Oxidation of copper in a copper etching solution by the use of oxygen and/or air as an oxidizing agent

Abstract

The present invention relates to a process of oxidizing copper in a copper etching solution by using oxygen gas and/or air as an oxidizing agent, the process comprising the steps of: a) introducing the oxidizing agent into an acidic reduced copper etching solution comprising Cl.sup. and Cu.sup.+, b) stirring the solution obtained in step a), and thereby allowing the reaction 2Cu.sup.++O.sub.2 (aq)+2H.sup.+.fwdarw.2Cu.sup.2++H.sub.2O to occur, thereby producing an oxidized copper etching solution comprising less Cu.sup.+ than the reduced copper etching solution. An advantage of the present invention is that it provides an improved process at least in terms of the speed of the oxidation and the quality of the etching.

Claims

1. A process of oxidizing copper in a copper etching solution by using oxygen gas and/or air as an oxidizing agent, the process comprising the steps of: a) introducing the oxidizing agent into an acidic reduced copper etching solution comprising Cl.sup. and Cu.sup.+ such that gaseous bubbles are formed in the copper etching solution; b) stirring the solution obtained in step a) by at least one stirrer to reduce the size of the gaseous bubbles of the oxidizing agent; and thereby allowing the reaction 2Cu.sup.++O.sub.2 (aq)+2H.sup.+.fwdarw.2Cu.sup.2++H.sub.2O to occur, thereby producing an oxidized copper etching solution comprising less Cu.sup.+ than the reduced copper etching solution.

2. The process according to claim 1, wherein the process of oxidizing copper in a copper etching solution is in a system comprising an etching machine and an oxidation reactor fluidly connected by a feeding pipe.

3. The process according to claim 2, wherein the oxidizing agent is introduced into the acidic reduced copper etching solution comprising Cl.sup. and Cu.sup.+ in the feeding pipe.

4. The process according to claim 2, wherein the solution obtained in step a) is stirred in the oxidation reactor.

5. The process according to claim 2, wherein the produced oxidized copper etching solution which is exiting from the oxidation reactor comprising less Cu.sup.+ than the reduced copper etching solution which is exiting from the etching machine.

6. The process according to claim 2, wherein the process further comprises the step of mixing the oxidizing agent with the acidic reduced copper etching solution in the feeding pipe.

7. The process according to claim 6, wherein the mixing is performed by at least one static mixer.

8. The process according to claim 2, wherein the pressure in the oxidation reactor is lower than the pressure in the feeding pipe.

9. The process according to claim 2, wherein the feeding pipe has an overpressure.

10. The process according to claim 2, wherein the oxidizing agent is introduced into the acidic reduced copper etching solution comprising Cl.sup. and Cu.sup.+ in the feeding pipe arranged upstream of the oxidation reactor and/or inside of the oxidation reactor.

11. The process according to claim 2, wherein the process further comprises the step of mixing the oxidizing agent with the acidic reduced copper etching solution, and wherein the mixing is performed by at least one static mixer in the feeding pipe and/or by at least one impeller in the oxidation reactor.

12. The process according to claim 1, wherein the reduced copper etching solution comprises Cl.sup. in a total concentration of at least 2.5 mol/L.

13. The process according to claim 1, wherein the Cl.sup. is derived from at least one compound selected from the group consisting of: chloride salts of copper, ammonium, alkali metals and alkaline earth metals, and hydrochloric acid.

14. The process according to claim 1, wherein the step b) is performed by at least one stirrer being an impeller.

15. The process according to claim 1, wherein a plurality of oxidation reactors are coupled in parallel.

16. The process according to claim 1, wherein the reduced copper etching solution and the oxidized copper etching solution, respectively, have a temperature in the range of from 20 to 60.

17. The process according to claim 1, wherein the oxidized copper etching solution comprises copper in a total concentration within the range of from 80 to 260 g/L, Cu.sup.+ in a concentration within the range of from 0 to 19.5 g/L, HCl (aq) in a concentration within the range of from 1 to 4 mol/L, and Cl.sup. in a total concentration within the range of from 2.5 to 12 mol/L.

