METHOD OF BONDING SUBSTRATES, MICROCHIP AND METHOD OF MANUFACTURING THE SAME
20180141280 ยท 2018-05-24
Assignee
Inventors
- Motohiro Sakai (Tokyo, JP)
- Shinji Suzuki (Tokyo, JP)
- Fumitoshi TAKEMOTO (Tokyo, JP)
- Kenichi Hirose (Tokyo, JP)
Cpc classification
H01L21/2007
ELECTRICITY
B29C66/534
PERFORMING OPERATIONS; TRANSPORTING
B29C65/02
PERFORMING OPERATIONS; TRANSPORTING
C09J5/02
CHEMISTRY; METALLURGY
B29C66/30223
PERFORMING OPERATIONS; TRANSPORTING
B29C66/712
PERFORMING OPERATIONS; TRANSPORTING
B29K2083/00
PERFORMING OPERATIONS; TRANSPORTING
B29C66/54
PERFORMING OPERATIONS; TRANSPORTING
B29C66/83221
PERFORMING OPERATIONS; TRANSPORTING
B29C66/73366
PERFORMING OPERATIONS; TRANSPORTING
B29C65/7415
PERFORMING OPERATIONS; TRANSPORTING
B29L2031/756
PERFORMING OPERATIONS; TRANSPORTING
B29C66/1122
PERFORMING OPERATIONS; TRANSPORTING
B29K2069/00
PERFORMING OPERATIONS; TRANSPORTING
B29K2023/38
PERFORMING OPERATIONS; TRANSPORTING
B29C66/71
PERFORMING OPERATIONS; TRANSPORTING
B29C66/71
PERFORMING OPERATIONS; TRANSPORTING
B29K2023/38
PERFORMING OPERATIONS; TRANSPORTING
B29C66/929
PERFORMING OPERATIONS; TRANSPORTING
B29L2011/00
PERFORMING OPERATIONS; TRANSPORTING
B29K2069/00
PERFORMING OPERATIONS; TRANSPORTING
B29C66/53461
PERFORMING OPERATIONS; TRANSPORTING
B29C66/232
PERFORMING OPERATIONS; TRANSPORTING
B29C66/949
PERFORMING OPERATIONS; TRANSPORTING
B29K2083/00
PERFORMING OPERATIONS; TRANSPORTING
B29C66/919
PERFORMING OPERATIONS; TRANSPORTING
B29C66/028
PERFORMING OPERATIONS; TRANSPORTING
B29C65/1432
PERFORMING OPERATIONS; TRANSPORTING
International classification
B29C65/74
PERFORMING OPERATIONS; TRANSPORTING
H01L21/67
ELECTRICITY
B29C65/14
PERFORMING OPERATIONS; TRANSPORTING
B81C3/00
PERFORMING OPERATIONS; TRANSPORTING
B29C65/00
PERFORMING OPERATIONS; TRANSPORTING
Abstract
Disclosed herein is a method of bonding substrates, a microchip, and a method of manufacturing the microchip capable of joining two substrates in a higher adhered state even when at least one of the substrate has a warpage or a roll. A method of bonding a first substrate and a second substrate each of which is made of glass or a resin comprises: a surface activating step for activating each of joining surfaces of the first substrate and the second substrate; and a pressurizing step for pressurizing the first substrate and the second substrate in a state that the first substrate and the second substrate are stacked such that respective joining surfaces contact each other. The joining surface of the first substrate and/or the joining surface of the second substrate are constituted with a plurality of joining regions segmented to be separate from one another by a segmenting recessed portion.
Claims
1. A method of bonding a first substrate and a second substrate each of which is made of glass or a resin, the method comprising: a surface activating step for activating each of a joining surface of the first substrate and a joining surface of the second substrate; and a pressurizing step for pressurizing the first substrate and the second substrate in a state that the first substrate and the second substrate are stacked such that respective joining surfaces contact each other, the joining surface of the first substrate and/or the joining surface of the second substrate being constituted with a plurality of joining regions segmented to be separate from one another by a segmenting recessed portion.
2. The method of bonding the substrates according to claim 1, wherein, where t denotes a thickness of the substrate having the segmenting recessed portion, d denotes an upper limit of a depth of the segmenting recessed portion from the joining surface, and d.sub.min denotes a lower limit of the depth d of the segmenting recessed portion from the joining surface, d.sub.min is greater than 50 ?m and satisfies a following formula (1):
0.7t?d?d.sub.min>0.05t.
3. The method of bonding the substrates according to claim 2, wherein the segmenting recessed portion is constituted with a groove, and where w denotes a width of the groove, w satisfies a following formula (2):
w?t.
