Opto-electronic modules and methods of manufacturing the same and appliances and devices comprising the same
09966493 ยท 2018-05-08
Assignee
Inventors
Cpc classification
G02B3/0056
PHYSICS
G01J5/0806
PHYSICS
G01J5/045
PHYSICS
H01L2924/0002
ELECTRICITY
G01J1/0411
PHYSICS
G02B3/0031
PHYSICS
G01J5/20
PHYSICS
H01L31/02325
ELECTRICITY
H01L25/167
ELECTRICITY
H01L31/16
ELECTRICITY
H01L31/167
ELECTRICITY
H01L2924/0002
ELECTRICITY
Y10T29/49002
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
H01L2924/00
ELECTRICITY
G01J5/024
PHYSICS
H01L27/14625
ELECTRICITY
H01L2924/00
ELECTRICITY
International classification
H01L31/16
ELECTRICITY
H01L31/167
ELECTRICITY
B29D11/00
PERFORMING OPERATIONS; TRANSPORTING
H01L25/16
ELECTRICITY
G02B13/00
PHYSICS
H01L31/0232
ELECTRICITY
G01J5/20
PHYSICS
Abstract
Manufacturing opto-electronic modules (1) includes providing a substrate wafer (PW) on which detecting members (D) are arranged; providing a spacer wafer (SW); providing an optics wafer (OW), the optics wafer comprising transparent portions (t) transparent for light generally detectable by the detecting members and at least one blocking portion (b) for substantially attenuating or blocking incident light generally detectable by the detecting members; and preparing a wafer stack (2) in which the spacer wafer (SW) is arranged between the substrate wafer (PW) and the optics wafer (OW) such that the detecting members (D) are arranged between the substrate wafer and the optics wafer. Emission members (E) for emitting light generally detectable by the detecting members (D) can be arranged on the substrate wafer (PW). Single modules (1) can be obtained by separating the wafer stack (2) into separate modules.
Claims
1. A method for manufacturing opto-electronic modules, said method comprising: providing a substrate wafer on which a multitude of detecting members are arranged; providing an optics wafer, said optics wafer comprising a multitude of solid transparent portions transparent for light generally detectable by said detecting members and blocking portions composed of a polymer material for substantially attenuating or blocking incident infrared light generally detectable by said detecting members, wherein the blocking portions of the optics wafer and the transparent portions of the optics wafer have substantially the same dimension along a vertical direction, and wherein upper and lower surfaces of the transparent portions are co-planar, respectively, with upper and lower surfaces of the blocking portions; subsequently applying an optical element to at least one of the upper or lower surface of each of the solid transparent portions; and preparing a wafer stack comprising said substrate wafer, said optics wafer, and a spacer wafer disposed between the optics wafer and the substrate wafer, wherein the spacer wafer is composed of a polymer material which substantially attenuates or blocks infrared light generally detectable by said detecting members, wherein the vertical direction is parallel to a direction in which the wafers are stacked.
2. The method according to claim 1, wherein preparing said wafer stack is carried out such that said detecting members are arranged between said substrate wafer and said optics wafer.
3. The method according to claim 1, wherein providing a substrate wafer on which a multitude of detecting members are arranged comprises placing said detecting members on said substrate wafer by pick-and-place.
4. The method according to claim 1, wherein each of said multitude of transparent portions has thereon at least one passive optical component comprising at least one optical structure each.
5. The method according to claim 4, further comprising manufacturing said at least one passive optical component by replication.
6. The method according to claim 1, wherein a multitude of emission members for emitting light generally detectable by said detecting members is arranged on said substrate wafer such that a multitude of neighboring emission members and detecting members are present on said substrate wafer.
7. The method according to claim 6, wherein a first plurality of passive optical components is associated with one of said emission members and another plurality of passive optical components is associated with one of said detecting members.
8. The method according to claim 6, wherein said spacer wafer is arranged such that it reduces optical cross-talk between said emission members and said detecting members.