18. The process according to claim 1, wherein the reduced copper etching solution comprises copper in a total concentration within the range of from 81 to 260 g/L, Cu.sup.+ in a concentration within the range of from 0.01 to 20 g/L, HCl (aq) in a concentration within the range of from 1 to 4 mol/L, and Cl.sup. in a total concentration within the range of from 2.5 to 12 mol/L.

19. The process according to claim 1, wherein the oxidized copper etching solution comprises copper in a total concentration within the range of from 80 to 260 g/L, Cu.sup.+ in a concentration within the range of from 0 to 19.5 g/L, HCl (aq) in a concentration within the range of from 0.01 to 1 mol/L, and Cl.sup. in a total concentration within the range of from 2.5 to 12 mol/L.

20. The process according to claim 1, wherein the reduced copper etching solution comprises copper in a total concentration within the range of from 81 to 260 g/L, Cu.sup.+ in a concentration within the range of from 0.01 to 20 g/L, HCl (aq) in a concentration within the range of from 0.01 to 1 mol/L, and Cl.sup. in a total concentration within the range of from 2.5 to 12 mol/L.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) Referring now to the Figures, which are exemplary embodiments, wherein:

(2) FIG. 1 is a flow chart depicting one example of a process of oxidizing copper in a copper etching solution by using oxygen gas and/or air as an oxidizing agent according to the present invention.

(3) FIG. 2 is a schematic representation depicting one example of introduction of oxygen gas and/or air directly into an oxidation reactor.

(4) FIG. 3 is a is schematic representation depicting one example of introduction of oxygen gas and/or air into a feeding pipe conducting reduced copper etching solution upstream of an oxidation reactor.

(5) FIG. 4 is a schematic representation depicting one example of the inventive process.

(6) FIG. 5 is a schematic representation depicting a full scale example of the inventive process.

(7) FIG. 6 is a cross section of a copper conductor of a printed circuit board, which has been produced in a conventional etching process using a conventional copper etching solution, comprising a high amount of acid.

(8) FIG. 7 is a cross section of a copper conductor of a printed circuit board, which has been produced in the inventive process using a conventional copper etching solution comprising a high amount of acid.

(9) FIG. 8 is a part of a printed circuit board prepared by a cross section of a copper conductor of the printed circuit board, which has been produced in the inventive process using an improved copper etching solution comprising a low amount of acid.

DETAILED DESCRIPTION OF THE INVENTION

(10) Examples of the process according to two embodiments of the present invention will now be described in more detail with reference to the schematic representations in FIGS. 3-4 and FIG. 5, respectively. However, the general concepts of the process will be described firstly referring to the flowchart in FIG. 1 and a simple embodiment shown in FIG. 2. Referring to FIGS. 6-8, experimental results will be described more in detail.

(11) FIG. 1 shows a flow chart of a process 100 of oxidizing copper in a copper etching solution by using oxygen gas and/or air as an oxidizing agent according to the present invention. In a first step 101, the oxidizing agent is introduced into a reduced copper etching solution comprising Cl.sup. and Cu.sup.+. In a second step 102, the solution obtained in step 101 is mixed to form a mixed solution. The mixing step may be performed e.g. by static mixers in a feeding pipe and/or by impellers in an oxidation reactor. Typically the mixing is performed by at least one impeller, so called stirring.

(12) The process of the present invention typically takes place in a system for producing etched printed circuit boards. The two main components of such a system are an etching machine and an oxidation reactor, which are directly fluidly connected with each other, e.g. by a feeding pipe, thereby forming a closed circuit. In FIG. 2, the oxidation reactor 22 is schematically shown.

(13) In the etching machine, printed circuit boards are contacted with a copper etching solution comprising Cu.sup.2+ in order to allow the etching reaction (i) to occur.
Cu.sup.0+Cu.sup.2+.fwdarw.2Cu.sup.+(i)

(14) An oxidized copper etching solution comprising Cu.sup.2+ is introduced into the etching machine, and subsequent to the etching reaction (i), a reduced copper etching solution comprising less Cu.sup.2+ than the oxidized copper etching solution is obtained. Subsequently, the reduced copper etching solution 20 is removed from the etching machine and supplied to the oxidation reactor via a feeding pipe.