4. The method of bonding the substrates according to claim 1, wherein the surface activating step includes an ultra violet light irradiation step for irradiating each of the joining surface of the first substrate and the joining surface of the second substrate with vacuum ultra violet light.
5. The method of bonding the substrates according to claim 2, wherein the surface activating step includes an ultra violet light irradiation step for irradiating each of the joining surface of the first substrate and the joining surface of the second substrate with vacuum ultra violet light.
6. The method of bonding the substrates according to claim 3, wherein the surface activating step includes an ultra violet light irradiation step for irradiating each of the joining surface of the first substrate and the joining surface of the second substrate with vacuum ultra violet light.
7. The method of bonding the substrates according to claim 1, wherein the surface activating step includes a plasma gas processing step for causing a process gas made into plasma by an atmospheric pressure plasma to contact each of the joining surface of the first substrate and the joining surface of the second substrate.
8. The method of bonding the substrates according to claim 2, wherein the surface activating step includes a plasma gas processing step for causing a process gas made into plasma by an atmospheric pressure plasma to contact each of the joining surface of the first substrate and the joining surface of the second substrate.
9. The method of bonding the substrates according to claim 3, wherein the surface activating step includes a plasma gas processing step for causing a process gas made into plasma by an pressure plasma to contact each of the joining surface of the first substrate and the joining surface of the second substrate.
10. A method of manufacturing a microchip having a flow channel in which a medium flows, the microchip being provided with a flow channel forming portion on at least one of joining surfaces of a first substrate and a second substrate each of which is made of glass or a resin, and the microchip being obtained by joining the first substrate and the second substrate according to the method of bonding the substrates according to claim 1.
11. A method of manufacturing a microchip having a flow channel in which a medium flows, the microchip being provided with a flow channel forming portion on at least one of joining surfaces of a first substrate and a second substrate each of which is made of glass or a resin, and the microchip being obtained by joining the first substrate and the second substrate according to the method of bonding the substrates according to claim 2.
12. A method of manufacturing a microchip having a flow channel in which a medium flows, the microchip being provided with a flow channel forming portion on at least one of joining surfaces of a first substrate and a second substrate each of which is made of glass or a resin, and the microchip being obtained by joining the first substrate and the second substrate according to the method of bonding the substrates according to claim 3.
13. A method of manufacturing a microchip having a flow channel in which a medium flows, the microchip being provided with a flow channel forming portion on at least one of joining surfaces of a first substrate and a second substrate each of which is made of glass or a resin, and the microchip being obtained by joining the first substrate and the second substrate according to the method of bonding the substrates according to claim 4.
14. A method of manufacturing a microchip having a flow channel in which a medium flows, the microchip being provided with a flow channel forming portion on at least one of joining surfaces of a first substrate and a second substrate each of which is made of glass or a resin, and the microchip being obtained by joining the first substrate and the second substrate according to the method of bonding the substrates according to claim 5.
15. A microchip having a flow channel in which a medium flows, the microchip comprising: a first substrate and a second substrate bonded to each other, each of the first substrate and the second substrate being made of glass or a resin; and a flow channel forming portion provided on at least one of a joining surface of the first substrate and a joining surface of the second substrate, the joining surface of the first substrate and/or the joining surface of the second substrate being constituted with a plurality of joining regions segmented to be separate from one another by a segmenting recessed portion.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
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DETAILED DESCRIPTION OF THE INVENTION
[0087] Hereinafter, embodiments of the present invention will be explained in detail with reference to accompanying drawings.
(Method of Bonding Substrates)
[0088]
[0089] The method of bonding substrate according to the present embodiment includes a surface activating step for activating a joining surface 12 of a first substrate 11 and a joining surface 16 of a second substrate 15, respectively (as shown in
(Substrates or Base Material)
[0090] Hereinafter throughout the specification, the term substrate broadly includes a plate like shape and also a three dimensional shape and may be referred to as base material. As a non-exhaustive example, a three dimensional substrate or base material may include an optical component such as a prism or a lens or the like.
[0091] The first substrate 11 and the second substrate 15, which is applicable to the present embodiment, are made of a material selected from a group consisting of glass and a synthetic resin, respectively.
[0092] As the synthetic resin constituting the substrates 11 and 15, a silicone resin, a cycloolefin resin (a cycloolefin polymer (COP) or a cycloolefin copolymer (COC) or the like), an acrylic resin, a polycarbonate resin, a styrene resin (polystyrene (PS)) or the like may be used. For example, when the substrates 11 and 15 are microchip substrates, it is preferable to employ a material having a sufficient light permeability. As a resin having a sufficient light permeability, for example, the acrylic resin or the cycloolefin resin may be used.
