ELECTRODE, METHOD FOR PREPARING SAME, AND ELECTROSTATIC DISCHARGE SYSTEM COMPRISING SAME
20240387791 ยท 2024-11-21
Assignee
Inventors
Cpc classification
H01M4/583
ELECTRICITY
H01M2004/021
ELECTRICITY
International classification
Abstract
The present application relates to an electrode, a method for preparing the electrode, and an electrostatic discharge system comprising the electrode. According to the electrode, the method for preparing the electrode, and the electrostatic discharge system comprising the electrode of the present application, the electrostatic discharge system exhibits an excellent anion generation concentration, maintains a residual ozone concentration of an indoor threshold or lower, prevents the corrosion of the electrode, and may exhibit excellent antimicrobial performance.
Claims
1. An electrode comprising: a body; a protrusion which has a nano size and is formed on a surface of the body; and a coating portion formed by applying conductive carbon on surfaces of the body and of the protrusion.
2. The electrode of claim 1, wherein a residual rate of bacteria, which is measured by supplying air to the electrode at a flow rate of 5 L/min, applying a DC negative voltage of 7 kV to generate anions, and injecting air including the generated anions into a 22 L chamber with 2,000 bacteria/cm3 of the bacteria to expose the bacteria to the anions, is 25% or less.
3. The electrode of claim 1, wherein a residual number of bacteria, which is measured by supplying air to the electrode at a flow rate of 5 L/min, applying a DC negative voltage of 7 kV to generate anions, and injecting air including the generated anions into a 22 L chamber with 2,000 bacteria/cm.sup.3 of the bacteria to expose the bacteria to the anions, is a 12 colony-forming unit (CFU) or less.
4. The electrode of claim 1, wherein an anion generation concentration, which is measured by supplying air to the electrode at a flow rate of 5 L/min and applying a DC negative voltage of 7 kV, is 8?10.sup.5 ions/cm.sup.3 or more.
5. (canceled)
6. The electrode of claim 4, wherein a residual ozone concentration when anions are generated is less than 50 ppb.
7. The electrode of any one of claims 2, wherein an electric field applied when anions are generated is in a range of 500 V/m to 500,000 V/m.
8. The electrode of claim 1, wherein the body has a pin shape.
8. The electrode of claim 1, wherein the body has a pin shape.
9. The electrode of claim 1, wherein the body includes a transition metal including iron, tungsten, silver, copper, gold, nickel, cobalt, zinc, molybdenum, or an alloy thereof.
10. The electrode of claim 1, wherein the protrusion has a radius of curvature of 1 nm to 10 ?m.
11. The electrode of claim 1, wherein the protrusion includes a transition metal including iron, tungsten, silver, copper, gold, nickel, cobalt, zinc, molybdenum, or an alloy thereof.
12. The electrode of claim 11, wherein the conductive carbon is included at a content of 10 to 40 parts by weight with respect to 100 parts by weight of the transition metal.
13. A method of manufacturing the electrode of claim 1, the method comprising: a forming operation of forming a protrusion having a nano size on a surface of a body; and a coating operation of applying conductive carbon on surfaces of the body and the protrusion to form a coating portion.
14. The method of claim 13, wherein the forming operation is performed through etching or attaching.
15. The method of claim 14, wherein the etching is performed through at least one selected from wet etching, optical etching, and physical etching.
16. The method of claim 15, wherein the wet etching is performed by immersing the body in an etching solution and then applying ultrasonic waves.
17. The method of claim 16, wherein an application time of the ultrasonic waves is in a range of 10 seconds to 1 hour.
18. The method of claim 14, wherein the attaching is performed by attaching catalyst particles to the surface of the body.
19. The method of claim 18, wherein the catalyst particles include a transition metal including iron, tungsten, silver, copper, gold, nickel, cobalt, zinc, molybdenum, or an alloy thereof.
20. The method of claim 13, wherein the coating operation is performed through one method selected from a chemical vapor deposition method, a sputtering method, an atomic layer deposition method, a spray coating method, and a spin coating method.
21. (canceled)
22. An electrostatic discharge system comprising the electrode of claim 1.
Description
DESCRIPTION OF DRAWINGS
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BEST MODE OF THE INVENTION
[0070] Hereinafter, the above contents will be described in more detail with reference to Examples and Comparative Example. However, the scope of the present application is not limited to the contents disclosed below.
Example 1: Manufacturing of Electrode
[0071]
[0072] Thereafter, an electrode in which the protrusions were formed on the surface of the body having a nano-pin shape was put into a chemical vapor deposition chamber 24, 100 mL/min of nitrogen (N.sub.2) was injected into the vapor deposition chamber 24 under conditions of 2 Torr and 20? C./min for 20 minutes, a temperature of the chemical vapor deposition chamber 24 was raised to 650? C. for 70 minutes, acetylene (C.sub.2H.sub.2) was injected into the vapor deposition chamber 24 at a rate of 30 mL/min for 10 minutes to cause a reaction for 50 minutes, and then the vapor deposition chamber 24 was naturally cooled to manufacture an electrode in which carbon was applied on surfaces of the body and the protrusions. In this case, a pressure in the vapor deposition chamber 24 may be controlled by a vacuum pump 25, and a radius of curvature of the protrusion may be 2 ?m or less. In addition, low magnification images (?500) were captured by photographing the protrusions of the electrode manufactured in Example 1 using a scanning electron microscope (SEM, S-4800 manufactured by Hitachi, Ltd., Japan). Results thereof are shown in
Example 2: Manufacturing of Electrode
[0073] An electrode was manufactured in the same manner as in Example 1, except that an electrode with a nano-pin shape including tungsten was immersed in a beaker containing an etching solution, and then ultrasonic waves were generated for 2 minutes to form protrusions on a surface of a body. In this case, a radius of curvature of the protrusion may be 1 ?m or less.
