Method for Producing a Multi-Layer Body

Abstract

A method for producing a multilayer body with the steps of a) applying a first varnish layer made of a water-based photoresist to a surface of a base body; b) exposing the first varnish layer in a first region, wherein the first varnish layer is not exposed in a second region; c) removing the first varnish layer in the second region.

Claims

1. A method for producing a multilayer body comprising: a) applying a first varnish layer made of a water-based photoresist to a surface of a base body; b) exposing the first varnish layer in a first region, wherein the first varnish layer is not exposed in a second region; and c) removing the first varnish layer in the second region.

2. The method according to claim 1, wherein the base body comprises at least one second varnish layer made of a solvent-based varnish.

3. The method according to claim 1, wherein the first varnish layer is applied to a surface of the second varnish layer.

4. The method according to claim 1, wherein at least one further layer is applied to the first varnish layer.

5. The method according to claim 4, wherein, after the application of the at least one further layer, the first varnish layer and the at least one further layer are removed in the first region.

6. The method according to claim 5, wherein the first varnish layer and the at least one further layer are removed by treatment with an acidic sodium metaperiodate solution.

7. The method according to claim 6, wherein the treatment with the acidic sodium metaperiodate solution is effected at a temperature of from 15 C. to 70 C., and/or with a treatment duration of from 600 s to 1 s.

8. The method according to claim 6 wherein a non-ionic surfactant is added to the acidic sodium metaperiodate solution, the non-ionic surfactant being selected from the group ethoxylate, alkoxylates of primary or secondary fatty alcohols, alkyl phenols, ethylene oxide/propylene oxide copolymers, amine ethoxylates, alkyl polyglycolides, fatty amine oxides, fatty acid alkanolamides, fatty acid alkyl glucamides.

9. The method according to claim 4, wherein the at least one further layer is or comprises a third varnish layer, made of a solvent-based varnish.

10. The method according to claim 4, wherein the at least one further layer is comprises a reflective layer.

11. The method according to claim 10, wherein the first varnish layer is applied to a reflective layer of the base body and, before the application of the at least one further layer, the reflective layer of the base body is removed in the first region, by etching.

12. The method according to claim 1, wherein the first varnish layer is only applied to a partial region of the surface of the base body.

13. The method according to claim 1, wherein an etch resist is applied to a partial region of the first varnish layer and/or of the at least one further layer and the first varnish layer and/or the at least one further layer is removed where it is not covered by the etch resist.

14. The method according to claim 1, wherein the exposure is effected from the side of the base body.

15. The method according to claim 14, wherein the base body comprises at least one partial layer, which in the first region is transparent for a wavelength range used for the exposure of the first varnish layer and in the second region is non-transparent for a wavelength range used for the exposure of the first varnish layer.

16. The method according to claim 1, wherein the exposure is effected at a wavelength of from 350 nm to 400 nm with an exposure time of from 0.1 s to 120 s, and/or an exposure dose of from 1 mJ/cm.sup.2 to 300 mJ/cm.sup.2.

17. The method according to claim 1, wherein, to remove the first varnish layer in the second region, a water with added isopropanol, is used.

18. The method according to claim 1, wherein, for the application of the first varnish layer, an aqueous photoresist is used which contains at least one water-soluble polymer, at least one film-forming polymer, at least one additive and at least one photoinitiator.

19. The method according to claim 18, wherein the water-soluble polymer is selected from the group: arginic acid derivatives, cellulose derivatives and/or carboxylated acrylic polymers such as e.g. sodium carboxymethyl cellulose, methyl cellulose, polyvinyl alcohol resins, polyethylene oxide, homo- and/or copolymeric vinyl acetates, polyacrylamides, long-chain carboxylic acids.

20. The method according to claim 18 wherein the water-soluble polymer is contained in the aqueous photoresist in a concentration of from 1 wt.-% to 50 wt. %, preferably from 1 wt. % to 20 wt. %.

21. The method according to claim 18, wherein the film-forming polymer is selected from the group: polyvinyl acetate resins, ethylene-vinyl acetate copolymers, vinyl acetate-acrylate copolymers, acrylic copolymers, polyurethane copolymers, polyacrylates, polyurethanes, polyester and/or epoxy resins, polyvinylpyrrolidone, urethane acrylate.

