Durable MgO—MgF2 composite film for infrared anti-reflection coatings

Abstract

This disclosure is directed to an optic having a composited MgOMgF.sub.2 infrared anti-reflective coating that is suitable for use in LWIR, MWIR and SWIR ranges, and is particularly suitable for use in the LWIR range. The coated optic disclosed herein passes the severe abrasion test with a barring force between 2 pounds and 2.5 pounds. The MgOMgF.sub.2 infrared anti-reflective coating has a thickness in the range of 500 nm to 1500 nm and a reflectance value R.sub.x at 12 of less than 2% in the wavelength range of 7.25 nm to 11.75 nm.

Claims

1. A method of depositing a thin film of a selected material on the surface of a substrate using plasma ion assisted deposition, the method having the steps of: providing a vacuum chamber and within said chamber: providing a substrate on which a coating is to be deposited; providing at a MgF.sub.2 material source and vaporizing said material using an e-beam to provide a coating material vapor flux, said flux passing from said material source through a reversed mask to said substrate; providing plasma ions containing oxygen ions within said plasma from a plasma source; rotating said substrate at a selected rotation frequency f; and depositing said coating material on said substrate as a coating film and bombarding said substrate and said film with said plasma ions before and during said material depositions; wherein the method forms a smooth, dense uniform composited MgOMgF.sub.2 coating.

2. The method according to claim 1, wherein the coating material deposited on said substrate passes an abrasion test with a barring force between 2 lbs and 2.5 lbs.

3. The method according to claim 1, wherein the deposited coating has a thickness in the range of 100 nm to 1500 nm.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) FIG. 1 is a schematic drawing of modified PIAD deposition system in an oxygen rich plasma environment using a reversed mask and a side shield that enable the deposition of a thick, densified and smooth MgOMgF.sub.2 composited coating.

(2) FIG. 2 is a graph of the refractive index versus wavelength in the infrared spectral range of the modified MgOMgF2 composited coating that was obtained using the modified PIAD method.

(3) FIGS. 3a and 3b are AFM images of 200 nm MgOMgF2 composited film deposited by the modified PIAD process (3a) and a standard 200 nm MgF2 film (3b) that was deposited without using the modified PIAD technique. The films corresponding surface roughness is 0.4 nm of FIG. 3a and 2.4 nm for FIG. 3b.

(4) FIG. 4 is a graph of the reflectance (Rx) at 12 deg angle of incidence of a LWIR broadband AR coating without the MgOMgF2 composited capping layer as shown by numeral 30 and with the MgOMgF2 composited capping layer as shown by numeral 32.

(5) FIG. 5 is a graph illustrating spectral transmittance (Tx) represented by numeral 44 and reflectance (Rx 12) represented by numeral 46 of the LWIR broadband AR coating with a MgOMgF2 composited capping layer.

DETAILED DESCRIPTION

(6) Herein the term composited film or composited coating means a MgOMgF.sub.2 film or coating in which MgF.sub.2 is used as the bulk material, and as it is vaporized and deposited on a substrate using PIAD and an oxygen rich atmosphere as described herein, and fluorine depletion and replacement occurs with the formation of a MgOMgF.sub.2 coating that is densified and smoothed by the plasma ion assist. The resulting film is one in which a Mg atom may be bonded to both a F atom and an O atom resulting is a uniform film and not one in which the MgO merely fills voids or the porosity of a MgF.sub.2 structure. In a composited coating the porosity of the base metal fluoride material is filled-in and the coating is densified as it is being deposited, hence thicker, more a durable coating can be made. In the earlier coatings the oxide is applied as a separate layer after the metal fluoride layer is formed and it also filled the porosity or any columnar structure of the metal fluoride film. Further, in previous applications the coating structure was for use with UV radiation. Such structures cannot be used in the infrared, particularly the LWIR. Also herein the terms film and coating may be used interchangeably. Further the coatings described herein are directed to operations in a short-wave infrared range (SWIR) of 1-3 m, a middle-wave infrared range (MWIR) 3-5 m, and long-wave infrared range (LWIR) of 8-14 m.

