REPRODUCTION OF A STEM CELL NICHE OF AN ORGANISM AND METHOD FOR THE GENERATION THEREOF
20180147751 ยท 2018-05-31
Inventors
- Andreas Schober (Erfurt, DE)
- Joerg Hampl (Kuehnhausen, DE)
- Frank Weise (Weimar, DE)
- Justyna Borowiec (Ilmenau, DE)
- Uta Fernekorn (Erfurt, DE)
- Michael Gebinoga (Ilmenau, DE)
- Sukhdeep Singh (Ilmenau, DE)
- Gregor Schlingloff (Ilmenau, DE)
- Sebastian Haefner (Dresden, DE)
- James Beck (Jena, DE)
- Angelika Mueller (Jena, DE)
- Astrid Voigt (Jena, DE)
Cpc classification
G03F1/70
PHYSICS
G03F1/00
PHYSICS
B82Y40/00
PERFORMING OPERATIONS; TRANSPORTING
G03F7/0017
PHYSICS
G03F7/70466
PHYSICS
G03F7/0002
PHYSICS
C12N2535/00
CHEMISTRY; METALLURGY
G03F1/62
PHYSICS
G03F7/70491
PHYSICS
B29C39/148
PERFORMING OPERATIONS; TRANSPORTING
International classification
B29C39/14
PERFORMING OPERATIONS; TRANSPORTING
C12N5/00
CHEMISTRY; METALLURGY
G03F7/00
PHYSICS
Abstract
The present invention relates firstly to a method for reproducing a stem cell niche of an organism. The invention further relates to a reproduction of a stem cell niche of an organism. According to the invention, an image of a tissue of an organism is generated, which tissue comprises at least one stem cell niche. The image is filtered in order to obtain a structural pattern of the imaged stem cell niche. In a further step, a lithographic mask is generated from the structural pattern. According to the invention, a starting material of a substrate is structured by means of indirect or direct application of the lithographic mask, whereby a structured substrate is obtained which represents the reproduction of the imaged stem cell niche of the organism. The reproduction can be characterised as biolithomorphic.
Claims
1. A method for reproducing a stem cell niche of an organism, comprising the following steps: creation of an image of a tissue comprising at least one stem cell niche of an organism; filtering of the image in order to produce a structural pattern of the reproduced stem cell niche; creation of a lithographic mask from the structural pattern; and structuring of a starting material through application of the lithographic mask, whereby a structured substrate is obtained which represents the reproduction of the imaged stem cell niche of the organism.
2. The method as set forth in claim 1, wherein the structural pattern comprises a substructural pattern for coarse structures of the imaged stem cell niche and a substructural pattern for fine structures of the imaged stem cell niche; wherein the lithographic mask comprises a submask for coarse structures that is produced from the substructural pattern for coarse structures; and wherein the lithographic mask comprises a submask for fine structures that is produced from the substructural pattern for fine structures.
3. The method as set forth in claim 2, wherein the fine structures have a maximum feature size of between 50 m and 75 m, and that the coarse structures have a minimum feature size of between 50 m and 75 m.
4. The method as set forth in claim 2, wherein the filtering of the image comprises different edge analyses with which the substructural pattern for the coarse structures and the substructural pattern for the fine structures are determined.
5. The method as set forth in any one of claim 1, wherein a tool is first created with the lithographic mask for deforming the starting material of the substrate, after which the starting material of the substrate is structured with the tool.
6. The method as set forth in claim 12, wherein the tool for deforming the starting material preferably includes a tool for creating coarse structures and a tool for creating fine structures, with the tool for creating coarse structures being created with the submask for coarse structures, and with the tool for creating fine structures being created with the submask for fine structures.
7. The method as set forth in claim 6, wherein the tool for creating fine structures is constituted by an embossing die for hot-embossing or by an embossing die for nanoimprint lithography, and that the tool for creating coarse structures is constituted by a thermoforming mold.
8. The method as set forth claim 1, wherein the structured substrate is populated with at least one stem cell.
9. Reproduction of a stem cell niche of an organism, which can be achieved by means of a method as set forth in claim 1.
10. Reproduction of a stem cell niche of an organism, characterized in that it has geometric characteristics of the stem cell niche of the organism.
11. The method as set forth in claim 3, wherein filtering of the image comprises different edge analyses with which the substructural pattern for the coarse structures and the substructural pattern for the fine structures are determined.
12. The method as set forth in claim 2, wherein tool is first created with the lithographic mask for deforming the starting material of the substrate, after which the starting material of the substrate is structured with the tool.
13. The method as set forth in claim 3, wherein tool is first created with the lithographic mask for deforming the starting material of the substrate, after which the starting material of the substrate is structured with the tool.
14. The method as set forth in claim 4, wherein tool is first created with the lithographic mask for deforming the starting material of the substrate, after which the starting material of the substrate is structured with the tool.
15. Reproduction of a stem cell niche of an organism, which can be achieved by means of a method as set forth in claim 2.
16. Reproduction of a stem cell niche of an organism, which can be achieved by means of a method as set forth in claim 4.
17. Reproduction of a stem cell niche of an organism, which can be achieved by means of a method as set forth in claim 5.
18. Reproduction of a stem cell niche of an organism, which can be achieved by means of a method as set forth in claim 6.
19. Reproduction of a stem cell niche of an organism, which can be achieved by means of a method as set forth in claim 7.
20. Reproduction of a stem cell niche of an organism, which can be achieved by means of a method as set forth in claim 8.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0054] Additional advantages, details, and developments of the invention follow from the following description of preferred exemplary embodiments of the invention with reference to the drawing.
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DETAILED DESCRIPTION
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LIST OF REFERENCE SYMBOLS
[0081] 01 mesostructure [0082] 02 microstructure [0083] 03 nanostructure [0084] 04 [0085] 05 [0086] 06 [0087] 07 [0088] 08 [0089] 09 [0090] 10 [0091] 11 selection of an image file [0092] 12 reading of the data of the image file [0093] 13 binary image [0094] 14 edge-detection algorithm [0095] 15 [0096] 16 local threshold calculation [0097] 17 selection of the most suitable structural patterns [0098] 18 vectoring [0099] 19 lithographic masks [0100] 20 [0101] 21 creation of a lithographic mask [0102] 22 processing of a wafer [0103] 23 silicone cast [0104] 24 hot-embossing step [0105] 25 microthermoforming process [0106] 26 application of a nanostructure