22. The method according to claim 18, wherein the film-forming polymer is contained in the aqueous photoresist in a concentration of from 1 wt.-% to 50 wt. %.

23. The method according to claim 18, wherein the at least one additive is comprises a dispersing additive, which is contained in the aqueous photoresist in a concentration of from 0.1 wt.-% to 5 wt. %.

24. The method according to claim 18, wherein the at least one additive comprises a defoamer, which is contained in the aqueous photoresist in a concentration of from 0.1 wt.-% to 5 wt-%.

25. The method according to claim 18, wherein the photoinitiator comprises a 4-diazodiphenylamine/formaldehyde condensate, which is contained in the aqueous photoresist in a concentration of from 0.1 wt.-% to 5 wt.-%.

26. The method according to claim 18, wherein the aqueous photoresist contains 1% to 30% isopropanol.

27. The method according to claim 1, wherein the first and/or second and/or third and/or fourth varnish layer comprises multi-colored or achromatic pigments and/or effect pigments, UV-excitable fluorescent pigments, thin-film systems, cholesteric liquid crystals, dyes and/or metallic or non-metallic nanoparticles.

28. The method according to claim 27, wherein the first and/or second and/or third and/or fourth varnish layer each comprise different colorants.

29. The method according to claim 1, wherein the first and/or second and/or third and/or fourth varnish layer is applied and/or structured in the form of a graphic motif, alphanumeric character, logo, image, or guilloche pattern.

30. The method according to claim 1, wherein the first varnish layer is applied to a base body which comprises one or more of the following layers: a carrier ply, a detachment layer, a wax layer, a base coat layer, a replication layer with a surface relief, a reflective layer, a protective layer, a volume hologram layer.

31. The method according to claim 30, wherein the surface relief introduced into the replication layer forms an optically variable element, a linear or crossed sinusoidal diffraction grating, a linear or crossed single- or multi-step rectangular grating, a zero-order diffraction structure, an asymmetrical relief structure, a blazed grating, a isotropic or anisotropic mat structure, or a light-diffracting and/or light-refracting and/or light-focusing micro- or nanostructure, a binary or continuous Fresnel lens, a binary or continuous Fresnel free-form surface, a microprism structure or a combined structure thereof.

32. A security element, obtained by means of a method according to claim 1.

33. A banknote, security, identity document, visa document, passport or credit card with a security element multilayer body.

Description

[0096] The invention is now explained in more detail with reference to embodiment examples. There are shown in

[0097] FIG. 1 a schematic representation of the method steps during the production of an embodiment example of a multilayer body with a structured layer made of a water-based photoresist;

[0098] FIG. 2 a schematic representation of the method steps during the production of an alternative embodiment example of a multilayer body using a water-based photoresist as wash varnish for a further varnish layer;

[0099] FIG. 3 a schematic representation of the method steps during the production of a further alternative embodiment example of a multilayer body with a structured layer made of a water-based photoresist using a partial varnish layer as internal exposure mask;

[0100] FIG. 4 a schematic representation of the method steps during the production of a further alternative embodiment example of a multilayer body with a structured layer made of a water-based photoresist using a partial metal layer as internal exposure mask;

[0101] FIG. 5 a schematic representation of the method steps during the production of a further alternative embodiment example of a multilayer body with a structured partial layer made of a water-based photoresist using a partial metal layer as internal exposure mask;

[0102] FIG. 6 a schematic representation of the method steps during the production of a further alternative embodiment example of a multilayer body with a structured layer made of a water-based photoresist using a partial metal layer and partial varnish layer as internal exposure mask;

[0103] FIG. 7 a schematic representation of the method steps during the production of a further alternative embodiment example of a multilayer body with a structured layer made of a water-based photoresist using a partial varnish layer as internal exposure mask and subsequent structuring by an etch resist;

[0104] FIG. 8 a schematic representation of the method steps during the production of a further alternative embodiment example of a multilayer body with a structured layer made of a water-based photoresist using a partial varnish layer as internal exposure mask;

[0105] FIG. 9 a schematic representation of the method steps during the production of an alternative embodiment example of a multilayer body using a water-based photoresist as wash varnish to generate two complementary reflective layers;

[0106] FIG. 10 a schematic representation of the method steps during the production of a further alternative embodiment example of a multilayer body with a structured layer made of a water-based photoresist using a partial metal layer and partial varnish layer as internal exposure mask;

[0107] FIG. 11 a schematic representation of the method steps during the further processing of the multilayer body according to FIG. 10 using the water-based photoresist as wash varnish to structure a further colored varnish layer.

