PLASMONIC SENSOR

Abstract

A plasmonic sensor includes at least a substrate and a thin film metallic glass formed on the substrate. The dielectric constant (.sub.r) of the thin film metallic glass is negative. Since the thin film metallic glass with negative .sub.r is used in the plasmonic sensor, the material cost can be significantly reduced, the mechanical property can be improved, and the optoelectronic property can be increased. Since the thin film metallic glass is a kind of supercooled alloy with amorphous structure, it can be applied for imprinting deformation and amorphous without grain boundary scattering.

Claims

1. A plasmonic sensor, comprising: a substrate; and a thin film metallic glass, formed on the substrate, wherein a dielectric constant (.sub.r) of the thin film metallic glass is negative.

2. The plasmonic sensor according to claim 1, wherein the thin film metallic glass is selected from the group consisting of: Au-based metallic glass, Cu-based metallic glass, Ag-based metallic glass, or Pt-based metallic glass.

3. The plasmonic sensor according to claim 2, wherein the Au-based metallic glass comprises 3-80 at. % Au, 10-60 at. % Cu, and 5-40 at. % Si.

4. The plasmonic sensor according to claim 1, wherein a thickness of the thin film metallic glass is 10 nm to 10,000 nm.

5. The plasmonic sensor according to claim 1, wherein the substrate comprises glass substrate, silicon substrate, sapphire substrate, metal substrate, or flexible substrate.

6. The plasmonic sensor according to claim 1, wherein the thin film metallic glass is an imprinted film consisting of a plurality of patterns, and the patterns are arranged periodically or randomly.

7. The plasmonic sensor according to claim 6, wherein each of the patterns is extruded from a bottom surface of the imprinted film.

8. The plasmonic sensor according to claim 6, wherein each of the patterns is intruded into a top surface of the imprinted film.

9. The plasmonic sensor according to claim 6, wherein each of the patterns has a nano-scale size or a micro-scale size.

10. The plasmonic sensor according to claim 1 comprises a propagating surface plasmon resonance (PSPR) sensor or a localized surface plasmon resonances (LSPR) sensor.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0019] The accompanying drawings are included to provide a further understanding of the invention, and are incorporated in and constitute a part of this specification. The drawings illustrate embodiments of the invention and, together with the description, serve to explain the principles of the invention.

[0020] FIG. 1 is a cross-sectional schematic diagram of a plasmonic sensor according to an embodiment of the invention.

[0021] FIG. 2 is a cross-sectional schematic diagram of a plasmonic sensor according to another embodiment of the invention.

[0022] FIG. 3A is an X-ray Diffraction (XRD) spectrum of Preparation (R55).

[0023] FIG. 3B is an XRD spectrums of R30, R40, R50, and R55.

[0024] FIG. 4 shows curves illustrating the real part of dielectric constant (.sub.r) of Preparation, Comparative Preparation 1 and Comparative Preparation 2, respectively.

[0025] FIG. 5 shows curves illustrating the imaginary part of dielectric constant (.sub.i) of Preparation, Comparative Preparation 1 and Comparative Preparation 2, respectively.

[0026] FIG. 6A is a cross-sectional schematic diagram of an instrument set-up for PSPR of Example 1.

[0027] FIG. 6B is a cross-sectional schematic diagram of the instrument of FIG. 6A during PSPR measurement.

[0028] FIG. 7 shows a PSPR analysis for H.sub.2O and C.sub.2H.sub.5OH according to Example 1 and Comparative Example 1.

[0029] FIG. 8 is a cross-sectional schematic diagram of imprinting process for SCLR of Example 2.

[0030] FIG. 9A shows six SEM images of the imprinted films consisting of patterns with different shapes and sizes, respectively.

[0031] FIG. 9B shows a SEM image of the film consisting of patterns by capillary effect.

[0032] FIG. 10 shows curves illustrating Raman spectra of p-aminothiolphenol (p-ATP) according to Example 1, Example 2 and Comparative Example 2.

DESCRIPTION OF THE EMBODIMENTS

[0033] Embodiments are provided hereinafter and described in detail with reference to figures. However, the embodiments provided are not intended to limit the scope of the invention. Moreover, the figures are only descriptive and are not drawn to scale. For ease of explanation, the same devices below are provided with the same reference numerals.

