Coherent diffractive imaging with arbitrary angle of incidence
09891584 ยท 2018-02-13
Assignee
Inventors
- Bosheng Zhang (Pleasanton, CA, US)
- Matthew D. Seaberg (San Mateo, CA, US)
- Daniel E. Adams (Boulder, CO, US)
- Henry C. Kapteyn (Boulder, CO, US)
- Margaret M. Murnane (Boulder, CO, US)
Cpc classification
G02B27/4205
PHYSICS
G03H2001/0825
PHYSICS
G03H2001/005
PHYSICS
G02B21/0016
PHYSICS
G03F7/70625
PHYSICS
G01N2223/33
PHYSICS
G01N23/20
PHYSICS
G03H1/0443
PHYSICS
G03H2001/0473
PHYSICS
G03H1/0866
PHYSICS
G21K2207/005
PHYSICS
G03H2001/0456
PHYSICS
International classification
G01N23/20
PHYSICS
G02B27/42
PHYSICS
Abstract
Apparatus and methods for coherent diffractive imaging with arbitrary angle of illumination incidence utilize a method of fast remapping of a detected diffraction intensity pattern from a detector pixel array (initial grid) to a uniform spatial frequency grid (final grid) chosen to allow for FFT on the remapped pattern. This is accomplished by remapping the initial grid to an intermediate grid chosen to result in a final grid that is linear in spatial frequency. The initial grid is remapped (generally by interpolation) to the intermediate grid that is calculated to correspond to the final grid. In general, the initial grid (x,y) is uniform in space, the intermediate grid ({tilde over (x)},{tilde over (y)}) is non-uniform in spatial frequency, and the final grid ({tilde over (f)}.sub.x,{tilde over (f)}.sub.y) is uniform in spatial frequency.
Claims
1. A method of Coherent Diffractive Imaging (CDI) with arbitrary angle of incidence comprising the steps of: (a) illuminating an object to be imaged with an at least partially-coherent beam to generate a diffractive pattern; (b) measuring the diffractive pattern with a detector and generating an amplitude pattern (212) corresponding to an initial detector grid; (c) selecting an intermediate spatial grid according to a desired final spatial frequency grid (202), and according to orientation of the object, the detector, and the coherent beam; (d) remapping the diffractive field amplitude from the initial detector grid to an intermediate spatial grid to generate remapped pattern.
2. The method of claim 1, further including the step of processing remapped pattern and obtaining imagery.
3. The method of claim 2 wherein the step of processing includes the step of fast Fourier transforming.
4. The method of claim 1 wherein the step of illuminating is accomplished with single wavelength illumination.
5. The method of claim 1 wherein the step of illuminating is accomplished with multi-wavelength illumination.
6. The method of claim 5 wherein the multi-wavelength illumination comprises a comb of high-order harmonics.
7. The method of claim 1 wherein the initial grid is a uniform spatial grid, the intermediate grid is a non-uniform spatial grid, and the final grid is a uniform spatial frequency grid.
8. The method of claim 1 wherein the step of illuminating is accomplished with multi-wavelength illumination.
9. The method of claim 8 wherein step (a) includes the step of high harmonic generation.
10. The method of claim 1 further including the step of ptychography CDI, wherein step (b) measures multiple diffraction patterns.
11. The method of claim 1 further including the step of keyhole CDI, wherein step (a) generates illumination having a curved wavefront.
12. Apparatus for Coherent Diffractive Imaging (CDI) with arbitrary angle of incidence comprising: an object; an illumination source for illuminating the object with an at least partially-coherent beam; a beam modifying element disposed between the illumination source and the object; a detector associated with an initial uniform spatial grid for detecting a diffraction intensity pattern from the object; and a processor constructed and arranged to remap a pattern based upon the diffraction intensity pattern to an intermediate non-uniform spatial grid based upon a desired final spatial frequency grid and based upon orientations of the object, the detector, and the beam.
13. The apparatus of claim 12, further comprising a vacuum iris far upstream of the optics.
14. The apparatus of claim 12 configured in a transmission configuration.
15. The apparatus of claim 14 configured in a non-normal transmission configuration.
16. The apparatus of claim 12 configured in a reflection configuration.
17. The apparatus of claim 16 configured in a non-grazing reflection configuration.
18. The apparatus of claim 12 wherein the optics includes at least one of the following: a grazing incidence focusing optic; an off-axis mirror; a multi-layer mirror; an ellipsoidal mirror; a toroidal mirror; a spectral filter; a zero dispersion stretcher.