[0093] The substrates 11 and 15 may be made of the same type of material, such as the acrylic resin and the acrylic resin or the COP and the COP, or alternatively made of a material in which different types of resin are combined, such as the COP and the PS. When combining the different resin, it is preferable to make the substrate 11, in which the segmenting recessed portion is fabricated, from a soft or flexible material in hardness, because the segmenting recessed portion acquires a higher flexibility so that the substrate is more likely to tightly adhere.
[0094] As the glass constituting the substrates 11 and 15, quartz glass, alkali-free glass, borosilicate glass, soda lime glass or the like may be used.
[0095] The substrates 11 and 15 may be made of the same type of material, such as the quartz glass and quartz glass or the borosilicate glass and the borosilicate glass, or alternatively made of a material in which different types of glass are combined, such as the alkali-free glass and the borosilicate glass.
[0096] Yet alternatively, the synthetic resin and the glass may be combined, such as the silicone resin and either the quartz glass or the alkali-free glass.
[0097] According to the present embodiment, the joining surface 12 of the first substrate 11 and/or the joining surface 16 of the second substrate 15 are constituted with a plurality of joining regions that are segmented or partitioned by a segmenting recessed portion consisting of a groove 18 (hereinafter also referred to as segmenting groove) so that each of the joining regions is separated from other joining regions.
[0098] The joining surface 12 of the first substrate 11 and the joining surface 16 of the second substrate 15 each contains a functional region. The functional region means, for example, a region on which a structural recess 20 (as shown in
[0099] Hereinafter, it is assumed that the first substrate 11 and the second substrate 15 are microchip substrates, respectively. Also, it is assumed that the joining surface 12 of the first substrate 11 is solely constituted with joining regions 12a each segmented by the segmenting groove 18, and the structural recess 20 is formed on each of the joining regions 12a constituting the joining surface 12. Yet also, it is assumed that the joining surface 16 of the second substrate 15 is shaped to be one continuous flat surface.
[0100] It is preferable that respective joining regions 12a constituting the joining surface 12 of the first substrate 11 are positioned on a substantially same plane.
[0101] More particularly, the structural recess 20 formed on each of the joining region 12a of the first substrate 11 includes an injection port 22, a discharge port 23, and a flow channel forming portion 24. The injection port 22 is constituted with a through hole configured to inject, for example, the reagent or the like shown in
[0102] The flow channel forming portion 24 allows the through hole of the injection port 22 to communicate with the through hole of the discharge port 23 and has a gutter like shape and a cross section of, for example, rectangular or semicircular shape. This kind of structural recess 20, which requires those injection port 22, discharge port 23, and flow channel forming portion 24, may be formed by employing a known technique such as the machining or the mold transcription.
[0103] Although the structural recess is not formed on the second substrate 15 in
[0104] The structural recess 20 and the segmenting groove 18 may be formed by, for example, injection molding a substrate having a flat plate shape.
[0105] On the first substrate 11 in an example of
[0106] The segmenting groove 18, which segments the joining surface 12 into the joining regions 12a, has a wall thickness smaller than that of the joining region 12a and serves as a non-contact portion that does not contact the opposing substrate when two substrates 11 and 15 are joined to each other. The segmenting groove 18 may be, for example, of a gutter like shape having a cross section of a rectangular, semicircular or a wedge shape, or a combination thereof.
[0107] Also, the segmenting groove 18 are arranged to be across the substrate (or base material) from one end of the substrate to the other end of the substrate so as to provide the higher flexibility to the substrate.
[0108] For example, the segmenting groove 18 in the example in
[0109] According to the method of bonding the substrates of the present embodiment, it is preferable that, where t denotes the thickness of the first substrate 11 having the segmenting groove 18, d denotes an upper limit of the depth of the segmenting groove 18 from the joining surface 12, and d.sub.min denotes a lower limit of the depth d of the segmenting groove 18 from the joining surface 12, d.sub.min has a value greater than 50 ?m and satisfies the following formula (1).
0.7t?d?d.sub.min>0.05t formula (1)
[0110] Furthermore, as shown in
w?t formula (2)
[0111] With the above formulas (1) and (2) being satisfied, it makes it possible to tightly adhere the whole surfaces of the joining regions 12a to the joining surface 16 of the second substrate 15 in an assured manner with a smaller pressing force that is unlikely to cause the flow channel forming portion 24 to be excessively deformed, which is applied in the pressurizing step, which will be described later.
[0112] Furthermore, with the above formula (1) being satisfied, the flexibility becomes larger at a position in which the segmenting groove 18 is formed on the first substrate 11 while obtaining a sufficient mechanical strength. As a result, it makes it possible to tightly adhere the respective joining regions 12a to the joining surface 16 of the second substrate 15 in an assured manner with a smaller pressing force that corresponds to respective flatness in the pressurizing step.
