DIRECT SYNTHESIS OF IMPROVED SUPERHYDROPHOBIC CARBON NITRIDE CO-PRODUCTS, AND IMPROVED SUPERHYDROPPBIC CARBON NITRIDE CO-PRODUCTS THEREOF
20240391773 ยท 2024-11-28
Assignee
Inventors
Cpc classification
C01P2002/72
CHEMISTRY; METALLURGY
International classification
C01B21/06
CHEMISTRY; METALLURGY
B01J35/00
PERFORMING OPERATIONS; TRANSPORTING
Abstract
The present invention is concerned with a method of direct synthesis of co-products of at a first co-product and a second co-product. The first co-product is superhydrophilic carbon nitride thin film and the second co-product is superhydrophilic carbon nitride powder. The method has a step of using a guanidine carbonate salt as a precursor material. The present invention is also concerned with carbon nitride co-products. The carbon nitride co-products has a first co-product of superhydrophilic carbon nitride thin film and a second co-product of superhydrophilic carbon nitride powder. The superhydrophilic carbon nitride thin film has chemical formula of CN.sub.x, wherein x is 0.86-1.04, and the superhydrophilic carbon nitride powder has a chemical formula of g-C.sub.3N.sub.4.
Claims
1. A method of direct synthesis of co-products of at a first co-product and a second co-product, wherein the first co-product is superhydrophilic carbon nitride thin film and the second co-product is superhydrophilic carbon nitride powder, comprising a step of using a guanidine carbonate salt as a precursor material.
2. A method as claimed in claim 1, wherein the superhydrophilic carbon nitride thin film has a chemical formula of CN.sub.x, and the superhydrophilic carbon nitride powder has a chemical formula of g-C.sub.3N.sub.4, wherein x is 0.86-1.04.
3. A method as claimed in claim 1, wherein the superhydrophilic carbon nitride thin film has a water contact angle of 0-5.
4. A method as claimed in claim 3, wherein the water contact angle of 4.5.
5. A method as claimed in claim 1, wherein the superhydrophilic carbon nitride thin film on its surface has an oxygen-carbon ratio of 0.01-0.63.
6. A method as claimed in claim 5, wherein the superhydrophilic carbon nitride thin film on its surface has an oxygen-carbon ratio of 0.63.
7. A method as claimed in claim 1, wherein the guanidine carbonate salt has a chemical formula of NH.sub.2C(NH)NH.sub.2.Math.H.sub.2CO.sub.3).
8. A method as claimed in claim 1, wherein the method makes use of chemical vapor deposition (CVD).
9. A method as claimed in claim 1, comprising the steps of: providing a reaction tube acting as a reaction chamber defining opposite open lateral ends, with one end receiving a flow of gas and the opposite end allowing, after reaction, the flow of gas to exit, wherein the opposite end is filled with a one-way valve for preventing backflow, placing a predetermined amount of the guanidine carbonate salt on the bottom of the reaction tube, providing a growth substrate and putting the growth substrate in the reaction tube such that there is a clearance of 1-5 cm between the growth substrate and the guanidine carbonate salt, subjecting the reaction chamber to heat in a furnace, subjecting the reaction chamber to the flow of gas therethrough and allowing the reaction to take place for a predetermined amount of time at a predetermined temperature, and allowing annealing to complete and collecting the first co-product superhydrophilic carbon nitride thin film on the growth substrate and the second co-product superhydrophilic carbon nitride powder at the opposite end of the reaction tube.
10. A method as claimed in claim 9, wherein the flow of gas is dry and consists of nitrogen, oxygen, argon and carbon dioxide.
11. A method as claimed in claim 9, wherein reaction tube has a diameter tube of 8-15 cm.
12. A method as claimed in claim 9, wherein the amount of guanidine carbonate salt placed in the reaction tube is 0.5 g to 1.5 g.
13. A method as claimed in claim 9, wherein the guanidine carbonate salt is located in the center of the heating zone of the furnace, and the growth substrate is located downstream of the heating zone in the reactive tube.
14. A method as claimed in claim 9, wherein the flow of gas has a rate in the range of 50 sccm to 200 sccm.
15. A method as claimed in claim 9, wherein the reaction takes place with an initial ramping time of 30 to 60 min, following by a subsequent annealing time of 1 to 6 hrs at 450-600 C.
16. Carbon nitride co-products of a first co-product of superhydrophilic carbon nitride thin film and a second co-product of superhydrophilic carbon nitride powder, wherein the superhydrophilic carbon nitride thin film has chemical formula of CN.sub.x, wherein x is 0.86-1.04, and the superhydrophilic carbon nitride powder has a chemical formula of g-C.sub.3N.sub.4.
