Solar cell

Abstract

A solar cell has a condenser lens and a solar cell element, the solar cell element including an n-type InGaAs layer, an n-type GaAs layer, an n-type InGaP layer, the first InGaAs peripheral part having a thickness (d2), and a width (w2), the second InGaAs peripheral part having a thickness (d3), and a width (w3), the first GaAs peripheral part having a thickness (d5), and a width (w4), the second GaAs peripheral part a thickness (d6), and a width (w5), the first InGaP peripheral part having a thickness (d8), and a width (w6), the second InGaP peripheral part having a thickness (d9), and a width (w7), the following inequation set being satisfied: 1 nm(d2, d3, d5, and d6)4 nm, 1 nm(d8 and d9)5 nm, 100 nm(w2, w3, w4, w5, w6, and w7), the InGaAs center part having a thickness (w1), a window layer has a range S irradiated by sunlight having a width (w8); w8w1.

Claims

1. A method for generating an electric power using a solar cell, the method comprising: (a) preparing the solar cell comprising a condenser lens and a solar cell element; wherein the solar cell element comprises an n-type InGaAs layer, a p-type InGaAs layer, an n-type GaAs layer, a p-type GaAs layer-, an n-type InGaP layer, a p-type InGaP layer, a first tunnel junction layer, a second tunnel junction layer, a window layer, an n-side electrode, and a p-side electrode; Z direction is a normal line direction of the p-type InGaAs layer; X direction is perpendicular to the Z direction; the n-type InGaAs layer, the p-type InGaAs layer, the first tunnel junction layer, the n-type GaAs layer, the p-type GaAs layer, the second tunnel junction layer, the n-type InGaP layer, the p-type InGaP layer, and the window layer are stacked in this order along the Z direction; the n-side electrode is connected electrically to the n-type InGaAs layer; the p-side electrode is connected electrically to the p-type InGaP layer; the n-type InGaAs layer is divided into an InGaAs center part, a first InGaAs peripheral part, and a second InGaAs peripheral part; the InGaAs center part is interposed between the first InGaAs peripheral part and the second InGaAs peripheral part along the X direction; the first InGaAs peripheral part and the second InGaAs peripheral part have a shape of a layer; the n-type GaAs layer is divided into a GaAs center part, a first GaAs peripheral part, and a second GaAs peripheral part; the GaAs center part is interposed between the first GaAs peripheral part and the second GaAs peripheral part along the X direction; the first GaAs peripheral part and the second GaAs peripheral part have a shape of a layer; the n-type InGaP layer is divided into an InGaP center part, a first InGaP peripheral part, and a second InGaP peripheral part; the InGaP center part is interposed between the first InGaP peripheral part and the second InGaP peripheral part along the X direction; the first InGaP peripheral part and the second InGaP peripheral part have a shape of a layer; the following inequation set (I) is satisfied; (I) d2<d1, d3<d1, 1 nanometerd24 nanometers, 1 nanometerd34 nanometers, d5<d4, d6<d4, 1 nanometerd54 nanometers, 1 nanometerd64 nanometers, d8<d7, d9<d7, 1 nanometerd85 nanometers, 1 nanometerd95 nanometers, 100 nanometersw2, 100 nanometersw3, 100 nanometersw4, 100 nanometersw5, 100 nanometersw6, and 100 nanometersw7 d1 represents a thickness of the InGaAs center part along the Z direction; d2 represents a thickness of the first InGaAs peripheral part along the Z direction; d3 represents a thickness of the second InGaAs peripheral part along the Z direction; d4 represents a thickness of the GaAs center part along the Z direction; d5 represents a thickness of the first GaAs peripheral part along the Z direction; d6 represents a thickness of the second GaAs peripheral part along the Z direction; d7 represents a thickness of the InGaP center part along the Z direction; d8 represents a thickness of the first InGaP peripheral part along the Z direction; d9 represents a thickness of the second InGaP peripheral part along the Z direction; w2 represents a width of the first InGaAs peripheral part along the X direction; w3 represents a width of the second InGaAs peripheral part along the X direction; w4 represents a width of the first GaAs peripheral part along the X direction, w5 represents a width of the second GaAs peripheral part along the X direction; w6 represents a width of the first InGaP peripheral part along the X direction; and w7 represents a width of the second InGaP peripheral part along the X direction; (b) irradiating a region S which is included in the surface of the window layer through the condenser lens with light in such a manner that the following inequation (II) is satisfied so as to generate a voltage difference between the n-side electrode and the p-side electrode; w8w1 (II) where, w1 represents a width of the InGaAs center part along the X direction; w8 represents a width of the range S along the X direction when viewed in the cross-sectional view which includes the Z direction; and the first center part overlaps the region S when viewed from the Z-direction.

2. The method according to claim 1, wherein the following equation is satisfied:
w1+w2+w3+w4+w5+w6+w7=w8+w9+w10 where, w9 and the width w10 represent widths of portions of the window layer which are not irradiated with the light.

3. The method according to claim 1, wherein sides of the n-type InGaAs layer, the p-type InGaAs layer, the first tunnel junction layer, the n-type GaAs layer, the p-type GaAs layer, the second tunnel junction layer, the n-type InGaP layer, the p-type InGaP layer and the p-type window layer are covered with an insulation layer.

4. A solar cell comprising a condenser lens and a solar cell element, wherein the solar cell element comprises an n-type InGaAs layer, a p-type InGaAs layer, an n-type GaAs layer, a p-type GaAs layer, an n-type InGaP layer, a p-type InGaP layer, a first tunnel junction layer, a second tunnel junction layer, a window layer, an n-side electrode, and a p-side electrode; Z direction is a normal line direction of the p-type InGaAs layer; X direction is perpendicular to the Z direction; the n-type InGaAs layer, the p-type InGaAs layer, the first tunnel junction layer, the n-type GaAs layer, the p-type GaAs layer, the second tunnel junction layer, the n-type InGaP layer, the p-type InGaP layer, and the window layer are stacked in this order along the Z direction; the n-side electrode is connected electrically to the n-type InGaAs layer; the p-side electrode is connected electrically to the p-type InGaP layer; the n-type InGaAs layer is divided into an InGaAs center part, a first InGaAs peripheral part, and a second InGaAs peripheral part; the InGaAs center part is interposed between the first InGaAs peripheral part and the second InGaAs peripheral part along the X direction; the first InGaAs peripheral part and the second InGaAs peripheral part have a shape of a layer; the n-type GaAs layer is divided into a GaAs center part, a first GaAs peripheral part, and a second GaAs peripheral part; the GaAs center part is interposed between the first GaAs peripheral part and the second GaAs peripheral part along the X direction; the first GaAs peripheral part and the second GaAs peripheral part have a shape of a layer; the n-type InGaP layer is divided into an InGaP center part, a first InGaP peripheral part, and a second InGaP peripheral part; the InGaP center part is interposed between the first InGaP peripheral part and the second InGaP peripheral part along the X direction; the first InGaP peripheral part and the second InGaP peripheral part have a shape of a layer; the following inequation set (I) is satisfied; (I) d2<d1, d3<d1, 1 nanometerd24 nanometers, 1 nanometerd34 nanometers, d5<d4, d6<d4, 1 nanometerd54 nanometers, 1 nanometerd64 nanometers, d8<d7, d9<d7, 1 nanometerd85 nanometers, 1 nanometerd95 nanometers, 100 nanometersw2, 100 nanometersw3, 100 nanometersw4, 100 nanometersw5, 100 nanometersw6, and 100 nanometersw7 d1 represents a thickness of the InGaAs center part along the Z direction; d2 represents a thickness of the first InGaAs peripheral part along the Z direction; d3 represents a thickness of the second InGaAs peripheral part along the Z direction; d4 represents a thickness of the GaAs center part along the Z direction; d5 represents a thickness of the first GaAs peripheral part along the Z direction; d6 represents a thickness of the second GaAs peripheral part along the Z direction; d7 represents a thickness of the InGaP center part along the Z direction; d8 represents a thickness of the first InGaP peripheral part along the Z direction; d9 represents a thickness of the second InGaP peripheral part along the Z direction; w2 represents a width of the first InGaAs peripheral part along the X direction; w3 represents a width of the second InGaAs peripheral part along the X direction; w4 represents a width of the first GaAs peripheral part along the X direction, w5 represents a width of the second GaAs peripheral part along the X direction; w6 represents a width of the first InGaP peripheral part along the X direction; and w7 represents a width of the second InGaP peripheral part along the X direction.

