TANDEM SOLAR CELL, TANDEM SOLAR CELL MODULE COMPRISING THE SAME, AND METHOD FOR MANUFACTURING THEREOF

20180019358 ยท 2018-01-18

    Inventors

    Cpc classification

    International classification

    Abstract

    The present disclosure relates to a tandem solar cell, a tandem solar cell module comprising the tandem solar cell, and a method for manufacturing the same. More specifically, the present disclosure relates to a monolithic tandem solar cell comprising a perovskite solar cell laminated on a front surface of a crystalline silicon solar cell, and a method for manufacturing the same.

    According to the present disclosure, a Nano-electrode structure can be patterned on a front surface of a front transparent electrode of a solar cell in which a crystalline silicon solar cell and a perovskite solar cell are bonded via a junction layer, such that the optical path of the sunlight incident on the solar cell through the Nano-electrode structure can be increased to improve the utilization rate of the light.

    Claims

    1. A solar cell, comprising: a first solar cell; a second solar cell; an inter-layer positioned between the first solar cell and the second solar cell; a first transparent electrode that is coupled to a first surface of the first solar cell; and a transparent electrode structure that is coupled to a first surface of the first transparent electrode and that includes a patterned transparent electrode.

    2. The solar cell of claim 1, wherein the transparent electrode structure includes: a Nano-structure, a concave-convex pattern, or a grid pattern.

    3. The solar cell of claim 1, wherein the first transparent electrode and the transparent electrode structure are integrally formed.

    4. The solar cell of claim 1, wherein the second solar cell includes: a crystalline silicon substrate that includes a first surface of the crystalline silicon substrate and a second surface of the crystalline silicon substrate, the second surface of the crystalline silicon substrate including a textured structure; a first i-type amorphous silicon layer that is positioned on the first surface of the crystalline silicon substrate; a second i-type amorphous silicon layer that is positioned on the second surface of the crystalline silicon substrate; a first conductive amorphous silicon layer that is positioned on the first i-type amorphous silicon layer; and a second conductive amorphous silicon layer that is positioned on the second i-type amorphous silicon layer.

    5. The solar cell of claim 4, further comprising: a second electrode positioned on the second conductive amorphous silicon layer.

    6. The solar cell of claim 5, wherein the second electrode includes: a second transparent electrode that is positioned on the second conductive amorphous silicon layer, and a metal electrode that is coupled to at least a portion of the second transparent electrode.

    7. The solar cell of claim 4, wherein the first conductive amorphous silicon layer is an emitter layer and the second conductive amorphous silicon layer is an electric field layer.

    8. The solar cell of claim 7, wherein the emitter layer is an impurity doping layer having a first conductivity, and the electric field layer is an doping layer having a second conductivity that is different from the first conductivity, and wherein the crystalline silicon substrate has the second conductivity.

    9. The solar cell of claim 4, further comprising: a passivation layer that is positioned on the second conductive amorphous silicon layer

    10. The solar cell of claim 9, further comprising: a second electrode that that passes through at least a portion of the passivation layer, P1 wherein the second electrode is metal electrode, and P1 wherein the metal electrode is electrically and physically coupled to the second conductive amorphous silicon layer.

    11. The solar cell of claim 1, wherein the first solar cell includes: an electron transport layer; a perovskite absorption layer; and a hole transport layer.

    12. The solar cell of claim 11, wherein the perovskite absorption layer includes a meso-porous layer.

    13. The solar cell of claim 11, wherein the perovskite absorption layer has a perovskite structure meso-porous layer, and wherein the perovskite structure meso-porous layer can be represented by AMX.sub.3 (where A is a monovalent organic ammonium or a metallic cation; M is a divalent metallic cation; and X is a halogen anion).

    14. A solar cell module, comprising: a first substrate; a plurality of solar cells, two adjacent solar cells of the plurality of solar cells being electrically coupled to each other; and a second substrate, wherein each solar cell includes; a first solar cell, a second solar cell, an inter-layer positioned between the first solar cell and the second solar cell, a first transparent electrode that is coupled to a first surface of the first solar cell, a transparent electrode structure that is coupled to a first surface of the first transparent electrode and that includes a patterned transparent electrode, a first metal electrode positioned on the first transparent electrode, and a second electrode positioned on the second solar cell, and wherein the first substrate and the second substrate are positioned with a gap on the first solar cell and the second solar cell of the plurality of solar cells, respectively.

    15. The solar cell module of claim 14, further comprising: a first encapsulating layer positioned between the first substrate and the plurality of the solar cells; and a second encapsulating layer positioned between the second substrate and the plurality of the solar cells.

    16. The solar cell module of claim 14, further comprising: a first gas layer positioned between the first substrate and the plurality of the solar cells; and a second gas layer positioned between the second substrate and the plurality of the solar cells.

    17. The solar cell module of claim 14, wherein the two adjacent solar cells of the plurality of solar cells are coupled with a conductive wire having a circular section.