17. Carbon nitride co-products as claimed in claim 16, wherein the superhydrophilic carbon nitride thin film has a water contact angle of 0-5.
18. Carbon nitride co-products as claimed in claim 17, wherein the water contact angle of 4.5.
19. Carbon nitride co-products as claimed in claim 16, wherein the superhydrophilic carbon nitride thin film on its surface has an oxygen-carbon ratio of 0.01-0.63.
20. Carbon nitride co-products as claimed in claim 19, wherein oxygen-carbon ratio is 0.63.
Description
BRIEF DESCRIPTION TO THE DRAWINGS
[0020] The patent or application file contains at least one drawing executed in color. Copies of this patent or patent application publication with color drawing(s) will be provided by the Office upon request and payment of the necessary fee.
[0021] Some embodiments of the present invention will now be explained, with reference to the accompanied drawings, in which:
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DETAILED DESCRIPTION OF PREFERRED EMBODIMENTS OF THE INVENTION
[0040] Superhydrophilicity benefits many applications working in the water/humid-involved environments, from the self-cleaning outdoor window surfaces to the high performance photocatalysts and membranes. The present invention provides for direct synthesis of superhydrophilic CN.sub.x which can significantly improve the catalytic efficiency of this metal-free photocatalysts and has a profound application prospect in the field of photocatalysis and photo-electrocatalysis.
[0041] In existing technologies, superhydrophilicity carbon nitrides can be achieved by using strong acids or bases to functionalize the surface. Another way is using plasma treatment for embedding O-based functional groups which has strong polarization toward water molecules. However, these methods always cause serial damage to the original surface and degrade the durability of the materials. Meanwhile, most of superhydrophilic coatings are polymers without photocatalytic behavior.
[0042] The present invention for direct synthesis of superhydrophilic carbon nitrides exempts all chemical waste and cost in post-treatment processes in achieve superhydrophilicity on surface of a metal-free photocatalyst material, as well as shorten the preparation time and yield the manufacturing efficiency. Moreover, this method can directly grow superhydrophilic CN.sub.x thin film on both hydrophilic and hydrophobic substrates. The new superhydrophilic CN.sub.x coating also has potential application in smart window, that surface can own both self-cleaning and photocatalyst function. Experiments leading to the present invention show that superhydrophilic CN.sub.x thin film can be grown directly on different substrate including hydrophilic (glass, FTO glass) and hydrophobic substrate (carbon cloth), and superhydrophilic CN.sub.x powder. The prese invention enables for a large-scale synthesis and improving its photo-electrocatalytic performance.
[0043] The present invention discloses a method for direct synthesis of co-products, including superhydrophilic carbon nitride thin films (CN.sub.x, x0.86-1.04) and graphitic carbon nitride powder (g-C.sub.3N.sub.4) using chemical vapor deposition (CVD) and their application for metal-free photocatalyst in hydrogen evolution reaction (HER). The superhydrophilicity is obtainable on different grown substrate and enhance the photo-electrocatalytic of carbon nitride thin films as well. The process uses guanidine carbonate salt as precursor sealed by quartz wool in a test tube with the grown substrate, and then anneals at appropriated temperature with constant dry air supply.
[0044] Surface wetting greatly impacts on the performances of many photocatalysts in water/humid-involved medium. Carbon nitrides and its isotopes, as emerging metal-free low cost photocatalysts for water splitting, usually require strong chemical or irradiation treatments to obtain highly hydrophilic surfaces, which can undermine their photocatalytic performances. The present invention has identified an alternative and improved method for the direct synthesis of superhydrophilic carbon nitride thin films (CN.sub.x, x0.86-1.04) and graphitic carbon nitride powder (g-C.sub.3N.sub.4) by using chemical vapor deposition (CVD). Experiments have shown that less than 5 (or 1-5) contact angle with water is accessible on both surface of as-grown CN.sub.x thin films and the membranes made from the g-C.sub.3N.sub.4 powder. The present invention has illustrated the remarkable wetting property attributed to the spontaneous hydrophilic functionalization group (e.g., OH, NO.sub.x, O) supplied by a constant multi-elemental air flow. The abundant CN triple bonds also promote needle-shaped nanostructures on the 2D surfaces, which enhances their chemical wettability. The present invention with respect the direct synthesis of superhydrophilic carbon nitride can be applied or embodied in photocatalysis applications. Below are further illustrations including experiments, results and discussion concerning the present invention.
