OPTICAL SYSTEM FOR A METROLOGY SYSTEM AND METROLOGY SYSTEM WITH SUCH AN OPTICAL SYSTEM
20240369946 ยท 2024-11-07
Inventors
Cpc classification
G03F7/706849
PHYSICS
International classification
Abstract
An optical system for a metrology system for measuring an object has an object holder for holding the object in an object plane. A transmissive optical focusing component is arranged in the beam path of illumination light between a light source of the metrology system and an object field in the object plane. The transmissive optical focusing component is used to generate an illumination focus in the subsequent beam path of the illumination light. The transmissive optical focusing component has a focal length which is smaller than 5 mm. A detection device is used for detecting the illumination light in the beam path downstream of the object field. An imaging optical unit is used for imaging the illumination focus generated by the transmissive optical focusing component into a further illumination focus in the region of the object field. The result is an optical system, the handling of which, in particular with respect to the object arrangement, is facilitated.
Claims
1. An optical system for a metrology system for measuring an object, comprising an object holder for holding the object in an object plane, comprising a transmissive optical focusing component, which is arranged in the beam path of illumination light between a light source of the metrology system and an object field in the object plane, for generating an illumination focus in the beam path of the illumination light downstream of the transmissive optical focusing component, wherein the transmissive optical focusing component has a focal length which is smaller than 5 mm, comprising a detection device for detecting the illumination light in the beam path downstream of the object field, comprising an imaging optical unit for imaging the illumination focus generated by the transmissive optical focusing component into a further illumination focus in the region of the object field.
2. The optical system of claim 1, wherein the transmissive optical focusing component is designed as a zone plate.
3. The optical system of claim 2, wherein a working distance between the zone plate and the object field which is larger than 10 mm.
4. The optical system of claim 1, wherein the imaging optical unit is designed as a mirror optical unit.
5. The optical system of claim 1, wherein the imaging optical unit has at least one mirror.
6. The optical system of claim 5, wherein the imaging optical unit has at least one folding mirror.
7. The optical system of claim 5, wherein the imaging optical unit has at least one aspherical mirror.
8. The optical system of claim 1, wherein a chief ray angle of the illumination light incident in the object field is smaller than 6?.
9. The optical system of claim 1, comprising an actuator for displacing the object holder perpendicular to the object plane.
10. A metrology system for measuring an object, the metrology system comprising: an optical system according to claim 1, a light source for generating illumination light.
11. The metrology system of claim 10, wherein the light source is an EUV light source.
12. The metrology system of claim 11, wherein the transmissive optical focusing component is designed as a zone plate.
13. The metrology system of claim 12, wherein a working distance between the zone plate and the object field which is larger than 10 mm.
14. The metrology system of claim 11, wherein the imaging optical unit is designed as a mirror optical unit.
15. The metrology system of claim 11, wherein the imaging optical unit has at least one mirror.
16. The metrology system of claim 15, wherein the imaging optical unit has at least one folding mirror.
17. The metrology system of claim 15, wherein the imaging optical unit has at least one aspherical mirror.
18. The metrology system of claim 11, wherein a chief ray angle of the illumination light incident in the object field is smaller than 6?.
19. The metrology system of claim 11, comprising an actuator for displacing the object holder perpendicular to the object plane.
20. The optical system of claim 2, wherein the imaging optical unit is designed as a mirror optical unit.
Description
BRIEF DESCRIPTION OF DRAWINGS
[0022]
[0023]
[0024]
[0025]
[0026]
[0027]
[0028]
[0029]
DETAILED DESCRIPTION
[0030]
[0031] The light source 5 is an EUV light source for generating the EUV illumination light 4 with a central used wavelength in the range between 5 nm and 30 nm, in particular of 13.5 nm. A spectral width ??/?) (FWHM, full width at half max) of the EUV illumination light 4, which is used for the illumination of the object 2, is at least 1?10.sup.?4 and may, for example, lie in the range between 1/250 and 1/300. The light source 5 can be a plasma light source or a high-harmonic generation (HHG) light source.
[0032] Arranged in the beam path of the illumination light 4 downstream of the light source 5 is an intermediate focus plane 7, in which an intermediate focus stop 8 is arranged. The intermediate focus stop 8 is used to separate the used illumination light 4 from debris which is in particular undesirably carried along. Downstream of the intermediate focus stop 8, an extraneous light filter for separating the used illumination light 4 from wavelength components undesirably carried along in the beam path can be arranged in the beam path of the illumination light 4.
[0033] Downstream of the light source 5, the illumination light 4 is guided by an optical system 9 of the metrology system 1.
