Flow rate range variable type flow rate control apparatus
09921089 ยท 2018-03-20
Assignee
- Fujikin Incorporated (Osaka, JP)
- National University Corporation Tohuku University (Miyagi, JP)
- TOKYO ELECTRON LTD. (Tokyo, JP)
Inventors
- Tadahiro Ohmi (Miyagi, JP)
- Masahito Saito (Tokyo, JP)
- Shoichi Hino (Tokyo, JP)
- Tsuyoshi Shimazu (Miyagi, JP)
- Kazuyuki Miura (Miyagi, JP)
- Kouji Nishino (Osaka, JP)
- Masaaki Nagase (Osaka, JP)
- Katsuyuki Sugita (Osaka, JP)
- Kaoru Hirata (Osaka, JP)
- Ryousuke Dohi (Osaka, JP)
- Takashi HIROSE (Osaka, JP)
- Tsutomu Shinohara (Osaka, JP)
- Nobukazu Ikeda (Osaka, JP)
- Tomokazu Imai (Osaka, JP)
- Toshihide Yoshida (Osaka, JP)
- Hisashi Tanaka (Osaka, JP)
Cpc classification
Y10T137/87499
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10T137/86734
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
G01F1/6847
PHYSICS
Y10T137/776
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10T137/8741
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10T137/87298
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10T137/87684
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10T137/87314
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10T137/7761
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10T137/87354
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10T137/0379
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10T137/87265
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10T137/86815
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
G01F7/005
PHYSICS
Y10T137/87306
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10T137/7759
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
G01F5/005
PHYSICS
Y10T137/87539
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
G05D7/0652
PHYSICS
International classification
G01F1/36
PHYSICS
G01F1/684
PHYSICS
Abstract
A pressure type flow rate control apparatus is provided wherein flow rate of fluid passing through an orifice is computed as Qc=KP1 (where K is a proportionality constant) or as Qc=KP2.sup.m (P1-P2).sup.n (where K is a proportionality constant, m and n constants) by using orifice upstream side pressure P1 and/or orifice downstream side pressure P2. A fluid passage between the downstream side of a control valve and a fluid supply pipe of the pressure type flow rate control apparatus comprises at least 2 fluid passages in parallel, and orifices having different flow rate characteristics are provided for each of these fluid passages, wherein fluid in a small flow quantity area flows to one orifice for flow control of fluid in the small flow quantity area, while fluid in a large flow quantity area flows to the other orifice for flow control of fluid in the large flow quantity area.
Claims
1. A flow rate range variable type flow rate control apparatus comprising: (a) a thermal type mass flow rate control apparatus comprising (i) a flow rate control valve connected to a first fluid passage; (ii) a laminar flow element device part disposed on the first fluid passage; and (iii) a flow rate sensor part, wherein temperature changes in proportion to a mass flow rate of fluid are detected at the flow rate sensor part, and fluid with a predetermined set flow rate is made to flow out by opening or closing the flow rate control valve based on detected temperature of fluid flowing in the first fluid passage; and (b) a second fluid passage bypassing the flow rate sensor part and leading to the flow rate control valve arranged in parallel with the first fluid passage, wherein the second fluid passage is provided with a laminar flow element and a switching valve, wherein fluid flowing in a small flow quantity range is made not to flow to at least one laminar flow element provided to the second fluid passage while fluid flowing in a large flow quantity range is made to flow to the at least one laminar flow element.
2. A flow rate range variable type flow rate control apparatus as claimed in claim 1, wherein two second fluid passages are arranged in parallel, and the corresponding two laminar flow elements include a coarse laminar flow element and a fine laminar flow element, and a control range of fluid flow rate is switched by operating switching valves respectively provided on each second fluid passage.
3. The flow rate range variable type flow rate control apparatus according to claim 1, wherein when fluid is flowing in the large flow quantity range each switching valve in the second fluid passage are made to be open.
4. The flow rate range variable type flow rate control apparatus according to claim 1, wherein, in response to receiving a flow rate setting signal, the thermal type mass flow rate control apparatus is switched to a flow rate setting suitable for a large flow quantity, a medium flow quantity or a small flow quantity setting.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
(1)
(2)
(3)
(4)
(5)
(6)
(7)
LIST OF REFERENCE NUMBERS AND CHARACTERS
(8) FCS pressure type flow rate control apparatus MFC thermal type mass flow rate control apparatus 1 control part 2 control valve 3 orifice primary side pipe 4 driving part 5 fluid supply pipe 6 pressure sensor 8a orifice for a small flow quantity 8b orifice for a medium flow quantity 8c orifice for a large flow quantity 32 No. 1 switching electro-magnetic valve 33 No. 2 switching electro-magnetic valve 34 No. 1 switching valve 34a valve driving part 34b proximity sensor 35 No. 2 switching valve 35a valve driving part 35b proximity sensor 36 control part 36a bridge circuit 37 flow rate control valve 38, 38a, 38b laminar flow element bypasses 39 flow rate sensor part 40a, 40b fluid passages 41, 42 switching valves
BEST MODE OF CARRYING OUT THE INVENTION
Embodiment 1
(9) Referring to the drawings, embodiments of the present invention are described as follows.