[0113] In this regard, when the upper limit of the depth d of the segmenting groove 18 from the joining surface 12 is excessively large, in other words, the segmenting groove 18 is excessively deep, then the first substrate 11 fails to obtain the sufficient mechanical strength. On the other hand, when the lower limit of the depth d.sub.min of the segmenting groove 18 from the joining surface 12 is excessively small, in other words, the segmenting groove 18 is excessively shallow, then a portion of the first substrate 11 on which the segmenting groove 18 is formed fails to obtain the sufficient flexibility.
[0114] An area of the individual joining region 12a is required to have a size that does not interfere with the degree of freedom in the design of the structural recess 20, and determined depending on the maximum pressing force as far as the structural recess 20 does not deform excessively. In other words, when the pressing force is excessively large, then it entails an excessive deformation of the structural recess 20. This is because the pressing force to be applied in the pressurizing step is considered to be larger as the area of the joining region 12a becomes larger. For this reason, the area of the individual joining region 12a is determined to have a size that is capable of tightly adhering the whole surface thereof in an assured manner without entailing excessive deformation of the structural recess 20 in, in particular, the flow channel forming portion 24.
[0115] The pressing force that does not entail the excessive deformation of the structural recess 20 of the first substrate 11 is determined depending on the Young's modulus of a material constituting the first substrate 11 and the size of respective portions of the structural recess 20.
[0116] As an exemplary dimension of the substrates 11 and 15, each of the substrates 11 and 15 is sized in the length and breadth of, for example, 85 mm?128 mm. The thickness of the first substrate 11 is for example 2 to 5 mm, and the thickness of the second substrate 15 is for example 0.1 to 2 mm. Also, the width of the segmenting groove 18 is 2 mm, and the depth thereof is 1 to 2 mm. Also, each of the joining regions 12a is sized in the length and breadth of 85 mm?128 mm. Yet also, as an exemplary dimension of the flow channel forming portion 24 of the structural recess 20, the width thereof is 500 to 200 ?m, the depth thereof is 50 to 200 ?m, and the length thereof is 9 mm.
(Surface Activating Step)
[0117] It is preferable that the surface activating step is a ultraviolet light irradiation step for irradiating the joining surface 12 of the first substrate 11 and the joining surface 16 of the second substrate 15 with the vacuum ultra violet light L, respectively, or alternatively the surface activating step is a plasma gas processing step for causing a process gas made into plasma by an atmospheric pressure plasma to contact the joining surface of the first substrate and the joining surface of the second substrate, respectively. In
(1) Ultra Violet Light Irradiation Step
[0118] When the ultra violet light irradiation step is employed as the surface activating step, the joining surfaces 12 and 16 of the substrate 11 and 15 are irradiated with the vacuum ultra violet light having wavelength equal to or less than 200 nm from a ultra violet light source 30, respectively.
[0119] As the ultra violet light source 30, for example, a xenon excimer lamp having a bright line at the wavelength of 172 nm, a low pressure mercury lamp having a bright line at the wavelength of 185 nm, or a deuterium lamp having a bright line at the wavelength within the range between 120 and 200 nm.
[0120] The illuminance of the vacuum ultra violet light L irradiated onto the joining surfaces 12 and 16 of the substrates 11 and 15 is, for example, 10 to 100 nW/cm.sup.2.
[0121] Also, although the irradiation time of the vacuum ultra violet light L onto the joining surfaces 12 and 16 of the substrates 11 and 15 is to be set depending on a material constituting the substrates 11 and 15 as appropriate, the irradiation time is preferably, for example, equal to or greater than 5 seconds, and more preferably within the range between 10 to 60 seconds.
(2) Plasma Gas Processing Step
[0122] When the plasma gas processing step is employed as the surface activating step, a process gas made into plasma by an atmospheric pressure plasma is caused to contact the joining surfaces of the substrates.
[0123] As the process gas, it is preferable to use a gas composed mainly of a nitrogen gas, an argon gas or the like and contains 0.01 to 5 volume % of an oxygen gas. Alternatively, a mixed gas of the nitrogen gas and a clean dry air (CDA) may be used.
[0124] Also, the processing time for the plasma gas processing is, for example, 5 to 100 seconds.
[0125] By performing the surface activating processing to the substrate as described above, the joining surfaces 12 and 16 of the substrates 11 and 15 becomes the state that is appropriate to be joined to each other (in other words, the state in which a terminal thereof is substituted with a hydroxy group (OH group)).
(Stacking Step)
[0126] In the stacking step, as shown in
[0127] With the first and second substrates undergoing the above mentioned stacking step, it makes it possible to obtain a stacked body 10 in the state in which the first substrate 11 and the second substrate 15 are stacked onto each other.