(7) It is known that optical performance of an AR coating is dominated by the refractive index of outermost layer. A low refractive index of the outermost layer enables one to achieve a broadband AR coating [Jue Wang et al, Optical coatings with ultralow refractive index SiO.sub.2 films, 41.sup.st Boulder Damage Symposium, Sep. 21-23, 2009, SPIE 7504, 75040F]. On the other hand, coating durability and environmental stability are mainly affected by the outermost layer in optical coatings. As a result, material property of the outermost layer plays a critical role not only in optical performance but also in mechanical strength and environmental stability. As one of the hardest fluoride materials, MgF.sub.2 is a good candidate as a low refractive index layer for optical coating applications from UV, VIS up to LWIR. However, the MgF.sub.2 film or coating thickness for AR coatings in the LWIR range needs to be 40 times thicker than that used for MgF.sub.2 coatings AR coatings in the UV range. Further, the MgF.sub.2 film porosity and surface roughness strongly correlate to the layer thickness. Thick MgF.sub.2 layers lead to a porous, very rough surface which in turn results in a low abrasion resistance. A MgOMgF2 composited film suitable for use in the LWIR range and providing enhanced durability was prepared the use of modified PIAD with a high bias voltage and an oxygen rich plasma environment.

(8) Modified plasma ion-assisted deposition (PIAD) has been established for oxide coatings such as SiO.sub.2 have been described in US Patent Application Publication Nos. 2010/02154932 and 2009/0141358. The modified PIAD technique enables the preparation of dense and smooth oxide coatings. However, for hybrid oxide-fluoride coatings such as used in DUV coatings the method has been to deposit a metal fluoride layer and then fill in and smooth the fluoride layer indirectly by inserting in-situ smoothed oxide layers between metal fluoride layers. In contrast to the DUV coatings, in the present disclosure the plasma ions were directly employed to modified MgF.sub.2 film within a reversed mask configuration, see US application publication 2008/0050910, and an oxygen-rich environment, leading to a formation of MgOMgF.sub.2 composited film. The strengthened MgOMgF2 composited film was used as a capping layer for a LWIR broadband AR coating and the MgOMgF.sub.2 capping layer resulted on in increased abrasion resistance and environmental durability.

(9) FIG. 1 is a schematic drawing of modified PIAD with a reverse mask and a side shield that enabled the deposition of thick MgOMgF2 composited films or coatings that are also simultaneously densified. FIG. 1 illustrates a deposition set-up 8 having a vacuum chamber 28 in which is located a substrate carrier 21 having substrates 24 thereon, an e-beam 10 that impinges a target 18 to produce a vapor flux 20 that passes through a reversed mask 12 for deposition on the substrates 24. In addition, there is a plasma source 15 that generates a plasma 21, for example an argon plasma, and a oxygen source/feed for producing the plasma as a an oxygen containing plasma.

(10) The film densification process is controlled by means of masking technology as shown in FIG. 1, where zone and correspond to the mask shadowed and un-shadowed areas, respectively. This process is described by Eq. (1),

(11) $\begin{array}{cc}P=P_{}+P_{}=\frac{1}{2}\left(\frac{}{n_{s}f}+\frac{}{R}\right)J_i\sqrt{2m_{i}e{V}_b}& \left(1\right)\end{array}$
where P.sub. represents in-situ plasma smoothing, P.sub. corresponds to plasma ion-assisted deposition. V.sub.b is the bias voltage, J.sub.i and m.sub.i are the plasma ion flux in ion/(cm.sup.2 sec) and m.sub.i is mass in a.u., respectively. R is the coating deposition rate in nm/sec; e is the electron charge; is a unit conversion factor; n.sub.s is surface atom density in atom/cm.sup.2; and and are the radian of mask shadowed and un-shadowed area of the vapor flux relative to the center of the rotated plate having a rotation frequency of f. Adjustment of the mask shape and height, APS parameters, and plate rotation frequency enables one to separately control the amount of momentum transfer for fluorine depletion and for plasma assisted deposition. Oxygen gas, O.sub.2, is introduced into the deposition system during the modified PIAD process to compensate fluorine loss and obtain MgOMgF2 composited film. In the deposition processes described herein the process parameters that were used are Vb=110 V, /=2/1, O.sub.2 flow rate=6 sccm, Ar flow rate=11 sccm, R=0.25 nm/sec, f=0.4 Hz, and substrate temperature=120 C., where sccm is standard cubic centimeters per minute. The oxygen flow rate is proportional to the deposition rate and the applied bias voltage, and can range from 3 sccm to 25 sccm depending on the deposition rate and bias voltage. It should be noted that in the process described herein a relatively high bias voltage of 110V was employed in the process. In contrast to the present condition, in the deposition of a PIAD MgF.sub.2 film for DUV applications a low bias voltage of approximately 50V is necessary in order to eliminate the amount of fluorine depletion. In the present disclosure, in which a composited MgF.sub.2MgO coating is formed by fluorine depletion of the MgF.sub.2 source material and replacement with oxygen, a high bias voltage is intentionally applied for MgF.sub.2 film modification in an oxygen rich plasma environment in order to form the MgOMgF.sub.2 coating. There are three attributes which lead to an enhanced abrasion resistance of the MgOMgF2 composited film prepared via the modified PIAD process, modified film composition, increased film packing density and smoothed film surface.
(a) Modified Film Composition and Increased Film Packing Density
Based on Eq.(1), the amount of plasma momentum transfer P.sub. applied for film deposition is defined by,

