Abstract
The invention concerns an optical coating (3, 3), having a high refractive index and good optical properties (i.e., low absorption and scatter) and limited internal stresses in a spectral range extending from the visible to the near UV range (i.e., up to a wavelength of 220 nm). The coating (3, 3) according to the invention consists of a hafnium- or zirconium-containing oxide Hf.sub.xSi.sub.yO.sub.z or Zr.sub.xSi.sub.yO.sub.z containing an silicon fraction (y) between 1 at. % and 10 at. %, especially between 1.5 at. % and 3 at. %.
Claims
1. Coating comprising a composition having the formula Hf.sub.xSi.sub.yO.sub.z or Zr.sub.xSi.sub.yO.sub.z, wherein x=100(y+z) at. %, y=1.5 at. % to 3 at. %, and z=65 at. % to 68 at. %; wherein the formula Hf.sub.xSi.sub.yO.sub.z represents HfO.sub.2 with part of the hafnium replaced by silicon; and wherein the formula Zr.sub.xSi.sub.yO.sub.z represents ZrO.sub.2 with part of the zirconium replaced by silicon.
2. Coating according to claim 1, wherein z=66.7 at. % in the formula Hf.sub.xSi.sub.yO.sub.z or z=66.66 at. % in the formula Zr.sub.xSi.sub.yO.sub.z.
3. Coating according to claim 2, wherein the composition has the formula Zr.sub.30.83Si.sub.2.5O.sub.66.66.
4. Method of production of coating according to claim 1, wherein the coating is produced by magnetron sputtering.
5. Method according to claim 4, wherein the coating is produced by reactive co-magnetron sputtering of Hf or Zr and Si.
6. Method according to claim 4, wherein the coating is produced by reactive co-magnetron sputtering of HfSi or ZrSi and Si.
7. Method according to claim 4, wherein the coating is produced by reactive co-magnetron sputtering of Hf.sub.xSi.sub.yO.sub.z or Zr.sub.xSi.sub.yO.sub.z and Si.
8. Method according to claim 4, wherein the coating is produced by reactive magnetron sputtering using an Hf- or Zr- and Si-containing compound target.
9. Method according to claim 4, wherein the coating is produced by partially reactive magnetron sputtering using a conducting Hf.sub.xSi.sub.yO.sub.z or Zr.sub.xSi.sub.yO.sub.z compound target.
10. Method according to claim 4, wherein the magnetron sputtering is accompanied by reactive in situ plasma treatment.
11. Method according to claim 4, wherein the Si fraction is set so that the coating has minimal extinction with simultaneously low internal layer stress and high refractive index.
Description
(1) The invention is further explained below with reference to a practical example depicted in the figures. In the figures:
(2) FIG. 1a shows a schematic view of a substrate with an Hf.sub.xSi.sub.yO.sub.z coating;
(3) FIG. 1b shows a schematic view of a substrate with a multilayer system;
(4) FIG. 2a shows a view of transmission of uncoated quartz substrates and substrates coated with HfO.sub.2 layers in the spectral range from 200 nm to 600 nm;
(5) FIG. 2b shows a view of the transmission of an Hf.sub.30.8Si.sub.2.5O.sub.66.7 layer and several HfO.sub.2 layers on a quartz substrate in the spectral range from 220 nm to 260 nm.
(6) FIG. 3 shows measured values of the refractive index n at 550 nm and the internal stresses of an Hf.sub.xSi.sub.yO.sub.66.7 layer as a function of silicon content y;
(7) FIG. 4 shows measured values of the refractive index n at 550 nm and the epitaxial growth rates during reactive magnetron sputtering of Hf.sub.xSi.sub.yO.sub.66.7 layers as a function of power ratio PHf/(PHf+PSi):
(8) FIG. 5 shows measured values of the refractive index n at 550 nm, the extinction at 242 nm and the normalized internal stresses of Hf.sub.xSi.sub.yO.sub.66.7 layers as a function of silicon content y;
(9) FIG. 6 shows measured values of extinction at 242 nm and the absorption edge of Hf.sub.xSi.sub.yO.sub.66.7 layers as a function of sodium content y;
(10) FIG. 7 shows a graphic depiction of the relation between silicon content y of the Hf.sub.xSi.sub.yO.sub.z layer and the corresponding silicon content of an HfSi-mixed target, and
(11) FIG. 8 shows measured values of the refractive index n and the extinction k of a Zr.sub.xSi.sub.yO.sub.66.66 layer and a ZrO.sub.2 layer as a function of wavelength.