[0128] At this stage, it is assumed that a roll is generated on the joining surface 12 of the first substrate 11 (as shown as a portion enclosed by the chained line in
[0129] It should be noted that, in the example shown in
(Pressurizing Step)
[0130] In the pressurizing step, the stacked body 10 obtained by the stacking step is pushed and pressurized in the direction approaching to each other so that the joining surface 12 of the first substrate 11 and the joining surface 16 of the second substrate 15 are tightly adhered to each other.
[0131] Pressurizing the stacked body 10 may be performed, for example, under a constant pressurizing condition, or alternatively, in a plurality of phases, for example, two phases, with the processing condition being adjusted as appropriate. In
[0132] The pressurizing condition may be set depending on a material constituting the substrate or the heating temperature or the like as appropriate.
[0133] More particularly, as exemplary pressurizing conditions, the pressurizing force is to be set to the magnitude that prevents the flow channel forming portion 24 from being excessively deformed, and in particular, for example, set to 0.1 to 5 MPa. The pressurizing time is set to, for example, 60 to 300 seconds. Also, when the pressurizing process to the substrate is performed in two separate phases, the pressurizing force in the second pressurizing process may be set to be smaller than the pressurizing force in the first pressurizing process within the above mentioned numerical range. Likewise, the pressurizing time in the second pressurizing process maybe set to be longer than the pressurizing time in the first pressurizing process within the above described numerical range.
[0134] During the pressurizing step, from the viewpoint to allow the joining to be strengthen, the stacked body 10 may be heated simultaneously with the pressurizing and/or after the pressurizing.
[0135] More particularly, as exemplary heating conditions, the heating temperature is set to, for example, 40 to 130 degrees Celsius, and the heating time is set to, for example, 60 to 300 seconds.
[0136] In the pressurizing step, as will be described below in detail, the joining surface 12 of the first substrate 11 tightly adheres to the joining surface 16 of the second substrate 15. In other words, the first substrate 11, on which a plurality of joining regions 12a are formed on the joining surface 12 in a state separated from one another by the segmenting groove 18, and the second substrate 15 are pushed and pressurized. Then, first, the joining regions 12a, which serve as convex portions in the first substrate 11, contact the joining surface 16 of the second substrate 15. Subsequently, in the plurality of the joining regions 12a of the first substrate 11, the rolls on the joining regions 12a are repaired by a desired pressurizing force, respectively. Then, the joining regions 12a of the first substrate 11 align with the joining surface 16 of the second substrate 15 so that the space S between the joining surface 12 and the joining surface 16 in the stacked body 10 disappears.
[0137] On the other hand, the segmenting groove 18 of the first substrate 11 hardly contacts the joining surface 16 of the second substrate 15. Repairing of the roll on the joining region 12a may cause the deformation (that is, distortion or strain) to occur. However, the deformation in one joining region 12a is unlikely to spread to a neighboring joining regions 12a due to the action of the flexibility at a portion on which the segmenting recess 18 is formed, because the segmenting groove 18 segments the area of the joining surface 12 into small segments and suppress the deformation from occurring. As a result, it is considered that all joining regions 12a can be joined to the joining surface 16 with a smaller pressurizing force that hardly cause the flow channel forming portion 24 to be excessively deformed.
[0138] At this moment, it is not necessarily required to repair a space (i.e., roll) that exists between the segmenting groove 18 and the joining surface 16 other than the space S between the joining surface 12 and the joining surface 16. Such space may remain as a gap between the first substrate 11 and the second substrate 15.
[0139] It should be noted that when pressing another stacked body constituted with the first substrate without the segmenting recessed portion and the second substrate, in some cases it is impossible to join all of the joining regions 12a appropriately to the joining surface 16 with the above described small pressurizing force that hardly cause the flow channel forming portion 24 to be excessively deformed.
[0140] The above difference can be reasoned by the Hertz's contact elastic deformation theory. Generally outlining, when the joining surface is segmented into joining regions each having a smaller area than the joining surface, the flatness in the individual joining region becomes smaller than the flatness of the original joining surface, in other words, the degree of flatness becomes higher. Then, as the flatness becomes smaller, the pressurizing force required to tightly adhere the first substrate to the second substrate for sure becomes smaller. Accordingly, it makes it possible to perform the joining in the individual joining region without the gap being generated while preventing the flow channel forming portion from being excessively deformed.