[0034] To clarify the positional relationships between components of the metrology system, a Cartesian xyz coordinate system is drawn in
[0035] In the variant of the optical system 9 shown in
[0036] An object holder 14 of the optical system is used to hold the object 2 in the object plane 13 such that a portion of the object 2 is located in the object field 12. Via an actuator 15, the object holder 14 is displaceable perpendicular to the object plane 13, as is illustrated by a double-headed displacement arrow ?z in
[0037] The zone plate 11 generates an illumination focus 16 (see also
[0038] A chief ray angle ? (see
[0039] An object-side numerical aperture of the illumination light beam path can lie in the range of 0.1.
[0040] The object 2 is designed as a reflective object. Illumination light 4 reflected by the object 2 is guided as detection light from the optical system 9 to the detection device 6. In the embodiment according to
[0041]
[0042]
[0043] The dispersive optical component 18 will spatially separate two wavelength components with a wavelength difference ??/?) of at least 1/1000 by a separation angle of at least 1?10.sup.?4. Assuming a distance between the dispersive optical component 18 and the detection device 6 of 10 cm this will result in a split of such separated two wavelength components of at least 10 ?m. Such split may equal a pixel distance on the detection device 6. The grating 18 spatially splits up the different wavelength components 4.sup.1 to 4.sub.5 of the detection light 4. The wavelight components 4.sub.1 to 4.sub.5 of the detection light 4 are at least partially spatially separated in the beam path following the grating 18.
[0044] The detection device 6 is arranged in an arrangement plane or detection plane 19, in which this at least partial spatial separation of the wavelength components 4.sub.1 to 4.sub.5 takes place. The detection device 6 is designed as a sensor line with, in the illustrated embodiment, five sensor elements 6.sub.1 to 6.sub.5 for at least partially separate detection of the wavelength components 4.sup.1 to 4.sub.5 of the illumination or detection light 4 in the beam path downstream of the object field 12. Depending on the design, the detection device can have two, three, five, ten or even more sensor elements 6.sub.i. The detection device 6 can be designed as a sensor line or as a two-dimensional sensor array, for example in the form of a charge-coupled device (CCD) or complementary metal-oxide-semiconductor (CMOS) array.
[0045] With the aid of the detection device 6 according to
[0046] Alternatively or additionally, the z-actuator 15 can be used in combination with the spectrally sensitive detection according to
[0047] The first column of
[0048]
[0049] By use of a deconvolution matrix M (shown in
[0050]
[0051] For use as a bandpass filter, the grating 18 is operatively connected to an actuator 20 for swivelling the grating 18 and thus for selecting the wavelength component 4.sub.i used for the detection, which is shown by a double-headed arrow ?? in
[0052]
[0053]
[0054] The zone plate 11 has a focal length f.sub.1 (see
[0055] For imaging the illumination focus 16 generated by the zone plate 11 into a further illumination focus 16 in the region of the object field 12, an imaging optical unit 22 of the optical system 21 according to
[0056] In the embodiment according to
[0057] A working distance between the zone plate 11 and the object field 12 can be significantly larger than the focal length f.sub.1 due to the intermediate imaging optical unit 22 and may be larger than, for example, 10 mm, may be larger than 20 mm, may be larger than 50 mm and may be 100 mm or more. The working distance is the distance between the object field and the nearest component of the optical system, which is typically a component of the imaging optical unit for imaging the illumination focus, generated by the transmissive optical focusing component, into the further illumination focus in the region of the object field. The working distance can be measured as a real distance between the nearest points of the object field and the corresponding nearest component of the optical system, or as a pure z-distance between the object field and a component of the optical system that overlaps the object field in the x/y-direction and is remote in the z-direction.
[0058] Due to the intermediate imaging optical unit 22, it is possible in particular to set a desired dispersion in the design regardless of the necessary working distance, for example with the aim of being particularly favourable for the combination with the detection device 6. It is advantageous in this case if the dispersion between adjacent sensor elements 6; of the spectral detection device 6 leads to an offset ?z of, for example, 50 nm-200 nm, since this can correspond to a z-interval in a z-stack or image stack recorded by the metrology system 1.
[0059] An imaging scale when imaging the object field 12 into an image field in the region of the arrangement plane 19 may be greater than 10, may be greater than 25, may be greater than 50, may be greater than 100, may be greater than 250, may be greater than 300 and may lie in the range of 500 or 1000, for example.
[0060] To measure the structure of the object 2, an image of the object structure in the object field 12 is recorded by the detection device 6. Depending on the measurement method, either a single image is recorded or an image stack (aerial image) in a plurality of z-positions, in which case the object 2 is displaced into corresponding z-positions by use of the object holder 14 and the actuator 15.
[0061] A number of embodiments of the invention have been described. Nevertheless, it will be understood that various modifications may be made without departing from the spirit and scope of the invention. For example, the distance between the dispersive optical component and the detection device, the split of the separated two wavelength components, and the pixel distance on the detection device may be different from the examples described above. Accordingly, other embodiments are within the scope of the following claims.