(12) FIG. 1a shows a section of an optical component 1 with a substrate 2, on which a coating 3 of Hf.sub.xSi.sub.yO.sub.z according to the invention is applied. The thickness of the coating 3 is then shown strongly exaggerated relative to thickness 6 of substrate 2. The substrate 2 consists of a quartz, glass or plastic. Component 1 is a filter, which is supposed to have the lowest possible absorption in a stipulated spectral range. The spectral range considered here extends from visible light to UV radiation with a wavelength of about 230 nm.
(13) It is known that individual layers or multilayer systems based on hafnium dioxide (HfO.sub.2) are particularly suited for such applications, since this material has low absorption in a spectral range from the visible to 220 nm. FIG. 2a shows a graphic plot of transmission of uncoated quartz substrates and those coated with HfO.sub.2 layers, which were applied by reactive magnetron sputtering with different process parameters (pressure, plasma energy, etc.) on substrate 2. The uncoated quartz substrates over the entire considered spectral range show a transmission of greater than 90% (curve 21). The quartz substrates coated with HfO.sub.2 layers show in the considered spectral range moderate absorption with an absorption edge (T=50%) of about 220 nm (curve 22).
(14) However, the internal stress of an HfO.sub.2 coating 3 with 1000 MPa 1500 MPa is very high: as shown in FIG. 3, in a coating of pure HfO.sub.2, internal stresses of 1300-1400 MPa are measured. Such high internal stresses of coating 3 exert high forces on the underlying substrate 2, which can lead to deformations of substrate 2 and/or layer detachment.
(15) The internal stresses of coating 3 can be reduced, if the hafnium of the HfO.sub.2 coating is replaced partly by silicon: as is apparent from the measured values and the regression curve 23 in FIG. 3, the internal stress of an Hf.sub.xSi.sub.yO.sub.66.7 coating 3 at a silicon fraction of y1.5 at. % is only about 500 MPa, and a silicon fraction of y2.5 at. % of the internal stress has dropped even to below 200 MPa.
(16) The measurements of internal stresses (stress.sub.Ufilm) of coating 3 occurred with a measurement system SIG-500SP from the company sigma-physik (D-37115 Duderstadt), using the Stoney formula (1909).
(17)
(18) TABLE-US-00001 Esubstrate Young's modulus substrate vsubstrate Poisson ratio substrate dsubstrate Substrate thickness dfilm Layer thickness L Layer detector spacing a Laser beam spacing
(19) Monocrystalline silicon wafers 3 in diameter and 380 gm thick, polished on one side, were used as substrate material. These wafers are suitable because of their very limited roughness of 0.1 nm and very homogeneous surface for stress measurement. Uncoated wafers were first measured. For this purpose, the wafer was placed on the sample holder in precisely defined alignment and the spacing of the two laser beams was measured 5 times in succession on the detector (X.sub.before) and stored under the sample number. The individual already measured silicon wafers were then coated with Hf.sub.xSi.sub.yO.sub.z layers of different composition. The layer thickness was chosen at about 250 nm to increase the measurement accuracy. The precise layer thicknesses were determined with a spectral ellipsometer. The individual coated wafers were then placed in the same alignment on the sample holder and the spacing of the two laser beams measured 5 times in succession on the detector (X.sub.after), and also stored under the corresponding sample number. The stresses of the individual coatings were determined with the Stoney formula from the two measurements.