    18. A method for manufacturing a solar cell, the method comprising: forming a crystalline silicon solar cell from a crystalline silicon substrate; forming an inter-layer on a surface of the crystalline silicon solar cell; forming a perovskite solar cell on a surface of the inter-layer; forming a transparent electrode on a surface of the perovskite solar cell; and patterning a transparent electrode structure on a surface of the transparent electrode.

    19. The method of claim 18, wherein the transparent electrode structure includes: a Nano-structure, a concave-convex pattern, or a grid pattern.

    20. The method of claim 18, wherein patterning the transparent electrode structure includes: etching the surface of the transparent electro

    Description

    BRIEF DESCRIPTION OF DRAWINGS

    [0042] FIG. 1 schematically shows a cross section of a general tandem solar cell.

    [0043] FIG. 2 shows a cross-sectional view of a tandem solar cell according to an embodiment of the present disclosure.

    [0044] FIGS. 3 and 4 show another embodiment of the transparent electrode structure applied to the tandem solar cell depicted in FIG. 2.

    [0045] FIGS. 5 and 6 schematically show paths for absorbing shorter wavelength light in the tandem solar cell depicted in FIG. 2.

    [0046] FIGS. 7 and 8 schematically show paths for absorbing longer wavelength light in the tandem solar cell depicted in FIG. 2.

    [0047] FIG. 9 is a cross-sectional view of a tandem solar cell according to another embodiment of the present disclosure.

    [0048] FIGS. 10 and 11 show another embodiment of the transparent electrode structure applied to the tandem solar cell depicted in FIG. 9.

    [0049] FIG. 12 shows a manufacturing procedure of the tandem solar cell depicted in FIG. 2.

    [0050] FIG. 13 shows a manufacturing procedure of the tandem solar cell depicted in FIG. 9.

    [0051] FIG. 14 schematically shows a modular form of the tandem solar cell according to the present disclosure.

    DETAILED DESCRIPTION

    [0052] Hereinafter, a tandem solar cell according to a preferred embodiment of the present disclosure and a method for manufacturing the same will be described in detail with reference to the accompanying drawings.

    [0053] It is to be understood that the present disclosure is not limited to the embodiments disclosed herein but may be embodied in various forms, and the exemplary embodiments set forth herein are only provided so that these disclosures will fully convey the sprit and scope of the invention to those skilled in the art.

    Tandem Solar Cell

    [0054] The tandem solar cell described herein is generally assumed to be a double-sided light receiving type of tandem solar cell capable of receiving sunlight (or incident light) from both the front surface and the rear surface of the tandem solar cell, rather than receiving only from the front surface of the tandem solar cell.

    First Implementation

    [0055] FIG. 2 shows a cross-sectional view of a tandem solar cell according to an embodiment of the present disclosure.

    [0056] Referring to FIG. 2, the tandem solar cell according to the first embodiment of the present disclosure has a two-terminal tandem solar cell structure including a perovskite solar cell 130 including an absorption layer having a relatively large bandgap and a crystalline solar cell 110 including an absorption layer having a relatively small bandgap, wherein the perovskite solar cell 130 and the crystalline solar cell 110 are directly tunnel-bonded via an inter-layer 120 (hereinafter referred to as perovskite/crystalline silicon tandem solar cell).

    [0057] Accordingly, the light in a shorter wavelength region of the light incident on the tandem solar cell is absorbed by the perovskite solar cell 130 disposed on the front side to generate electric charges, while the light in a longer wavelength region transmitted through the perovskite solar cell is absorbed by the crystalline silicon solar cell 110 disposed on the rear surface to generate electric charges.

    [0058] The tandem solar cell having the above-described structure absorbs light at the shorter wavelength region in the perovskite solar cell 130 disposed on the front side to generate power, and absorbs light at the longer wavelength region in the crystalline silicon solar cell 110 disposed on the rear side to generate power, such that a threshold wavelength can be shifted to the longer wavelength side, and as a result, the advantage of broadening the wavelength band absorbed by the whole solar cells can be obtained.

    [0059] However, in the case of the two-terminal tandem solar cell, since the perovskite solar cell 130 is directly tunnel-bonded to the front surface of the silicon solar cell 110 via the inter-layer 120, the characteristics of the perovskite solar cell 130 may be influenced by the structure of the front surface of the crystalline silicon solar cell 110.

    [0060] In a single-junction solar cell, it is common to introduce a texture structure on a surface in order to reduce a reflectance of incident light on the surface and to increase a path of light incident on the solar cell.

    [0061] However, in the case of the perovskite/crystalline silicon tandem solar cell, problem may be arisen in that it is difficult to uniformly deposit the perovskite solar cell on the front surface of the crystalline silicon tandem solar cell when a texture structure is introduced on the whole surface of the crystalline silicon tandem solar cell. Accordingly, most of the perovskite/crystalline silicon tandem solar cells known so far have limitations that they must be realized on a front surface of flat wafer.