[0034] Moreover, terms such as first and second used herein do not represent order, and it should be understood that they are only for differentiating devices or operations having the same technical terms.

[0035] Moreover, terms such as contain, include and have used in the present specification are all open terms, i.e., contains but not limited to.

[0036] FIG. 1 is a cross-sectional schematic diagram of a plasmonic sensor according to an embodiment of the invention.

[0037] Referring to FIG. 1, a plasmonic sensor includes at least a substrate 100 and a thin film metallic glass 102 formed on the substrate 100. The dielectric constant (c,.) of the thin film metallic glass 102 is negative. In the embodiment, the thin film metallic glass 102 is selected from the group consisting of: Au-based metallic glass, Cu-based metallic glass, Ag-based metallic glass, or Pt-based metallic glass, for instance. Accordingly, the plasmonic sensor of FIG. 1 may be applied to be a propagating surface plasmon resonance (PSPR) sensor. In one embodiment, the Au-based metallic glass, for instance, includes 3-80 atomic percent (at. %) Au, 10-60 at. % Cu, and 5-40 at. % Si.

[0038] In FIG. 1, the thin film metallic glass 102 has, for example, a thickness of 10 nm to 10,000 nm, but it is not limited thereto. In other embodiments, the thickness of the thin film metallic glass 102 may be more than 10 nm so as to apply for different plasmonic sensors. The substrate 100 includes, for example, glass substrate, silicon substrate, sapphire substrate, metal substrate, or flexible substrate. Since the thin film metallic glass 102 has a glass transition temperature (T.sub.g) less than certain degree, the substrate 100 can be the flexible substrate made of thermoplastic or thermoset material. For example, the Au-based metallic glass has about 60 C. of T.sub.g, and others may have about 300 C. of T.sub.g.

[0039] FIG. 2 is a cross-sectional schematic diagram of a plasmonic sensor according to another embodiment of the invention.

[0040] Referring to FIG. 2, a plasmonic sensor includes at least a substrate 200 and a thin film metallic glass 202 formed on the substrate 200. The dielectric constant (.sub.r) of the thin film metallic glass 202 is negative, and a material or a thickness thereof can refer to that in above embodiment. Moreover, the thin film metallic glass 202 is an imprinted film consisting of a plurality of patterns 204 arranged periodically, and thus the plasmonic sensor of FIG. 1 may be applied to be a localized surface plasmon resonances (LSPR) sensor. However, the invention is not limited thereto. In other embodiment, the patterns 204 may be arranged randomly. Each of the patterns 204 is extruded from a bottom surface of the thin film metallic glass 202, wherein the bottom surface is in direct contact with the substrate 200. For the LSPR sensor, the resonance excited by the electromagnetic wave interacting with the subwavelength structures is the key factor for detecting the change in the refractive index of the surrounding medium. Therefore, the thin film metallic glass 202, a kind of supercooled alloy with amorphous structure, can be applied for imprinting deformation because of their smooth surfaces and viscous flow behavior in the supercooled liquid region.

[0041] In FIG. 2, the cross-section of each pattern 204 is rectangular. However, from top view, each of the patterns 204 is, for example, a rectangular shape, a triangular shape, a circular shape, a rhombic shape, an elliptical shape, a hexagonal shape, or an octagonal shape. In other embodiments, the cross-section of each pattern 204 may be semicircular, wave-shaped, or trapezoidal, and it is not limited to rectangular. Each of the patterns 204 preferably has a size S with nanoscale, e.g. 10-100 nm; alternatively, the size S may be microscale, e.g. 0.1-10 m. Moreover, since the patterns 204 are generally formed by imprinting, it is possible to keep a little metallic glass (not shown) among those patterns 204.

[0042] In order to verify the effect of this invention, please refer to following describes examples. However, the scope of this invention is not limited to the following examples.

[0043] Analysis Techniques

[0044] 1. X-ray Diffraction (XRD) for crystal structure.

[0045] 2. Transmission Electron Microscope (TEM) for crystal structure.