(20) The generation of such Hf.sub.xSi.sub.yO.sub.66.7 coatings 3 can occur, in particular, by reactive co-magnetron sputtering of Hf and Si targets, in which, with appropriate choice of process parameters, high sputtering rates can be achieved. It is apparent from FIG. 4 that admixture of silicon even has a positive effect on the epitaxial growth rate; curves 25 and 26 show epitaxial growth rates during use of different sputtering parameters. By partial replacement of Hf with Si in Hf.sub.xSi.sub.yO.sub.66.7, the internal stresses of coating 3 can therefore be reduced at high sputtering rates. However, with increasing silicon fraction y, the refractive index n of the Hf.sub.xSi.sub.yO.sub.66.7 coating 3 diminishes (see regression line 24 in FIG. 3 and regression lines 27, 28 in FIG. 4, which show the refractive index n as a function of Si content y at a wavelength X=550 nm). To achieve a high refractive index, the silicon fraction y should therefore be as low as possible. These opposite requirements can be satisfied, if the silicon fraction y is set between 1 at. % and 10 at. %.
(21) A particularly favorable Si concentration range lies between about y=1.5 at. % and y=3 at. % (see FIG. 5). As is apparent from the trend of the regression line 29 of the measured values of refractive index n=550 nm, the refractive index n is comparably large at about 2.05 in this Si concentration range. At the same time, the internal stresses (regression curve 30 in FIG. 5 and regression curve 23 in FIG. 3) in this Si concentration range have already dropped to values below 500 MPa. In this Si concentration range, the optical properties of the Hf.sub.xSi.sub.yO.sub.66.7 coating 3 are also particularly favorable, since a local maximum of extinction is present there, measured at the UV wavelength of 242 nm (regression curve 31 in FIG. 5 and regression curve 32 in FIG. 6). A corresponding dependence of extinction of the Si concentration is found at wavelengths up to the corresponding absorption edge.
(22) In the Si concentration range 1.5 at. %<y<3 at. %, the absorption edge is also almost constant and only slightly shifted relative to the absorption edge of pure HfO.sub.2 (i.e., y=0) (see regression curve 33 in FIG. 6); this indicates that the layer structure in the Si concentration range 1.5 at. %<y<3 at. % is HfO.sub.2-dominated. As shown in the detail view of FIG. 2b, co-sputtering of silicon also increases the transmission of the Hf.sub.xSi.sub.yO.sub.66.7 layer: in the depicted spectral range, the measured transmission of a sample with a silicon content of y=2.5 at. % (curve 34) is higher than the layers of pure HfO.sub.2 prepared with difference process parameters (curves 35-37). With an increase in Si concentration (y>5 at. %), an HfO.sub.2SiO.sub.2 mixed oxide is increasingly formed, with a distinct shift in absorption edge into the shortwave spectral range (regression curve 33 in FIG. 6), with diminishing extinction at 242 nm (regression curves 31 and 32 in FIG. 5 and FIG. 6), as well as a continuous reduction of refractive index n (regression line 29 in FIG. 5).
(23) The coating 3 according to the invention is produced by reactive co-magnetron sputtering of Hf and Si targets. During reactive co-magnetron sputtering, targets of HfSi or Hf.sub.xSi.sub.yO.sub.z and Si can also be used. The Hf.sub.xSi.sub.yO.sub.66.7 coating 3 can also be produced by other methods, for example, by using HfSi compound targets of appropriate composition. The layer can also be produced by partially reactive magnetron sputtering of a DC-conducting Hf.sub.xSi.sub.yO.sub.z target. Finally, layer production by one of the mentioned methods can be combined with reactive in situ plasma treatment.