    [0062] In this embodiment, there is a problem that the probability that the light in the longer wavelength region vertically incident to the crystalline silicon solar cell through particularly the perovskite solar cell is reflected at the interface between the inter-layer and the crystalline silicon solar cell increases. Further, even if the light is not reflected but transmitted through the crystalline silicon solar cell, there is a problem that it is difficult to improve the absorption rate of the longer wavelength light because the optical path of the longer wavelength is shorter than that of the light incident in the diagonal direction.

    [0063] In order to solve the problem of the conventional perovskite/crystalline silicon tandem solar cell, with the tandem solar cell according to the first embodiment of the present disclosure, the crystalline silicon solar cell 110 has a selective texture structure only on the rear surface thereof.

    [0064] The crystalline silicon solar cell 110 according to the first embodiment may be implemented with a heterojunction crystalline silicon solar cell.

    [0065] Specifically, the crystalline silicon solar cell 110 according to the first embodiment includes a crystalline silicon substrate 111, a front i-type amorphous silicon layer 112 located on a front surface of the crystalline silicon substrate 111, and a first conductive amorphous silicon layer 114 located on a front surface of the front i-type amorphous silicon layer 112. The front surface of the crystalline silicon substrate 111 is a portion where the light in a longer wavelength region transmitted through the perovskite solar cell 130 is first incident on the crystalline silicon solar cell 110.

    [0066] Further, the rear surface of the crystalline silicon substrate 111 includes a rear i-type amorphous silicon layer 113 and a second conductive amorphous silicon layer 115 located on a rear surface of the rear i-type amorphous silicon layer 113.

    [0067] In certain embodiments, when the crystalline silicon substrate 111 is an n-type single crystal silicon substrate, the first conductive amorphous silicon layer 114 is preferably a p-type amorphous silicon layer. That is, in order to improve the carrier mobility at the front surface where the amount of received light is relatively high as the light in the longer wavelength region is first incident on the crystalline silicon solar cell 110, it is preferable to configure reverse junction (p-n junction) in such a way that the p-type amorphous silicon layer is disposed on a front surface of the n-type single crystal silicon substrate, which can therefore improve a collection efficiency of the carrier. In this embodiment, the second conductive amorphous silicon layer 115 uses an n-type amorphous silicon layer to obtain a back surface electric field effect.

    [0068] Further, the crystalline silicon substrate 111 may be a p-type single-crystal silicon substrate instead of an n-type single-crystal silicon substrate or another crystalline silicon substrate that is typically used in the crystalline silicon solar cell 110. Similarly, the first conductive amorphous silicon layer 114 and the second conductive amorphous silicon layer 115 may also be designed to have a proper conductivity according to conductivity of the crystalline silicon substrate 111.

    [0069] The electric charge generated from the crystalline silicon solar cell 110 is collected in the rear transparent electrode 140 and the connection between the rear transparent electrode 140 and an external terminal is made via the rear metal electrode 180.

    [0070] The rear transparent electrode 140 may be implemented as a variety of transparent conductive materials.

    [0071] Examples of the transparent conductive material for implementing the rear transparent electrode 140 include a transparent conductive oxide, a carbonaceous conductive material, a metallic material, and a conductive polymer.

    [0072] The transparent conductive oxide may include ITO (Indium Tin Oxide), ICO (Indium Cerium Oxide), IWO (Indium Tungsten Oxide), ZITO (Zinc Indium Tin Oxide), ZIO (Zinc Indium Oxide), ZTO (Zinc Tin Oxide), GITO (Gallium Indium Tin Oxide), GIO (Gallium Indium Oxide), GZO (Gallium Zinc Oxide), AZO (Aluminum doped Zinc Oxide), FTO (Fluorine Tin Oxide), or ZnO. The carbonaceous conductive material may include graphene or carbon Nanotubes, and the metallic material may include metal (Ag) Nanowires and metal thin films of multilayer structure such as Au/Ag/Cu/Mg/Mo/Ti. The conductive polymer may include polyaniline, polypyrrole, polythiophene, poly-3,4-ethylene dioxythiophene-polystyrene sulfonate (PEDOT-PSS), poly-[bis(4-phenyl)(2,4,6-trimethylphenyl)amine] (PTAA), Spiro-MeOTAD, or polyaniline-camphorsulfonic acid (PANI-CSA).

    [0073] In this embodiment, as shown in FIG. 2, the rear metal electrode 180 is not provided on the rear surface of the rear transparent electrode 140 but is provided on a part of the rear surface of the rear transparent electrode 140, such that the sunlight may be incident on the rear surface of the crystalline silicon solar cell 110.