Description

BRIEF DESCRIPTION OF DRAWINGS

(1) The present disclosure will become readily understood from the following description of non-limiting and exemplary embodiments thereof made with reference to the accompanying drawings, in which like parts are designated by like reference numeral and in which:

(2) FIG. 1A shows a cross-sectional view of the solar cell according to the embodiment;

(3) FIG. 1B shows a cross-sectional view of the solar cell element according to the embodiment;

(4) FIG. 2 shows an enlarged cross-sectional view of the solar cell element according to the embodiment;

(5) FIG. 3A shows one step included in the method for fabricating a solar cell element according to the embodiment;

(6) FIG. 3B shows one step included in the method for fabricating a solar cell element according to the embodiment, subsequently to FIG. 3A;

(7) FIG. 3C shows one step included in the method for fabricating a solar cell element according to the embodiment, subsequently to FIG. 3B;

(8) FIG. 3D shows one step included in the method for fabricating a solar cell element according to the embodiment, subsequently to FIG. 3C;

(9) FIG. 3E shows one step included in the method for fabricating a solar cell element according to the embodiment, subsequently to FIG. 3D;

(10) FIG. 4A shows one step included in the method for fabricating a solar cell element according to the embodiment, subsequently to FIG. 3E;

(11) FIG. 4B shows one step included in the method for fabricating a solar cell element according to the embodiment, subsequently to FIG. 4A;

(12) FIG. 4C shows one step included in the method for fabricating a solar cell element according to the embodiment, subsequently to FIG. 4B;

(13) FIG. 4D shows one step included in the method for fabricating a solar cell element according to the embodiment, subsequently to FIG. 4C;

(14) FIG. 5 shows a cross-sectional view of the solar cell element according to the embodiment;

(15) FIG. 6 shows a cross-sectional view of the solar cell element according to the comparative example 1;

(16) FIG. 7 shows a cross-sectional view of the solar cell disclosed in Patent Literature 1 (Japanese Patent Laid-Open Publication No. 2008-124381);

(17) FIG. 8 shows a cross-sectional view of the solar cell disclosed in Patent Literature 2 (Japanese Patent Laid-Open Publication No. 2010-010704).

DETAILED DESCRIPTION

(18) According to a first aspect, a method for generating an electric power using a solar cell, the method includes:

(19) (a) preparing the solar cell comprising a condenser lens 101 and a solar cell element 102;

(20) wherein the solar cell element 102 comprises an n-type InGaAs layer 104, a p-type InGaAs layer 103, an n-type GaAs layer 106, a p-type GaAs layer 105, an n-type InGaP layer 108, a p-type InGaP layer 107, a first tunnel junction layer 110, a second tunnel junction layer 111, a window layer 109, an n-side electrode 120, and a p-side electrode 121;

(21) Z direction is a normal line direction of the p-type InGaAs layer 103;

(22) X direction is perpendicular to the Z direction;

(23) the n-type InGaAs layer 104, the p-type InGaAs layer 103, the first tunnel junction layer 110, the n-type GaAs layer 106, the p-type GaAs layer 105, the second tunnel junction layer 111, the n-type InGaP layer 108, the p-type InGaP layer 107, and the window layer 109 are stacked in this order along the Z direction;

(24) the n-side electrode 120 is connected electrically to the n-type InGaAs layer 104;

(25) the p-side electrode 121 is connected electrically to the p-type InGaP layer 107;

(26) the n-type InGaAs layer 104 is divided into an InGaAs center part 104a, a first InGaAs peripheral part 104b, and a second InGaAs peripheral part 104c; the InGaAs center part 104a is interposed between the first InGaAs peripheral part 104b and the second InGaAs peripheral part 104c along the X direction;

(27) the first InGaAs peripheral part 104b and the second InGaAs peripheral part 104c have a shape of a layer;

(28) the n-type GaAs layer 106 is divided into a GaAs center part 106a, a first GaAs peripheral part 106b, and a second GaAs peripheral part 106c;

(29) the GaAs center part 106a is interposed between the first GaAs peripheral part 106b and the second GaAs peripheral part 106c along the X direction;

(30) the first GaAs peripheral part 106b and the second GaAs peripheral part 106c have a shape of a layer;

(31) the n-type InGaP layer 108 is divided into an InGaP center part 108a, a first InGaP peripheral part 108b, and a second InGaP peripheral part 108c;

(32) the InGaP center part 108a is interposed between the first InGaP peripheral part 108b and the second InGaP peripheral part 108c along the X direction;

(33) the first InGaP peripheral part 108b and the second InGaP peripheral part 108c have a shape of a layer;

(34) the following inequation set (I) is satisfied;

(35) (I)

(36) d2<d1,

(37) d3<d1,

(38) 1 nanometerd24 nanometers,

(39) 1 nanometerd34 nanometers,

(40) d5<d4,

(41) d6<d4,

(42) 1 nanometerd54 nanometers,

(43) 1 nanometerd64 nanometers,

(44) d8<d7,

(45) d9<d7,

(46) 1 nanometerd85 nanometers,

(47) 1 nanometerd95 nanometers,

(48) 100 nanometersw2,

(49) 100 nanometersw3,

(50) 100 nanometersw4,

(51) 100 nanometersw5,

(52) 100 nanometersw6, and

(53) 100 nanometersw7

(54) d1 represents a thickness of the InGaAs center part 104a along the Z direction;

(55) d2 represents a thickness of the first InGaAs peripheral part 104b along the Z direction;

(56) d3 represents a thickness of the second InGaAs peripheral part 104c along the Z direction;

(57) d4 represents a thickness of the GaAs center part 106a along the Z direction;

(58) d5 represents a thickness of the first GaAs peripheral part 106b along the Z direction;

(59) d6 represents a thickness of the second GaAs peripheral part 106c along the Z direction;

(60) d7 represents a thickness of the InGaP center part 108a along the Z direction;

(61) d8 represents a thickness of the first InGaP peripheral part 108b along the Z direction;

(62) d9 represents a thickness of the second InGaP peripheral part 108c along the Z direction;

(63) w2 represents a width of the first InGaAs peripheral part 104b along the X direction;

(64) w3 represents a width of the second InGaAs peripheral part 104c along the X direction;

(65) w4 represents a width of the first GaAs peripheral part 106b along the X direction,

(66) w5 represents a width of the second GaAs peripheral part 106c along the X direction;

(67) w6 represents a width of the first InGaP peripheral part 108b along the X direction;

(68) w7 represents a width of the second InGaP peripheral part 108c along the X direction;

(69) (b) irradiating a region S which is included in the surface of the window layer 109 through the condenser lens 101 with light in such a manner that the following inequation (II) is satisfied so as to generate a voltage difference between the n-side electrode 120 and the p-side electrode 121;

(70) w8w1 (II)

(71) where, w1 represents a width of the InGaAs center part 104a along the X direction;

(72) w8 represents a width of the range S along the X direction when viewed in the cross-sectional view which includes the Z direction; and the first center part 104a overlaps the region S when viewed from the Z-direction.

(73) Further, as a method of a second aspect, in the first aspect, the following equation is satisfied:
w1+w2+w3+w4+w5+w6+w7=w8+w9+w10

(74) where, w9 and the width w10 represent widths of portions of the window layer 109 which are not irradiated with the light.