19. The apparatus of claim 12 wherein the illumination source provides multi-wavelength illumination.
20. The apparatus of claim 19 wherein the multi-wavelength illumination comprises a range of high-order harmonics.
21. The apparatus of claim 12 configured for ptychography CDI.
22. The apparatus of claim 12 configured for keyhole CDI.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
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DETAILED DESCRIPTION OF THE INVENTION
(11) The following table of elements and reference numbers is provided for convenience.
(12) TABLE-US-00001 10 Incident radiation 11 Object 12 Scattering field 13 Detector 14 Incident radiation before reflection 15 Mirror 17 Angle of incidence or reflection ?.sub.i 20 Incident radiation (transmission geometry) 21 Incident radiation (reflection geometry) 22 Object 24 Diffraction intensity 25 Detector 26 Diffraction intensity pattern detected 27 Initial (detector) grid (generally spatially uniform) 28 Remapped pattern on grid 29 29 Intermediate grid (chosen to result in uniform spatial frequency grid 202) 34 Step of remapping according to the present invention 35 Slow conventional remapping 44 Fourier transform magnitude on the detector grid 27 48 The step of calculating the Fourier transform magnitude 202 Final grid (generally uniform spatial frequency) 204 Prior art step of converting from detector grid 27 to a non-uniform spatial frequency grid 302 206 Step of calculating intermediate grid 29 from final grid 202 211 The distance from the sample to the detector plane z.sub.ds 212 Diffraction field magnitude calculated 302 Prior art non-uniform spatial frequency grid 501 Driving laser beam 502 Medium 503 Residual driving beam 504 Vacuum iris 505 Optics 506 Beam after optics 505 507 Off-axis focusing optics 508 Focusing mirror 509 Focused beam 510 Sample 512 Diffracted field 513 Detector
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(17) In the prior art, first the spatial frequency grid (f.sub.x,f.sub.y) 302 that corresponds to the detector grid is calculated. (f.sub.x,f.sub.y) 302 turns out to be non-uniform due to the nonlinear relationship with (x,y) 27. Then the Fourier transform magnitude is remapped from non-uniform grid (f.sub.x,f.sub.y) 302 to uniform grid ({tilde over (f)}.sub.x,{tilde over (f)}.sub.y) 202, which is a time consuming process, because remapping from a non-uniform to a uniform grid typically involves triangulation.
(18) In the implementation of the present invention, we first calculate the intermediate non-uniform spatial grid ({tilde over (x)},{tilde over (y)}) 29 that corresponds to eventual desired grid ({tilde over (f)}.sub.x,{tilde over (f)}.sub.y) 202, in step 206. Then the Fourier transform magnitude 44 is remapped from initial uniform grid (x,y) 27 to intermediate non-uniform grid ({tilde over (x)},{tilde over (y)}) 29 in step 34. Remapping from a uniform grid to a non-uniform one, instead of the other way around, is fast. The key is to choose an appropriate coordinate transform that enables the eventual usage of Fast Fourier transform, similar to what has been done in holographic microscopes (for example, see Kreuzer, U.S. Pat. No. 6,411,406 B1).
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(20) Without losing generality, any coordinate system may be chosen but for this example we select one for which the xy-plane is on the sample plane and for which the xz-plane is parallel to the incident wave vector {right arrow over (k)}.sub.0, such as coordinate system 210 in
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where ? is the sample plane, is the wavelength of the incident radiation, k=2?/? is the angular wave number, R=?{square root over ((x?x).sup.2+(y?y).sup.2+z.sup.2)} is the distance from a sample point (x, y, 0) to (x, y, z). Notice that we explicitly write out the linear phase in the field for the non-normal incidence case. Assuming |{right arrow over (r)}|>>max [|{right arrow over (r)}|, ?] and the far field condition |{right arrow over (r)}|>>D.sup.2/?, (D is the physical size of the sample) then equation (1) can be approximated with a 2D Fourier transform:
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where:
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and
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is the normalized incident wave vector.
(25) Assume z.sub.ds is the distance from the sample to the detector plane 211, {right arrow over (n)}.sub.det is the normal vector of the detector plane, then any point {right arrow over (r)}=(x, y, z) on the detector satisfy:
{right arrow over (n)}.sub.det.Math.{right arrow over (r)}=z.sub.ds(5)
(26) With equation (2), from the measured diffraction field magnitude on detector |E.sub.Det(x, y, z)| 212, the magnitude of the Fourier transform of the sample-plane E field |F[E.sub.Smp]|.sub.f.sub.