[0108] During the production of a multilayer body 1, a base body 2 is first provided which has a carrier ply 21 and a layer composite 22. On the side of the base body 2 facing away from the carrier ply 21, a first varnish layer 3 made of a water-based photoresist is deposited and exposed by means of a mask, not represented in FIG. 1.

[0109] The light from a UV light source 4 only strikes partial regions 31 of the first varnish layer 3 which are not shaded by the mask. The partial regions 32 shaded by the mask, in contrast, are not exposed. When the first varnish layer 3 is then developed, the exposed varnish in the partial regions 31 remains, while the varnish in the partial regions 32 is removed by the developing agent.

[0110] The structure of the base body 2 outlined below applies to all of the embodiments described in the following.

[0111] The carrier ply 21 forms a stable base ply on which the further layer composite 22 can be built up and preferably consists of polyester, polyolefin, polyvinyl, polyimide, ABS. Particularly preferably of PET, PC, PP, PE, PVC, PS with a layer thickness of from 4 m to 75 m, preferably from 6 m to 50 m, further preferably from 9 m to 25 m.

[0112] The layer composite 22 can comprise one or more of the following layers: a carrier ply, a wax layer, a detachment layer, a protective layer, a replication layer with a surface relief, a reflective layer, a volume hologram layer, a colored varnish layer, a base coat layer.

[0113] A detachment layer is preferably arranged between the carrier ply 21 and further layers of the base body 2 and preferably consists of wax or silicone with a layer thickness of from 0.0005 m to 0.3 m, preferably from 0.01 m to 0.1 m. The detachment layer can alternatively also consist of a strongly filming acrylate polymer/copolymer and/or also be part of the protective varnish layer and have a layer thickness of from 1 m to 5 m, preferably 1 m to 3 m. The detachment layer makes it possible to detach the carrier ply 21 without trouble when the multilayer body 1 is transferred to a security document.

[0114] A base coat layer preferably forms the surface of the base body 2, to which the first varnish layer 3 is applied, and serves to promote adhesion for the first varnish layer 3. The base coat layer preferably consists of polyester, epoxide, polyurethane, acrylate and/or copolymer resins or mixtures thereof, with a layer thickness of from 1 m to 5 m, preferably from 1 m to 3 m. Alternatively, thermoplastic adhesives, hot waxes, UV-curable adhesives or cold adhesives, or self-adhesive adhesives, can also be used.

[0115] Replication layers serve to generate optically variable effects, for example surface holograms. The replication layer preferably consists of acrylates or acrylate copolymers such as urethane acrylates, polyester acrylates, epoxy acrylates or acrylate copolymers, polyester acrylates, with a layer thickness of from 0.1 m to 50 m, preferably from 0.2 m to 5 m.

[0116] A surface relief which forms an optically variable element, in particular a hologram, Kinegram or Trustseal, a preferably linear or crossed sinusoidal diffraction grating, a linear or crossed single- or multi-step rectangular grating, a zero-order diffraction structure, an asymmetrical relief structure, a blazed grating, a preferably isotropic or anisotropic mat structure, or a light-diffracting and/or light-refracting and/or light-focusing micro- or nanostructure, a binary or continuous Fresnel lens, a binary or continuous Fresnel free-form surface, a microprism structure or a combined structure thereof, can be introduced into the replication layer.

[0117] Reflective layers serve to improve the visibility of such optically variable effects and can also be used to realize further design effects.

[0118] It can be a metal layer, in particular made of aluminum, copper, silver, gold, chromium or an alloy of the above-named metals. Alternatively, the reflective layer can also be formed as a layer made of a high refractive index (HRI) material, in particular made of zinc sulfide or titanium dioxide.

[0119] The layer thickness of a metallic reflective layer is preferably from 5 nm to 150 nm, particularly preferably from 10 nm to 50 nm. The layer thickness of HRI layers is preferably from 30 nm to 250 nm. In the thickness range from 30 nm to 75 nm a more color-neutral reflection results, while in the case of thicker layers the light reflected by the reflective layer displays pronounced colors.