(75) Further, as a method of a third aspect, in the first aspect, sides of the n-type InGaAs layer 104, the p-type InGaAs layer 103, the first tunnel junction layer 110, the n-type GaAs layer 106, the p-type GaAs layer 105, the second tunnel junction layer 111, the n-type InGaP layer 108, the p-type InGaP layer 107 and the p-type window layer 109 are covered with an insulation layer 121.

(76) According to a fourth aspect, a solar cell includes a condenser lens 101 and a solar cell element 102,

(77) wherein the solar cell element 102 includes an n-type InGaAs layer 104, a p-type InGaAs layer 103, an n-type GaAs layer 106, a p-type GaAs layer 105, an n-type InGaP layer 108, a p-type InGaP layer 107, a first tunnel junction layer 110, a second tunnel junction layer 111, a window layer 109, an n-side electrode 120, and a p-side electrode 121;

(78) Z direction is a normal line direction of the p-type InGaAs layer 103;

(79) X direction is perpendicular to the Z direction;

(80) the n-type InGaAs layer 104, the p-type InGaAs layer 103, the first tunnel junction layer 110, the n-type GaAs layer 106, the p-type GaAs layer 105, the second tunnel junction layer 111, the n-type InGaP layer 108, the p-type InGaP layer 107, and the window layer 109 are stacked in this order along the Z direction;

(81) the n-side electrode 120 is connected electrically to the n-type InGaAs layer 104;

(82) the p-side electrode 121 is connected electrically to the p-type InGaP layer 107;

(83) the n-type InGaAs layer 104 is divided into an InGaAs center part 104a, a first InGaAs peripheral part 104b, and a second InGaAs peripheral part 104c;

(84) the InGaAs center part 104a is interposed between the first InGaAs peripheral part 104b and the second InGaAs peripheral part 104c along the X direction;

(85) the first InGaAs peripheral part 104b and the second InGaAs peripheral part 104c have a shape of a layer;

(86) the n-type GaAs layer 106 is divided into a GaAs center part 106a, a first GaAs peripheral part 106b, and a second GaAs peripheral part 106c;

(87) the GaAs center part 106a is interposed between the first GaAs peripheral part 106b and the second GaAs peripheral part 106c along the X direction;

(88) the first GaAs peripheral part 106b and the second GaAs peripheral part 106c have a shape of a layer;

(89) the n-type InGaP layer 108 is divided into an InGaP center part 108a, a first InGaP peripheral part 108b, and a second InGaP peripheral part 108c;

(90) the InGaP center part 108a is interposed between the first InGaP peripheral part 108b and the second InGaP peripheral part 108c along the X direction;

(91) the first InGaP peripheral part 108b and the second InGaP peripheral part 108c have a shape of a layer;

(92) the following inequation set (I) is satisfied;

(93) (I)

(94) d2<d1,

(95) d3<d1,

(96) 1 nanometerd24 nanometers,

(97) 1 nanometerd34 nanometers,

(98) d5<d4,

(99) d6<d4,

(100) 1 nanometerd54 nanometers,

(101) 1 nanometerd64 nanometers,

(102) d8<d7,

(103) d9<d7,

(104) 1 nanometerd85 nanometers,

(105) 1 nanometerd95 nanometers,

(106) 100 nanometersw2,

(107) 100 nanometersw3,

(108) 100 nanometersw4,

(109) 100 nanometersw5,

(110) 100 nanometersw6, and

(111) 100 nanometersw7

(112) d1 represents a thickness of the InGaAs center part 104a along the Z direction;

(113) d2 represents a thickness of the first InGaAs peripheral part 104b along the Z direction;

(114) d3 represents a thickness of the second InGaAs peripheral part 104c along the Z direction;

(115) d4 represents a thickness of the GaAs center part 106a along the Z direction;

(116) d5 represents a thickness of the first GaAs peripheral part 106b along the Z direction;

(117) d6 represents a thickness of the second GaAs peripheral part 106c along the Z direction;

(118) d7 represents a thickness of the InGaP center part 108a along the Z direction;

(119) d8 represents a thickness of the first InGaP peripheral part 108b along the Z direction;

(120) d9 represents a thickness of the second InGaP peripheral part 108c along the Z direction;

(121) w2 represents a width of the first InGaAs peripheral part 104b along the X direction;

(122) w3 represents a width of the second InGaAs peripheral part 104c along the X direction;

(123) w4 represents a width of the first GaAs peripheral part 106b along the X direction,

(124) w5 represents a width of the second GaAs peripheral part 106c along the X direction;

(125) w6 represents a width of the first InGaP peripheral part 108b along the X direction;

(126) w7 represents a width of the second InGaP peripheral part 108c along the X direction.

(127) The embodiment of the present disclosure is described below with reference to the drawings.

Embodiment

(128) (Step (a))

(129) In the step (a), a solar cell is prepared.

(130) FIG. 1A shows a cross-sectional view of the solar cell according to the embodiment. As shown in FIG. 1A, the solar cell comprises a condenser lens 101 and a solar cell element 102.

(131) FIG. 1B shows a cross-sectional view of the solar cell element 102 according to the embodiment. As shown in FIG. 1B, the solar cell element 102 comprises an n-type InGaAs layer 104, a p-type InGaAs layer 103, an n-type GaAs layer 106, a p-type GaAs layer 105, an n-type InGaP layer 108, a p-type InGaP layer 107, a first tunnel junction layer 110, a second tunnel junction layer 111, a window layer 109, an n-side electrode 120, and an p-side electrode 121.

(132) The p-type InGaAs layer 103 is stacked on the n-type InGaAs layer 104. The p-type GaAs layer 105 is stacked on the n-type GaAs layer 106. The p-type InGaP layer 107 is stacked on the n-type InGaP layer 108. The Z direction is a lamination direction. In other words, the Z direction is parallel to a normal line direction of the p-type InGaAs layer 103.

(133) Along the Z direction, the first tunnel junction layer 110 is interposed between the p-type InGaAs layer 103 and the n-type GaAs layer 106. Along the Z direction, the second tunnel junction layer 111 is interposed between the p-type GaAs layer 105 and the n-type InGaP layer 108.

(134) The p-side electrode 121 is electrically connected to the p-type InGaP layer 107. The n-side electrode 120 is electrically connected to the n-type InGaAs layer 104.

(135) Along the Z direction, it is desirable that a first n-type barrier layer 112 and an n-type electric contact layer 118 are interposed between the n-type InGaAs layer 104 and the n-side electrode 120. Along the Z direction, the first n-type barrier layer 112 is interposed between the n-type InGaAs layer 104 and the n-type electric contact layer 118. Along the Z direction, the n-type electric contact layer 118 is interposed between the first n-type barrier layer 112 and the n-side electrode 120.

(136) Along the Z direction, it is desirable that the first p-type barrier layer 113 is interposed between the p-type InGaAs layer 103 and the first tunnel junction layer 110. Along the Z direction, it is desirable that the second n-type barrier layer 114 is interposed between the n-type GaAs layer 106 and the first tunnel junction layer 110.

(137) Along the Z direction, it is desirable that the second p-type barrier layer 115 is interposed between the p-type GaAs layer 105 and the second tunnel junction layer 111. Along the Z direction, it is desirable that the third n-type barrier layer 116 is interposed between the n-type InGaP layer 108 and the second tunnel junction layer 111.

(138) Along the Z direction, it is desirable that a p-type electric contact layer 119 is interposed between the window layer 109 and the p-side electrode 121. The p-side electrode 121, the p-type electric contact layer 119, the window layer 109, the p-type InGaP layer 107, the n-type InGaP layer 108, the third n-type barrier layer 116, the second tunnel junction layer 111, the second p-type barrier layer 115, the p-type GaAs layer 105, the n-type GaAs layer 106, the second n-type barrier layer 114, the first tunnel junction layer 110, the first p-type barrier layer 113, the p-type InGaAs layer 103, the n-type InGaAs layer 104, the first n-type barrier layer 112, the n-type electric contact layer 118, and the n-side electrode 120 are electrically connected serially in this order.