[0046] 3. Spectroscopic Ellipsometer (J.A. Woolam Co, M2000 ELLIPSOMTER) for dielectric function.

[0047] 4. Scanning Electron Microscope (SEM) for microscope structure.

[0048] 5. Raman Spectrometer for Raman spectrum.

[0049] Preparation

[0050] A thin film metallic glass with thickness of 50 nm was prepared by the co-sputtering process on BK7 (n=1.5168) glass substrate. The co-sputtering process is performed by using a gold (Au) target and a CuSi target, and the temperature of substrates keeping under 15 C. The resulting thin film metallic glass are Au.sub.35Cu.sub.28Si.sub.37, Au.sub.49Cu.sub.22Si.sub.29, Au.sub.61Cu.sub.19Si.sub.20, and Au.sub.65Cu.sub.17Si.sub.17 represented by R30, R40, R50 and R55, respectively.

[0051] The XRD spectrum of R55 is shown in FIG. 3A, and the diffraction pattern of TEM is inset in the upper-right of FIG. 3A. No obvious crystalline peaks were observed in the spectrum and the broad peak at 40 supported the formation of amorphous structure of the film.

[0052] The amorphous structure was further confirmed by TEM in the upper-right of FIG. 3A. The diffused halo rings in the diffraction pattern in the inset provided the strong evidence for the formation of fully amorphous structure. In the absence of grain boundaries in the amorphous structure, grain boundary scattering of the light does not occur.

[0053] The XRD spectrum of R30, R40, R50, and R55 is shown in FIG. 3B. No obvious crystalline peaks were observed in the spectrum and the broad peak at 40 supported the formation of amorphous structure of the film.

[0054] Comparative Preparation 1

[0055] A gold (Au) thin film was formed on BK7 (n=1.5168) glass substrate.

[0056] Comparative Preparation 2

[0057] A silver (Ag) thin film was formed on BK7 (n=1.5168) glass substrate.

[0058] Detection for Dielectric Function

[0059] For plasmonic sensors, the desired resonance wavelength supporting the strong surface plasmon is a critical issue. The ability of a metal to produce the surface plasmon is dependent on its dielectric properties, which represent the physical interaction between its orbital electrons and the light and has a real part of dielectric constant (.sub.r) and an imaginary part of dielectric constant (.sub.i) varying with excitation wavelength ().

[0060] To obtain the dielectric function of the Preparation, the spectroscopic ellipsometer is utilized to measure the real part (.sub.r) and the imaginary part (.sub.i). FIG. 4 shows curves illustrating the real part of dielectric constant (.sub.r) of Preparation, Comparative Preparation 1 and Comparative Preparation 2, respectively. In general, the real part (.sub.r) is regarded as a dielectric constant of a material.

[0061] In FIG. 4, Comparative Preparation 1 (Au) and Comparative Preparation 2 (Ag) show negative .sub.r and small.sub.i for the small loss during the light interaction, where the dielectric property of Ag and Au are the most popular and conventional metals to produce sufficiently strong LSPR and PSPR for plasmonic applications.

[0062] By contrast, the Preparation (R30, R40, R50, and R55) also has the excellent dielectric function as shown in FIG. 4. It can be seen that the real part of dielectric function (.sub.r) is negative and smaller than those of Comparative Preparation 1 (Au) and Comparative Preparation 2 (Ag) for the wavelength smaller than 800 nm.

[0063] FIG. 5 shows curves illustrating the imaginary part of dielectric constant (.sub.i) of Preparation, Comparative Preparation 1 and Comparative Preparation 2, respectively. In FIG. 5, the imaginary part (.sub.i) of dielectric function is larger than those of Comparative Preparation 1 and Comparative Preparation 2.

EXAMPLE 1

[0064] The thin film metallic glass (TFMG) and the BK7 glass substrate of the Preparation (R55) were attached to a BK7 prism with index matching oil (n=1.51500.0002) for PSPR of Example 1 as shown in FIG. 6A. The BK7 prism is used as a spectroscope; however, the invention is not limited thereto. The prism may be replaced by semicircular in other embodiments.