[0141] On the other hand, the flatness in a large-area continuous joining surface that is not segmented by the segmenting recessed portion becomes larger as compared to the case in which the joining surface is segmented into a plurality of joining regions, in other words, the degree of flatness becomes smaller. For this reason, the pressurizing force required to tightly adhere the first substrate to the second substrate for sure becomes larger. Accordingly, the flow channel forming portion is more likely to be deformed because the joining surface has to be pressed with such larger pressurizing force. Here, the flatness means the shortest distance between two hypothetical parallel planes when a target surface (that is, a joining surface or an individual joining region) is sandwiched by the two hypothetical parallel planes.
[0142] As described above, as shown in
[0143] Subsequently, the first substrate 11 and the second substrate 15 undergo various chemical reaction processes, for example, are joined to each other by the hydrogen bond between the OH group at the terminal of the joining surface 12 of the first substrate 11 and the OH group at the terminal of the joining surface 16 of the second substrate 16. As a result, a joined body 17 can be obtained in which the first substrate 11 is firmly and integrally joined to the second substrate 15.
[0144] According to the above described method of bonding the substrates, the joining surface 12 of the first substrate 11 is constituted with a plurality of joining regions 12a segmented to be separate from one another by the segmenting groove 18. The area of individual joining region 12a is smaller as compared to the case in which the whole surface of the substrate 11 is constituted with one joining surface. Thus, it makes it possible to suppress warpage of the substrate 11 and the roll on the joining surface 12 from affecting the joining. For this reason, when pressurizing in the pressurizing step, it makes it possible to tightly adhere whole surface in each of the joining regions 12a to the joining surface 16 in an assured manner. As a result, whole surface of the joining boundary 17a in the joined body 17 are tightly adhered in an assured manner. Resultantly, it makes it possible to join the first substrate 11 and the second substrate 15 in the higher adhered state even when at least one of the substrate has the warpage of the substrate or the roll on the joining surface thereof.
(Method of Manufacturing Microchip)
[0145] A method of manufacturing microchip according to the present embodiment is a method to obtain a microchip having a flow channel in which a medium flows using the above described method of bonding the substrates.
[0146] In other words, to be used for a microchip substrate is the first substrate and the second substrate at least one of which has a flow channel forming portion provided on one joining surface thereof.
[0147] According to the above described method of manufacturing the microchip, the first substrate 11 and the second substrate 15 are joined to each other using the above described method of bonding the substrates. Thus, it makes it possible to tightly adhere the whole surface of the joining boundary 17a in the obtained joined body (i.e., microchip) 17. Accordingly, the first substrate 11 and the second substrate 15 such as a microchip substrate having a large area, at least one of which may have the warpage of the substrate or the roll on the joining surface thereof, can be joined to each other in the higher adhered state. As a result, it makes it possible to form a desired flow channel with the higher reliability even when the large sized microchip is employed.
(Microchip)
[0148] A microchip according to the present embodiment includes a flow channel in which a medium flows, which is obtained by the above mentioned method of manufacturing the microchip.
[0149] More particularly, as shown in
[0150] Then, at least one joining surface out of the joining surface 12 of the first substrate 11 and the joining surface 16 of the second substrate 15 (the joining surface 12 of the first substrate 11 in
[0151] At least one of the joining surfaces 12 and 16 of the first substrate 11 and the second substrate 15 (the joining surface 12 of the first substrate in
[0152] As described above, the present embodiment of the present invention has been described in detail. Nevertheless, the present invention is not limited to those described as the present embodiment and various modifications can be conceived.
[0153] For example, the present invention is not limited to the configuration in which the structural recess 20 is formed in the joining regions 12a constituting the joining surface 12 of the first substrate 11, as the joined body 17 shown in
[0154] Yet alternatively, the structural recesses may be formed on both of the first substrate 11 and the second substrate 15.
[0155] Yet also, for example, the joining surface constituted with a plurality of joining regions, which are segmented by the segmenting groove 18, may be provided on either of the first substrate 11 or the second substrate 15. Nevertheless, alternatively, the joining surfaces may be provided on both substrates 11 and 15. In this case, the microchip has a configuration in which the joining regions 12a constituting the joining surface 12 of the first substrate 11 correspond to and contact the joining regions of the joining surface 16 of the second substrate 15. In such configuration, both of the first substrate 11 and the second substrate 15 preferably have the flexibility so that the joining surfaces are more likely to contact each other.
[0156]
[0157] Yet alternatively, for example, the segmenting groove 18 may be formed on an opposite surface to the joining surface 12 of the first substrate 11 and/or an opposite surface to the joining surface 16 of the second substrate 15. In this case, the joining surfaces of the substrates are easier to contact each other because the wall thickness at the portion of the segmenting groove 18 becomes thinner regardless of the orientation of the segmenting groove 18.