9. The method according to claim 1, comprising obtaining said spacer wafer by means of a replication process.
10. The method according claim 1, wherein said opto-electronic modules are proximity sensors.
11. The method according to claim 1, further comprising: providing said substrate wafer with solder balls on that side of the substrate wafer which is opposed to that side of the substrate wafer on which said detecting members are arranged.
12. The method according to claim 1, further comprising separating said wafer stack into a multitude of separate modules each comprising: a portion of said substrate wafer; at least one of said detecting members; at least one of said transparent portions; at least one of said blocking portions.
13. The method according to claim 12 wherein, after separating the wafer stack into separate modules, the at least one transparent portion of a particular one of the modules and the at least one blocking portion of the particular one of the modules form, together in combination, a solid rectangular-prism shape.
14. The method according to claim 1, further comprising separating said wafer stack into a multitude of separate modules each comprising: a portion of said substrate wafer; at least one of said detecting members; a portion of said spacer wafer; at least one of said transparent portions; at least one of said blocking portions.
15. The method according to claim 1, further comprising: providing a baffle wafer comprising a multitude of transparent regions.
16. The method according to claim 1, further comprising: providing a baffle wafer arranged next to said optics wafer on that side of said optics wafer facing away from said substrate wafer; and wherein preparing said wafer stack is carried out such that said detecting members are arranged between said substrate wafer and said optics wafer, and wherein said optics wafer is arranged between said baffle wafer and said substrate wafer.
17. The method according to claim 1, wherein said substrate wafer substantially is a printed circuit board assembly.
18. The method according to claim 1 wherein each of the transparent portions of the optics wafer has a respective first side that is a same first distance from the substrate wafer as a first side of the blocking portions of the optics wafer, and wherein each of the transparent portions of the optics wafer has a respective second side that is a same second distance from the substrate as a second side of the least one blocking portion of the optics wafer.
19. The method according to claim 1 wherein the blocking portions are composed of an epoxy resin.
20. The method of claim 1 wherein applying an optical element to at least one of the upper or lower surface of each of the solid transparent portions includes using an embossing technique to apply each of the optical elements to a respective one of the solid transparent portions such that each of the optical elements is separate from all other ones of the optical elements.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
(1) Below, examples of the invention are described in more detail with reference to the drawings. The figures show schematically:
(2)
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(8) The reference symbols used in the figures and their meaning are summarized in the list of reference symbols. The described embodiments are intended as examples.
DETAILED DESCRIPTION
(9)
(10) Module 1 comprises several constituents (P, S, O, B) stacked upon each other in a direction through which the term vertical is defined; it corresponds to the z direction (cf.
(11) Module 1 comprises a substrate P, a separation member S, an optics member O and a baffle member B stacked upon each other. Substrate P is, e.g., a printed circuit board assembly. The printed circuit board (PCB) of this PCB assembly can more specifically also be referred to as an interposer. On the PCB, an emission member E for emitting light, in particular infrared light (more particularly near-infrared light), can be mounted, e.g., a light-emitting diode; and a detecting member D can be mounted thereon, for detecting light, in particular infrared light (more particularly near-infrared light, e.g., a photo diode. Electrical contacts of emission member E and detecting member D are electrically connected to the outside of module 1, where solder balls 7 are attached. Instead of providing solder balls 7, it would also be possible to provide contact pads on the PCB which are not (or at a later time) provided with solder balls.
(12) This way, module 1 can be mounted on a printed circuit board 9, e.g., in surface mount technology (SMT), next to other electronic components (not shown). Printed circuit board 9 may be a constituent of an electronic device 10 such as a hand-held communication device. In particular, device 10 can be a smart phone. Module 1 is particularly suitable for such an application because it can be manufactured having a particularly small size.
(13) Separation member S has two openings 4, emission member E arranged in one of them and detecting member D being arranged in the other. This way, emission member E and detecting member D are laterally encircled by separating member S.