(15) In the oxidation reactor 22, the reduced copper etching solution 20 is oxidized by an oxidizing agent 21, i.e. oxygen gas and/or air, according to the oxidation reaction (ii), thereby producing an oxidized copper etching solution 23 exiting the oxidation reactor, and which may be reused in the etching machine.
2Cu.sup.++O.sub.2(aq)+2H.sup.+.fwdarw.2Cu.sup.2++H.sub.2O(ii)

(16) In FIG. 2, the continuous oxidation reactor, schematically shown, may have a reactor volume of 0.5 m.sup.3. More than one continuous oxidation reactor may be present, typically in parallel as shown in FIG. 5. The liquid steady state flow may be selected such as to provide a retention time of the liquid in each of the continuous oxidation reactors to ensure sufficient reduction of Cu.sup.+. This is knowingly to the skilled man done by varying the reactor volume or the reactor volumes and the liquid flow through the reactor or reactors.

(17) The oxidizing agent, i.e. pure oxygen gas and/or air, may be introduced into the reduced copper etching solution upstream of the oxidation reactor, such as in the feeding pipe, (e.g. shown in FIGS. 3-4) or inside of the oxidation reactor (e.g. shown in FIG. 2). The oxidizing agent may be introduced both in the feeding pipe and in the oxidation reactor (embodiment not shown).

(18) In FIGS. 3-4, oxygen gas and/or air 31, 41 is introduced into a feeding pipe conducting reduced copper etching solution 30, 40, upstream of an oxidation reactor 32, 42, thereby forming a solution 34, 44. The feeding pipe is fluidly connecting the etching machine 45 (shown in FIG. 4) and the oxidation reactor 32, 42. The solution 34, 44 is introduced into the oxidation reactor 32, 42 via the bottom of the oxidation reactor 32, 42. The oxidation reactor herein comprises two impellers, for obtaining agitation in the oxidation reactor. One of the impellers is placed above in proximity of the inlet of the oxidation reactor 32, 42, which may suck the introduced solution and eject it to the towards the periphery of the oxidation reactor 32, 42, where baffles of the impeller are promoting agitation of the oxygen gas in the solution. The size of the bubbles of oxygen gas is further reduced, such as to increase the overall contacting surface between the gas phase and the liquid phase to promote the mass transfer of oxygen gas into the liquid solution. Dissolved oxygen is then available for reacting with Cu.sup.+ and H.sup.+ in the solution, such as to oxidize the Cu.sup.+ to Cu.sup.2+. An oxidized copper etching solution 33, 43 comprising less amount of Cu.sup.+ than in the reduced copper etching solution 30, 40, is leaving the oxidation reactor 32, 42, from the top of the oxidation reactor 32, 42.

(19) In the oxidation reactor 22, 32, 42, 52 the pressure can be reduced compared to the pressure in the feeding pipe conducting the reduced copper etching solution 20, 30, 40, 50, and optionally the oxidizing agent 31, 41, 51. Typically, the pressure in the oxidation reactor is in the range of from 0 to 0.1 bar overpressure. Due to the pressure difference, a portion of the previously dissolved oxygen forms small gas bubbles upon entry into the oxidation reactor.

(20) The reduced copper etching solution and the oxidizing agent, either in a combined flow (e.g. shown in FIGS. 3-5) or in separate flows (e.g. shown in FIG. 2), are typically introduced into the oxidation reactor via the bottom of the oxidation reactor. The oxidized copper etching solution is typically removed from top of the oxidation reactor. Thus, the inlet of the oxidation reactor is typically arranged in the bottom of the oxidation reactor and the outlet of the oxidation reactor is typically arranged at the top of the oxidation reactor.

(21) The reduced copper etching solution and the oxidized etching solution may comprise a relatively high or a relatively low content of HCl (aq) (see Table 1). In the case of a relatively low content of HCl (aq), an additional salt of chloride is added in order to assure a total content of Cl.sup. in the range of from 2.5 to 12 mol/L in the two solutions, i.e. in the oxidized copper etching solution comprising a low amount of acid and in the reduced copper etching solution comprising a low amount of acid. Table 1 shows the different concentration intervals of the different compounds comprised in the reduced copper etching solution, comprising a low and a high concentration of acid, respectively, and the oxidized copper etching solution comprising a low and a high concentration of acid, respectively.