(139) As shown in FIG. 1B, the n-type in GaAs layer 104 is divided into an InGaAs center part 104a, a first InGaAs peripheral part 104b, and a second InGaAs peripheral part 104c. The InGaAs center part 104a is interposed between the first InGaAs peripheral part 104b and the second InGaAs peripheral part 104c along the X direction. The X direction is perpendicular to the Z direction.

(140) As shown in FIG. 1B, the n-type GaAs layer 106 is divided in a GaAs center part 106a, a first GaAs peripheral part 106b, and second GaAs peripheral part 106c. The GaAs center part 106a is interposed between the first GaAs peripheral part 106b and the second GaAs peripheral part 106c along the X direction.

(141) As shown in FIG. 1B, the n-type InGaP layer 108 is divided in a InGaP layer center part 108a, a first InGaP peripheral part 108b, and a second InGaP peripheral part 108c. The InGaP center part 108a is interposed between the first InGaP peripheral part 108b and the second InGaP peripheral part 108c along the X direction.

(142) As shown in FIG. 2, the thickness d1 of the InGaAs center part 104a is greater than the thickness d2 of the first InGaAs peripheral part 104b and than the thickness d3 of the second InGaAs peripheral part 104c. In case where the thickness d1 is identical to the thickness d2 and the thickness d3, the higher photoelectric conversion efficiency is not achieved (See the comparative examples 1 and 2, which are described later).

(143) As shown in FIG. 2, the thickness d4 of the GaAs center part 106a is greater than the thickness d5 of the first GaAs peripheral part 106b and than the thickness d6 of the second GaAs peripheral part 106c. In case where the thickness d4 is identical to the thickness d5 and the thickness d6, the higher photoelectric conversion efficiency is not achieved (See the comparative examples 1 and 2, which are described later).

(144) As shown in FIG. 2, the thickness d7 of the InGaP center part 108a is greater than the thickness d8 of the first InGaP peripheral part 108b and than thickness d9 of the second InGaP peripheral part 108c. In case where the thickness d7 is identical to the thickness d8 and thickness d9, the higher photoelectric conversion efficiency is not achieved (See the comparative examples 1 and 2, which are described later).

(145) The thickness d2 is not less than 1 nanometer and not more than 4 nanometers. In case where the thickness d2 is less than 1 nanometer, the higher photoelectric conversion efficiency is not achieved (See the comparative example 7, which is described later). In case where the thickness d2 is more than 4 nanometers, the higher photoelectric conversion efficiency is not achieved (See the comparative examples 4-6, which are described later). Similarly, the thickness d3 is also not less than 1 nanometer and not more than 4 nanometers.

(146) The thickness d5 is not less than 1 nanometer and not more than 4 nanometers. In case where the thickness d5 is less than 1 nanometer, the higher photoelectric conversion efficiency is not achieved (See the comparative example 11, which is described later). In case where the thickness d5 is more than 4 nanometers, the higher photoelectric conversion efficiency is not achieved (See the comparative examples 8-10, which are described later). Similarly, the thickness d6 is also not less than 1 nanometer and not more than 4 nanometers.

(147) The thickness d8 is not less than 1 nanometer and not more than 5 nanometers.

(148) In case where the thickness d8 is less than 1 nanometer, the higher photoelectric conversion efficiency is not achieved (See the comparative example 14, which is described later). In case where the thickness d8 is more than 5 nanometers, the higher photoelectric conversion efficiency is not achieved (See the comparative examples 12-13, which are described later). Similarly, the thickness d9 is also not less than 1 nanometer and not more than 5 nanometers.

(149) As shown in FIG. 2, the InGaAs center part 104a has a width w1. The first InGaAs peripheral part 104b has a width w2. The second InGaAs peripheral part 104c has a width w3. The value of w2 is not less than 0.1 micrometer. In case where the value of w2 is smaller than 0.1 micrometer, the photoelectric conversion efficiency is decreased (See the comparative example 15, which is described later). For the similarly reason, the value of w3 is not less than 0.1 micrometer.

(150) As shown in FIG. 2, the GaAs center part 106a has a width of (w1+w2+w3). The first GaAs peripheral part 106b has a width w4. The second GaAs peripheral part 106c has a width w5. The value of w4 is not less than 0.1 micrometer. In case where the value of w4 is smaller than 0.1 micrometer, the photoelectric conversion efficiency is decreased (See the comparative example 16, which is described later). For the similarly reason, the value of w5 is not less than 0.1 micrometer.

(151) As shown in FIG. 2, the InGaP center part 108a has a width of (w1+w2+w3+w4+w5). The first InGaP peripheral part 108b has a width w6. The second InGaP peripheral part 108c has a width w7. The value of w6 is not less than 0.1 micrometer. In case where the value of w6 is smaller than 0.1 micrometer, the photoelectric conversion efficiency is decreased (See the comparative example 17, which is described later). For the similarly reason, the value of w7 is not less than 0.1 micrometer.

(152) Accordingly, in the embodiment, it is necessary that the following inequation set (I) is satisfied.

(153) (I)

(154) d2<d1,

(155) d3<d1,

(156) 1 nanometerd24 nanometers,

(157) 1 nanometerd34 nanometers,

(158) d5<d4,

(159) d6<d4,

(160) 1 nanometerd54 nanometers,

(161) 1 nanometerd64 nanometers,

(162) d8<d7,

(163) d9<d7,

(164) 1 nanometerd85 nanometers,

(165) 1 nanometerd95 nanometers,

(166) 100 nanometersw2,

(167) 100 nanometersw3,

(168) 100 nanometersw4,

(169) 100 nanometersw5,

(170) 100 nanometersw6, and

(171) 100 nanometersw7,

(172) As described above, the value of d1 represents the thickness of the InGaAs center part 104a along the Z direction.

(173) The value of d2 represents the thickness of the first InGaAs peripheral part 104b along the Z direction.

(174) The value of d3 represents the thickness of the second InGaAs peripheral part 104c along the Z direction.

(175) The value of d4 represents the thickness of the GaAs center part 106a along the Z direction.

(176) The value of d5 represents the thickness of the first GaAs peripheral part 106b along the Z direction.

(177) The value of d6 represents the thickness of the second GaAs peripheral part 106c along the Z direction.

(178) The value of d7 represents the thickness of the InGaP center part 108a along the Z direction.

(179) The value of d8 represents the thickness of the first InGaP peripheral part 108b along the Z direction.

(180) The value of d9 represents the thickness of the second InGaP peripheral part 108c along the Z direction.

(181) The value of w2 represents the width of the first InGaAs peripheral part 104b along the X direction.

(182) The value of w3 represents the width of the second InGaAs peripheral part 104c along the X direction.

(183) The value of w4 represents the width of the first GaAs peripheral part 106b along the X direction.

(184) The value of w5 represents the width of the second GaAs peripheral part 106c along the X direction.

(185) The value of w6 represents the width of the first InGaP peripheral part 108b along the X direction.

(186) The value of w7 represents the width of the second InGaP peripheral part 108c along the X direction.

(187) The obverse surface of the condenser lens 101 is irradiated with light. This is described in more detail in the step (b), which is described later. Sunlight is desirable.

(188) It is desirable that the reverse surface of the condenser lens 101 is in contact with the solar cell element 102. The light is focused onto the window layer 109 by the condenser lens 101. It is desirable that the condenser lens 101 has a diameter of 2 millimeters-10 millimeters, a thickness of 2 millimeter-10 millimeters, and a refractive index of 1.1-2.0. The material of the condenser lens 101 is not limited. An example of the material of the condenser lens 101 is glass or resin.

(189) The window layer 109 is made of a p-type compound semiconductor having a lattice constant close to that of InGaP and having a wider bandgap than InGaP. An example of the material of the window layer 109 is p-type InAlGaP or p-type InAlP.