    [0074] In this embodiment, it is preferable that the rear metal electrode 180 is arranged to occupy 1% to 30% of the total area of the rear surface of the rear transparent electrode 140. If the area occupied by the rear metal electrode 180 is less than 1%, the effect of collecting charges generated from the crystalline silicon solar cell 110 by the rear metal electrode 180 may be insufficient, whereas if the area occupied by the rear metal electrode 180 exceeds 30%, the area occupied by the rear metal electrode 180 is excessively wide, and the utilization of light incident from the rear surface of the crystalline silicon solar cell 110 may be reduced.

    [0075] The rear metal electrode 180 includes a grid electrode 181 that contacts a portion of the rear surface of the rear transparent electrode 140 and collects charges on the rear surface. In addition, a pad electrode 182 may be provided to be in electrical contact with the grid electrode structure. The pad electrode 182 is provided with an electrode wire 183 for electrically connecting neighboring tandem solar cells in a modular configuration, and the electrode wire 183 connected to the rear surface of the pad electrode 182 of one cell is integrally provided with the electrode wire 173 connected to the pad electrode 172 of a neighboring cell.

    [0076] In this embodiment, the electrode wire 183 is preferably a wire form having a cylindrical or elliptical cross section. Accordingly, the light incident from the rear surface of the crystalline silicon solar cell 110 is reflected and incident in an oblique direction, thereby increasing the optical path.

    [0077] In addition, as a texture structure is introduced into the rear surface of the crystalline silicon substrate 111, and the silicon layers 113 and 115 and the rear transparent electrode 140 sequentially formed on the rear surface of the crystalline silicon substrate 111 are formed along the texture structure, the path of the light incident vertically through the rear surface of the crystalline silicon solar cell 110 can be changed to an oblique direction. That is, it is advantageous that light scattering effect by the texture structure introduced on the rear surface of the crystalline silicon solar cell 110 can increase the path of light incident from the rear surface of the crystalline silicon solar cell 110.

    [0078] When the perovskite solar cell 130 is formed on the front surface of the silicon solar cell 110 by making the front surface of the crystalline silicon substrate 111 flat without introducing the texture structure as in the rear surface, it is possible to prevent the occurrence of defects in the perovskite solar cell 130.

    [0079] Then, on the front surface of the first conductive amorphous silicon layer 114 of the crystalline silicon solar cell 110, an inter-layer 120 for electrically connecting the crystalline silicon solar cell 110 and the perovskite solar cell 130 by tunnel junction is located.

    [0080] The inter-layer 120 may be formed from for example a transparent conductive oxide, a carbonaceous conductive material, a metallic material, or a conductive polymer, in a manner similar to that of the rear transparent electrode 140 so that it electrically connects the crystalline silicon solar cell 110 and the perovskite solar cell 130 and simultaneously transmits the light of a longer wavelength transmitted through the perovskite solar cell 130 to the crystalline silicon solar cell 110 disposed on the rear surface thereof without transmission loss. In addition, the inter-layer 120 may be doped with an n-type or p-type material. For example, it is also possible to apply an n-type or p-type amorphous silicon layer instead of the transparent electrode as inter-layer 120.

    [0081] According to an alternative embodiment, the inter-layer 120 may be formed in a multi-layer structure in which silicon layers having different refractive indexes are alternately laminated a plurality of times. In this embodiment, the multilayer structure may have a structure in which a lower refractive index layer and a higher refractive index layer are alternately laminated. Accordingly, the light having a shorter wavelength based on the inter-layer 120 can be reflected to the perovskite solar cell 130, while the light having a longer wavelength can be transmitted to the crystalline silicon solar cell 110. This makes it possible to selectively collect light of the perovskite/crystalline silicon tandem solar cell.

    [0082] In this embodiment, the above-described selective reflection and transmission of light can be realized by providing a structure in which a lower refractive index layer and a higher refractive index layer are alternately laminated on the front surface or the rear surface of the transparent conductive oxide layer or the n+ type silicon layer.

    [0083] On the front surface of the inter-layer 120 is positioned the perovskite solar cell 130. The perovskite solar cell 130 includes an electron transport layer 131 located on a front surface of the inter-layer 120, a perovskite absorption layer 132 located on a front surface of the electron transport layer, and a hole transport layer 133 positioned on a front surface of the perovskite absorption layer. In this embodiment, the electron transport layer 131 and the hole transport layer 133 may be substituted with each other as necessary.

    [0084] The electron transport layer 131 located on the front surface of the inter-layer 120 may include a metal oxide. Non-limiting examples of the metal oxide constituting the electron transport layer 131 include Ti oxides, Zn oxides, In oxides, Sn oxides, W oxides, Nb oxides, Mo oxides, Mg oxides, Zr oxides, Sr oxides, Yr oxides, La oxides, V oxides, Al oxides, Y oxides, Sc oxides, Sm oxides, Ga oxides, In oxides, and SrTi oxides. Preferably, the electron transport layer 131 may include at least one metal oxide selected from ZnO, TiO.sub.2, SnO.sub.2, WO.sub.3, and TiSrO.sub.3.

    [0085] In addition, a mesoporous layer 131a including the same or different metal oxide as the electron transport layer 131 may be further provided on the front surface of the electron transport layer 131.