(14) Separation member S may fulfill several tasks. It can ensure a well-defined distance between substrate P and optics member O (through its vertical extension) which helps to achieve well-defined light paths from emitting member E through optics member O and from the outside of module 1 through optics member O onto detecting member D. Separation member S can also provide protection of detecting member D from light that is not supposed to be detected by detection member D, by being substantially non-transparent to light generally detectable by detecting member D and by forming a portion of the outside walls of module 1. And, separation member S can also provide protection of detecting member D from light emitted by emitting member E which should not reach detecting member D, so as to reduce optical cross-talk between emission member E and detecting member E, by being substantially non-transparent to light generally detectable by detecting member D and by forming a wall between emission member E and detecting member D. Light reflected inside module 1 and stray light originating from emission member E can be kept from reaching detecting member D this way. Separating member S can be made of a polymer material, in particular of a hardenable or more specifically curable polymer material, e.g., of an epoxy resin.
(15) Optics member O comprises a blocking portion b and two transparent portions t, one for allowing light emitted by emission member E to leave module 1, and another one for allowing light to enter module 1 from the outside of module 1 and reach detecting member D.
(16) Blocking portion b is substantially non-transparent for light generally detectable by detecting member D, e.g., by being made of a suitable (polymer) material. Transparent portions t comprise a passive optical component L or, more particularly and as an example, a lens member L each, for light guidance. Lens members L may, e.g., comprise, as shown in
(17) Baffle member B allows to shield undesired light, in particular light leaving module 1 or incident to module 1 in an desired angle. For example, baffle member B can have two separate transparent regions 3 which may be embodied as openings or by means of transparent material. Baffle member B can, outside the transparent regions 3, be made of a material substantially attenuating or blocking light generally detectable by the detecting members, or it could be provided with a coating having such a property, wherein the latter can be more complex to manufacture. The shape of baffle member B or more precisely of the transparent regions 3, can be different from what is shown in
(18) The lateral shape not only of the transparent regions 3, but also of the transparent portions t and of the openings 4 do not have to be circular, but may have other appearances, e.g., polygonal or rectangular with rounded corners.
(19) Module 1 is an opto-electronic component, more precisely a packaged opto-electronic component. The vertical side walls of module 1 are formed by items P, S, O and B. A bottom wall is formed by substrate P, and a top wall by baffle member B or by baffle member B together with optics member O.
(20) As is well visible in
(21) The module 1 shown in
(22) It would also be possible to create a module which comprises (as electronic components) only a detecting member D and no emission member E. In that case, the module could be embodied substantially as the right half of the module 1 shown in
(23) Furthermore, it is possible to provide modules which are designed according to the same principles as discussed above, but comprising, in addition to detecting member D, one or more additional electronic components such as additional light detectors, or one or more integrated circuits, or two or more light sources.
(24) The active electronic components comprised in a module (such as emission member E o and detecting member D in the example of
(25)
(26) Four wafers are sufficient for manufacturing a multitude of modules as shown in
(27) Substrate wafer PW can be a PCB assembly comprising a PCB of standard PCB materials, provided with solder balls 7 on the one side and with active optical components (E and D) soldered to the other side. The latter can be placed on substrate wafer PW by pick-and-place using standard pick-and-place machines.
(28) In order to provide maximum protection from detecting undesired light, all wafers PW, SW, OW, BW can substantially be made of a material substantially non-transparent for light detectable by detecting members D, of course except for transparent areas such as transparent portions t and transparent regions 3.
(29) Wafers SW and BW and possibly also all or a portion of wafer OW can be produced by replication. In an exemplary replication process, a structured surface is embossed into a liquid, viscous or plastically deformable material, then the material is hardened, e.g., by curing using ultraviolet radiation or heating, and then the structured surface is removed. Thus, a replica (which in this case is an negative replica) of the structured surface is obtained. Suitable materials for replication are, e.g., hardenable (more particularly curable) polymer materials or other replication materials, i.e. materials which are transformable in a hardening step (more particularly in a curing step) from a liquid, viscous or plastically deformable state into a solid state. Replication is a known technique, cf., e.g., WO 2005/083789 A2 for more details about this.
(30) In case of optics wafer OW, replication or molding may be used for obtaining the non-transparent portions (blocking portions b). It would also be possible to provide holes, where transparent portions t are supposed to be, by drilling or by etching.
