POROUS ELECTRODES FOR SPECTROELECTROCHEMISTRY AND X-RAY STRUCTURE ANALYSES
20180031496 ยท 2018-02-01
Assignee
Inventors
- Gihan Kwon (Lemont, IL)
- Jonathan D. Emery (Chicago, IL)
- In Soo Kim (Woodridge, IL)
- Alex B. Martinson (Naperville, IL)
- David M. Tiede (Elmhurst, IL)
Cpc classification
C25D17/00
CHEMISTRY; METALLURGY
Y02E60/36
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
G01N23/20
PHYSICS
International classification
Abstract
An electrochemical cell that allows for in-situ structural characterization of amorphous thin film materials during the course of electrolysis using high-energy X-ray scattering (>50 keV). The compact and versatile cell, fabricated using a 3D printer, employs a three-electrode configuration and minimizes X-ray scattering contributions from the cell, reference and counter electrodes, as well as the working electrode support. A large surface area working electrode has a physically robust support and is largely transparent to X-rays. This design, which utilizes a three-dimensional working electrode, also greatly improves the intensity and quality of the scattered signal compared to a two-dimensional working electrode. The in-situ cell can be used not only to investigate structural evolution during electrolysis using X-ray scattering (e.g. pair distribution function), but also to perform electrochemical potential-dependent structural analysis by extended X-ray absorption fine structure. The in-situ electrochemical cell opens new opportunity to characterize amorphous thin films thinner than 70 nm.
Claims
1. An article of manufacture comprising: an in-situ cell comprising: at least three electrodes including a working electrode (W.E.), a reference electrode (R.E.), and a cell electrode (C.E.); an electrolyte system including an electrolyte line and an electrolyte source in fluid communication with the in-situ cell; and a film over the WE forming an WE electrolyte chamber.
2. The article of manufacture of claim 1, wherein the W.E. includes a substrate having a glass capillary array having a conformal conductive layer deposited thereon.
3. The article of manufacture of claim 1, wherein the glass capillary array is a microporous glass capillary array having pores with a diameter of 40 m or less and at least a 20 mm.sup.2 surface area.
4. The article of manufacture of claim 3, wherein the conformal conductive layer is less than 70 nm thick.
5. The article of manufacture of claim 2, wherein the W.E. further comprises a metallic layer deposited on the glass capillary array opposite the conductive layer.
6. The article of manufacture of claim 2, wherein the conformal conductive layer is less than 50 nm thick.
7. The article of manufacture of claim 2, further comprising the housing of magnetic stirrer and possesses a tubing and syringe pump for electrolyte flow.
8. The article of manufacture of claim 1, wherein the W.E. electrolyte chamber has a cross-section shape selected from half-moon, semi-elliptical, and semi-circular.
9. The article of manufacture of claim 7, wherein the film is 7.5 m thick.
10. The article of manufacture of claim 1, wherein the electrolyte system further including a stirrer associated with the electrolyte source and configured to stir electrolyte in the electrolyte source.
11. The article of manufacture of claim 2, wherein the electrolyte system further comprises a pump.
12. A method of characterizing a thin film within an electrochemical cell, the method comprising: depositing a thin film on a working electrode within the electrochemical cell; controlling the deposition at last in part by application of a current to a cell electrode in electrical contact with the working electrode; interacting the deposited thin film with an incident x-ray beam; measuring background scattering; and collecting CV data for the thin film.
13. The method of claim 12, wherein measuring the background scattering is at a distance q.
14. The method of claim 12, wherein the deposited thin film is less than 70 nm thick.
15. The method of claim 14, wherein the deposited thin film is less than 50 nm thick.
16. The method of claim 12, further comprising providing a continuous flow of electrolyte over the working electrode.
17. The method of claim 15, wherein providing the continuous flow further includes purging oxygen bubbles from the working electrode.
18. The method of claim 12, wherein an interaction volume for interaction for the x-rays with the deposited thin film is at least 150010.sup.6 mm.sup.3.
19. The method of claim 11, wherein the working electrode comprises a microporous glass capillary array having pores with a diameter of 40 m or less and at least a 20 mm.sup.2 surface area
Description
BRIEF DESCRIPTION OF DRAWINGS
[0009] The foregoing and other features of the present disclosure will become more fully apparent from the following description and appended claims, taken in conjunction with the accompanying drawings. Understanding that these drawings depict only several implementations in accordance with the disclosure and are therefore, not to be considered limiting of its scope, the disclosure will be described with additional specificity and detail through use of the accompanying drawings.