    [0086] In this embodiment, the mesoporous layer 131a allows electrons to be easily transferred to the inter-layer 120 after a hole-electron pair generated from the perovskite absorption layer 132 is decomposed into electrons or holes. In addition, the mesoporous structure formed on the mesoporous layer 131a may serve to further increase the optical path by allowing the transmitted light to be scattered.

    [0087] The perovskite absorption layer 132 located on the front surface of the junction layer 120 is a photoactive layer containing a compound having a perovskite structure, wherein the perovskite structure can be represented by AMX.sub.3(where A is a monovalent organic ammonium or a metallic cation; M is a divalent metallic cation; and X is a halogen anion). Non-limiting examples of compounds having a perovskite structure include CH.sub.3NH.sub.3PBI.sub.3, CH.sub.3NH.sub.3PBIxCl.sub.3-x, CH.sub.3NH.sub.3PBI.sub.xBr.sub.3-x, CH.sub.3NH.sub.3PBCl.sub.xBr.sub.3-x, HC(NH.sub.2).sub.2PBI.sub.3, HC(NH.sub.2).sub.2PBI.sub.xCl.sub.3-x, HC(NH.sub.2).sub.2PBI.sub.xBr.sub.3-x, HC(NH.sub.2).sub.2PBCl.sub.xBr.sub.3-x, (CH.sub.3NH.sub.3)(HC(NH.sub.2)2).sub.1-yPBI.sub.3, (CH.sub.3NH.sub.3)(HC(NH.sub.2).sub.2).sub.1-yPBI.sub.xCl.sub.3-x, (CH.sub.3NH.sub.3)(HC(NH.sub.2).sub.2).sub.1-yPBI.sub.xBr.sub.3-x, or (CH.sub.3NH.sub.3)(HC(NH.sub.2).sub.2).sub.1-yPBCl.sub.xBr.sub.3-x. Further, a compound in which A in AMX.sub.3is partially doped with Cs may also be used.

    [0088] In this embodiment, the perovskite absorption layer 132 is preferably laminated on the front surface of the mesoporous layer 131a at a predetermined height while filling the mesoporous of the mesoporous layer 131a for improving an electron transfer.

    [0089] The hole transport layer 133 located on the front surface of the perovskite absorption layer 132 may be formed of a conductive polymer referred to as a material for the rear transparent electrode 140. The hole transport layer 133 may further include an n-type or p-type dopant, if necessary.

    [0090] The electric charge generated from the perovskite solar cell 130 having the above-described structure is collected in the front transparent electrode 150 and the connection between the front transparent electrode 150 and an external terminal is made via the front metal electrode 170.

    [0091] The front transparent electrode 150 may be implemented as a variety of transparent conductive materials as the rear transparent electrode 140.

    [0092] The tandem solar cell according to certain embodiments of the present disclosure reduces the reflectance of vertically incident light and changes the incidence direction of light to a diagonal direction, such that it further includes a transparent electrode structure 160 in a Nano-sized patterned on the front surface of the front transparent electrode 150 in order to increase a light path passing through the tandem solar cell. In this embodiment, the transparent electrode structure 160 may have a lattice pattern such as a grid or a mesh pattern.

    [0093] That is, by way of arranging the patterned transparent electrode structure 160 on the front surface of the front transparent electrode 150, it is possible to reduce the reflectance of the incident light by changing the incident angle of the light vertically incident on the tandem solar cell.

    [0094] In particular, even if the texture structure is not introduced to the front surface of the crystalline silicon solar cell 110, the light having a longer wavelength transmitted through the perovskite solar cell 130 is refracted in a diagonal direction by the transparent electrode structure 160 toward the crystalline silicon solar cell 110, such that the reflectance at an interface between the inter-layer 120 and the crystalline silicon solar cell 110 can be reduced.

    [0095] In addition, the light incident vertically toward the tandem solar cell can be refracted by the patterned transparent electrode structure 160 and can be incident diagonally toward the perovskite solar cell 130 and the crystalline silicon solar cell 110. As a result, the path of the incident light passing through each solar cell is increased, and eventually, the light absorption rate in each solar cell can be improved.

    [0096] The transparent electrode structure 160 may be formed of various transparent conductive materials as in the case of the front transparent electrode 150, and the transparent electrode structure 160 may be provided as a separate layer from the front transparent electrode 150 or may be integrally formed with the front transparent electrode 150.

    [0097] For example, referring to FIG. 2, the front transparent electrode 150 and the transparent electrode structure 160 are provided as separate layers, and the transparent electrode structure 160 has a Nano-sized structure or a grid or mesh pattern, such that the front transparent electrode 150 is exposed in some regions.

    [0098] Referring to FIG. 3 according to another alternative embodiment, the front transparent electrode 150 and the transparent electrode structure 160 are provided as separate layers, and the transparent electrode structure 160 may be patterned in a concave-convex pattern.