(22) The relatively high content of HCl (aq) has the advantage of facilitating the oxidation reaction.

(23) The relatively low content of HCl (aq) has the advantage of improved etching result and an improved working environment. At the low content of HCl (aq), it may be necessary to add a salt of Cl.sup., such as NaCl, in order to complex bind with Cu.sup.+ ions such that these will not negatively impact the etching speed.

(24) Thereby, the total concentration of Cl.sup. may be at quite similar levels in both copper etching solutions comprising a low and a high amount of acid, respectively.

(25) TABLE-US-00001 TABLE 1 Concentration intervals of the different compounds comprised in the oxidized copper etching solution comprising a low amount of acid and a high amount of acid, respectively, and in the reduced copper etching solution comprising a low amount of acid and a high amount of acid, respectively. Oxidized Oxidized Reduced Reduced copper copper copper copper etching etching etching etching solution solution solution solution comprising comprising comprising comprising a low a high a low a high amount amount amount amount Compound of acid of acid of acid of acid Total 80-260 80-260 81-260 81-260 concentration of copper [g/l] Cu.sup.+ [g/l] 0-19.5 0-19.5 0.5-20 0.5-20 HCl (aq) [mol/l] 0.01-1 1-4 0.01-1 1-4 Total Cl.sup. [mol/l] 2.5-12 2.5-12 2.5-12 2.5-12

(26) The concentration of HCl (aq) in the oxidized copper etching solution is higher than 0.01 mol/L. By keeping the concentration of HCl (aq) above 0.01 mol/L, precipitation of copper hydroxide and a negative influence on the speed of the oxidation reaction (ii), respectively, can be avoided. It has further been tested with a concentration of Cu.sup.+ in a range of from 0.01 to 20 g/l in a solution comprising a low amount of acid and a solution comprising a high amount of acid, respectively.

(27) More specific concentration ranges of the chemical composition of the reduced copper etching solution having a low amount of acid obtained subsequent to reaction (i) is shown in Table 2.

(28) TABLE-US-00002 TABLE 2 Composition of the reduced copper etching solution having a low amount of acid obtained subsequent to reaction (i). Total concentration of copper 105-240 g/L Cu.sup.+ 5-8 g/L total Cl.sup. 3.4-7.7 mol/L HCl (aq) 0.05 mol/L

(29) More specific concentration ranges of the chemical composition of the oxidized copper etching solution having a low amount of acid obtained subsequent to reaction (ii) is shown in Table 3.

(30) TABLE-US-00003 TABLE 3 Composition of the oxidized copper etching solution having a low amount of acid obtained subsequent to reaction (ii). Total 104-239 g/L concentration of copper Cu.sup.+ 3-6 g/L total Cl.sup. 3.4-7.7 mol/L CuCl.sub.2 (+NaCl/KCl/NH.sub.4Cl/MgCl.sub.2/CaCl.sub.2) HCl (aq) >0.01 mol/L, such as 0.02 mol/L

(31) The ratio of the concentration of monovalent copper ions Cu.sup.+ to the concentration of divalent copper ions Cu.sup.2+ is typically kept substantially constant in the etching machine.

(32) The total content of copper (Cu.sup.+ and Cu.sup.2+ in combination) in the system is typically kept substantially constant. The total content of copper may be within the range of from 80 to 260 g/L.

(33) It is important to keep the concentration of reduced copper ions Cu.sup.+ low in the oxidized copper etching solution. By adding a high amount of salt of chloride into the copper etching solution, chloride ions may bind these copper ions to form a complex, CuCl.sub.2.sup., which form a complex according to the reaction (iii) during the etching process. Examples of suitable salts of chloride are NaCl, KCl, MgCl.sub.2, CaCl.sub.2 and/or NH.sub.4Cl.
Cu.sup.++2Cl.sup..fwdarw.CuCl.sub.2.sup.(iii)

(34) The supply of oxidizing agent into the reduced copper etching solution may occur through a valve being controlled by a sensor measuring the redox potential (ORP) in the copper etching solution present in the etching machine. The sensor may have two critical limits for the redox potential, wherein the first limit indicates a need of additional supply of oxidizing agent and the second limit indicates a need of maximum supply of oxidizing agent is required. When using a sensor based on a Pt electrode having an Ag/AgCl electrode as reference, a divalent copper ion concentration of around 180 g/L, a monovalent copper ion concentration of around 8 g/L, a sodium chloride concentration of around 3.5 mol/L corresponding to a total chloride of 9.4 mol/L, the two critical limits have been measured to +510 mV and +505 mV, respectively.