(10)
(11) The afore-mentioned switching electro-magnetic valves 32, 33, which have been disclosed, are air operation type electro-magnetic valves. When switching signals C.sub.1, C.sub.2 are inputted from the control part 1 so that switching electro-magnetic valves 32, 33 start working and a driving gas (0.40.7 MPa) Gc is supplied. Thus, the driving gas Gc is supplied to valve driving parts 34a, 35a of the switching valves, and the switching valves 34, 35 start operating for opening and closing. Furthermore, operation of both switching valves 34, 35 is detected by proximity switches 34b, 35b installed on the valve driving parts 34a, 35a, and a corresponding signal is inputted to the control part 1. With present embodiments of the invention, for each switching valve 34, 35 a pneumatically operated normally closed type valve has been employed.
(12) Pipes 5a, 5b, 5c, 5d, 5e and 5f, shown in
(13) More specifically, in the case that the maximum flow rate to be controlled is, for example, 2000 SCCM (Standard Cubic Centimeters per Minute), an orifice for the maximum flow rate of 20 SCCM is employed as the orifice 8a for small flow quantity, an orifice for the maximum flow rate of 200 SCCM is employed as the orifice 8b for medium flow quantity, and an orifice for the maximum flow quantity of 1780 SCCM is employed as the orifice 8c for large flow quantity, respectively. Namely, in the case that flow rate is controlled for a small flow quantity less than 20 SCCM, the switching signal S.sub.S is inputted to the control part, the driving gas Gc is sent to the No. 2 switching valve 35 by releasing No. 2 electro-magnetic switching valve 33, and the No. 2 switching valve 35 is released (while the No. 1 switching valve 34 is maintained in a state of closing). As a result, fluid flows to pipe 5 through pipe 3, orifice 8a for small flow quantity, pipe 5b, valve 35, orifice 8c for large flow quantity, pipe 5c and pipe 5d, orifice 8b for medium flow quantity, and pipe 5f, and thus the flow rate Q.sub.L of the fluid being controlled as Q=K.sub.LP.sub.1 (where K.sub.L is a constant specific to the orifice 8a for small flow quantity). Also, the flow rate characteristics of the apparatus of
(14) In the case wherein the flow rate to be controlled is 200 SCCM (i.e., for approximately medium flow quantity), the No. 1 switching valve 34 is switched to the state of opening (i.e., opened) and the No. 2 switching valve 35 is switched to the state of closing (i.e., closed), and fluid is made to flow to orifice 8b for medium flow quantity through pipe 3, pipe 5a, valve 34, pipe 5b and pipe 3 again, and through orifice 8a for small flow quantity. Thus, in this case, the flow rate Q.sub.M of the fluid being controlled as Q=K.sub.MP.sub.1 (where K.sub.M is a constant specific to the orifice 8b for medium flow quantity). The flow rate characteristics in this case are shown by curve B shown in
(15) In addition, in the case wherein the flow rate to be controlled is 2000 SCCM (i.e., the maximum flow rate), both switching valves 34, 35 are released through the mediation of both switching electro-magnetic valves 32, 33, and fluid is supplied to pipe 5 through pipe 3, pipe 5a, valve 34, valve 35, the orifice 8c for large flow quantity, pipe 5c and the orifice 8a for small flow quantity, the orifice 8b for medium flow quantity, and pipe 5f. In this case, the flow rate of the fluid is controlled mainly by orifice 8c for large flow quantity as a flow rate Q.sub.M=K.sub.MP.sub.1 (where K.sub.M is a constant specific to an orifice 8c for large flow quantity). However, strictly speaking, the flow rate of pipe 5 is controlled as the sum of the flow rate Q.sub.M=K.sub.MP.sub.1 passing through orifice 8b for medium flow quantity and the flow rate Q.sub.L=K.sub.LP.sub.1 passing through orifice 8c for large flow quantity. Also, in this case, flow rate characteristics are shown by curve C shown in
Embodiment 2
(16)
(17) In accordance with the afore-mentioned flow rate control apparatus shown in
(18) As described above, in accordance with the first two embodiments of the present invention, the accuracy of flow rate control with an error of less than 1% set point becomes possible over a wide flow rate control range of, for example, 2 SCCM2000 SCCM, by means of appropriately combining orifice 8c for large flow quantity and orifice 8a for small flow quantity (or orifice 8c for large flow quantity, orifice 8b for medium flow quantity and orifice 8a for small flow quantity). A swift switching operation is required, however, to change the flow rate of a gas when the flow rate control is performed using orifice 8a for small flow quantity. In such a case, with the present invention, the pressure drop time for a pipe on the orifice secondary side can be easily shortened by installing bypass passages (5a, 34, 8c, 5c) in parallel with the flow passage in which orifice 8a is disposed, and releasing the bypass passages.
(19) Furthermore, in accordance with the two embodiments of the present invention described above, because the apparatus is constructed so that the flow rate control of fluid is performed under a critical condition, the computed flow rate Q can be converted to the flow rate of a gas in use by making use of a so-called flow factor F.F. even when a type of gas flowing is changed. Thus, it is possible that excellent properties of the pressure type flow rate control apparatus may be fully utilized. However, accuracy of flow rate control in a state outside of the critical condition of the fluid, wherein a pressure type flow rate control apparatus used in the first two embodiments of the present invention is employed, is shown in
Embodiment 3
(20)
(21) In
FEASIBILITY OF INDUSTRIAL USE
(22) The present invention can be applied to fluid supplying facilities for various kinds of fluid used with industries such as semiconductor manufacturing, chemical goods manufacturing, pharmaceutical products manufacturing, foods processing, and the like.