(190) The first n-type barrier layer 112 is made of an n-type compound semiconductor having a lattice constant close to that of InGaAs and having a wider bandgap than InGaAs. An example of the material of the first n-type barrier layer 112 is n-type InGaP or n-type InP.

(191) The second n-type barrier layer 114 is made of an n-type compound semiconductor having a lattice constant close to that of GaAs and having a wider bandgap than GaAs. An example of the material of the second n-type barrier layer 114 is n-type InGaP or n-type AlGaAs.

(192) The third n-type barrier layer 116 is made of an n-type compound semiconductor having a lattice constant close to that of InGaP and having a wider bandgap than InGaP. An example of the material of the third n-type barrier layer 116 is n-type InAlGaP or n-type InAlP.

(193) The first p-type barrier layer 113 is made of a p-type compound semiconductor having a lattice constant close to that of InGaAs and having a wider bandgap than InGaAs. An example of the material of the first p-type barrier layer 113 is p-type InGaP or p-type InP.

(194) The second p-type barrier layer 115 is made of a p-type compound semiconductor having a lattice constant close to that of GaAs and having a wider bandgap than GaAs. An example of the material of the second p-type barrier layer 115 is p-type InGaP or p-type AlGaAs.

(195) The first tunnel junction layer 110 is composed of two thin semiconductor layers which form pn-junction. In other words, the first tunnel junction layer 110 is composed of a p-type semiconductor layer (not illustrated) and an n-type semiconductor layer (not illustrated). This p-type semiconductor layer is stacked on this n-type semiconductor layer. These two semiconductor layers are doped at a high concentration. These two semiconductor layers have a lattice constant which is close to that of GaAs. An example of the material of the first tunnel junction layer 110 is GaAs, InGaP, or AlGaAs.

(196) Similarly to the first tunnel junction layer 110, the second tunnel junction layer 111 is also composed of the two thin semiconductor layers which form pn-junction. In other words, the second tunnel junction layer 111 is also composed of a p-type semiconductor layer (not illustrated) and an n-type semiconductor layer (not illustrated). This p-type semiconductor layer is stacked on this n-type semiconductor layer. These two semiconductor layers are doped at a high concentration. These two semiconductor layers have a lattice constant which is close to that of GaAs or InGaP. An example of the material of the second tunnel junction layer 111 is GaAs, InGaP, or AlGaAs.

(197) A buffer layer 117 cancels a lattice mismatch between the p-type InGaAs layer 103 and the n-type GaAs layer 106. An example of the buffer layer 117 is In.sub.1-xGa.sub.xP layer. Here, the value of x gradually decreases from the p-type InGaAs layer 103 toward the n-type GaAs layer 106. As one example, a portion of the buffer layer 117 which is in contact with the p-type InGaAs layer 103 is In.sub.1-xGa.sub.xP layer (x=0.51), whereas a portion of the buffer layer 117 which is in contact with the n-type GaAs layer 106 is In.sub.1-xGa.sub.xP layer (x=0.22).

(198) As long as an ohmic contact is formed in the interface with the window layer 109 and in the interface with the p-side electrode 121, a material of the p-type contact layer 119 is not limited. An example of the material of the p-type electric contact layer 119 is p-type GaAs.

(199) As long as an ohmic contact is formed in the interface with the first n-type barrier layer 112 and in the interface with the n-side electrode 120L, a material of the n-type contact layer 119 is not limited. An example of the material of the n-type electric contact layer 118 is n-type GaAs.

(200) As shown in FIG. 1B, for example, the sides of the layers 103 to 109 are covered with an insulation film 122. An example of the material of the insulation film 122 is non-doped InGaP, silicon dioxide, or silicon nitride.

(201) When the insulation film 122 is used, as shown in FIG. 5, the insulation film 122 is covered with a metal film 131. The metal film 131 improves heat radiation property of the solar cell element 102.

(202) It is desirable that the metal film 131 is electrically connected with the p-side electrode 121 and that the metal film 131 and the n-type electrode 120 are exposed on one surface (in FIG. 5, the bottom surface).

(203) (Method for Fabricating the Solar Cell Element 102)

(204) A method for fabricating the solar cell element 102 is described below with reference to FIGS. 3A-3E and FIGS. 4A-4D.

(205) First, as shown in FIG. 3A, a sacrificial layer 125, the p-type electric contact layer 119, the window layer 109, the p-type InGaP layer 107, the n-type InGaP layer 108, the third n-type barrier layer 116, the second tunnel junction layer 111, the second p-type barrier layer 115, the p-type GaAs layer 105, the n-type GaAs layer 106, the second n-type barrier layer 114, the first tunnel junction layer 110, the buffer layer 117, the first p-type barrier layer 113, the p-type InGaAs layer 103, the n-type InGaAs layer 104, the first n-type barrier layer 112, and the n-type electric contact layer 118 are grown on a surface of a GaAs substrate 124 in this order by a conventional semiconductor growth method such as a molecular beam epitaxy method or a metal organic chemical vapor deposition method (hereinafter, referred to as MOCVD method). The sacrificial layer 125 has a lattice constant which is close to that of GaAs. The sacrificial layer 125 is a layer to be etched selectively with regard to GaAs. An example of the material of the sacrificial layer 125 is AlAs or InGaP.

(206) Then, as shown in FIG. 3B, a first mask 126 is formed on the n-type electric contact layer 118. The first mask 126 has a width identical to the value of w1. Using the first mask 126, an unnecessary portion of the n-type electric contact layer 118 and an unnecessary portion of the first n-type barrier layer 112 are etched. Furthermore, an upper portion of the peripheral part of the n-type in GaAs layer 104 is etched. The etching depth of the n-type in GaAs layer 104 is the same as the thickness of (d1-d3) shown in FIG. 2. For the etching, a gaseous mixture of BCl.sub.3 and SF.sub.6 can be used.

(207) As shown in FIG. 3C, the first mask 126 is removed, and a second mask 127 is formed. The width of the second mask 127 is the same as the value of (w1+w2+w3) shown in FIG. 2. Using the second mask 127, unnecessary portions of the n-type InGaAs layer 104, the p-type InGaAs layer 103, the first p-type barrier layer 113, the first tunnel junction layer 110, and the second n-type barrier layer 114 are etched. Furthermore, the upper portion of the peripheral part of the n-type GaAs layer 106 is etched. The etching depth of the n-type GaAs layer 106 is the same as the thickness of (d4-d5) shown in FIG. 2.

(208) As shown in FIG. 3D, the second mask 127 is removed, and a third mask 128 is 13 formed. The width of the third mask 128 is the same as the value of (w1+w2+w3+w4+w5) shown in FIG. 2. Using the third mask 128, unnecessary portions of the n-type GaAs layer 106, the p-type GaAs layer 105, the second p-type barrier layer 115, the second tunnel junction layer 111, and the third n-type barrier layer 116 are etched. Furthermore, the upper portion of the peripheral part of the n-type InGaP layer 108 is etched. The etching depth of the n-type InGaP layer 108 is the same as the thickness of (d7-d8) shown in FIG. 2.

(209) As shown in FIG. 3E, the third mask 128 is removed, and a fourth mask 129 is formed. The width of the fourth mask 129 is the same as the value of (w1+w2+w3+w4+w5+w6+w7) shown in FIG. 2. Using the fourth mask 129, unnecessary portions of the n-type InGaP layer 108, the p-type InGaP layer 107, the window layer 109, and the n-type electric contact layer 118 are etched.

(210) As shown in FIG. 4A, the fourth mask 129 is removed. The n-side electrode 120 and the insulator film 122 are formed. An example of a method for forming the n-side electrode 120 is a sputtering method or an electron beam evaporation method. An example of a method for forming the insulator film 122 is a sputtering method or a chemical vapor deposition method.

(211) As shown in FIG. 4B, a base substrate 130 is equipped with the n-side electrode 120. The GaAs substrate 124 and the sacrificial layer 125 are removed by etching. An example of the base substrate 130 is a silicon substrate or a glass substrate. A wax film or an adhesion sheet may be interposed optionally between the n-side electrode 120 and the base substrate 130.