[0120] Protective layers can be used in order to form an outer surface of the multilayer body that is stable vis--vis environmental influences. Preferred varnishes for this are polyacrylates, acrylate compounds and/or polymethacrylates, epoxides, polyvinylidene fluorides with a layer thickness of from 1 m to 10 m, preferably from 1 m to 5 m.

[0121] Volume hologram layers likewise serve to generate optically variable effects and typically consist of a monomer, an initiator and a photosensitive dye. They preferably contain substances from the following groups: acrylates, amides, epoxides, vinyl esters, vinyl ethers, styrenes, polyols, polyisocyanates, acrylamides, polyvinyl alcohol, polyurethanes, with a layer thickness of from 3 m to 50 m, preferably from 5 m to 25 m.

[0122] Colored varnish layers of the layer composite 22 can be solvent-based and have a preferred layer thickness of from 0.1 m to 10 m, particularly preferably from 0.2 m to 5 m. The colored varnish layers are dyed by means of pigments and/or dyes. The pigments and/or dyes can display a color effect in visible light, but also alternatively or additionally also in infrared light (IR light) and/or in ultraviolet light (UV light). By means of optically variable pigments, the colored varnish layers can also have optically variable effects.

[0123] The first varnish layer 3 preferably consists of an aqueous photoresist which contains at least one water-soluble polymer, at least one film-forming polymer, at least one additive and at least one photoinitiator.

[0124] A corresponding composition of the varnish of the first varnish layer 3 applies to all of the embodiment examples described.

[0125] The water-soluble polymer is preferably selected from the group: arginic acid derivatives, cellulose derivatives and/or carboxylated acrylic polymers such as e.g. sodium carboxymethyl cellulose methyl cellulose, polyvinyl alcohol resins, polyethylene oxide, homo- and/or copolymeric vinyl acetates, polyacrylamides, long-chain carboxylic acids.

[0126] The water-soluble polymer ensures the detachability of the unexposed photoresist by aqueous solvents and improves its dispersibility.

[0127] The water-soluble polymer is preferably contained in the aqueous photoresist in a concentration of from 1 wt.-% to 50 wt.-%, preferably from 1 wt.-% to 20 wt.-%.

[0128] It is further preferred if the film-forming polymer is selected from the group: polyvinyl acetate resins, ethylene-vinyl acetate copolymers, vinyl acetate-acrylate copolymers, acrylic copolymers, polyurethane copolymers, polyacrylates, polyurethanes, polyester and/or epoxy resins, polyvinylpyrrolidone, urethane acrylate.

[0129] The film-forming polymer is dispersed in the varnish and forms the actual matrix of the varnish after exposure and drying.

[0130] It is preferred if the film-forming polymer is contained in the aqueous photoresist in a concentration of from 1 wt.-% to 50 wt.-%, preferably from 10 wt.-% to 30 wt.-%.

[0131] In order to improve the dispersibility and stability of the varnish, it is expedient if the at least one additive is or comprises a dispersing additive, which is contained in the aqueous photoresist in a concentration of from 0.1 wt.-% to 5 wt.-%, preferably from 0.1 wt.-% to 3 wt.-%.

[0132] Furthermore it is advantageous if the at least one additive is or comprises a defoamer, which is contained in the aqueous photoresist in a concentration of from 0.1 wt.-% to 5 wt.-%, preferably from 0.1 wt.-% to 3 wt.-%. The processability of the varnish is hereby improved.

[0133] It is further preferred if the photoinitiator is or comprises a photosensitive diazo resin, in particular a 4-diazodiphenylamine/formaldehyde condensate, which is contained in the aqueous photoresist in a concentration of from 0.1 wt.-% to 5 wt.-%, preferably from 0.1 wt.-% to 3 wt.-%.

[0134] During UV irradiation such diazo resins act as crosslinkers which link the polymer chains of the varnish in the exposed regions together. The increase in the molecular weight associated therewith results in a decrease in the water solubility, with the result that the exposed varnish is not washed off during developing.

[0135] It is furthermore preferred if the aqueous photoresist contains 1% to 30%, preferably 5% to 15%, isopropanol.

[0136] The first varnish layer 3 furthermore preferably comprises colorants, in particular multi-colored or achromatic pigments and/or effect pigments, UV-excitable fluorescent pigments, thin-film systems, cholesteric liquid crystals, dyes and/or metallic or non-metallic nanoparticles. These pigments and/or dyes can display a color effect in visible light, but also alternatively or additionally also in infrared light (IR light) and/or in ultraviolet light (UV light). By means of optically variable pigments, the colored varnish layers can also have optically variable effects.