EXPERIMENTS
[0045]
[0046] Chemical reactions in the synthesis process were characterized by thermogravimetric analysis (TGA) in
[0047] The temperature was ramped up to 450, 500, 550 and 600 C. and held for two hours in separated synthesis experiments, before naturally cooling to room temperature (see Methods). Since the precursor decomposition was complete at 305 C., further annealing at higher temperatures was primarily employed to sublime melamine onto the downstream glass substrate and to promote the polycondensation of melamine ions into larger melem ions, which serve as the primary units of polyheptazine (g-C.sub.3N.sub.4). Finally, the transparent yellow thin film deposited on glass substrate and the yellow solid powder at the end of test tube were collected after annealing for further characterization (
[0048] The wettability of CN.sub.x thin films as well as membranes made from powder samples (see Methods and
where R is the ratio between the actual solid surface area and the nominal surface area; .sub.y and .sub.m are the Young contact angle and measured CA of actual solid surface with water, respectively. According to Wenzel's equation (1), an increase in surface roughness leads to an increase in chemical wettability. The difference in CA between the 600 C. and 500 C. films of 1-2 is negligible, suggesting that their surfaces had similar morphology and chemistry. Additionally, the initial CA of the 550 C. film (28.75) was higher than that of the 450 C. film (26.25). After 2 seconds, the droplets on the surface stabilized, and the final CA of the 550 C. film (15) was significantly lower than the final CA of the 450 C. film (21.25). This phenomenon can be explained by the relation between CA and surface porosity (fp) described by Cassie-Baxter's equation (2):
The final variation in CA between the 450 C. and 550 C. films was attributed to the fact that the 450 C. film had a higher porosity than the 550 C. film, as evidenced by the cross-sectional scanning electron microscope (SEM) images (
[0049] To further understand the physical structure and chemical bonding in the CN.sub.x thin films and membranes, X-ray diffraction (XRD) and Fourier-transform infrared (FT-IR) measurements were employed on both powder and thin film samples. The yellow powder samples were identified as polyheptazine g-C.sub.3N.sub.4 (
[0050] In
[0051]
[0052] In particular, the superhydrophilic thin films deposited at 600 C. and 500 C. contained CO bonds, indicated by the peak at 281 eV, and the peak at 395 eV was assigned to the NH bond energy in (NH4.sup.+) groups. In contrast, 550 C. and 450 C. thin films presented only bonds between C atoms in CN hexagonal rings with amine groups (NH.sub.x, x=1, 2), as well as bonds between N and H in NH.sub.x, corresponding to the peaks at 288.5 eV and 400 eV, respectively. This observation further supported the conclusion that O-based and NH.sub.x functional groups co-existed in the CN.sub.x thin films, and that the superhydrophilicity was mainly contributed by the rich O-based functional groups embedded on thin films deposited at 500 C. and 600 C.
[0053] For comparison, the XPS results of g-C.sub.3N.sub.4 powder samples were provided in
[0054] The atomic percentage (at %) of carbon (C), nitrogen (N) and oxygen (O) in CN.sub.x thin films were strongly influenced by annealing temperature (Table 3). Overall, the N at % increased proportionally with annealing temperature, while the O at % decreased, and the C at % approximately maintained at 42%, except for the 450 C. thin film. The low N at % of 450 C. thin film was due to the low thermal energy, where the decomposition reaction was stronger than polymerization, as in above-mentioned TGA result. The superhydrophilic 500 C. thin film had high O concentration contributed by rich O-based functional groups (O, OH and NO.sub.x). Meanwhile, the C/N ratio in 550 and 600 C. thin films were similar to the g-C.sub.3N.sub.4 powder. On the other hand, annealing temperature was less effective in controlling the at% in g-C.sub.3N.sub.4 powder (Table 4). The graphitic powder has C/N ratio of 1.05-1.15 with small amount of oxygen intercalation (4.84-7.39 at %).