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[0020] Reference is made to the accompanying drawings throughout the following detailed description. In the drawings, similar symbols typically identify similar components, unless context dictates otherwise. The illustrative implementations described in the detailed description, drawings, and claims are not meant to be limiting. Other implementations may be utilized, and other changes may be made, without departing from the spirit or scope of the subject matter presented here. It will be readily understood that the aspects of the present disclosure, as generally described herein, and illustrated in the figures, can be arranged, substituted, combined, and designed in a wide variety of different configurations, all of which are explicitly contemplated and made part of this disclosure.
DETAILED DESCRIPTION OF VARIOUS EMBODIMENTS
[0021] Embodiments described herein relate generally the design of a versatile cell utilizing a three-dimensional electrode that is exceptionally useful in probing electrochemical processes in-situ using high-energy X-ray scattering and X-ray absorption spectroscopies.
[0022] Towards the goal of acquiring quality and highly resolved PDF from amorphous films relevant to electrochemical water oxidation, described herein is a macroscopic support which hosts micron-scale porous conductive materials to serve as electrodes for thin, amorphous, water-splitting catalytic films. Conventional, flat, amorphous thin films pose huge challenges due to their lack of long-range order and the small illuminated scattering area at high X-ray energy due to the thin film geometry and relatively unfocused X-ray beam. To circumvent this issue, high surface area supports were identified which are fully coincident with the large high-energy X-ray beam to be the best candidate substrate supports. One structure, inverse opal nanostructures, have often served as photoanodes for photoelectrochemical systems and should be suitable for in-situ work due to their three-dimensional high surface area and their absorption range of the sunlight.
[0023] However, these structures do not have enough mechanical strength, long-range continuity, or thickness (inverse opal films typically 10 m) to be easily applied as supports in in-situ electrochemical HEXS. Instead, a glass capillary array (GCA) was chosen as the support material due to its large, open surface area and mechanical robustness. This support, in one embodiment, has a vertical dimension of 1.1 mm which allows use of the full, high-energy X-ray at the Argonne National Lab's (ANL) Advanced Photon Source (APS), which has a vertical dimension of 0.5 mm, for structural analysis of surface-supported materials. Its porous nature reduces scattering and absorption by the support itself, thereby increasing the incident X-ray flux on the thin film during in-situ deposition. Most importantly, the GCA provides porous structures with uniform pore sizes available in the 1 m to 100 m diameter range. The use of ALD and other techniques to coat these porous substrates with an electrically conductive surface layer creates a porous electrode geometry that has a surface area that can be chosen to be more than a thousand-fold higher than a conventional, single flat electrode design. Whereas at APS and other synchrotrons approximately 10 m to 100 m thick films are needed for high-energy X-ray scattering and PDF analysis of amorphous or molecular catalysts comprised of first row transition metals, embodiments of the present invention have demonstrated the ability to perform high-energy X-ray scattering and PDF analysis of amorphous cobalt oxide films that are electrocatalytically active and with film thickness of 50 nm (in alternative embodiments, no greater than 50 nm) using porous supports having a 40 m pore diameter (in alternative embodiments, no greater than 40 nm). This unique architecture also facilitates X-ray Absorption Spectroscopy (XAS) to study the reaction surface directly in order to monitor the oxidation state and structural change of the water oxidation catalyst in-situ. Further the optically transparent nature of the porous GCA support allows for simultaneous analysis of surface electrochemistry using optical absorption spectroscopy.
[0024] An in-situ electrochemical cell utilizing a 3D working electrode for PDF which allows the study of structural evolution of amorphous films during aqueous electrolysis was developed. In one embodiment, one or more components may be fabricated by traditional means or by a 3-D printer. In a particular embodiment, a 3D printer is used to fabricate the intricate electrochemical cell to allow for precise arrangement of the three electrode setup. A glass capillary array (GCA) was used to serve as the substrate in the electrochemical cell to meet several requirements necessary for in-situ PDF and XAFS such as high surface area, for example >20 mm.sup.2 surface area within the 0.5 mm0.5 mm X-ray beam aperture, sufficient physical strength to be self-supporting and mechanically mountable, and have greater that 90% transparency for X-rays with energy of 50 keV and above. Other materials satisfying these requirements include carbon-based polymer materials made by lithography or printing techniques. The in-situ grown cobalt oxide film on GCA provides a scattering pattern of similar quality compared to that of an ex-situ grown bulk powder. One embodiment of an in-situ technique allows high-energy X-ray scattering and PDF analysis of 50 nm thin amorphous film of cobalt oxide. The setup not only enables the electrolytic growth an amorphous metal oxide films on an ITO-coated GCA but also allows acquisition of scattering patterns as XAFS signals during electrolysis or different potentials, which has not been thoroughly studied before. This cell offers a simple route for structural investigation of many electrodeposited thin amorphous catalytic films and will help provide clues to improve synthesis of water oxidation catalytic films.