(35) A process control system, introduced in the paragraph above, may sense the level of Cu.sup.+ in the etch machine by measuring the redox potential. An increased level of Cu.sup.+ in the reduced copper etching solution causes a drop in the potential, eventually to a value below the critical limit. At the critical limit, a given flow of oxidizing agent can be supplied to the oxidation system. If the potential continues to drop, the gas flow of oxidizing agent can be set to successively higher levels. Eventually, at the second critical limit of a minimum redox potential, a level of maximum gas flow is supplied allowing the potential to increase and the oxidation and a balanced steady state situation can be attained in the oxidation reactor.

(36) A steady state flow situation may thereby be obtained by means of the process control system, where the oxidized copper etching solution having a relatively lower content of Cu.sup.+ balances the generation of Cu.sup.+ through the etching reaction, such that the concentration of monovalent copper ions remains at an essentially constant level seen in the etching machine.

(37) The feeding pipe typically comprises at least one static mixer, preferably a plurality of static mixers, enabling turbulent flow and overpressure inside the feeding pipe. Typically, the oxidizing agent is introduced into the feeding pipe upstream of the static mixer(s). The turbulent conditions will ensure a uniform distribution of the dissolved oxygen in the liquid phase. The feeding pipe may further include valves adapted to further regulate the pressure inside the feeding pipe and to maintain the turbulent flow. Herein, the feeding pipe has an overpressure of 1 bar. The overpressure increases the solubility of the oxidizing agent, herein the pure oxygen gas, in the copper etching solution, with reference to Henry's Law.

Example 1: Full-Scale Test Comprising the Process

(38) A full-scale test was performed in a system comprising two oxidation reactors arranged in parallel, schematically shown in FIG. 5. The volume of each of the oxidation reactors was 0.5 m.sup.3. The system further comprised an etching machine 55 consisting of three modules. The etching modules had in total a working capacity of 1.2 m.sup.3 copper etching solution. Consequently, the system in total had a total working capacity of 2.2 m.sup.3 copper etching solution.

(39) Reduced copper etching solution 50 was supplied to a pump from the bottom of the etching machine via a feeding pipe. A common feeding pipe conducts the reduced copper etching solution to the pump, and from the pump to the oxidation reactors 52a-b, the reduced copper etching solution is conducted in two parallel feeding pipes, one to each oxidation reactor.

(40) Closely downstream of the pump, each of the two feeding pipes are provided with an inlet for the oxidizing agent comprising a valve. The valves are controlled by sensors.

(41) Downstream of the inlet for oxidizing agent 51a-b, each of the two feeding pipes is provided with a static mixer 56a-b providing overpressure and turbulent flow.

(42) In between the static mixers and the oxidation reactors, manometers and additional valves may be provided to adjust the flow and the overpressure on the fluid before entry into each of the oxidation reactor. This example was conducted with an overpressure of 0.8 bar which increases the solubility of the oxidizing agent, herein the pure oxygen gas in the copper etching solution, with reference to Henry's Law.

(43) The feeding pipe is arranged such that it forms an inlet for the mixed copper etching solution 54a-b in the bottom of the oxidation reactor. A first impeller is arranged above the inlet in order to agitate it inside of the oxidation reactor. The impeller creates turbulent agitation facilitating the mass transfer of oxygen between the gaseous phase and the liquid phase and further distribution throughout the liquid volume. Above of the first impeller, a second impeller is arranged to provide further agitation.

(44) The oxidation reactor comprises a stirrer, herein an impeller, with a speed of 294 rpm, such as to form agitation and turbulence also inside of the oxidation reactor. Preferably, the stirrer is selected such as to allow agitation in substantially the entire reactor volume. The agitation disperses the oxygen gas bubbles in the liquid phase of the copper etching solution creating a large contacting surface between the liquid phase of the copper etching solution and the gaseous phase of the gas bubbles, thereby accelerating the oxidation reaction (ii) by promoting mass transfer of oxygen through the contacting surface between the gaseous phase and the liquid phase. Due to the turbulent conditions in the liquid phase oxygen having passed the phase boundary will be homogenously distributed in the liquid phase where it is consumed according to the reaction above (ii).