[0055] The wettability of CN.sub.x thin films was highly consistent with their chemical bonding. The superhydrophilicity in 600 C. and 500 C. thin films were associated with the rich O-based functional groups (indicated by CO and CO bonds) on the surface, resulting high attraction to water molecules. Meanwhile, the 550 C. is the ideal temperature for the polycondensation of heptazine structure, and 450 C. is for the combined structure of triazine and heptazine (See
[0056] Superhydrophilicity can benefit the photoelectrocatalytic performance by increasing ion transfer and gas separation. In addition, the superhydrophilicity can be further enhanced under light irradiation (
METHODS
Samples PreparationSynthesis of Carbon Nitrides
[0057] About 0.6 g of guanidine carbonate (linear formula NH.sub.2C(NH)NH.sub.2.Math.H.sub.2CO.sub.3, 99%, Merck 593-85-1) was placed at the end of a quartz test tube (length: 155 mm, diameter: 12 mm). A glass microscope slide or carbon cloth (CC) was positioned 1 cm away from the guanidine carbonate. The test tube was sealed with quartz wool and put into a tube furnace nameplated STF 15/180. The furnace was heated up at the speed of 10 C./min from room temperature to the desired temperature and annealed for 2 hours afterwards. The dry air flow (78.09% nitrogen, 20.95% oxygen, 0.93% argon, 0.04% carbon dioxide) of 100 ml/min was supplied constantly from 30 minutes before the heating process until the end of synthesis process.
Samples PreparationPreparation of Graphitic Carbon Nitride (g-C.SUB.3.N.SUB.4.) Membrane
[0058] About 10 mg of g-C.sub.3N.sub.4 powder dispersed in 10 ml of dimethylformamide (DMF) solvent (99.8%, Merck 68-12-2) was placed into ultrasonic bath for an hour (37 kHz, 80% power) before being filtrated on hydrophilic polytetrafluoroethylene (PTFE) membrane with pore size of 0.1 m to form g-C.sub.3N.sub.4 membranes (see
Characterization TechniquesThermogravimetric Analysis (TGA)
[0059] The TGA measurement was carried out using the Thermogravimetric Analyser (TA Instruments Q500). About 15 mg of guanidine carbonate salt was put to an alumina pan hanging in the TGA chamber. A dry air flow of 20 ml/min was supplied to the TGA chamber in whole measuring process to imitate the synthesis conditions. At first the chamber was equilibrated at 100 C. for 30 min to remove humid absorption. Then the chamber was ramping up of 10 C./min to 600 C. and isothermal for 30 min before naturally cooling down to room temperature.
Characterization TechniquesContact Angle Measurements
[0060] The wetting behaviors of the samples were examined by contact angle (CA) measurement, using sessile drop technique (Drop shape analyser DSA25S, KRSS GmbH, Germany). It was performed under ambient conditions (20 C. in temperature, 50% in humidity). A water droplet of 1-5 l was deposited on a substrate and CA was measured within two seconds. The CA analysis from the recorded videos was processed by the software of ImageJ.
Characterization TechniquesX-Ray Diffraction (XRD)
[0061] XRD results of thin films and powder were carried out by the Smartlab X-ray diffractometer (RIGAKU, Japan), which scanned over the sample in the 2 range of 10-60, with the resolution of 0.02.
Characterization TechniquesFourier Transform Infrared Spectroscopy (FT-IR)
[0062] FTIR spectra of sample were recorded using FT/IR-4700 (JASCO, Japan) spectrophotometer, which scanned over the wavenumber range of 600-4000 cm.sup.1, with resolution of 1 cm.sup.1 in the transmittance mode.
Characterization TechniquesX-Ray Photoelectron Spectroscope (XPS)
[0063] XPS was applied to measure the chemical binding energy as well as the atomic ratio (at %) using an Al X-ray source (Thermo-Scientific, ESCALAB 250Xi). All the peaks were measured under high vacuum (10-8 Torr). The raw XPS data has been corrected using Shirley method to subtract signal from the inelastic scattering of electrons before analysis (See
Characterization TechniquesScanning Electron Microscope (SEM)
[0064] SEM (Philips FEG SEM XL30, USA) was used to examine the cross-section morphology of the thin film. High-level resolution at different magnifications is obtain by operating at different accelerating voltages.
Characterization TechniquesAtomic Force Microscope (AFM)
[0065] AFM measurement was carried out using AFM5300E system (Hitachi, Japan). The tapping mode was applied for observation of the topography, using a gold-coated Si cantilever (NSG30, Nanotips, f=340 KHz, C=1 N/m).
Characterization TechniquesPhotoelectrochemical Measurement
[0066] The photoelectrochemical measurements were performed by a three-electrode system in 0.5 M H2SO4 electrolyte. The in-situ grown CN.sub.x@CC is used as the work electrode, Ag/AgCl and Pt are acted as the reference and counter electrode, respectively. The HER performance was tested by linear sweep voltammetry (LSV, 10 mV s1) and electrochemical impedance spectroscopy (EIS) on CHI760E electrochemical workstation. Photocurrents were obtained using a 300 W Xenon arc lamp under an output power of 15 W. All the polarization curves were obtained without IR correction.