(212) As shown in FIG. 4C, the p-side electrode 121 is formed on the p-type electric contact layer 119. Furthermore, a portion of the p-type electric contact layer 119 which is not in contact with the p-side electrode 121 is removed by etching. An example of a method for forming the p-side electrode 121 is a sputtering method or an electron beam evaporation method.

(213) Finally, as shown in FIG. 4D, the base substrate 130 is removed. In this way, the solar cell element 102 is obtained. As shown in FIG. 1A, the obtained solar cell element 102 is equipped with the condenser lens 101. In this way, the solar cell is provided.

(214) (Step (b))

(215) In the step (b), the window layer 109 is irradiated with light which passes through the condenser lens 101 to generate a voltage difference between the n-side electrode 120 and the p-side electrode 121. As shown in FIG. 2, a range S of window layer 109 is irradiated with the light 123.

(216) The present inventors discovered that the following inequation (II) is required to be satisfied in the step (b).

(217) w8w1 (II)

(218) As described above, the value of w1 represents the width of the InGaAs center part 104a along the X direction.

(219) The value of w8 represents the width of the range S along the X direction.

(220) When viewed along the Z direction, the InGaAs center part 104a overlaps the range S.

(221) In case where the inequation (II) is not satisfied, the higher photoelectric conversion efficiency is not achieved (See the comparative examples 18-21).

(222) As shown in FIG. 2B, when the following equation: (w1+w2+w3+w4+w5+w6+w7)=(w8+w9+w10) is satisfied, the width w9 is equal to or more than width (w2+w4+w6), and width w10 is equal to or more than width (w3+w5+w7). The width w9 and the width w10 represent widths of portions of the window layer 109 which are not irradiated with light.

EXAMPLES

(223) The following examples describe the present disclosure in more detail.

Example 1

(224) In the example 1, the solar cell element 102 shown in FIG. 2 was fabricated in accordance with the method shown in FIG. 3A-FIG. 3E and FIG. 4A-FIG. 4D.

(225) Table 1 shows the composition and film thickness of each layer provided in the solar cell element 102 according to the example 1.

(226) TABLE-US-00001 TABLE 1 Dopant Concentration Film thickness Layer Composition Type [cm.sup.3] [unit: micrometer] n-type electric contact layer 118 GaAs Te 2.0 10.sup.19 0.1 First n-type barrier layer 112 In.sub.0.75Ga.sub.0.25P Si 1.0 10.sup.19 0.05 n-type InGaAs layer 103 In.sub.0.3Ga.sub.0.7As Si 1.0 10.sup.18 2.9 p-type InGaAs layer 104 In.sub.0.3Ga.sub.0.7As Zn 1.0 10.sup.18 0.1 First p-type barrier layer 113 In.sub.0.75Ga.sub.0.25P Zn 1.0 10.sup.19 0.05 Buffer layer 117 In.sub.1xGa.sub.xP Zn 2.0 10.sup.18 3.0 (x = 0.51 0.22) First tunnel junction layer 110 GaAs C 1.0 10.sup.20 0.02 Al.sub.0.3Ga.sub.0.7As Te 1.0 10.sup.19 0.012 Second n-type barrier layer 114 In.sub.0.49Ga.sub.0.51P Si 1.0 10.sup.19 0.05 n-type GaAs layer 106 GaAs Si 1.0 10.sup.18 2.5 p-type GaAs layer 105 GaAs Si 1.0 10.sup.18 0.1 Second p-type barrier layer 115 In.sub.0.49Ga.sub.0.51P Zn 1.0 10.sup.19 0.1 Second tunnel junction layer 111 GaAs C 1.0 10.sup.20 0.02 Al.sub.0.3Ga.sub.0.7As Te 1.0 10.sup.19 0.012 Third n-type barrier layer 116 In.sub.0.49Ga.sub.0.51P Si 1.0 10.sup.19 0.1 n-type InGaP layer 108 In.sub.0.49Ga.sub.0.51P Si 1.0 10.sup.18 0.9 p-type InGaP layer 107 In.sub.0.49Ga.sub.0.51P Zn 3.0 10.sup.17 0.1 Window layer 109 In.sub.0.49Al.sub.0.25Ga.sub.0.26P Zn 1.0 10.sup.19 0.025 p-type contact layer 119 GaAs Zn 1.0 10.sup.19 0.1 Sacrificial layer 125 AlAs 0.1 Substrate 124 GaAs 350

(227) The values of d1-d9 and w1-w7 in the example 1 are described below.

(228) d1: 2.9 micrometers

(229) d2: 4 nanometers

(230) d3: 4 nanometers

(231) d4: 2.5 micrometers

(232) d5: 4 nanometers

(233) d6: 4 nanometers

(234) d7: 0.9 micrometers

(235) d8: 4 nanometers

(236) d9: 4 nanometers

(237) w1: 70 micrometers

(238) w2: 5 micrometers

(239) w3: 5 micrometers

(240) w4: 5 micrometers

(241) w5: 5 micrometers

(242) w6: 5 micrometers

(243) w7: 5 micrometers

(244) The condenser lens 101 according to the example 1 had a thickness of 3 millimeters. The bottom of the condenser lens 101 was 3 millimeters square. The condenser lens 101 had a focal spot of 70 micrometers square.

(245) The solar cell according to the example 1 was fabricated as below.

(246) First, as shown in FIG. 3A, the layers 104-125 were grown on the non-doped GaAs substrate 124 by an MOCVD method.

(247) Then, as shown in FIG. 3B, a resist film of 70 micrometers square was formed on the n-type electric contact layer 118 by a photolithography method. Using this resist film as the first mask 126, an unnecessary portion of the n-type electric contact layer 118 and an unnecessary portion of the first n-type barrier layer 112 were removed by an ICP plasma etching method using a gaseous mixture of BCl.sub.3 and SF.sub.6. Furthermore, using the same gas mixture, almost all of the peripheral parts of the n-type InGaAs layer 104 were etched in such a manner that the peripheral part of the n-type InGaAs layer 104 was left slightly.

(248) After the etching, the thickness of the left peripheral part of the n-type InGaAs layer 104 was measured with a transmission electron microscope. As a result, the thickness was 4 nanometers.

(249) The first mask 126 was removed using a resist stripper liquid. Subsequently, a resist film of 80 micrometers square was formed as the second mask 127. The center of the resist film corresponded with the center of the first mask 126.

(250) Using the second mask 127, unnecessary portions of the n-type InGaAs layer 104, the p-type in GaAs layer 103, the first p-type barrier layer 113, the first tunnel junction layer 110, and the second n-type barrier layer 114 were etched. Furthermore, as shown in FIG. 3C, almost all of the peripheral parts of the n-type GaAs layer 106 were etched in such a manner that the peripheral part of the n-type GaAs layer 106 was left slightly.

(251) After the etching, the thickness for the left peripheral part of the n-type GaAs layer 106 was measured with the transmission electron microscope. The thickness was 4 nanometers.

(252) The second mask 127, was removed using a resist stripper, liquid. After the removal, a resist film of 90 micrometers square was formed as the third mask 128. The center of the resist film corresponds with the center of the first mask 126 and with the center of the second mask 127.

(253) Using the third mask 128, unnecessary portions of the n-type GaAs layer 106, the p-type GaAs layer 105, the second p-type barrier layer 115, the second tunnel junction layer 111, and the third n-type barrier layer 116 were etched. Furthermore, as shown in FIG. 3D, almost all of the peripheral parts of the n-type InGaP layer 108 were etched in such a manner that the peripheral part of the n-type InGaP layer 108 was left slightly.

(254) After the etching, the thickness of the left peripheral part of the n-type InGaP layer 108 was measured with the transmission electron microscope. The thickness was 4 nanometers.

