EQUIPMENT FOR PRODUCING FILM

Abstract

An equipment for producing a film comprises a linear plasma generating module and a plasma distributing module. When the plasma flows out from the slit opening of the linear plasma generating module, the sleeve of the plasma distributing module rotates with respect to the liner plasma generating module, so that the plasma flowing out from the slit opening is further uniformly distributed outward by passing through the plurality of holes of the sleeve. The equipment for producing a film is applicable to selenization sulfuring process of the glass substrate.

Claims

1. An equipment for producing a film, comprising: a distributing module, including: a first sleeve having a slit opening; a second sleeve having a plurality of holes, wherein the second sleeve is positioned to surround the first sleeve, and there is a gap between the second sleeve and the first sleeve; and a plurality of rotary isolation rollers disposed between the second sleeve and the first sleeve, for making the second sleeve rotate with respect to the first sleeve and maintaining a constant distance between the second sleeve and the first sleeve; wherein when a coating material is injected into the first sleeve, the coating material flows out from the slit opening, and the second sleeve rotates with respect to the first sleeve, so that the coating material flowing out from the slit opening is further uniformly distributed outward by passing through the plurality of holes of the second sleeve.

2. The equipment for producing a film as claimed in claim 1, wherein the plurality of holes of the second sleeve are distributed according to CFD (Computational Fluid Dynamics) analysis.

3. The equipment for producing a film as claimed in claim 1, wherein the plurality of rotary isolation rollers are used as barriers between the slit opening of the first sleeve and the plurality of holes of the second sleeve.

4. An equipment for producing a film, comprising: a linear plasma generating module, including: a high voltage electrode; a ground electrode having a slit opening, wherein the ground electrode is positioned to surround the high voltage electrode, and there is a gap between the ground electrode and the high voltage electrode; and a dielectric layer at one side of the high voltage electrode and between the high voltage electrode and the ground electrode, wherein a plasma generating space is defined between the ground electrode and the dielectric layer; wherein when a high voltage is applied between the high voltage electrode and the ground electrode and a reaction gas is injected into the plasma generating space, a plasma is generated in the plasma generating space, and the generated plasma flows out through the slit opening; and a plasma distributing module, including: a sleeve having a plurality of holes that are uniformly distributed, wherein the sleeve is positioned to surround the liner plasma generating module, and there is a gap between the sleeve and the linear plasma generating module; and a plurality of rotary isolation rollers disposed between the sleeve and the linear plasma generating module, for making the sleeve rotate with respect to the liner plasma generating module and maintaining a constant distance between the sleeve and the linear plasma generating module; wherein when the plasma flows out from the slit opening of the linear plasma generating module, the sleeve rotates with respect to the liner plasma generating module, so that the plasma flowing out from the slit opening is further uniformly distributed outward by passing through the plurality of holes of the sleeve.

5. The equipment for producing a film as claimed in claim 4, wherein the linear plasma generating module further includes: a supporting element, which is positioned between the dielectric layer and the ground electrode, for maintaining a constant distance between the dielectric layer and the ground electrode.

6. The equipment for producing a film as claimed in claim 4, wherein the plurality of holes of the sleeve are distributed according to CFD (Computational Fluid Dynamics) analysis.

7. The equipment for producing a film as claimed in claim 4, wherein the plurality of rotary isolation rollers are used as barriers between the slit opening of the ground electrode and the plurality of holes of the sleeve.

8. The equipment for producing a film as claimed in claim 4, wherein the linear plasma generating module is a Dielectric Barrier Discharge (DBD) module.

9. The equipment for producing a film as claimed in claim 4, wherein the reaction gas is a mixed gas of selenium or sulfur and an inert gas.

10. The equipment for producing a film as claimed in claim 4, wherein the material of the high voltage electrode is formed of graphite.

11. The equipment for producing a film as claimed in claim 4, wherein the material of the ground electrode is formed of graphite.

12. The equipment for producing a film as claimed in claim 4, wherein the material of the dielectric layer is formed of quartz.

13. The equipment for producing a film as claimed in claim 4, wherein the material of the sleeve is formed of graphite or stainless steel.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0037] FIG. 1 is a schematic diagram showing an equipment for producing a film according to Embodiment 1 of the present invention;

[0038] FIG. 2 is a schematic diagram showing an equipment for producing a film according to Embodiment 2 of the present invention;

[0039] FIGS. 3A and 3B are schematic diagrams showing a linear plasm generating module according to Embodiment 2 of the present invention; and

[0040] FIGS. 4A and 4B are schematic diagrams showing a plasm distributing module according to Embodiment 2 of the present invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0041] The following will illustrate the embodiments of the present invention by specific examples. Any persons skilled in the art could easily understand the advantages and the effects of the present invention from the disclosed contents in the present specification.

Embodiment 1

[0042] Referring to FIG. 1, the equipment 1 for producing a film according to Embodiment 1 of the present invention includes: a distributing module, including: a first sleeve 2 having a slit opening 3; a second sleeve 4 having a plurality of holes 5, wherein the second sleeve 4 is positioned to surround the first sleeve 2, and there is a gap between the second sleeve 4 and the first sleeve 2; and a plurality of rotary isolation rollers 6 disposed between the second sleeve 4 and the first sleeve 2, for making the second sleeve 4 rotate with respect to the first sleeve 2 and maintaining a constant distance between the second sleeve 4 and the first sleeve 2. When a coating material is injected into the first sleeve 2, the coating material flows out from the slit opening 3, and the second sleeve 4 rotates with respect to the first sleeve 2, so that the coating material flowing out from the slit opening 3 is further uniformly distributed outward by passing through the plurality of holes 5 of the second sleeve 4.

