RESURFACEABLE CONTACT PAD FOR SILICON or ORGANIC REDISTRIBUTION INTERPOSER FOR SEMICONDUCTOR PROBING

Abstract

The present invention relates to a method and an apparatus for a resurfaceable contact pad that uses an epoxy to encapsulate contact pads so that the epoxy and encapsulated contact pads are coplanar on a silicon redistribution interposer. These redistribution interposers electrically connect a wafer semi-conductor to a probe card where it is necessary to convert the course pad arrangement of one with a fine pad arrangement of the other through the use of an interposer board. The present invention relates to an apparatus and a method creates resurfaceable contact pads which may be resurfaced one or multiple times with an abrasive sanding operation to recreate a coplanar surface should any contact pad surfaces become damaged, allowing for a more cost-effective repair.

Claims

1. An apparatus for resurfaceable contact pads, comprising: an epoxy to encapsulate contact pads so that the epoxy and encapsulated contact pads are coplanar on a silicon redistribution interposer, said pads being formed by lengthening along a z-axis by one of either electro-plating, electro-less plating or thermal sonic bonding, said redistribution interposer being electrically connected to a wafer semi-conductor to a probe card where it is necessary to convert the course pad arrangement of one with a non-coarse pad arrangement of another one of said pads through the use of an interposer board.; said resurfaceable contact pads having a coplanar surface formed by resurfacing one or more times with an abrasive sanding operation.

2. The apparatus for resurfaceable contact pads according to claim 1 wherein said conductive contact pads are encapsulated in an epoxy and said contact pads are equally coplanar with a surface of a surrounding epoxy.

3. The apparatus according to claim 1 wherein said pads are lengthened along a z axis by an electro-plating operation.

4. The apparatus according to claim 3 wherein a suitable temporary mask, of suitable thickness approximately ranging from 0.0005 to 0.005 thick, such as a photo image-able plating mask is formed over a top surface of the interposer exposing just the pads to be plated and the pads are built up to a designated height forming a column by an electro-plating operation, of a wear resistant, contact resistant having a resistant that approximates that of a noble metal, is performed and the temporary mask is removed and a permanent epoxy is formed around the plated columns.

5. The apparatus according to claim 1 wherein said pads are lengthened along a z axis by an electro-less plating operation.

6. The apparatus according to claim 3 wherein a suitable temporary mask, of suitable thickness typically ranging from 0.0005 to 0.005 thick, such as a photo image-able plating mask is formed over a top surface of the interposer exposing just the pads to be plated and the pads are built up to a designated height forming a column by an electro-less plating operation, of a wear resistant, contact resistant having a resistant that approximates a resistant of a noble metal, is performed and the temporary mask is removed and a permanent epoxy is formed around the plated columns.

7. The apparatus according to claim 1 wherein said pads are lengthened along a z axis by a thermal-sonic gold ball bonding electro-plating operation.

8. The apparatus according to claim 3 wherein instead of a temporary photo image-able mask a photo image-able permanent epoxy can be used.

9. The apparatus according to claim 5 wherein instead of a temporary photo image-able mask a photo image-able permanent epoxy can be used.

10. A method for resurfaceable contact pads, the steps comprising: planarizing a contact pad's surface by forming conductive columns or balls on top surface contact pads or lands of a Silicon, organic or ceramic redistribution interposer; encapsulating said columns or balls in an epoxy or similar moldable compound; resurfacing the contact pads by an abrasive sanding operation so that said conductive contact pads will be equally coplanar with the surface of the surrounding epoxy to recreate a coplanar surface should any contact pad surfaces become damaged to provide a cost-effective repair.

11. The method according to claim 10 wherein said conductive contact pads are encapsulated in an epoxy and said contact pads are equally coplanar with a surface of a surrounding epoxy.

12. The method according to claim 10 wherein said pads are lengthened along a z axis by an electro-plating operation.

13. The method according to claim 12 wherein a suitable temporary mask, of suitable thickness typically ranging from 0.0005 to 0.005 thick, such as a photo image-able plating mask is formed over a top surface of the interposer exposing just the pads to be plated and the pads are built up to a desired height forming a column by an electro-plating operation, of a suitable wear resistant, low contact resistant preferably noble metal, is performed and the temporary mask is removed and a permanent epoxy is formed around the plated columns.