(12) $\begin{array}{cc}{P}_{}=\left(\frac{}{2R}\right)J_i\sqrt{2m_{i}e{V}_b}& \left(2\right)\end{array}$

(13) It has been understood that the refractive index of PIAD modified film, in which the plasma ion-assist densifies and smoothes the coating, is directly correlated to film packing density and film composition. FIG. 2 is a graph of the refractive indices, n, of a 200 nm modified MgOMgF.sub.2 coating as a function of wavelength. A comparison of the refractive index at a wavelength of 2 m, where most reference data is available, can be made for the modified MgOMgF.sub.2 coating versus bulk MgF.sub.2 and MgO. The estimated refractive index of the modified a MgOMgF.sub.2 film disclosed herein is 1.43. The refractive index of MgF.sub.2 and MgO bulk materials at the same wavelength is 1.37 and 1.73, respectively (Handbook of Chemistry and Physics, 48.sup.th ed. (The Chemical Rubber Co., Cleveland, Ohio, 1968) page B-192). To explain the relatively high refractive index of the modified MgOMgF.sub.2 film, there is a need to consider impact of film densification process in an oxygen rich plasma environment.

(14) Looking first at the composition, fluorine depletion typically occurs when plasma interacts with the fluorides (see J. Wang et al, Extended lifetime of fluoride optics, 39.sup.th Bolder Damage Symposium, published as Proceedings of the SPIE 6720, 672011-9 (2009). The amount of fluorine depletion is strongly process dependent. Using a bias voltage of 110 V and a deposition rate of 0.25 nm/sec, it is reasonable to assume a maximum of 10% fluorine is depleted during the MgF.sub.2 modification process which results in the formation of a MgOMgF.sub.2 coating. Within an oxygen rich plasma environment, the depleted fluorine sites are replaced by oxygen, leading to the formation of MgO and resulting in a MgOMgF.sub.2 composited coating. An estimated refractive index of coating consisting of 10% MgO and 90% MgF.sub.2, the material being deposited using MgO and MgF.sub.2 as coating source materials, at a wavelength of 2 is 1.40, which is lower the value of 1.43 for the modified MgOMgF.sub.2 film of the present disclosure in which only MgF.sub.2 is the only metal-containing source material and oxygen is used to convert some of the MgF.sub.2 to MgO. The additional increase in refractive index of the modified MgF.sub.2 film may contribute to the fact that the PIAD process results in a high film packing density which is higher than the MgF.sub.2 bulk material. Similar densification effect has been obtained in SiO.sub.2 film (J. Wang et al, Elastic and plastic relaxation of densified SiO.sub.2 films, Applied Optics Vol. 47(13), pages 189-192 (2008)). In the present disclosure, where oxygen is used in the PIAD process, the modified MgF.sub.2 film or coating is a densified to form a MgOMgF.sub.2 composited coating or film, instead of a pure MgF.sub.2 film or coating.

(15) (b) Smoothed Film Surface

(16) In addition to high film packing density and modified film composition as discussed above, it is also important to realize that a smooth film surface enhances film durability. The plasma momentum transfer P.sub. used for plasma smoothing can be determined by,

(17) $\begin{array}{cc}{P}_{}=\left(\frac{}{2n_{s}f}\right)J_i\sqrt{2m_{i}e{V}_b}& \left(3\right)\end{array}$
where n.sub.s in Eq.(3) is the surface atom density of the deposited film in atom/cm.sup.2. All other parameters are described in Eq.(1). This process is called in-situ plasma smoothing because the plasma successively interacts with the deposited film surface of every 34 atomic layer.