[0025] Described below are examples illustrating certain embodiments as described.
Experimental Procedures
A. Electrode Preparation
[0026] Designing a proper electrochemical cell for high-energy X-ray beam line applications requires several conditions. 1.) The electrochemical cell itself must work properly under reaction conditions. 2.) The host material, if 3D, has to be generally transparent to X-rays. 3.) The electrodeboth support and conductorshould not create a large or complex background signal that complicates background subtraction. 4.) Finally, there exist serious constraints dictated by current high-energy X-ray optics, limiting the flux density of the incident beam. The 11-ID-B beamline at the APS, which is dedicated to HEXS for the study of the molecular structure, the minimum achievable beam size (before reducing flux) is about 500 m500 m. In order to acquire the intense scattering signal from thin catalytic metal oxide film required for PDF, the X-ray illuminated film volume must be maximized and the background scattering from the electrode and the support must be minimized. The X-ray signal will scale with the intensity of the X-ray light source. The X-ray photon flux at the APS beamline 11-ID-B, used for experiements described herein, is 2.310.sup.11 @ 58.66 keV. Accurate background subtraction is critical in PDF because Fourier transformation of scattering data without proper background subtraction can distort the structural interpretation. Cobalt phosphide and cobalt borate (CoPi and CoBi) thin films on Sn-doped indium oxide coated (ITO) glass were tested as well as on inverse opal nanostructures coated with atomic layer deposition (ALD)-grown ITO with HEXS. In both of these cases, acquiring a high quality scattering signal was not possible due to the limitation of small interaction volume with the incident X-ray beam, as shown in
[0027] The GCA volume interacts fully with X-ray, as shown in
B. Experimental Setup
[0028]
[0029] In one example, the cell 200 was fabricated using a 3D printer (Objet30 Pro, Stratasys Ltd.) and used optically transparent VeroClear-RGD810 (Stratasys Ltd.) to permit monitoring of the inside of the cell during electrolysis or X-ray scattering. The W.E 220 was 50 nm of ALD-ITO on GCA connected with polyurethane/nylon insulated copper wire (8056, BELDEN). Silver paste (Cat. #12642-14, Electron Microscopy Science) was used to contact GCA and the copper wire and the assembly was dried in an oven. Chemical resistant epoxy (9340, Loctite) was applied to cover the silver paste and copper wire. Two built R.E.s 230 shown in
[0030] For one embodiment two identically constructed R.E. were oppositely positioned and placed 1 mm from the W.E. 220. The R.E.s 230 consisted of an electrochemically deposited AgCl film on 0.5 mm Ag wire that was inserted into a polytetrafluoroethylene (PTFE) 2 mm OD tube, filled with 3 M KCl electrolyte solution, and sealed with a 5 m porous Teflon plug. The AgCl film on the Ag reference electrode was formed by electrochemical deposition from 0.1 M HCl with 0.5 V applied potential using a AgCl/Ag reference electrode and Pt wire counter electrode. The R.E. were stable for more than 10 hours of electrolysis. Chemically inert septa 223 were used to prevent electrolyte leaking and to hold the R.E. 230 and W.E. wire 221. A W.E. film 225, 7.5 m thick kapton (NC0775341, Fisher Scientific) in the experiments descried, shown in
[0031] In one embodiment, the W.E. region 224 has a cross-sectional shape, or electrolyte shape, atop the ITO/GCA electrode shown in
[0032] During electrolysis, Hydrogen bubbles can cause the discontinuation of electrolyte in the housing of C.E. and this event may alter the measurement of the reaction current. In order to prevent this during electrolysis, internal diameter of the tube housing for the C.E. was chosen to be 5 mm or greater to allow facile release of hydrogen bubbles that are produced during anodic potential sweeps of the W.E. Before use, the printed in-situ cell was sonicated in a solution of 0.5 M NaOH solution in deionized water, and then rinsed using deionized water. This process was repeated several times to remove low-cross-linked support materials on the surface of the printed cell. The in-situ cell was mounted on a kinematic base (BKL-4, Newport), dovetail optical rail (RLA0600, THORLABS), and rail carrier (RC1, THORLABS). To flow electrolyte into the GCA channel, first an electrolyte-compatible syringe was pumped to remove bubbles through the entire cell and tubing. A syringe was mounted on a precise programmable syringe pump (NE-1000, New Era Pump Systems, Inc.) and syringe was moved back and forth to flow electrolyte continuously through cell the cell by a pre-programmed schedule in syringe pump. The arrow indicates the bidirectional flow of electrolyte seen in