Example 3: Manufacturing of Electrode
[0074] An electrode was manufactured in the same manner as in Example 1, except that an electrode with a nano-pin shape including tungsten was immersed in a beaker containing an etching solution, and then ultrasonic waves were generated for 3 minutes to form protrusions on a surface of a body. In this case, a radius of curvature of the protrusion may be 500 nm or less.
Example 4: Manufacturing of Electrode
[0075] An electrode was manufactured in the same manner as in Example 1, except that an electrode with a nano-pin shape including tungsten was immersed in a beaker containing an etching solution, and then ultrasonic waves were generated for 4 minutes to form protrusions on a surface of a body. In this case, a radius of curvature of the protrusion may be 300 nm or less.
Example 5: Manufacturing of Electrode
[0076] An electrode was manufactured in the same manner as in Example 1, except that an electrode with a nano-pin shape including tungsten was immersed in a beaker containing an etching solution, and then ultrasonic waves were generated for 5 minutes to form protrusions on a surface of a body. In this case, a radius of curvature of the protrusion may be 100 nm or less.
Comparative Example 1: Manufacturing of Electrode
[0077] An electrode with a nano-pin shape including tungsten of Example 1, in which a protrusion and a coating portion were not formed, was manufactured. In this case, the electrode manufactured in Comparative Example 1 does not include the protrusion, and a radius of curvature of a sharp portion at an upper end portion of a body may be 100 ?m.
Experimental Example 1: Evaluation of Electrode Surface Shape and Composition
[0078] Surface shapes of the electrodes manufactured in Examples 1, 3, and 5 and the electrode manufactured in Comparative Example 1 were photographed using a SEM (S-4800 manufactured by Hitachi, Ltd., Japan) to capture low and high magnification images. Results thereof are shown in
[0079] In addition, compositions of the electrode manufactured in Example 1 and the electrode manufactured in Comparative Example 1 were observed using energy dispersive X-ray spectroscopy (EDX, S-4800 manufactured by Hitachi, Ltd., Japan). Results thereof are shown in
TABLE-US-00001 TABLE 1 Example 1 Comparative Example 1 W 68.18 wt % 100 wt % C 18.85 wt % 0 wt % O 12.82 wt % 0 wt % Fe 0 wt % 0 wt % K 0.20 wt % 0 wt %
[0080] As shown in
Experimental Example 2: Evaluation of Anion Generation Concentration of Electrode
[0081] An anion generation concentration of the electrodes manufactured in Examples 1 to 5 and the electrode manufactured in Comparative Example 1 was evaluated using the anion concentration evaluation apparatus of
[0082] As shown in
Experimental Example 3: Evaluation of Antibiosis of Electrode
[0083] The antibiosis evaluation apparatus of
[0084] As shown in
Experimental Example 4: Evaluation of Ionization Discharge Onset Voltage According to Radius of Curvature of Protrusion
[0085] An ionization radius onset voltage according to a radius of curvature of a protrusion of each of the electrodes manufactured in Examples 1 to 5 and a radius of curvature of an upper end portion of a body of the electrode manufactured in Comparative Example 1 were calculated using General Formula 1 below. Results thereof are shown in
[0086] In General Formula 1, r is a radius of curvature of the protrusion, E is electric field strength when ionization begins to appear on surfaces of the body and the protrusions to generate anions, and d is a distance between the electrode and a ground plate.
[0087] As shown in
Experimental Example 5: Evaluation of Residual Ozone Concentration According to Anion Generation of Electrode
[0088] A residual ozone concentration of the electrodes manufactured in Examples 1 to 5 and the electrode manufactured in Comparative Example 1 were evaluated using the residual ozone concentration evaluation apparatus of
[0089] As a result, it was confirmed that the residual ozone concentration in the electrodes manufactured in Examples 1 to 5 was lower than the residual ozone concentration in the electrode manufactured in Comparative Example 1. In particular, it was confirmed that the residual ozone concentration in the electrode manufactured in Example 1, to which an electric field was applied at electric field strength of ? of that of an electric field applied to the electrode manufactured in Comparative Example 1, was 50 ppb, which was considerably lower than the residual ozone concentration of 130 ppb in the electrode manufactured in Comparative Example 1, to which an electric field was applied at the above-described strength.
DESCRIPTION OF REFERENCE NUMERALS
[0090] 11: body
[0091] 12: protrusion
[0092] 13: coating portion
[0093] 21, 31, 41, 51: electrode
[0094] 22: beaker
[0095] 23: ultrasonic tank
[0096] 24: chemical vapor deposition chamber
[0097] 25: vacuum pump
[0098] 32, 42, 52: air supply unit
[0099] 33, 43, 53: flow rate control unit
[0100] 34, 44, 54: anion generating unit
[0101] 35: anion measuring unit
[0102] 45: chamber
[0103] 46: button sampler
[0104] 47: buffer solution
[0105] 48: medium
[0106] 55: ozone measuring unit