(18) The plasma smoothing effect can be demonstrated by comparing surface features of the modified MgOMgF.sub.2 composited film with a standard pure MgF.sub.2 film derived by PVD. FIGS. 3a and 3b show AFM images of 200 nm MgOMgF.sub.2 composited film deposited by the modified PIAD process (FIG. 3a) and a standard pure MgF.sub.2 film with the same thickness (FIG. 3b). The corresponding surface roughness for FIGS. 3a and 3b is 0.4 nm and 2.4 nm, respectively. The smoothed film structure of FIG. 3a further increases coating durability, especially when it is used as a capping layer.

(19) (c) MgOMgF2 Composited Film as Capping Layer for Durable IR AR Coating

(20) There are many possible applications of the modified MgOMgF.sub.2 composited film for IR optics, especially for IR antireflective coatings where the modified MgOMgF.sub.2 composited film serves as a capping layer, leading to an increased abrasion resistance and environmental durability. For example, the MgOMgF.sub.2 composited film can be used as a capping layer for a LWIR broadband AR application. FIG. 4 plots a reflectance (Rx) at 12 angle of incidence of a LWIR broadband AR coating without the MgOMgF.sub.2 composited capping layer (numeral 30); and with the MgOMgF2 composited capping coating layer (numeral 32). The reflectance of the an optic having the MgOMgF.sub.2 composited capping coating layer is less than 2% in the wavelength range of 7.25 nm to 11.75 nm as shown in FIG. 4. In the wavelength range of 7.5 nm to 11.5 nm the reflectance Rx is less than 1%. In contrast, the reflectance of a coating without the MgOMgF.sub.2 composited capping coating layer is greater than 2% in the same wavelength.

(21) FIG. 5 plots the spectral transmittance Tx (numeral 40) and reflectance Rx_12 (numeral 42) of the LWIR broadband AR coating with the MgOMgF.sub.2 composited layer 30 as a capping layer. The reflectance Rx is less than 2% in the approximate range of 7.25 nm to 11.25 nm, and the transmission Tx is greater than 60% in the same wavelength range. The LWIR broadband AR without the capping layer fails severe abrasion test describe elsewhere herein. The durability of the MgOMgF.sub.2 composited AR coating increases with the use of a 700 nm MgOMgF.sub.2 composited capping layer. A witness sample prepared as described here with a 700 nm MgOMgF.sub.2 composited capping layer passed all severe abrasion tests and environmental tests using MIL-C-48497A.

(22) Thus, the disclosure is directed to an optic having a composited MgOMgF.sub.2 anti-reflective coating thereon suitable for use with infrared radiation having a wavelength in the range of 1 m to 14 m, said coating thickness being variable with said wavelength range, the coating thickness being in the range of 100 nm to 1500 nm. In an embodiment suitable for the 1-3 m infrared wavelength range the coating thickness is in the range of 150 nm to 300 nm. In an embodiment suitable for the 3-5 m infrared wavelength range the coating thickness is in the range of 250 nm to 450 nm. In an embodiment suitable for the 8-13 m infrared wavelength range the coating thickness is in the range of 600 nm to 1500 nm. In an embodiment the coating has a reflectance Rx of less than 2% in the wavelength range of 7.25 nm to 11.75 nm. In another embodiment the coating has a reflectance of less than 1% in the wavelength range of 7.5 nm to 11.5 nm. In a further embodiment the coated optic has a transmission of greater than 60% in the wavelength range of 7.5 nm to 11.5 nm. In an additional embodiment the coating on the coated optic passes an abrasion test with a barring force between 2 and 2.5 lbs.

(23) The disclosure is further directed to a method of depositing a thin film of a selected material on the surface of a substrate using plasma ion assisted deposition, the method having the steps of:

(24) providing a vacuum chamber and within said chamber:

(25) providing a substrate on which a coating is to be deposited;

(26) providing at a MgF.sub.2 material source and vaporizing said material using an e-beam to provide a coating material vapor flux, said flux passing from said material source through a reversed mask to said substrate;

(27) providing plasma ions contain oxygen ion within said plasma from a plasma source;

(28) rotating said substrate at a selected rotation frequency f; and

(29) depositing said coating material on said substrate as a coating film and bombarding said substrate and said film with said plasma ions before and during said material depositions;

(30) wherein the method forms a smooth, dense uniform composited MgOMgF.sub.2 coating.

(31) In the method the coating is deposited to a thickness in the range of 100 nm to 1500 nm. For use in the 1-3 m wave range the coating is deposited to a thickness in the range of 150 nm to 300 nm. For use in the 3-5 m wavelength range the coating is deposited to a thickness in the range of 250 nm to 450 nm. For use in the 8-13 m wavelength range the coating is deposited to a thickness in the range of 600 nm to 1500 nm.