(31) Subsequently, a so-obtained precursor wafer is provided with lens members L, so as to yield optics wafer OW. This may be accomplished by means of replication, e.g., forming lens members L as a unitary parts, e.g., as described in US 2011/0043923 A1. The lens members L can, however, also be manufactured starting from a semi-finished part being a wafer comprising transparent elements 6 within holes by which transparent portions t are defined. This can be particularly useful when the lens members L each describe at least one apex, and those apices are located outside a vertical cross-section of the optics wafer OW. Such a semi-finished part can be (as in the example shown in the figures) a flat disk-like wafer having no holes penetrating the wafer in the transparent portions t and having virtually no or only shallow surface corrugations, such surface corrugations being, for example, concave, i.e. not extending beyond the wafer surface as described by the blocking portions b.
(32) A semi-finished part like that can be obtained starting from a flat precursor wafer (made, for example, of one material) having holes or openings where the transparent portions are supposed to be and then filling the holes with transparent material, e.g., using a dispensing process, and either filling the holes in the precursor wafer one-by-one, e.g., using a dispenser such as used for underfilling processes in flip-chip technology or the like, or by filling several holes at once, e.g., using a squeegee process (e.g. as known from screen printing) or a dispenser with several hollow needles outputting material. During the dispensing, the wafer can be placed on a flat support plate, e.g., made of a silicone. Care has to be taken order to prevent the formation of air bubbles or cavities in the dispensed material, since this would degrade the optical properties of the lens members L to be produced. E.g., one can carry out the dispensing in such a way that wetting of the wafer material starts at an edge formed by the wafer and an underlying support plate (or in a place close to such an edge), e.g., by suitably guiding a hollow needle outputting the material close to such an edge. Subsequently, the dispensed material is cured, e.g., by heat or UV radiation, so as to obtain hardened transparent material.
(33) Convex meniscuses possibly formed this way can be flattened by polishing, so as to obtain a transparent element 6 having parallel surfaces adjusted to the wafer thickness. Then, by means of replication, lens elements 5 are applied, for example, to both sides (top and button side) of wafer OW. In case of concave meniscuses of the transparent elements, the replication can take place on these, wherein the amount of applied replication material might have to be adjusted accordingly.
(34) As has already been mentioned, it is generally possible to provide that the spacer wafer SW and/or the baffle wafer BW are obsolete in the sense that a particular kind of optics wafer is provided. Namely an optics wafer (combined optics wafer) which incorporates the features and functionalities of the spacer wafer SW and/or the baffle wafer BW. Producing such a combined optics wafer may be accomplished using a particular precursor wafer and, manufactured based thereon, a particular semi-finished part. Such a precursor wafer and semi-finished part, respectively, has at least one structured surface, having, for example, protrusions extending vertically beyond at least one of the two surfaces of transparent elements to be provided in precursor wafer and present in the semi-finished part, respectively.
(35) In
(36) It is readily deduced from
(37) In order to form a wafer stack 2, the wafers are aligned and bonded together, e.g., by gluing, e.g., using a heat-curable epoxy resin. Each active optical component (such as detecting members D and emission members E on the substrate wafer PW) should be sufficiently accurately allocated with a corresponding passive optical component (such as lens members L of the optics wafer OW).
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(39) The fact that most alignment steps are carried out on wafer level makes it possible to achieve a good alignment (in particular of members D and E with respect to members L) in a rather simple and very fast way. The overall manufacturing process is very fast and precise. Due to the wafer-scale manufacturing, only a very small number of production steps is required for manufacturing a multitude of modules 1.
(40) Other implementations are within the scope of the claims.
LIST OF REFERENCE SYMBOLS
(41) 1 opto-electronic module, proximity sensor 2 wafer stack 3 transparent region 4 opening 5 optical structure, lens element 6 transparent element 7 solder ball 9 printed circuit board 10 electronic device, smart phone b blocking portion, non-transparent portion B baffle member BW baffle wafer D detecting member, detector, photo diode E emission member, light emitter, light-emitting diode L passive optical component, lens member O optics member ow semi-finished part OW optics wafer P substrate PW substrate wafer s1,s2, . . . refers to a sectional view S separation member SW spacer wafer t transparent portion