CONCLUSIONS
[0067] The present invention has demonstrated the synthesis of superhydrophilic CN.sub.x thin films and g-C.sub.3N.sub.4 membranes using direct CVD method. The superhydrophilicity of our products breaks the previous limitation of the as-grown CN.sub.x products. The effect of different temperature conditions on the thermal polycondensation of CN.sub.x in dry air medium has been revealed, suggesting the dominant incorporation of O-based or N-based functional groups can be spontaneously achieved by CVD annealing, followed by the relative change in chemical wettability. Moreover, enriched functional groups as well as (CN) bonds collectively promoted the formation of 1D texture that greatly enhanced the surface area and porosity of CN.sub.x thin films. The superhydrophilic CN.sub.x thin films and the g-C.sub.3N.sub.4 powder are ideal candidates for a variety of applications working in water/humid environments.
[0068] Superhydrophilicity benefits many applications working in the water/humid-involved environments, from the self-cleaning outdoor window surfaces, to the high performance photocatalysts and membranes in various studies. The contribution of superhydrophilicity to the surface applications can be categorized into two factors: first, by increasing the attraction to water molecules which directly speed up the water splitting reactions or water transportation through the membrane; second, by self-cleaning effect preventing the contaminations of catalytic surface or/and fouling effect on the membrane applications. Therefore, the present invention of increasing hydrophilicity without interfering their intrinsic properties of target materials is advantageous to many applications.
[0069] Specifically, the present invention has contributed to a new method for direct synthesis of the superhydrophilic CN.sub.x thin films on hydrophobic substrate and highly crystalline superhydrophilic powder of g-C.sub.3N.sub.4 using the chemical vapor deposition (CVD). The CA with water of the CN.sub.x thin films and the membranes made from g-C.sub.3N.sub.4 powder reaches below 5, which is inaccessible via direct growth before. In addition, different surface textures and water wettability could be tuned by controlling the thermal condensation temperature of 450 C. to 600 C. The new superhydrophilic CN.sub.x structure has shown their potential as metal-free photocatalyst for hydrogen evolution reaction (HER).
[0070] It should be understood that certain features of the invention, which are, for clarity, described in the content of separate embodiments, may be provided in combination in a single embodiment. Conversely, various features of the invention which are, for brevity, described in the content of a single embodiment, may be provided separately or in any appropriate sub-combinations. It is to be noted that certain features of the embodiments are illustrated by way of non-limiting examples. For example, one application of the present invention is the provision of superhydrophilic CN.sub.x thin film which can be used as metal-free photocatalyst for hydrogen evolution reaction (HER). The superhydrophilic CN.sub.x thin films and powder has potential to be applied as coating for example on smart windows which have both self-cleaning and photocatalytic properties.
TABLE-US-00001 TABLE 1 Comparison of conventional methodologies and present invention with respect to O/C ratio and CA value CA value Conventional methods O/C ratio (deg.) Plasma-enhanced chemical vapor deposition 0.34 81.9 (S.A. Almad Kamal et. al. Applied Surface 0.39 103.9 Science 328 (2015) 146-153) 0.44 120.8 0.08 156.6 Plasma-enhanced pulsed laser deposition ~0 66-77 (M.E. Ransey et. al. Thin Solid Films 360 (2000) 82-88) Present invention 0.01-0.63 0-5
TABLE-US-00002 TABLE 2 Surface roughness and contact angle with water of CN.sub.x then films deposited at different annealing temperature Thin films surface 450 C. 550 C. 450 C. 450 C. AFM 10.4 4.3 2.5 Roughness (RMS) Contact angle 26.25 12.75 28.75 15.5 () 0 sec 1.sup.st sec 22 8.25 19 8.5 2.sup.nd sec 21.25 6.75 15 5.5
TABLE-US-00003 TABLE 3 Elemental atomic ration of g-C.sub.3N.sub.4 powder synthesized at different annealing temperatures Synthesis temperature Element 600 C. 550 C. 500 C. 450 C. C (at %) 48.69 49.30 48.65 50.9 N (at %) 45.17 43.30 46.22 44.26 O (at %) 6.14 7.39 5.14 4.84 C/N ratio 1.08 1.14 1.05 1.15
TABLE-US-00004 TABLE 4 Ratio of thin film carbon/nitrogen atom (C/N) of samples/ embodiments from experiments leading to present invention Samples C/N ratio 1. CN.sub.x film on glass 1.04 2. CN.sub.x film on FTO glass 0.86 3. CNx film on carbon cloth 0.92 4. g-C.sub.3N.sub.4 membrane on PTFE membrane 1.05
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