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(28) To allow for the use of fast Fourier transform (FFT) in CDI reconstructions, we need to use the E-field Fourier transform magnitude on a uniform grid of frequencies ({tilde over (f)}.sub.x,{tilde over (f)}.sub.y), instead of on a uniform grid of detector pixel coordinates which correspond to a non-uniform grid of frequencies (f.sub.x,f.sub.y). The most straightforward way to obtain |E({tilde over (f)}.sub.x,{tilde over (f)}.sub.y)| from |E(x, y, z)| is as following: first, calculate (f.sub.x,f.sub.y) for all pixel coordinates (x, y, z) using equation (3) and (4), resulting in a non-uniform grid; secondly, interpolate E magnitude from non-uniform (f.sub.x,f.sub.y) grid onto the uniform grid ({tilde over (f)}.sub.x,{tilde over (f)}.sub.y). This way is intuitive, but interpolation from a non-uniform to uniform grid is time-consuming as it typically involves triangulation methods. Instead, we use a different and much faster approach. Assume ({circumflex over (f)}.sub.x, {circumflex over (f)}.sub.x)=?({tilde over (f)}.sub.x,{tilde over (f)}.sub.y) is the chosen uniform frequency grid 202 normalized by 1/?. First we calculate the coordinates ({tilde over (x)},{tilde over (y)}) 29 corresponding to the uniform grid ({tilde over (f)}.sub.x,{tilde over (f)}.sub.y) of choice 202 from equations (3), (4) and (5) using the measured distance z.sub.ds 211 and angle ?.sub.i 17:
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Then, in step 34, we interpolate |F[E.sub.Smp]|.sub.f.sub.
(30) In summary, the steps of performing fast reforming 34 are as following: 1. The inputs are: detector grid (x,y) 27, z value for each (x,y) grid point z(x,y), calculated diffraction field magnitude on detector E.sub.Det(x, y, z) 212, a given spatial frequency grid ({tilde over (f)}.sub.x,{tilde over (f)}.sub.y) 202, and two experiment parameters ?.sub.i 17 and z.sub.ds 211. 2. Calculate the Fourier transform magnitude on the detector grid (x,y) 27: |F[E.sub.Smp](x,y)| (or |F[E.sub.Smp]|.sub.f.sub.
(31) As seen from equations (7) and (8), the fast remapping is wavelength-independent making it suitable for hyperspectral imaging in which the incident radiation contains multiple wavelengths.
(32) Although the distortion in the diffraction looks more obvious with non-normal incidence, for any diffraction measured with wide collecting angle, or high numerical aperture (NA), even for normal-incidence, it may be advisable to perform the remapping. The remapping results in a better result for any high-NA configuration simply because the spatial-frequency coordinates have a non-linear relationship with the detector pixel coordinates. An alternative to the remapping would be to use a Non-uniform FFT.
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(35) As an example, we used the imaging instrument of the present invention to image a test object, which is composed of titanium of about 30 nm thickness deposited on a silicon wafer. The fast remapping is performed on each diffraction pattern in the ptychography scan, which is composed of approximately 200 diffraction patterns. The fast remapping algorithms is beneficial for practical implementation of the microscope reconstruction step.
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(38) The microscope according to the invention has potential for applications including inspection of masks for lithography, semiconductor metrology, and general surface profilometry. It also has applications for magnetic imaging.
(39) Imaging using multiple colors in the EUV can be done sequentially; however, it is often more convenient to illuminate the sample with several colors simultaneously, then to use a ptychographic reconstruction to obtain a separate image for each illumination wavelength.
(40) With the probe reconstructed from ptychography, keyhole CDI technique can be employed to reconstruct the sample from a single diffraction pattern.
(41) Due to the ultrashort pulse nature of the HHG light source, embodiments of a microscope of the invention are capable of imaging ultrafast dynamics (changing in time), with temporal resolution of up to femtosecond or even attosecond.
(42) While the embodiments of the present invention have been described hereinabove by way of example with particularity, those skilled in the art will appreciate various modifications, additions, and applications other than those specifically mentioned, which are within the scope of this invention. For example, the fast remapping is applicable not only ptychography CDI, but also other types of CDI.