C. Solution Preparation and Film Growth
[0033] For in-situ HEXS, electrolyte solutions of 0.1 M potassium phosphate (KPi, pH 7.0) containing 0.5 mM Co(NO.sub.3).sub.2.Math.6H.sub.2O was prepared from mono- and dibasic-potassium phosphate (KH.sub.2PO.sub.4 and K.sub.2HPO.sub.4, Sigma-Aldrich) and boric acid (H.sub.3BO.sub.3, Sigma-Aldrich) with ultra-pure water (MilliQ, 18.2 Mcm). The preparation of the electrolyte and cobalt oxide films (CoPi and CoBi) has previously been reported in the art. For ex-situ (or powder) HEXS, two cobalt oxide films, CoPi from 0.1 M KPI and CoBi from 0.1 M boric acid (KBi, pH 9.2), were electrodeposited on ITO/glass (CB-501N-1511, Rs=515, Delta Technologies, Ltd). The pH of the electrolyte solution was adjusted using concentrated KOH (Sigma-Aldrich) solution. The deposited film on ITO/glass was directly scraped off from the ITO surface by glass capillary. Prior to performing in-situ EXAFS, CoPi film was grown over the course of two hours of electrolysis at 12 BM at the APS. After electrolysis, the used electrolyte for growing CoPi was replaced with Co.sup.2+-free 0.1 M KPi solution due to difficulty to subtract the contribution of Co.sup.2+ in electrolyte. After draining the used electrolyte, the assembly of the in-situ electrochemical cell was rinsed with MilliQ water for several times. Then Co.sup.2+-free 0.1 M KPi solution was refilled into the cell and was circulated into the assembly of cell. Electrolysis of CoPi and CoBi was performed at a potential of 1.34V and 1.21V vs. NHE, respectively. To insure that the in-situ cell worked properly before starting the electrolysis, a CV was collected and compared to a CV which was taken from bulk electrolysis. CV was recorded in the range of 0.2-1.3 V vs. NHE with a scan rate of 5 mV/sec. A potentiostat (Epsilon, Bioanalytical Systems, Inc.) was used to perform all experiments. IR drop was not accounted for in any the electrochemical measurements.
[0034] For the detection sensitivity limit measurement, CoPi film was in-situ grown for 50 min at 1.34V vs. NHE. Then the scattering pattern of CoPi film was immediately collected after electrolysis.
D. X-ray Data Acquisition and Processing
[0035] The current optics of high-energy incident X-rays (58.66 keV, =0.2114 ) at 11ID-B at Advanced Photon Source (APS) of Argonne National Laboratory (11-ID-B is a dedicated pair-distribution-function (PDF) beamline operating at fixed energies of 58.66 and 86.7 keV.) allow only for an un-focused 500 m500 m (verticalhorizontal) beam, which is sufficient for HEXS of materials which fill this X-ray beam cross-section, but could not be used to examine electrode supported thin-films comprise of first row transition metals with thickness less than 1 m. To demonstrate the capabilities of the described systems and methods for HEXS characterization of thin film catalysts, the vertical beam size was slitted down to 100 m500 m (verticalhorizontal) to probe the sample, and a 2D scattering pattern was collected using a Perkin-Elmer amorphous silicon detector (200 m200 m/pixel, total size in width and height : 40.96 cm40.96 cm). A sample-to-detector distance of 17.6 cm was used, calibrated using a CeO.sub.2 powder pattern. The maximum q value accessible in this setup was q.sub.max=4 sin(2/2)/=24/, where 2 is the scattering angle and is the X-ray wavelength. The 2D X-ray scattering pattern was integrated to one-dimensional data using Fit2D software. Data was acquired at two vertically offset beam positions width X-ray beam as shown the side view in
[0036] For XAFS demonstration on the amorphous cobalt oxide film, CoPi, the XAFS spectra of cobalt K-edge were collected at 12 BM at APS. The X-ray energy was selected by Si (111) double crystals used in monochromator (detuning to 50% intensity) and was used to irritate the CoPi/ITO/GCA electrode directly at 45 degree of an angle. The XAFS spectra at the cobalt K-edge of cobalt foil and CoPi film were obtained by the fluorescence detection mode using a Canberra 13-element germanium solid state detector array with the fluorescence photon energy window set for the cobalt K emission. XAFS data analysis was performed with Athena package based on IFEFFIT.