(45) The oxidation reactors further comprise an internal circulation system comprising pumps and venturi injectors. The internal circulation system assists in generation of small bubbles within the liquid phase which increases the efficiency of the oxidizing agent used in the system.

(46) At the top of each oxidation reactor 52a-b, an outlet, herein overflow, for the oxidized copper etching solution 53a-b is arranged. The outlet flows from each of the two oxidation reactors may be combined 53 and connected to a return pipe fluidly connected to the etching machine 55.

(47) In the full-scale test, using an copper etching solution with a relatively low content of HCl (aq), a divalent copper ion concentration of about 180 g/L, a monovalent copper ion concentration of about 8 g/L, a sodium chloride concentration of about 3.5 mol/L corresponding to a total chloride of 9.4 mol/L and a flow of pure oxygen gas at 28 Nm.sup.3/h, the system managed an etching load of 45 kg copper/h without falling below a redox potential (ORP) of +505 mV.

(48) In the full-scale test, a conventional pH electrode was used to control the dosage of concentrated hydrochloric acid into the copper etching solution in the etching machine in order to keep the concentration of HCl (aq) constant and low, herein, at 0.05 mol/L. Further, a conventional density sensor was used to control the dosage of water into the copper etching solution in the etching machine in order to keep the total concentration of copper constant, herein, at 190 g/L. The target value for the density was 1.42 g/cm.sup.3.

(49) TABLE-US-00004 TABLE 4 Parameters in a specific example. Volume of each of the two oxidation reactors 0.5 m.sup.3 Dimension of each of the two oxidation 0.74 0.74 1.34 m reactors (L W H) Diameter of the feeding pipe 75 mm Volume of each of the three etch modules 0.4 m.sup.3 Retention time of the copper etching solution 0.05 h inside each of the two oxidation reactors Etching load of copper 45 kg/h Redox potential (ORP) >+505 mV Liquid volume flow 24 m.sup.3/h Gas volume flow of pure oxygen 28 Nm.sup.3/h Speed of the impeller inside the oxidation 294 rpm reactor Overpressure inside the feeding pipe 0.8 bar Overpressure inside the oxidation reactor 0 bar Temperature of the reduced copper etching 50 C. solution Temperature of the oxidized copper etching 50 C. solution Concentration of HCl (aq) in the copper 0.05 mol/L etching solution Total concentration of copper in the copper 190 g/L etching solution Density of copper etching solution 1.42 g/cm.sup.3

(50) Ventilation of the oxidation reactor(s) were connected to the etching system whereby excess oxidizing agent could exit through the process ventilation of the etching line. The exited oxidizing agent may be recirculated to the oxidation reactor(s).

Example 2: Etched Flanks of Copper Conductors

(51) As described above, the conductor of a printed circuit board preferably has flanks with a vertical profile. The inventive process produces flanks having a straighter vertical profile than one obtained in conventional processes. In this way they, conductors of the printed circuit board may be produced closer to each other without jeopardizing the quality of the printed circuit board.

(52) FIG. 6 shows a part of a printed circuit board, and more specifically a cross section of a copper conductor 60 of the printed circuit board, which has been produced by a conventional combined etching and oxidation process using a conventional copper etching solution comprising a high amount of acid.

(53) In the conventional etching and oxidation process, the oxidation agent was hydrogen peroxide. The hydrogen peroxide was added to the etching machine via a venturi pipe. Thus, the oxidation of copper took place in the etching machine. No extra mixing was performed except the mixing naturally occurring in the venturi pipe and an internal circulation between the three etching modules enforced by a circulation pump.

(54) The conventional copper etching solution comprising a high amount of acid, as measured in the etching machine, used in the conventional etching and oxidation process had a composition comprising: total copper: 115 g/L; Cu.sup.+: 2 g/L; HCl (aq): 3.5 mol/L; NaCl: 0 mol/L; total Cl.sup.: 7.1 mol/L.