(255) The third mask 128 was removed using a resist stripper liquid. After the removal, a resist film of 100 micrometers square was formed as a fourth mask 129. The center of the resist film corresponds with the centers of the first mask 126, the second mask 127, and the third mask 128.

(256) Using the fourth mask 129, as shown in FIG. 3E, unnecessary portions of the n-type InGaP layer 108, the p-type InGaP layer 107, the window layer 109, and the n-type electric contact layer 118 were etched to expose the sacrificial layer 125.

(257) The fourth mask 129 was removed using a resist stripper liquid. After the removal, as shown in FIG. 4A, a titanium film having a thickness of 50 nanometers and a gold film having a thickness of 250 nanometers were stacked on the n-type electric contact layer 118 with an electron beam evaporation equipment to form the n-side electrode 120.

(258) Then, as shown in FIG. 4A, the insulator film 122 consisting of a SiN film having a thickness of 400 nanometers was formed with a plasma chemical vapor deposition equipment.

(259) Wax was applied using a spin coater to the surface where the n-side electrode 120 was formed. After the wax was dried, the n-side electrode 120 was fixed to a glass base substrate 130.

(260) After the n-side electrode 120 was fixed, the GaAs substrate 124 was removed with use of a liquid mixture of citric acid and hydrogen peroxide. Subsequently, the sacrificial layer 125 was removed with use of buffered hydrofluoric acid to expose the p-type contact layer 119. Thus, the structure shown in FIG. 4B was obtained.

(261) As shown in FIG. 4C, a titanium film having a thickness of 50 nanometers, a platinum film having a thickness of 150 nanometers, and a gold film having a thickness of 250 nanometers were formed in this order on the p-type electric contact layer 119 with the electron beam evaporation equipment to form the p-side electrode 121. Furthermore, a portion of the p-type contact layer 119 which was not in contact with the p-side electrode 121 was removed by etching.

(262) After the etching, the wax was dissolved with isopropanol to remove the base substrate 130. In this way, the solar cell element 102 shown in FIG. 4D was obtained.

(263) The obtained solar cell element 102 was attached to the condenser lens 101 in such a manner that the center of the focus position of the condenser lens 101 corresponded with the center of the solar cell element 102. In this manner, the solar cell according to the example 1 was obtained.

(264) The solar cell according to the example 1 was irradiated with sunlight under the condition that w8=70 micrometers and w9=w10=15 micrometers. The volt-ampere characteristics of the solar cell according to the example 1 were measured, and the photoelectric conversion efficiency was calculated. Table 2-1 shows the results of the example 1 together with the results according to the examples 2-17 and Table 2-2 shows the results of the comparative examples 1-21, which are described later.

(265) The conversion efficiency was calculated according to the following equation (I):
(Conversion efficiency)=(Maximum output value from the solar cell)/(Energy of the sunlight)(I)

(266) The maximum output value described in the above-mentioned equation (I) denotes maximum the value of the output value defined by the following equation (II):
(Output value)=(Current density obtained from the solar cell).Math.(Bios voltage from the solar cell)(II)

(267) For more detail, see the pages 11-13 disclosed in Non Patent Literature 1 (Jenny Nelson, The Physics of Solar Cells, World Scientific Pub. Co. Inc.)

(268) TABLE-US-00002 TABLE 2-1 Unit of d1-d9 and w1-w10: micrometer Conversion d2 d5 d8 w2 w4 w6 w9 efficiency d1 (=d3) d4 (=d6) d7 (=d9) w1 (=w3) (=w5) (=w7) w8 (=w10) [%] Example 1 2.9 0.004 2.5 0.004 0.9 0.004 70 5 5 5 70 15 34.78 Example 2 2.9 0.002 2.5 0.004 0.9 0.004 70 5 5 5 70 15 34.91 Example 3 2.9 0.001 2.5 0.004 0.9 0.004 70 5 5 5 70 15 34.93 Example 4 2.9 0.004 2.5 0.002 0.9 0.004 70 5 5 5 70 15 34.84 Example 5 2.9 0.004 2.5 0.001 0.9 0.004 70 5 5 5 70 15 34.86 Example 6 2.9 0.004 2.5 0.004 0.9 0.005 70 5 5 5 70 15 34.69 Example 7 2.9 0.004 2.5 0.004 0.9 0.002 70 5 5 5 70 15 34.80 Example 8 2.9 0.004 2.5 0.004 0.9 0.001 70 5 5 5 70 15 34.62 Example 9 2.9 0.004 2.5 0.004 0.9 0.004 79.8 0.1 5 5 70 15 34.34 Example 10 2.9 0.004 2.5 0.004 0.9 0.004 79 0.5 5 5 70 15 34.45 Example 11 2.9 0.004 2.5 0.004 0.9 0.004 79.8 5 0.1 5 70 15 34.38 Example 12 2.9 0.004 2.5 0.004 0.9 0.004 79 5 0.5 5 70 15 34.49 Example 13 2.9 0.004 2.5 0.004 0.9 0.004 79.8 5 5 0.1 70 15 34.33 Example 14 2.9 0.004 2.5 0.004 0.9 0.004 79 5 5 0.5 70 15 34.35 Example 15 2.9 0.004 2.5 0.004 0.9 0.004 70 5 5 5 66 17 34.75 Example 16 2.9 0.004 2.5 0.004 0.9 0.004 40 10 10 10 40 30 34.45 Example 17 2.9 0.004 2.5 0.004 0.9 0.004 40 10 10 10 36 32 34.31

(269) TABLE-US-00003 TABLE 2-2 Conversion d2 d5 d8 w2 w4 w6 w9 efficiency d1 (=d3) d4 (=d6) d7 (=d9) w1 (=w3) (=w5) (=w7) w8 (=w10) [%] Comparative 2.9 2.9 2.5 2.5 0.9 0.9 70 5 5 5 100 0 30.48 Example 1 Comparative 2.9 2.9 2.5 2.5 0.9 0.9 70 5 5 5 70 15 32.96 Example 2 Comparative 2.9 0.004 2.5 0.004 0.9 0.004 70 5 5 5 100 0 26.81 Example 3 Comparative 2.9 0.1 2.5 0.004 0.9 0.004 70 5 5 5 70 15 32.14 Example 4 Comparative 2.9 0.01 2.5 0.004 0.9 0.004 70 5 5 5 70 15 32.39 Example 5 Comparative 2.9 0.005 2.5 0.004 0.9 0.004 70 5 5 5 70 15 32.86 Example 6 Comparative 2.9 0 2.5 0.004 0.9 0.004 70 5 5 5 70 15 32.41 Example 7 Comparative 2.9 0.004 2.5 0.1 0.9 0.004 70 5 5 5 70 15 31.67 Example 8 Comparative 2.9 0.004 2.5 0.01 0.9 0.004 70 5 5 5 70 15 31.92 Example 9 Comparative 2.9 0.004 2.5 0.005 0.9 0.004 70 5 5 5 70 15 32.37 Example 10 Comparative 2.9 0.004 2.5 0 0.9 0.004 70 5 5 5 70 15 31.93 Example 11 Comparative 2.9 0.004 2.5 0.004 0.9 0.1 70 5 5 5 70 15 32.59 Example 12 Comparative 2.9 0.004 2.5 0.004 0.9 0.01 70 5 5 5 70 15 32.53 Example 13 Comparative 2.9 0.004 2.5 0.004 0.9 0 70 5 5 5 70 15 32.56 Example 14 Comparative 2.9 0.004 2.5 0.004 0.9 0.004 79.9 0.05 5 5 70 15 31.60 Example 15 Comparative 2.9 0.004 2.5 0.004 0.9 0.004 79.9 5 0.05 5 70 15 32.62 Example 16 Comparative 2.9 0.004 2.5 0.004 0.9 0.004 79.9 5 5 0.05 70 15 32.07 Example 17 Comparative 2.9 0.004 2.5 0.004 0.9 0.004 70 5 5 5 78 11 29.02 Example 18 Comparative 2.9 0.004 2.5 0.004 0.9 0.004 70 5 5 5 74 13 32.32 Example 19 Comparative 2.9 0.004 2.5 0.004 0.9 0.004 40 10 10 10 48 26 26.84 Example 20 Comparative 2.9 0.004 2.5 0.004 0.9 0.004 40 10 10 10 44 28 31.09 Example 21

Example 2

(270) The experiment similar to that of the example 1 was performed, except that d2=d3=2 nanometers.