    [0099] Referring to FIG. 4 according to another alternative embodiment, the front transparent electrode 150 and the transparent electrode structure 160 may be integrally formed, wherein the transparent electrode structure 160 may be formed by depositing a transparent electrode and then patterning the transparent electrode structure 160 by a predetermined depth from the front surface.

    [0100] The front transparent electrode 150 and the transparent electrode structure 160 can be provided according to various modified embodiments described above to further improve the light collection effect in the tandem solar cell.

    [0101] The front metal electrode 170 is provided in a part of the front surface of the front transparent electrode 150. The front metal electrode 170 includes a grid electrode 171 that contacts a portion of the front surface of the front transparent electrode 150. In addition, a grid electrode structure for collecting charges is formed on the front surface of the front transparent electrode 150, and a pad electrode 172 formed on a part of the front surface of the grid electrode structure, for example, in a direction connected to or intersecting with the grid electrode. The pad electrode 172 is provided with an electrode wire 173 for electrically connecting neighboring tandem solar cells when connecting modules of multiple cells, and the electrode wire 173 connected to the front surface of the pad electrode 172 of one cell is integrally provided with the electrode wire 183 connected to the rear surface of the pad electrode 172 of a neighboring cell. In this embodiment, the pad electrodes 172 and 182 and the electrode wires 173 and 183 may be solder-bonded using a conductive paste or the like.

    [0102] In this embodiment, the electrode wire 173 is preferably a wire form having a cylindrical or elliptical cross section. Accordingly, the light incident vertically toward the electrode wire 173 can be scattered and the probability of re-entering into the tandem solar cell can be increased.

    [0103] FIGS. 5 and 6 schematically show paths for absorbing shorter wavelength light in the tandem solar cell depicted in FIG. 2, and FIGS. 7 and 8 schematically show paths for absorbing longer wavelength light in the tandem solar cell depicted in FIG. 2.

    [0104] Referring to FIGS. 5 to 8, a transparent substrate 190 is disposed on the rear surface of the perovskite/crystalline silicon tandem solar cell shown in FIG. 2 with a gap 195 filled with an encapsulating material or a gas therebetween, and a transparent substrate 200 is provided on the front surface thereof with a gap 205 filled with an encapsulating material or a gas therebetween. In this embodiment, as for the transparent substrates 190 and 200, a glass substrate, a transparent polymer substrate, or the like may be used.

    [0105] FIG. 5 shows various paths in which the light of a shorter wavelength incident from the front of the tandem solar cell in the perovskite solar cell 130 is absorbed.

    [0106] First, the first optical path {circle around (1)} is an optical path in which shorter wavelength light is refracted by the transparent electrode structure 160 and is incident on the perovskite absorption layer 132 in an oblique direction. That is, by introducing a patterned transparent electrode structure 160 on the front surface of the perovskite solar cell 130, the path of the light vertically incident on the perovskite solar cell 130 is changed to a diagonal direction, such that the antireflection effect is obtained and at the same time the utilization rate of the shorter wavelength light in the perovskite absorption layer 132 can be improved by the increased optical path.

    [0107] The second optical path {circle around (2)} and the third optical path {circle around (3)} are paths in which shorter wavelength light is reflected by the front metal electrode 170 to which a wire-shaped metal wire having a cylindrical or elliptical cross section is connected.

    [0108] In this embodiment, the second optical path {circle around (2)} is a light path in which light incident vertically toward the front surface of the front metal electrode 170 is reflected on the curved surface of the electrode wire and is incident on the transparent substrate 200 in a diagonal direction. The light incident on the transparent substrate 200 in an oblique direction can be reflected again and incident on the perovskite solar cell 130 in an oblique direction.

    [0109] Accordingly, it is possible to increase the probability of re-entering into the perovskite solar cell 130 by scattering light vertically incident on the front metal electrode 170 in various directions.

    [0110] The third optical path {circle around (3)} is an optical path in which light incident vertically toward the side of the electrode wire is reflected and is incident on the perovskite solar cell 130 in an oblique direction. As a result, the utilization rate of the shorter wavelength light in the perovskite absorption layer 132 can be improved by the increased optical path while obtaining the antireflection effect.

    [0111] The fourth optical path {circle around (4)} is an optical path reflected by the inter-layer 120 and re-incident on the perovskite absorption layer 132. To this end, preferably the inter-layer 120 has a multi-layer structure having different refractive indexes so as to reflect light of a shorter wavelength to the perovskite absorption layer 132 and transmit light of a longer wavelength to the crystalline silicon solar cell 110.

    [0112] FIG. 6 shows various paths in which the light of a shorter wavelength incident from the rear of the tandem solar cell in the perovskite solar cell 130 is absorbed.