(55) The copper conductor was photographed in a microscope allowing the dimensions of the copper conductor to be measured. The copper conductor 60 has an upper width x.sub.2, a lower width x.sub.1, a first flank width x.sub.3, and a second flank width x.sub.4. The upper width x.sub.2 has been measured to 230.9 m, the lower width x.sub.1 to 289 m, the first flank width to 29.1 m, and the second flank width x.sub.4 to 28 m. The height y of the copper conductor 60 is 84 m.

(56) FIG. 7 shows a part of a printed circuit board, and more specifically a cross section of a copper conductor 70 of the printed circuit board, which has been produced by a conventional etching process combined with an inventive oxidation process using a conventional copper etching solution.

(57) In the inventive oxidation process, the oxidation agent was oxygen gas. The oxygen gas was added to a feeding pipe downstream of the etching machine and upstream of an oxidation reactor. Thus, the oxidation of copper took place in the feeding pipe and/or the oxidation reactor. Mixing was performed in the feeding pipe using one static mixer, and/or in the oxidation reactor using two impellers.

(58) The conventional copper etching solution, comprising a high amount of acid, as measured in the etching machine, used in the inventive oxidation process had a composition comprising: total copper: 115 g/L; Cu.sup.+: 2 g/L; HCl (aq): 3.5 mol/L; NaCl: 0 mol/L; total Cl.sup.: 7.1 mol/L.

(59) The copper conductor was photographed in a microscope allowing the dimensions of the copper conductor to be measured. The copper conductor 70 has an upper width x.sub.2, a lower width x.sub.1, a first flank width x.sub.3, and a second flank width x.sub.4. The upper width x.sub.2 has been measured to 257.3 m, the lower width x.sub.1 to 293.3 m, the first flank width to 19.4 m, and the second flank width x.sub.4 to 17.2 m. The height y of the copper conductor 70 is 82.3 m.

(60) Thus, the copper conductor 70 shows a smaller flank width than the copper conductor 60 of FIG. 6. Hence the inventive oxidation process using a conventional copper etching solution is producing an improved printed circuit board as compared to when a conventional combined etching and oxidation process using a conventional copper etching solution is used.

(61) FIG. 8 shows a part of a printed circuit board, and more specifically a cross section of a copper conductor 80 of the printed circuit board, which has been produced by a conventional etching process combined with an inventive oxidation process using a copper etching solution comprising a low amount of acid.

(62) In the inventive oxidation process, the oxidation agent was oxygen gas. The oxygen gas was added to a feeding pipe downstream of the etching machine and upstream of an oxidation reactor. Thus, the oxidation of copper took place in the feeding pipe and/or the oxidation reactor. Mixing was performed in the feeding pipe using one static mixer, and/or in the oxidation reactor using two impellers.

(63) The copper etching solution comprising a low amount of acid, as measured in the etching machine, used in the inventive oxidation process had a composition comprising: total copper: 190 g/L; Cu.sup.+: 8 g/L; HCl (aq): 0.05 mol/L; NaCl: 3.5 mol/L; total Cl.sup.: 9.4 mol/L.

(64) The copper etching solution comprising a low amount of acid, had a markedly lower concentration of HCl (aq) than the conventional copper etching solution. Instead, the chloride ions of the copper etching solution comprising a low amount of acid were provided by addition of a salt of chloride, namely, NaCl.

(65) The copper conductor was photographed in a microscope allowing the dimensions of the copper conductor to be measured. The copper conductor 80 has an upper width x.sub.2, a lower width x.sub.1, a first flank width x.sub.3, and a second flank width x.sub.4. The upper width x.sub.2 has been measured to 264.8 m, the lower width x.sub.1 to 294.9 m, the first flank width to 14.5 m, and the second flank width x.sub.4 to 12.9 m. The height y of the copper conductor 80 is 85 m.

(66) Thus, the copper conductor 80 shows a smaller flank width than both of the copper conductor 60 of FIG. 6 and the copper conductor 70 of FIG. 7. Hence the inventive oxidation process using the copper etching solution comprising a low amount of acid is producing an improved printed circuit board as compared to both when a conventional combined etching and oxidation process using a conventional copper etching solution, and when the inventive oxidation process using a conventional copper etching solution, respectively, is used.