[0137] Examples of varnish formulations are given in the following tables:

TABLE-US-00001 Varnish formulation 1 Wt.-% Polyvinyl alcohol 1.6 Polyvinylpyrrolidone 13.4 Diazodiphenylamine/formaldehyde-condensate- 0.45 hydrogen sulfate (complexed with zinc chloride) Dispersing additive, e.g. Disperbyk 190 0.25 Defoamer, e.g. BYK 012 0.125 Isopropanol 9.55 Water 74.625

TABLE-US-00002 Varnish formulation 1 (colored) Wt.-% Polyvinyl alcohol 1.6 Polyvinylpyrrolidone 13.4 Diazodiphenylamine/formaldehyde-condensate- 0.45 hydrogen sulfate (complexed with zinc chloride) Dispersing additive, e.g. Disperbyk 190 0.25 Defoamer, e.g. BYK 012 0.125 Isopropanol 9.55 Water 69.025 Dye dispersion or dye (e.g. iron oxide, Luconyl 5.6 NG)

TABLE-US-00003 Varnish formulation 2 Wt.-% Aliphatic urethane acrylate oligomer 20 Water-soluble diacrylate monomer 2 Diazodiphenylamine/formaldehyde-condensate- 0.62 hydrogen sulfate (complexed with zinc chloride) Dispersing additive, e.g. Disperbyk 190 0.25 Defoamer, e.g. BYK 012 0.13 Water 77

[0138] The exposure of the first varnish layer 3 is preferably effected at a wavelength of from 350 nm to 400 nm with an exposure time of from 0.1 s to 120 s, preferably from 0.1 s to 60 s, and/or an exposure dose of from 1 mJ/cm.sup.2 to 300 mJ/cm.sup.2, preferably from 1 mJ/cm.sup.2 to 100 mJ/cm.sup.2.

[0139] In particular, UV LEDs can be used as UV light source 4. Also suitable are mercury-vapor lamps, which can also be doped, such as for example with gallium or iron, in order to match the radiation spectrum to the sensitivity of the photoactivator and the transmitting behavior of the varnish layers.

[0140] Furthermore, lasers can also be used for the exposure. Because of their beam quality, they can also be used for controlled partial exposure through the medium of a deflection unit and thus, for example, carry out an individual exposure.

[0141] During the exposure, the photoactivator is activated and acts as crosslinker for the polymer chains of the varnish in the region 31, with the result that its water solubility is lost there.

[0142] For the developing, thus for the removal of the first varnish layer 3 in the second region 32, water with added isopropanol, in particular with 1% to 30% isopropanol, preferably with 5% isopropanol, can then preferably be used, with the result that a gentle removal of the unexposed regions 32 is made possible, without other layers of the layer composite 22 being attacked.

[0143] In order to ensure the bonding or a sufficient adhesion of the first varnish layer 3 or further layers, a pretreatment, e.g. by means of corona or plasma, can be carried out before the application.

[0144] As FIG. 2 shows, after the exposure and developing of the first varnish layer 3, a further layer composite 5 can be applied to it. In the embodiment example according to FIG. 2 this is only one individual varnish layer 51 made of a colored varnish.

[0145] The varnish layer 51 furthermore preferably comprises colorants, in particular multi-colored or achromatic pigments and/or effect pigments, UV-excitable fluorescent pigments, thin-film systems, cholesteric liquid crystals, dyes and/or metallic or non-metallic nanoparticles. These pigments and/or dyes can display a color effect in visible light, but also alternatively or additionally also in infrared light (IR light) and/or in ultraviolet light (UV light). By means of optically variable pigments, the colored varnish layers can also have optically variable effects.

[0146] The layer thickness of the varnish layer 51 is preferably from 0.1 m to 10 m, particularly preferably from 1 m to 5 m.

[0147] The first varnish layer 3 is removed again after the varnish layer 51 has been deposited. The aqueous photoresist of the first varnish layer 3 here thus acts as wash varnish. Not only the first varnish layer 3, but with it also the varnish layer 51 is removed in the regions 31, with the result that they remain only in the regions 32.