[0043] The plurality of holes of the second sleeve are distributed according to CFD (Computational Fluid Dynamics) analysis, so that the coating material can be further uniformly distributed outward.

[0044] The plurality of rotary isolation rollers are used as barriers between the slit opening of the first sleeve and the plurality of holes of the second sleeve.

[0045] The equipment for producing a film according to Embodiment 1 of the present invention can be used in distribution of the fluid with low viscosity. For example, in the process for preparing the light absorbing layer of the CIGS solar cell, the nano powder (CuInSe.sub.2CuInGaSe.sub.2) can be prepared by solvothermal method, and then the nano powder is stably dispersed in ethylene glycol and terpineol to form a coating material. The viscosity coefficient of the coating material is approximate to that of water, therefore the equipment for producing a film according to the present invention can be used to uniformly coat the coating material on the substrate. Thereafter, a film with desired CIGS thickness and composition can be obtained after performing calcination.

Embodiment 2

[0046] Referring to FIG. 2, the equipment 10 for producing a film according to Embodiment 2 of the present invention includes: a linear plasma generating module 11 and a plasma distributing module 12. Referring to FIGS. 3A and 3B, the linear plasma generating module 11 includes: a high voltage electrode 21; a ground electrode 22 having a slit opening 26, wherein the ground electrode 22 is positioned to surround the high voltage electrode 21, and there is a gap between the ground electrode and the high voltage electrode; and a dielectric layer 23 at one side of the high voltage electrode 21 and between the high voltage electrode 21 and the ground electrode 22, wherein a plasma generating space 25 is defined between the ground electrode 22 and the dielectric layer 23. When a high voltage is applied between the high voltage electrode 21 and the ground electrode 22 and a reaction gas is injected into the plasma generating space 25, a plasma is generated in the plasma generating space 25, and the generated plasma flows out through the slit opening 26.

[0047] The plurality of holes of the sleeve are distributed according to CFD (Computational Fluid Dynamics) analysis, so that the coating material can be further uniformly distributed outward.

[0048] The plurality of rotary isolation rollers are used as barriers between the slit opening of the ground electrode and the plurality of holes of the sleeve.

[0049] The electric power used for the linear plasma generating module 11 is provided by a matching power supply (not shown). With use of the power supply which applies a sufficient high voltage between the high voltage electrode 21 and the ground electrode 22 to generate an electrical field, the charged particles in the plasma generating space 25 are accelerated to obtain kinetic energy. At this moment, an appropriate quantity of reaction gases are injected into the plasma generating space 25, thereby forming a plasma in the plasma generating space 25. Preferably, the high voltage electrode 21 and the ground electrode 22 can be cylinder-shaped electrodes.

[0050] Because of low mass of the atoms, the velocity of the atoms is far greater than other particles in the electrical field. Under the circumstance of the velocity difference, the collisions among the particles are easy to occur, generating radicals with high activity which facilitates advance of relevant reactions. The ground electrode 22 includes a slit opening 26, and the generated plasma flows out through the slit opening 26.

[0051] Preferably, the linear plasma generating module further includes: a supporting element 24, which is positioned between the dielectric layer 23 and the ground electrode 22, for maintaining a constant distance between the dielectric layer 23 and the ground electrode 22.

[0052] Referring to FIGS. 4A and 4B, the plasma distributing module 12 includes: a sleeve 31 having a plurality of holes 33 that are uniformly distributed, wherein the sleeve 31 is positioned to surround the liner plasma generating module 11, and there is a gap between the sleeve 31 and the linear plasma generating module 11; and a plurality of rotary isolation rollers 32 disposed between the sleeve 31 and the linear plasma generating module 11, for making the sleeve 31 rotate with respect to the liner plasma generating module 11 and maintaining a constant distance between the sleeve 31 and the linear plasma generating module 11. When the plasma flows out from the slit opening 26 of the linear plasma generating module 11, the sleeve 31 rotates with respect to the liner plasma generating module 11, so that the plasma flowing out from the slit opening 26 is further uniformly distributed outward by passing through the plurality of holes 33 of the sleeve 31.

[0053] Referring to FIG. 4A, the sleeve 31 fits around a rotation axis 34. As a result of interlinkage of the rotation axis 34, precise control of the rotation rate can be achieved. Each of the two ends of the rotation axis forms an air-tight joint. As shown in FIG. 3B, a plurality of rotary isolation rollers 32 are disposed at each of the two sides of the bottom of the sleeve for isolating the materials sprayed from the slit opening 26 to diffuse to inaccurate sites.

[0054] The equipment for producing a film according to the present invention is applicable to the selenization sulfuring process of the glass substrate. Since the glass substrate can be moved accurately in reciprocating motion, with the advance direction (X axis), rotating motion of the sleeve can make the activated gases to be uniformly distributed in the vertical advance direction (Y direction). As such, a film of large area with good uniformity can be obtained.

[0055] The above embodiments are just illustrated to explain the characteristics and the effects of the present invention and are not used to limit the scope of the substantial content of the present invention. Any persons skilled in the art can make modifications and changes to the above embodiments without departing from the spirit and scope of the present invention. Accordingly, the scope intended to be protected by the present invention should be defined by the appended claims.