[0158]
[0159] Yet also, for example, the shape of the joining regions may be, as shown in
[0160] Alternatively, the shape of the joining regions may be, as shown in
[0161] Yet alternatively, the shape of the joining regions may be, as shown in
[0162] It should be noted that, in
[0163] The peripheral recesses 19B and 19C maybe formed by, for example, injection molding a substrate in a flat plate shape.
[0164] As a further modifications to the present embodiment, the present embodiment is not limited to the joining of a plate-like members but also applicable to the bonding of base members having a three dimensional shape such as an optical component or the like.
[0165]
[0166] Referring to
[0167] Furthermore, the base member 71 is provided with a groove 73 on the upper surface of the stepwise convex portion thereof. A bottom face of the prism 72 is caused to face and joined to the upper face with the groove 73 of the base member 71 so that the prism 72 is capable of being tightly adhered to the base member 71.
[0168]
[0169] Referring to
[0170] Furthermore, the cylinder 81 is provided with a groove 83 on the flat surface thereof. A bottom face of the lens 82 is caused to face and joined to the flat surface with the groove 83 of the cylinder 81 so that the lens 82 is capable of being tightly adhered to the cylinder 81.
[0171] According to those modifications to the present embodiment, it makes it possible to suppress the warpage of the base material or the roll on the joining face from adversely affecting the joining or bonding. As a result, it makes it possible to allow the whole surface of each of the joining regions to tightly adhere to opposing base material when being pressurized in the pressurizing step.
Working Examples
[0172] Hereinafter, working examples of the method of bonding substrates according to the present embodiment will be described in detail below. Nevertheless, it should be noted that the present invention is not limited to the following working examples.
Working Example 1
[0173] The first substrate and the second substrate were prepared as follows.
[0174]
[0175] The segmenting groove 48A has the width of 2 mm and the depth (that is, the distance from the joining regions 42aA to the innermost portion of the segmenting groove 48A) of 1 mm. Likewise, the peripheral recessed portion 49A also has the depth (that is, the distance from the joining regions 42aA to the innermost portion of the peripheral recess 49A) of 1 mm.
[0176] A second substrate has a profile conforming to the SBS standard (i.e., 85 mm?128 mm). The second substrate is a microplate with 12?8 holes on which structural recesses are formed on a joining face of a plate having the thickness of 2 mm and made of the cycloolefin resin (ZEONEX 460R manufactured by ZEON Corporation). A plurality of holes of the microplate, which serve as the structural recesses, respectively, are independent of one another. In this regard, although it does not have a so-called microchip structure in which two holes are coupled to each other through a flow channel, it is assumed that each of the holes of the microplate is to be the injection port and the discharge port of the microchip so as to perform the bonding. It is also assumed that the hole to be serve as the structural recess of the respective holes of the microplate is opposed to the same joining region 42aA on the opposing first substrate. In
[0177] The above prepared first substrate 41A and the second substrate were bonded to each other by performing the following ultra violet light irradiation step and the joining step.
(Ultra Violet Light Irradiation Step)
[0178] Using a xenon excimer lamp, respective joining surfaces of the two substrates were irradiated with the vacuum ultra violet light under the condition of the illuminance of 40 mW/cm.sup.2 and the irradiation time of 20 seconds.
(Joining Step)
[0179] The two substrates were stacked such that respective joining surfaces thereof contact each other so as to obtain a stacked body (Stacking Step). Subsequently, the stacked body were pressurized under the condition of the pressure of 0.2 MPa, the pressurizing time of 300 seconds, and the heating temperature of 90 degrees Celsius so as to join the two substrates, and resultantly a joined body [A] was obtained.
Working Example 2
[0180] Two substrates were joined and the joined body [B] were obtained similarly to the working example 1, except that the first substrate was prepared as follows.
[0181]
[0182] The segmenting groove 48B has the width of 2 mm and the depth (that is, the distance from the joining regions 42aB to the innermost portion of the segmenting groove 48B) of 1 mm. Likewise, the peripheral recessed portion 49B also has the depth (that is, the distance from the joining regions 42aB to the innermost portion of the peripheral recessed portion 49B) of 1 mm.
Working Example 3
[0183] Two substrates were joined and the joined body [C] were obtained similarly to the working example 1, except that the first substrate was prepared as follows.
[0184]
[0185] The segmenting groove 48C has the width of 2 mm at the narrowest portion and the depth (that is, the distance from the joining regions 42aC to the innermost portion of the segmenting groove 48C) of 1 mm. Likewise, the peripheral recessed portion 49C also has the depth (that is, the distance from the joining regions 42aC to the innermost portion of the peripheral recessed portion 49C) of 1 mm.
Working Example 4
[0186] Two substrates were joined and the joined body [D] were obtained similarly to the working example 1, except that the first substrate was prepared as follows.
