinitiator for the layers of colored polish.

Example 4

Proportions of Oligomer and Photoinitiator

[0089] In this example, different percentages of oligomer and photoinitiator were used in the finishing composition (top coat) applied on the same colored polish as in example 3. The three additional finishing compositions are presented in Table 6.

TABLE-US-00010 TABLE 6 Polish 3 of ex. 3 Polish 4 Polish 5 Polish 6 Butyl acetate 19.4 20.4 17.4 19.4 Ethyl acetate 46 48 43 44 Cellulose acetate 15 15 15 15 butyrate Isopropyl alcohol 10 10 10 10 Photoinitiator 2 2 2 4 Acetyl tributyl 2.6 2.6 2.6 2.6 citrate Oligomer 5 2 10 5 TOTAL 100 100 100 100

[0090] The photoinitiator is ethyl (2,4,6-trimethylbenzoyl)phenylphosphinate (TPO I) and the oligomer is the product Doublemer 347-1 from the company Double Bound.

[0091] Similarly to example 3, measurements of gloss, loss of gloss in a wet abrasion test (Table 7), make-up and make-up removal times (Table 8) were performed, and are presented below.

[0092] Gloss at t.sub.0

[0093] Polish 3=88 UB

[0094] Polish 4=86 UB

[0095] Polish 5=89 UB

[0096] Polish 6=87 UB

[0097] The results for the percentage loss of gloss as a function of the number of passes in the wet abrasion test are presented in Table 7 below.

TABLE-US-00011 TABLE 7 Polish 3 Polish 4 Polish 5 Polish 6 0 pass 100 100 100 100 2000 passes 100 99.7 100 100 4000 passes 99.5 99.1 99.6 99.4 6000 passes 99.3 98.5 99.5 99.4 8000 passes 99.1 98.1 99.2 99.0 10000 passes 98.8 97.7 98.9 98.7

TABLE-US-00012 TABLE 8 Polish Make-up time Make-up removal time Polish 3 5 minutes 5 minutes with nail polish remover based on ethyl acetate Polish 4 5 minutes 5 minutes with nail polish remover based on ethyl acetate Polish 5 5 minutes 7 minutes with nail polish remover based on ethyl acetate Polish 6 5 minutes 6 minutes with nail polish remover based on ethyl acetate