    [0113] First, the first optical path {circle around (1)} is a light path in which shorter wavelength light is refracted by a texture structure introduced on the rear surface of the crystalline silicon solar cell 110 and is incident on the perovskite solar cell 130 in an oblique direction. That is, by introducing a texture structure on the rear surface of the crystalline silicon solar cell 110, the optical path of a shorter wavelength vertically incident from the rear surface of the tandem solar cell is changed to an oblique direction, such that it is possible to obtain the antireflection effect and at the same time increase the optical path to improve the utilization rate of the shorter wavelength light in the perovskite solar cell 130.

    [0114] The second optical path {circle around (2)} and the third optical path {circle around (3)} are paths in which shorter wavelength light is reflected by the rear metal electrode 180 to which a wire-shaped metal wire having a cylindrical or elliptical cross section is connected.

    [0115] In this embodiment, the second optical path {circle around (2)} is a light path in which light incident vertically toward the rear metal electrode 180 is reflected on the curved surface of the electrode wire bonded to the pad electrode 181 and is incident on the transparent substrate 190 in a diagonal direction. The light incident on the transparent substrate 190 in an oblique direction can be reflected again and incident on the perovskite solar cell 130 in an oblique direction.

    [0116] Accordingly, it is possible to increase the probability of re-entering into the perovskite solar cell 130 by scattering light vertically incident on the rear metal electrode 180 in various directions.

    [0117] The third optical path {circle around (3)} is an optical path in which light incident vertically toward the side of the electrode wire is reflected and is incident on the perovskite solar cell 130 in an oblique direction. As a result, the utilization rate of the shorter wavelength light in the perovskite absorption layer 132 can be improved by the increased optical path while obtaining the antireflection effect.

    [0118] FIG. 7 shows various paths in which the light of a longer wavelength incident from the front surface of the tandem solar cell in the crystalline silicon solar cell 110 is absorbed.

    [0119] First, the first optical path {circle around (1)} is an optical path in which longer wavelength light is refracted by the transparent electrode structure 160 and is incident on the crystalline silicon solar cell 110 in an oblique direction. That is, by introducing a transparent electrode structure 160 on the front surface of the perovskite solar cell 130, the optical path of a longer wavelength vertically incident toward the tandem solar cell is changed to an oblique direction, such that it is possible to obtain the antireflection effect and at the same time increase the optical path to improve the utilization rate of the longer wavelength light in the crystalline silicon solar cell 110.

    [0120] The second optical path {circle around (2)} and the third optical path {circle around (3)} are paths in which a longer wavelength is reflected by the rear transparent electrode 140 on which a textured structure is introduced, and the transparent substrate 190 disposed on a rear surface of the rear transparent electrode 140.

    [0121] First, when the light of a longer wavelength reaches the rear transparent electrode 140 along the second optical path {circle around (2)}, a part of light is reflected and re-entered into the crystalline silicon solar cell 110. On the other hand, the light transmitted through the rear transparent electrode 140 is reflected in a diagonal direction again by the transparent substrate 190 and is incident again on the crystalline silicon solar cell 110, which corresponds to the third optical path {circle around (3)}.

    [0122] In order to allow the light transmitted through the rear transparent electrode 140 to be emitted to the rear side as in the third optical path {circle around (3)}, the rear metal electrode 180 is provided only on a part of the rear surface of the rear transparent electrode 140. Accordingly, the longer wavelength light not absorbed by the crystalline silicon solar cell 110 can be emitted to the rear surface along the third optical path {circle around (3)}, and the light emitted to the rear surface can be reflected by the transparent substrate 190 and re-incident on the crystalline silicon solar cell 110, thereby improving the utilization rate of the longer wavelength light.

    [0123] The fourth optical path {circle around (4)} is a light path in which the light incident vertically toward the front surface of the front metal electrode 170 is reflected on the curved surface of the electrode wire and is incident on the transparent substrate 200 in a diagonal direction. The light incident in a diagonal direction toward the transparent substrate 200 may be reflected again and incident in a diagonal direction toward the tandem solar cell, and can reach the crystalline silicon solar cell 110 through the perovskite solar cell 130.

    [0124] That is, it is possible to increase the probability of re-entering into the crystalline silicon solar cell 110 by scattering light vertically incident toward the electrode wire 173 in various directions.

    [0125] FIG. 8 shows various paths in which the light of a longer wavelength incident from the rear surface of the tandem solar cell in the crystalline silicon solar cell 110 is absorbed.

    [0126] First, the first optical path {circle around (1)} is a light path in which the longer wavelength light is refracted by a texture structure introduced on the rear surface of the crystalline silicon solar cell 110 and is incident on the crystalline silicon solar cell 110 in an oblique direction. That is, by introducing a texture structure on the rear surface of the crystalline silicon solar cell 110, the optical path of a longer wavelength vertically incident from the rear surface of the tandem solar cell is changed to an oblique direction, such that it is possible to obtain the antireflection effect and at the same time increase the optical path to improve the utilization rate of the longer wavelength light in the crystalline silicon solar cell 110.