[0148] It is preferred in particular if the first varnish layer 31 and the varnish layer 51 are removed by treatment with an acidic sodium metaperiodate solution, in particular an aqueous solution of 1.5 wt.-% sodium metaperiodate and 0.05 wt.-% sulfuric acid.

[0149] The removal of the first varnish layer 31 is thus an oxidative process. The admixture of acid serves to stabilize the metaperiodate. Instead of sulfuric acid, nitric acid can also be used for example.

[0150] The pH of the sodium metaperiodate solution is preferably from 1 to 7, particularly preferably from 2 to 5.

[0151] The treatment with the acidic sodium metaperiodate solution is preferably effected at a temperature of from 15 C. to 70 C., preferably from 25 C. to 50 C., and/or with a treatment duration of from 600 s to 1 s, preferably from 120 s to s.

[0152] The detachment of the first varnish layer 31 can furthermore be supported by agitation of the solution, targeted flow against the multilayer body, brushing, smearing or sonication.

[0153] Furthermore, it is expedient if a non-ionic surfactant is added to the acidic sodium metaperiodate solution, in particular selected from the group ethoxylate, alkoxylates of primary or secondary fatty alcohols, alkyl phenols, ethylene oxide/propylene oxide copolymers, amine ethoxylates, alkyl polyglycolides, fatty amine oxides, fatty acid alkanolamides, fatty acid alkyl glucamides.

[0154] Such surfactants act as wetting agents and ensure that the sodium metaperiodate solution completely wets the first varnish layer 31 and the varnish layer 51, with the result that the desired detachment result can be achieved.

[0155] The concentration of the surfactant is preferably from 0% to 50%, particularly preferably from 0.01% to 3%.

[0156] In the embodiment according to FIG. 3, the base body 22 comprises a partial varnish layer 23. This is non-transparent for the wavelength range used for the exposure of the first varnish layer 3, thus preferably has a transmissivity of less than 20% in this wavelength range.

[0157] Furthermore, a metal layer 52 is applied to the first varnish layer 3 before the exposure and developing of the first varnish layer 3. It consists in particular of aluminum, copper, silver, gold, chromium or an alloy of the above-named metals with a layer thickness of from 1 nm to 1 m, preferably from 10 nm to 100 nm.

[0158] The exposure of the first varnish layer 3 in this case is effected from the side of the base body 2. The first varnish layer 3 is exposed in the regions 31 where the partial varnish layer 23 is not present; no exposure is effected in the regions 32 where the partial varnish layer 23 is present, with the result that during the subsequent developing of the partial varnish layer 3 the latter is removed together with the metal layer 52 in the regions 32. The partial varnish layer 3 and the metal layer 52 thus form a motif that complements the partial varnish layer 23.

[0159] In the embodiment according to FIG. 4, the base body 22 comprises a partial metal layer 24. Analogously to the partial varnish layer 23 according to FIG. 3, this is non-transparent for the wavelength range used for the exposure of the first varnish layer 3.

[0160] The partial metal layer 24 consists in particular of aluminum, copper, silver, gold, chromium or an alloy of the above-named metals with a layer thickness of from 1 nm to 1 m, preferably from 10 nm to 100 nm.

[0161] The exposure of the first varnish layer 3 here is also effected from the side of the base body 2. The first varnish layer 3 is exposed in the regions 31 where the partial metal layer 24 is not present; no exposure or only a slight exposure is effected in the regions 32 where the partial metal layer 24 is present, with the result that during the subsequent developing of the partial varnish layer 3 the latter is removed in the regions 32. The first varnish layer 3 thus forms a motif that complements the partial metal layer 24.

[0162] The embodiment example according to FIG. 5 corresponds to that according to FIG. 4, and only differs in that the first varnish layer 31 is applied to the base body 2 not over the whole surface, but only partially.

[0163] The embodiment example according to FIG. 6 also corresponds to that according to FIG. 4, and only differs in that, in addition to the partial metal layer 24, the base body has a partial varnish layer 23 which is congruent with the partial metal layer 24 in the direction of the surface normals to the plane of extension of the base body.

[0164] The embodiment example according to FIG. 7 corresponds to the embodiment example according to FIG. 3. However, the application of the metal layer 51 to the first varnish layer 3 is dispensed with. Here too, the first varnish layer 3 is exposed from the side of the base body 2 using a partial varnish layer 23 of the base body 2 as internal mask, and then developed as described.