(24) The use of HfSi or Hf.sub.xSi.sub.yO.sub.z compound targets, whose Si content is set so that the sputtered layer has minimal extinction with simultaneously low internal stress and high refractive index, is particularly advantageous. With such targets, different requirements can be optimized by co-magnetron sputtering with Si with the advantage of lower internal stresses of the layer growing on the HfSi or Hf.sub.xSi.sub.yO.sub.z cathode environment, which significantly reduces the probability of particle loading. FIG. 7 shows the relation between silicon content y of the Hf.sub.xSi.sub.yO.sub.z layer in at. % and the corresponding silicon content of an HfSi mixed target in weight % (line 39). For the preferred Si content y of the Hf.sub.xSi.sub.yO.sub.z layer (1 at. %<y<10 at. %) described above, during use of an HfSi compound target, the target should therefore have a silicon content between 0.5 wt % and 5 wt %. For a preferred Si content y of the Hf.sub.xSi.sub.yO.sub.66.7 layer (1 at. %<y<7 at. %), during use of an HfSi compound target, the target should have a silicon content between 0.5 wt % and 4 wt %. FIG. 8 shows measured values of the refractive index n and the extinction k of a Hf.sub.xSi.sub.yO.sub.66.66 layer and a ZrO.sub.2 layer as a function of wavelength. As is apparent, a reduction of the optical losses in the UV range in Zr.sub.xSi.sub.yO.sub.z is even more pronounced than in Hf.sub.xSi.sub.yO.sub.z i.e., in pure ZrO.sub.2, the extinction reaches a value of 1E-3, already at a wavelength of 330 nm, whereas in Hf.sub.30.83Si.sub.2.5O.sub.66.66, this value is only reached at 280 nm. In this composition, coating at a high rate of about 0.5 m/s can be accomplished, whereas in a coating with ZrO.sub.2, only half that rate was achieved. As in Hf.sub.xSi.sub.yO.sub.66.7, the stress is also reduced in the corresponding zirconium compound by about the same factor relative to the pure metal oxide.
(25) A layer with stoichiometric or almost stoichiometric composition (Zr.sub.30.83Si.sub.2.5O.sub.66.66) is preferably produced or used, which offers optimal optical and mechanical properties, i.e., low optical losses into the UV spectral range, high refractive index>2.1 and low stress<100 MPa.
(26) FIG. 1b shows an optical component 1, an edge filter, which is provided with an integrated reflection reduction layer or antireflection layer to increase its light transparency. Edge filters allow light to pass through almost unfiltered up to a limit frequency, but block most of the light from the limit frequency. A multilayer system 5 with several superimposed layers 3, 4 from dielectric materials with different refractive indices are used as coating, in which layers 3 from a high refractive material and layers 4 from a relatively low refractive material are arranged superimposed in alternation. The multilayer system typically consists of 10-100 individual layers 3, 4, in which the individual layers 3, 4 typically have a thickness from 20 to 100 nm. In the present practical example, the substrate 2 consists of a thin plate of quartz or plastic. The thickness 6 of the substrate is between 0.5 and 1.0 mm; the magnitude of the multilayer thickness 5 in FIG. 1b is therefore shown strongly exaggerated relative to the thickness 6 of substrate 2. The layers 3, 4 of the multilayer system 5 are applied to the substrate 2 by a sputtering method and, depending on the size of the internal stresses in the individual layers, exert forces on substrate 2. The forces of the individual layers are added, so that in a complex multilayer system 5 with internal stresses of >1 GPa, very high forces can act on the substrate 2. In order to avoid deformation of substrate 2 because of such layer stresses, the internal stresses of the individual layers 3, 4 must therefore be as low as possible. This is achieved in the present practical example in that the layers 3 with high refractive index consist of Hf.sub.xSi.sub.yO.sub.66.7, the silicon content y preferably lying between 1.5 at. % and 3 at. %. With corresponding adjustment of the sputtering parameters, such sputtering layers, as described above, have low internal stress with high refractive index and high transparency. The individual layers 4 with low refractive index can consist of SiO.sub.2, which has a refractive index of about n=1.48 at 550 nm.
(27) The Hf.sub.xSi.sub.yO.sub.z and Zr.sub.xSi.sub.yO.sub.z coatings according to the invention are particularly suited for use of laser-resistant optical components with low residual reflection and high transparency for UV light from a wavelength range up to 230 nm, for example, for optical components that are used in laser optics in microlithography systems to produce microelectronic components (for example, for use in laser optics for KrF excimer lasers with a working wavelength of X=248 nm). The Hf.sub.xSi.sub.yO.sub.z and Zr.sub.xSi.sub.yO.sub.z coatings according to the invention are also suited for use in mirrors, especially laser mirrors and edge filters, and also for interference filters into the UV range. The coating, in particular, can be used as an antireflection coating on semiconductor lasers.