14. The method according to claim 10 wherein said pads are lengthened along a z axis by an electro-less plating operation.

15. The method according to claim 10 wherein a suitable temporary mask, of suitable thickness typically ranging from 0.0005 to 0.005 thick, such as a photo image-able plating mask is formed over a top surface of the interposer exposing just the pads to be plated and the pads are built up to a desired height forming a column by an electro-less plating operation, of a suitable wear resistant, low contact resistant preferably noble metal, is performed and the temporary mask is removed and a permanent epoxy is formed around the plated columns.

16. The method according to claim 10 wherein said pads are lengthened along a z axis by a thermal-sonic gold ball bonding electro-plating operation.

17. The method according to claim 10 wherein instead of to the temporary photo image-able mask a photo image-able permanent epoxy can be used.

18. The method according to claim 10 wherein instead of to the temporary photo image-able mask a photo image-able permanent epoxy can be used.

19. The method according to claim 10 wherein said top pads are lengthened along a z axis by electroplating or elctroless plating operation or by thermal sonic gold ball bonding.

20. The method according to claim 19 wherein when lengthening said pads by electroplating a suitable temporary mask is formed over said the top surface of said interposer exposing the pads to be plated.

21. The method according to claim 21 wherein said mask has a suitable thickness in the range of 0.0005 to 0.005 thick.

22. The method according o claim 20 wherein the photo-mask can be hot-roll laminated or spun with a liquid resist.

23. The method according to claim 24 wherein an electro-plating or an electro-less plating is formed to build up said [ads to a desired height forming a column in a range of 5 microns to 25 microns and the temporary mask is then removed and the an optional permanent mask is formed around said plated columns.

24. The method according to claim 24 wherein epoxy is formed around said plated columns by a potted process or a spin coating process.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0004] FIG. 1 illustrates an exploded sectional view of the present invention in which the redistribution silicon board contains a coplanar surface of connecting pads encapsulated with an epoxy; and

[0005] FIG. 2 shows a section view of the present invention where the redistribution interposer's surface contains connecting pads that are equally coplanar with an epoxy that encapsulates the connecting pads.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT(S)

[0006] Referring now to the drawings of FIGS. 1-2, FIG. 1 illustrates the redistribution silicon, ceramic or organic interposer board 3 of the present invention with top connecting lands or pads 7 in which the pads 7 are lengthened along the z axis by either an electro-plating or electro-less plating operation or by thermal-sonic gold ball bonding. In the case of lengthening by electroplating, a suitable temporary mask, of suitable thickness typically ranging from 0.0005 to 0.005 thick, such as a photo image-able plating mask is formed over the top surface of the interposer 3 exposing just the pads to be plated 7 The photo mask can be hot-roll laminated or spun on with a liquid resist, process known in the semiconductor industry. Then an electro-plating or electro-less plating operation, of a suitable wear resistant, low contact resistant preferably noble metal, is performed to build the pads up to the desired height forming a column in a range of 5 micros to 25 microns. At this point the temporary mask can be removed and an optional permanent epoxy is formed around the plated columns, epoxy formed by potted process or spin coating process. As an alternative to the temporary photo image-able mask a photo image-able permanent epoxy can be used, coated or potted and being photo imageable the excess epoxy is developed away as known in the art. Once the epoxy is formed around the plated columns 1 they can both be sanded or lapped in the same plane to form a coplanar surface with a sanding process or lapping process as shown in the art, which can be re-sanded multiple tunes in the future after extended use or damage to the connecting pads, each time reducing the overall height of the column 7 to reform a flat coplanar pad. An alternative to the electroplating process would be thermal sonic or compression bonding of a suitable metal a compression bonder or a thermal sonic ball bonder, respectively, as typically use in the wire bonding industry such as gold to the contact pad 7, then forming epoxy around the gold ball/column or other suitable metal.

[0007] While presently preferred embodiments have been described for purposes of the disclosure, numerous changes in the arrangement of method steps and those skilled in the art can make apparatus parts. Such changes are encompassed within the spirit of the invention as defined by the appended claims.