[0165] In a further step, an etch resist 53 is now applied partially to the first varnish layer 3 and the partial varnish layer 23. The first varnish layer 3 and the partial varnish layer 23 are then removed where they are not covered by the etch resist 53.

[0166] The etch resist 53 preferably consists of acrylate, polyester, epoxy, polyurethane resins or acrylate copolymers with a layer thickness of from 0.1 m to 10 m, preferably from 0.1 m to 5 m.

[0167] The etch resist 53 can also be applied in the form of a pattern, grid or motif, in particular also in the form of a fine line pattern, which, in the resulting multilayer body 1, is then dyed in the color pattern of the first varnish layer 3 and the partial varnish layer 23.

[0168] The embodiment according to FIG. 8 also corresponds to the embodiment example according to FIG. 3. A structuring of the first varnish layer 3 using the partial varnish layer 23 as internal mask is likewise effected here. Unlike in FIG. 3, here only one further reflective layer 25 over the whole surface is provided in the base body 2, which has the properties explained at the beginning in the description of the base body 2.

[0169] Here too, analogously to FIG. 7, a further structuring by application of an etch resist 53 and subsequent etching can then be effected.

[0170] In the embodiment example according to FIG. 9, the first varnish layer 3 is used as wash varnish, analogously to FIG. 2. In this embodiment, the first varnish layer 3 is first deposited on a reflective layer 25 of the base body 2, exposed by means of an external mask or a laser and removed in the unexposed region 32 during the developing.

[0171] An etching step in which the reflective layer 25 is removed in the region 32 is then effected. During the etching, the reflective layer is protected in the region 31 by the first varnish layer 3, with the result that it remains there.

[0172] A further reflective layer 52 is then applied to the base body 2 and the first varnish layer 3, for example by vapor deposition, sputtering, chemical vapor deposition or the like.

[0173] During a subsequent treatment with sodium metaperiodate solution, the first varnish layer 3 is removed together with the further reflective layer 52 in the first region 31. The reflective layer 25 now remains there on the surface of the base body 2, while the further reflective layer 52 forms the surface of the base body in the first region 31. This makes sense in particular if different materials are used for the reflective layers 25, 52. Thus, for example, two different metals or metal alloys can be arranged complementary to each other.

[0174] Here too, a partial overprinting with an etch resist and a further structuring of the reflective layers 25, 52 can then be effected.

[0175] The embodiment according to FIG. 10 is analogous to the embodiment according to FIG. 6. Here too, a partial metal layer 24 and a partial varnish layer 23 are used as internal exposure mask for the first varnish layer 3. The only difference is in the layer sequence. Here, the partial metal layer 24 faces the first varnish layer 3, while the partial varnish layer 23 faces the carrier ply 21.

[0176] This layer sequence makes it possible to structure the partial metal layer 24 likewise using the partial varnish layer 23. For this, the partial varnish layer 23 is first generated and then the metal layer 24 is applied over the whole surface. A photosensitive etch resist which is exposed through the base body 2 is deposited on the metal layer 24. When a positive resist is used, the resist remains, after the developing, overlapping with the partial varnish layer 23, with the result that during the subsequent etching the partial metal layer 24 also remains precisely registered congruent with the partial varnish layer 23.

[0177] After removal of the resist, as already described with reference to FIG. 6, the first varnish layer 3 can then be generated precisely registered complementary to the layers 23, 24.

[0178] Starting from the thus-generated layer structure, as shown in FIG. 11, a further colored varnish layer 51 can be applied. Analogously to FIG. 2, the first varnish layer 3 is then removed by acidic sodium metaperiodate solution. The further colored varnish layer 51 is also removed in the regions in which the first varnish layer 3 is present, with the result that it now remains precisely registered congruent with the partial varnish layer 23 and the partial metal layer 24.

LIST OF REFERENCE NUMBERS

[0179] 1 multilayer body [0180] 2 base body [0181] 21 carrier ply [0182] 22 layer composite [0183] 23 partial varnish layer [0184] 24 partial metal layer [0185] 25 reflective layer [0186] 3 first varnish layer [0187] 31 exposed region [0188] 32 unexposed region [0189] 4 UV light source [0190] 5 further layer composite [0191] 51 colored varnish layer [0192] 52 reflective layer [0193] 53 etch resist