[0187]
[0188] The segmenting groove 48D has the width of 2 mm and the depth (that is, the distance from the joining regions 42aD to the innermost portion of the segmenting groove 48D) of 1 mm. Likewise, the peripheral recessed portion 49D also has the depth (that is, the distance from the joining regions 42aD to the innermost portion of the peripheral recess 49D) of 1 mm.
Comparative Example 4
[0189] Two substrates were joined and the joined body [E] were obtained similarly to the working example 1, except that the first substrate was prepared as follows.
[0190]
[0191] The peripheral recessed portion 49E has the depth (that is, the distance from the joining regions 42E to the innermost portion of the peripheral recess 49E) of 1 mm.
[0192] A joining statuses of the joined bodies [A] to [E] were evaluated, respectively, as follows. Table 1 illustrates the results evaluated.
[0193] More particularly, when the first substrate and the second substrate are joined to each other, both substrates are unified or integrated, thus a portion that is tightly joined without a gap becomes to be without a boundary face or interfacial surface. On the other hand, the boundary face remains at a portion that is not joined. For this reason, when a planar photograph is taken from the second substrate side, then the portion at which the boundary face remains can be observed as a dark portion in the photographed image.
[0194] Accordingly, in evaluating the joining statuses of the joined bodies [A] to [E], the planar photographs of the joined bodies [A] to [E] were taken, respectively, from the second substrate side, areas of the portions that are not joined in the photographed images were calculated, respectively, using an image measurement software, and ratios of the joined area actually joined with respect to the entire areas to be joined (i.e., theoretical values) were obtained, respectively.
[0195] It can be assumed that, when the ratio of the joined area is equal to or greater than 80%, a joined body is endurable to a practical use.
TABLE-US-00001 TABLE 1 Segmented Joining Surfaces Evaluation Result of First Substrate Ratio of Number Shape Joined Area Evaluation Working 6 FIG. 7 100% Excellent Example 1 Working 12 FIG. 8 100% Excellent Example 2 Working 11 FIG. 9 100% Excellent Example 3 Working 2 FIG. 10 83% Acceptable Example 4 Comparative 1 FIG. 11 68% No good Example 1
[0196] As apparent from the above table 1, in the joined bodies according to the working examples 1 to 4, in which the joining face of the first substrate was constituted with a plurality of joining regions that were segmented to be separate from one another by the segmenting recessed portion such as the segmenting groove, it was confirmed that the whole surface of the boundary face of the joined body were tightly adhered to the second substrate. As a result, it was confirmed that the first substrate and the second substrate would be capable of being joined to each other in a higher adhered state, even when at least one of the substrates would have the warpage of the substrate or the roll on the joining surface thereof.
[0197] While certain embodiments have been described, these embodiments have been presented by way of example only, and are not intended to limit the scope of the present invention. The novel apparatuses and methods thereof described herein may be embodied in a variety of other forms. Furthermore, various omissions, substitutions and changes in the form of the apparatuses and methods thereof described herein may be made without departing from the gist of the present invention. The accompanying claims and their equivalents are intended to cover such forms or modifications as would fall within the scope and gist of the present invention.
[0198] The present application is based upon and claims the benefit of a priority from Japanese Patent Application No. 2016-225765, filed on Nov. 21, 2016, and the entire contents of which are incorporated herein by reference.
REFERENCE SIGNS LIST
[0199] 10: Stacked Body [0200] 11: First Substrate [0201] 12: Joining Surface [0202] 12a; 12aA; 12aB; 12aC: Joining Region [0203] 15: Second Substrate [0204] 16: Joining Surface [0205] 17: Joined Body [0206] 17a: Joining Boundary [0207] 18; 18A; 18B; 18C: Segmenting Groove [0208] 19B; 19C: Peripheral Recessed Portion [0209] 20: Structural Recess [0210] 22: Injection Port [0211] 23: Discharge Port [0212] 24: Flow Channel Forming Portion [0213] 30: Ultra Violet Light Source [0214] 41A; 41B; 41C; 41D; 41E: First Substrate [0215] 42aA; 42aB; 42aC; 42aD: Joining Region [0216] 42E: Joining Surface [0217] 48A; 48B; 48C; 48D: Segmenting Groove [0218] 49A; 49B; 49C; 49D; 49E: Peripheral Recessed Portion [0219] 50: Stacked Body [0220] 51: First Microchip Substrate [0221] 51a: Joining Surface [0222] 55: Second Microchip Substrate [0223] 55a: Joining Surface [0224] 57: Joined Body [0225] 59: Ultra Violet Light Source [0226] 62: Injection Port [0227] 63: Discharge Port [0228] 64: Flow Channel Forming Portion [0229] L: Vacuum Ultra Violet Light [0230] R: Flow Channel [0231] S: Space