Results and Discussion
[0037] According to the range of q as function of X-ray energy at a fixed distance between sample and detector, the range of q depends on the incoming energy of the X-ray, according to the well-known relation, q=(4/)sine, where is the X-ray wavelength and is the scattering angle. Because the X-ray wavelength decreases with energy, high energy X-ray allows a larger q.sub.max for a measured angle range, and provides a higher resolution pair distribution function, G(r). The dependence of G(r) on q.sub.max is clearly demonstrated in
[0038] Cyclic voltammetry (CV) data is collected at a certain range of potential (0.2-1.3 V vs. NHE) to compare with CV data collected from the same film grown by bulk electrolysis. During the CV, a voltmeter monitors the applied potential between the W.E. and R.E.. The CV before electrolysis in a KPi solution containing Co.sup.2+ was recorded as shown in
[0039] The trend of current density in the CV curves in
[0040]
[0041] In
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[0045] The data in
[0046] Current and new detection methods of in-situ XAFS study for water oxidation are represented in
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[0048] Scanning electron microscopy (SEM) images of in-situ grown CoPi on ITO/GCA are shown in
[0049] To evaluate a possible detection limit of the in-situ cell under these experimental conditions, the same experiment as shown in
[0050] To estimate the detection limit from these scattering intensities, peak scattering intensities at q=4.5/ for 8 min and 50 min depositions (indicated by two arrows in
[0051] As used herein, the singular forms a, an and the include plural referents unless the context clearly dictates otherwise. Thus, for example, the term a member is intended to mean a single member or a combination of members, a material is intended to mean one or more materials, or a combination thereof.
[0052] As used herein, the terms about and approximately generally mean plus or minus 10% of the stated value. For example, about 0.5 would include 0.45 and 0.55, about 10 would include 9 to 11, about 1000 would include 900 to 1100.
[0053] It should be noted that the term exemplary as used herein to describe various embodiments is intended to indicate that such embodiments are possible examples, representations, and/or illustrations of possible embodiments (and such term is not intended to connote that such embodiments are necessarily extraordinary or superlative examples).
[0054] The terms coupled, connected, and the like as used herein mean the joining of two members directly or indirectly to one another. Such joining may be stationary (e.g., permanent) or moveable (e.g., removable or releasable). Such joining may be achieved with the two members or the two members and any additional intermediate members being integrally formed as a single unitary body with one another or with the two members or the two members and any additional intermediate members being attached to one another.
[0055] It is important to note that the construction and arrangement of the various exemplary embodiments are illustrative only. Although only a few embodiments have been described in detail in this disclosure, those skilled in the art who review this disclosure will readily appreciate that many modifications are possible (e.g., variations in sizes, dimensions, structures, shapes and proportions of the various elements, values of parameters, mounting arrangements, use of materials, colors, orientations, etc.) without materially departing from the novel teachings and advantages of the subject matter described herein. Other substitutions, modifications, changes and omissions may also be made in the design, operating conditions and arrangement of the various exemplary embodiments without departing from the scope of the present invention.
[0056] While this specification contains many specific implementation details, these should not be construed as limitations on the scope of any inventions or of what may be claimed, but rather as descriptions of features specific to particular implementations of particular inventions. Certain features described in this specification in the context of separate implementations can also be implemented in combination in a single implementation. Conversely, various features described in the context of a single implementation can also be implemented in multiple implementations separately or in any suitable subcombination. Moreover, although features may be described above as acting in certain combinations and even initially claimed as such, one or more features from a claimed combination can in some cases be excised from the combination, and the claimed combination may be directed to a subcombination or variation of a subcombination.