X-RAY OPTICAL ARRANGEMENT
20220351874 ยท 2022-11-03
Inventors
- Shirly BORUKHIN (Atlit, IL)
- Michael KLECKNER (Ramat-Yishai, IL)
- Aharon BAR-DAVID (Nesher, IL)
- Zeev HAREL (Kfar Saba, IL)
Cpc classification
B23H9/00
PERFORMING OPERATIONS; TRANSPORTING
B23H9/008
PERFORMING OPERATIONS; TRANSPORTING
G21K1/06
PHYSICS
International classification
G21K1/06
PHYSICS
Abstract
A method of manufacturing burr-edged reflecting tile elements for a mosaic X-ray lens configured for forming an X-ray beam comprises steps of: (a) providing a single crystal having first and second faces thereof being parallel therebetween; single crystal having crystallographic planes thereof being parallel to first and second faces of the single crystal; the first face dedicated for reflecting an X-ray beam to be incident thereto; (b) cutting the single crystal by means of a wire electrical discharging machine normally to the main faces. The step of cutting the single crystal comprises moving a wire within a cut in direction from the second face to the first face; such that burrs configured for reflecting the X-ray beam to be incident thereto are formed on edges of the cut.
Claims
1. A method of manufacturing burr-edged reflecting tile elements for a mosaic X-ray lens configured for forming an X-ray beam; said method comprising steps of: a. providing a single crystal having first and second faces thereof being parallel therebetween; single crystal having crystallographic planes thereof being parallel to first and second faces of said single crystal; said first face dedicated for reflecting an X-ray beam to be incident thereto; b. cutting said single crystal by means of a wire electrical discharging machine normally to said main faces; wherein said step of cutting said single crystal comprises moving a wire within a cut in direction from said second face to said first face; such that burrs configured for reflecting said X-ray beam to be incident thereto are formed on edges of said cut.
2. An X-ray reflecting burr-edged tile for a mosaic X-ray lens configured for forming an X-ray beam; said reflecting tile manufactured by a method comprising steps of: a. providing a single crystal having first and second faces thereof being parallel therebetween; single crystal having crystallographic planes thereof being parallel to first and second faces of said single crystal; said first face dedicated for reflecting an X-ray beam to be incident; b. cutting said single crystal by means of a wire electrical discharging machine normally to said main faces; wherein said step of cutting said single crystal comprises moving a wire within a cut in direction from said second face to said first face such that burrs edging said cut are configured for reflecting said X-ray beam to be incident thereto.
3. An X-ray lens forming an X-ray beam; said lens comprising a plurality of burr-edged crystal tiles with burrs, said plurality of reflecting tiles manufactured by a method comprising steps of: a. providing a single crystal having first and second faces thereof being parallel therebetween; single crystal having crystallographic planes thereof being parallel to first and second faces of said single crystal; said first face dedicated for reflecting an X-ray beam to be incident; b. cutting said single crystal by means of a wire electrical discharging machine normally to said main faces; wherein said step of cutting said single crystal comprises moving a wire within a cut in direction from said second face to said first face such that burrs edging said cut are configured for reflecting said X-ray beam to be incident thereto.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0010] In order to understand the invention and to see how it may be implemented in practice, a plurality of embodiments is adapted to now be described, by way of non-limiting example only, with reference to the accompanying drawings, in which
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DETATILED DESCRIPTION OF THE INVENTION
[0020] The following description is provided, so as to enable any person skilled in the art to make use of the invention and sets forth the best modes contemplated by the inventor of carrying out this invention. Various modifications, however, are adapted to remain apparent to those skilled in the art, since the generic principles of the present invention have been defined specifically to provide a method of manufacturing burr-edged reflecting tile elements for a mosaic X-ray lens configured for forming an X-ray beam, burr-edged reflecting tile elements and mosaic X-ray lenses manufactured by the aforesaid method.
[0021] According to the present invention, a method of manufacturing burr-edged reflecting tile elements for a mosaic X-ray lens configured for forming an X-ray beam is disclosed. A plurality of burr-edged reflecting tiles obtainable by the disclosed method can be arranged into an X-ray lens providing a sharper focal spot of higher intensity in comparison with a continuous curvilinear reflecting surface of an equivalent geometry. It should be emphasized that each burr-edged reflecting tile manufactured by the disclosed method converges the incident X-rays in an individual manner. Thus, a resulting focal spot is a superposition of focal spots created by the burr-edged reflecting tile forming the abovementioned X-ray lens.
[0022] Reference is now made to
[0023] Reference is now made to
[0024] Single crystal 10 is cut along cutting directions 12. It is the inherent property of the electric discharge technology to form burrs on the edges of the cuts obtained by means of the abovementioned technology.
[0025] Reference is now made to
[0026] A major use of crystal tiles is for X-ray Bragg reflection. Burr areas 14 located at the edges of element 13 provide enhanced reflection of the incident X-ray beam (not shown).
[0027] Reference is now made to
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[0029] Intensity distribution is shown on plane 32. X-rays 31 reflected from the burr areas 35 at the edges deviate from the rays reflected by the central portion of tile 30 going towards area 34 on plane 32. Side areas 33 are characterized by higher intensity in comparison with the areas neighboring thereto and even exceeding the intensity at central area 34.
[0030] The width of areas 33 depends on the cutting methods, other types of treatment as explained above, the type of material, crystal thickness and other parameters.
[0031] If the tile is relatively wide, the high reflectivity appears in areas 33 as shown in
[0032] Making the tile narrow so that the burr's reflections at the sides become closer to each other results in two hot spots coinciding at the desired location and forming a high-intensity area in the middle at the desired location. Thus, adjustment of the tile width allows to control the location and width of the high-intensity areas.
[0033] Reference is now made to
[0034] Reference is now made to
[0035] Reference is now made to
[0036] Reference is now made to
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[0043] Smooth lens 50 in
[0044] Lens 65 formed by a plurality of burr-edged tiles 60 advantageously differs from smooth lens 50 because focusing properties of each tile 60 can varied independently. Specifically, tile orientation and distance between the burrs allow to customize the intensity distribution on plane 63 (