Example 3

(271) The experiment similar to that of the example 1 was performed, except that d2=d3=1 nanometer.

Example 4

(272) The experiment similar to that of the example 1 was performed, except that d5=d6=2 nanometers.

Example 5

(273) The experiment similar to that of the example 1 was performed, except that d5=d6=1 nanometer.

Example 6

(274) The experiment similar to that of the example 1 was performed, except that d8=d9=5 nanometers.

Example 7

(275) The experiment similar to that of the example 1 was performed, except that d8=d9=2 nanometers.

Example 8

(276) The experiment similar to that of the example 1 was performed, except that d8=d9=1 nanometer.

Example 9

(277) The experiment similar to that of the example 1 was performed, except that w1=79.8 micrometers and w2=w3=0.1 micrometer.

Example 10

(278) The experiment similar to that of the example 1 was performed, except that w1=79 micrometers and w2=w3=0.5 micrometers.

Example 11

(279) The experiment similar to that of the example 1 was performed, except that w1=79.8 micrometers and w4=w5=0.1 micrometer.

Example 12

(280) The experiment similar to that of the example 1 was performed, except that w1=79 micrometers and w4=w5=0.5 micrometers.

Example 13

(281) The experiment similar to that of the example 1 was performed, except that w1=79.8 micrometers and w6=w7=0.1 micrometer.

Example 14

(282) The experiment similar to that of the example 1 was performed, except that w1=79 micrometers and w6=w7=0.5 micrometers.

Example 15

(283) The experiment similar to that of the example 1 was performed, except that w8=66 micrometers and w9=w10=17 micrometers.

Example 16

(284) The experiment similar to that of the example 1 was performed, except that w1=40 micrometers, w2=w3=w4=w5=w6=w7=10 micrometers, w8=40 micrometers, and w9=w10=30 micrometers.

Example 11

(285) The experiment similar to that of the example 1 was performed, except that w1=40 micrometers, w2=w3=w4=w5=w6=w7=10 micrometers, w8=36 micrometers, and w9=w10=32 micrometers.

Comparative Example 1

(286) The experiment similar to that of the example 1 was performed, except that d2=d3=2.9 micrometers, d5=d6=2.5 micrometers, d8=d9=0.9 micrometers, and w8=100 micrometers.

Comparative Example 2

(287) The experiment similar to that of the example 1 was performed, except that d2=d3=2.9 micrometers, d5=d6=2.5 micrometers and d8=d9=0.9 micrometers.

Comparative Example 3

(288) The experiment similar to that of the example 1 was performed, except that w8=100 micrometers.

Comparative Example 4

(289) The experiment similar to that of the example 1 was performed, except that d2=d3=0.1 micrometer.

Comparative Example 5

(290) The experiment similar to that of the example 1 was performed, except that d2=d3=0.01 micrometer.

Comparative Example 6

(291) The experiment similar to that of the example 1 was performed, except that d2=d3=0.005 micrometers.

Comparative Example 7

(292) The experiment similar to that of the example 1 was performed, except that d2=d3=0 micrometer.

Comparative Example 8

(293) The experiment similar to that of the example 1 was performed, except that d5=d6=0.1 micrometer.

Comparative Example 9

(294) The experiment similar to that of the example 1 was performed, except that d5=d6=0.01 micrometer.

Comparative Example 10

(295) The experiment similar to that of the example 1 was performed, except that d5=d6=0.005 micrometers.

Comparative Example 11

(296) The experiment similar to that of the example 1 was performed, except that d5=d6=0 micrometer.

Comparative Example 12

(297) The experiment similar to that of the example 1 was performed, except that d8=d9=0.1 micrometer.

Comparative Example 13

(298) The experiment similar to that of the example 1 was performed, except that d8=d9=0.01 micrometer.

Comparative Example 14

(299) The experiment similar to that of the example 1 was performed, except that d8=d9=0 micrometer.

Comparative Example 15

(300) The experiment similar to that of the example 1 was performed, except that w1=79.9 micrometers and w2=w3=0.05 micrometers.

Comparative Example 16

(301) The experiment similar to that of the example 1 was performed, except that w1=79.9 micrometers and w4=w5=0.05 micrometers.

Comparative Example 17

(302) The experiment similar to that of the example 1 was performed, except that w1=79.9 micrometers and w6=w7=0.05 micrometers.

Comparative Example 18

(303) The experiment similar to that of the example 1 was performed, except that w8=78 micrometers and w9=w10=11 micrometers.

Comparative Example 19

(304) The experiment similar to that of the example 1 was performed, except that w6=74 micrometers and w9=w10=13 micrometers.

Comparative Example 20

(305) The experiment similar to that of the example 1 was performed, except that w1=40 micrometers, w2=w3=w4=w5=w6=w7=10 micrometers, w8=48 micrometers, and w9=w10=26 micrometers.

Comparative Example 21

(306) The experiment similar to that of the example 1 was performed, except that w1=40 micrometers, w2=w3=w4=w5=w6=w7=10 micrometers, w8=44 micrometers, and w9=w10=28 micrometers.

(307) As is clear from Table 2-1 and Table 2-2, when the following inequation set (III) is satisfied, the solar cell has high photoelectric conversion efficiency of not less than 34%.

(308) (III)

(309) d2<d1,

(310) d3<d1,

(311) 1 nanometerd24 nanometers,

(312) 1 nanometerd34 nanometers,

(313) d5<d4,

(314) d6<d4,

(315) 1 nanometerd55 nanometers,

(316) 1 nanometerd65 nanometers,

(317) d8<d7,

(318) d9<d7,

(319) 1 nanometerd85 nanometers,

(320) 1 nanometerd95 nanometers,

(321) 100 nanometersw2,

(322) 100 nanometersw3,

(323) 100 nanometersw4,

(324) 100 nanometersw5,

(325) 100 nanometersw6,

(326) 100 nanometersw7 and

(327) w8w1

(328) The examples 1-17 and the comparative examples 1-2 reveal that it is necessary that the following inequality set is satisfied.

(329) d2<d1,

(330) d3<d1,

(331) d5<d4,

(332) d6<d4,

(333) d8<d7, and

(334) d9<d7

(335) The examples 1-3 and the comparative examples 4-7 reveal that it is necessary that the following inequality set is satisfied.

(336) 1 nanometerd24 nanometers and

(337) 1 nanometerd34 nanometers

(338) The examples 1, 4-5 and the comparative examples 8-11 reveal that it is necessary that the following inequality set is satisfied.

(339) 1 nanometerd54 nanometers and

(340) 1 nanometerd64 nanometers

(341) The examples 1, 6-8 and the comparative examples 12-14 reveal that it is necessary that the following inequality set is satisfied.

(342) 1 nanometerd85 nanometers and

(343) 1 nanometerd95 nanometers

(344) The examples 9-10 and the comparative example 15 reveal that it is necessary that the following inequality set is satisfied.

(345) 100 nanometersw2 and

(346) 100 nanometersw3

(347) The examples 11-12 and the comparative example 16 reveal that it is necessary that the following inequality set is satisfied.

(348) 100 nanometersw4 and

(349) 100 nanometersw5

(350) The examples 13-14 and the comparative example 17 reveal that it is necessary that the following inequality set is satisfied.

(351) 100 nanometersw6 and

(352) 100 nanometersw7

(353) The examples 1, 15-17 and the comparative examples 18-21 reveal that it is necessary that the following inequality is satisfied.

(354) w8w1

(355) The present disclosure provides a solar cell having higher photoelectric conversion efficiency.