[0065] FIG. 6B is a cross-sectional schematic diagram of the instrument of FIG. 6A during PSPR measurement. In detail, de-ionized water (H.sub.2O) and ethyl alcohol (C.sub.2H.sub.5OH) with refractive indexes of 1.333 and 1.361, respectively, were used as analytes in a container for the PSPR measurement. A polarized incident light with wavelength from 370 to 1690 nm was illuminated through the prism onto the TFMG. The prism, the TFMG, and the container were fixed on the stage. The reflectance of Example 1 and Comparative Example 1 was measured by the spectroscopic ellipsometer with angle of incident from 45 to 85, and the results were shown in FIG. 7.

COMPARATIVE EXAMPLE 1

[0066] The gold (Au) film and the glass substrate of Comparative Preparation 1 were attached to a BK7 prism with the index matching oil, and then the PSPR measurement was performed as FIG. 6B. The result is also shown in FIG. 7.

[0067] In FIG. 7, the SPR angle, at which the reflectance in p-direction is minimal in the reflectance intensity versus incident angle curve, shifts with different analytes, as shown in FIG. 6B. The shift angle, .sub.SPR, of Comparative Example 1 (Au) and Example 1 (TFMG) for the incident wavelength of 850 nm were 5 and 4, respectively, as the analyte was switched from de-ionized water to ethyl alcohol. Therefore, it is concluded that the TFMG is good plasmonic materials for PSPR sensors.

EXAMPLE 2

[0068] The patterns with nanoscale on the surface of the TFMG of Example 1 were fabricated by embossing the stamper onto the TFMG within SCLR as shown in FIG. 8. The size of each patterns is able to as large as stamper. Then, the stamper was retreated when the temperature decreased to below 0.8 T.sub.g. According to this method, nano-structured patterns with different shapes and sizes could be fabricated, as shown in the SEM images of FIGS. 9A and 9B, respectively. Each of the patterns in FIG. 9A is intruded into the top surface of the imprinted film, while the patterns in FIG. 9B are extruded from the bottom surface of the imprinted film due to capillary effect.

COMPARATIVE EXAMPLE 2

[0069] A gold film (40 nm in thickness) was coated on the top of a nano-structured Si substrate. The nano-structured Si substrate has the same size as the patterns of Example 2.

[0070] For Raman spectroscopy, the self-assembled molecule of p-aminothiolphenol (p-ATP) was selected as the analyte to ensure the monolayer adsorption of molecules on the surface of the nano-structure. The imprinted sample was soaked in the 10.sup.3 M p-ATP dilute solution for 12 hours. The corresponding Raman spectrum is shown in FIG. 10.

[0071] Similar to Comparative Example 2 (Au patterns), Example 2 (imprinted TFMG) is able to reveal characteristic peaks of analyte effectively. On the other hand, there is no obvious peak in the spectrum for Example 1, and it provides a strong evidence that imprinted TFMG with nano-structured patterns has great Raman enhancement effects. Compared with Comparative Example 2, the vibrational characteristic peaks of the analyte for Example 2 were much more distinguishable, and the process for Example 2 is much more efficient and easier. The TFMG is amorphous, and grain boundary scattering does not occur. In addition, because Au is only coated on the top of the Si substrate in Comparative Example 2, the incomplete coverage of Si by Au on the side-surface would result in a strong vibrational signal of Si at 900 cm.sup.1 (as shown in FIG. 10), which may overlap the signals of analyte and decrease the accuracy of sensing.

[0072] Based on the above, the invention provides a thin film metallic glass with negative dielectric constant, and thus it is suitable for plasmonic sensor applications, including propagating surface plasmon resonance (PSPR) sensors and localized surface plasmon resonances (LSPR) sensors. Accordingly, the plasmonic sensor according to the invention is useful in a wide variety of applications, including but not limited to energy absorption, biomedical sensing, light harvest collection, thermal management, chemical detection, and photocatalyst applications.

[0073] Although the invention has been described with reference to the above embodiments, it will be apparent to one of ordinary skill in the art that modifications to the described embodiments may be made without departing from the spirit of the invention. Accordingly, the scope of the invention is defined by the attached claims not by the above detailed descriptions.