    [0127] The second optical path {circle around (2)} and the third optical path {circle around (3)} are paths in which longer wavelength light is reflected by the rear metal electrode 180 to which an electrode wire having a cylindrical or elliptical cross section is bonded.

    [0128] In this embodiment, the second optical path {circle around (2)} is a light path in which the light incident vertically toward the rear metal electrode 180 is reflected on the curved surface of the electrode wire and is incident toward the transparent substrate 190 in a diagonal direction. The light incident on the transparent substrate 190 in an oblique direction can be reflected again and incident on the crystalline silicon solar cell 110 in an oblique direction.

    [0129] Further, the third optical path {circle around (3)} is an optical path in which the light incident vertically toward the side of the electrode wire is reflected and is incident toward the crystalline silicon solar cell 110 in an oblique direction.

    Second Implementation

    [0130] FIG. 9 shows a cross-sectional view of a tandem solar cell according to a second embodiment of the present disclosure.

    [0131] The crystalline silicon solar cell 210 according to the second embodiment may be implemented with a homojunction crystalline silicon solar cell.

    [0132] Specifically, the crystalline silicon solar cell 210 according to the second embodiment includes a crystalline silicon substrate 211, an emitter layer 212 located on a front surface of the crystalline silicon substrate 211, and a rear electric field layer 213 located on a rear surface of the crystalline silicon substrate 211. The front surface of the crystalline silicon substrate 211 is a portion where the light in a longer wavelength region transmitted through the perovskite solar cell 230 is first incident on the crystalline silicon solar cell 210.

    [0133] In this embodiment, an impurity doping layer having conductivity different from that of the crystalline silicon substrate is used as the emitter layer 212, and an impurity doping layer having the same conductivity as the crystalline silicon substrate is used as the rear electric field layer 213, thereby providing a homojunction crystalline silicon solar cell.

    [0134] For example, when the crystalline silicon substrate 211 is an n-type single crystal silicon substrate, the emitter layer 212 is a semiconductor layer doped with p-type impurities, and the rear electric field layer 213 is a semiconductor layer doped with n-type impurities. In this embodiment, the rear electric field layer 213 may be a p+ type semiconductor layer doped at a higher concentration than the concentration of the p-type impurity doped into the crystalline silicon substrate 211.

    [0135] Further, the crystalline silicon substrate 211 may be a p-type single-crystal silicon substrate instead of an n-type single-crystal silicon substrate or another crystalline silicon substrate that is typically used for the crystalline silicon solar cell 210. Similarly, the emitter layer 212 and the rear electric field layer 213 may also be designed to be doped with an impurity having a suitable conductivity according to the conductivity of the crystalline silicon substrate 211.

    [0136] A front passivation layer 221 and a rear passivation layer 240 are disposed on the front surface of the emitter layer 212 and the rear surface of the rear electric field layer 213, respectively. Particularly, the front passivation layer 221 may be disposed to cover the defect of the front surface of the emitter layer 212 and at the same time to ensure conductivity for the tunnel junction via the inter-layer 220.

    [0137] The front passivation layer 221 and the rear passivation layer 240 may be made of at least one dielectric material selected from silicon oxide (SiO.sub.x), silicon nitride (Si.sub.xN.sub.y), and silicon oxynitride (SiO.sub.xN.sub.y).

    [0138] The electric charge generated from the crystalline silicon solar cell 210 is collected in the rear metal electrode 280. In this embodiment, the rear metal electrode 280 is located on a part of the rear surface of the rear passivation layer 240, contacting the rear surface of the rear electric field layer 213 through the rear passivation layer 240.

    [0139] In this embodiment, as shown in FIG. 9, the rear metal electrode 280 is not provided on the rear surface of the rear passivation layer 240 but is provided on a part of the rear surface of the rear passivation layer 240, such that the sunlight may be incident on the rear surface of the crystalline silicon solar cell 210.

    [0140] In this embodiment, it is preferable that the rear metal electrode 280 is arranged to occupy 1% to 30% of the total area of the rear surface of the rear passivation layer 240. If the area occupied by the rear metal electrode 280 is less than 1%, the effect of collecting charges generated from the crystalline silicon solar cell 210 by the rear metal electrode 280 may be insufficient, whereas if the area occupied by the rear metal electrode 280 exceeds 30%, the area occupied by the rear metal electrode 280 is excessively wide, and the utilization of light incident from the rear surface of the crystalline silicon solar cell 210 may be reduced.

    [0141] In addition, a grid electrode structure for collecting charges is formed on the front surface of the front transparent electrode 213, and the pad electrode 282 may be provided to contact a part of the front surface of the grid electrode structure. On the pad electrode 282 is bonded by soldering method an electrode wire 283 for electrically connecting neighboring tandem solar cells, and the electrode wire 283 connected to the rear surface of the pad electrode 281 of one cell is integrally provided with the electrode wire 273 connected to the front surface of the pad electrode 272 of a neighboring cell. In this embodiment, the electrode wire 283 is preferably a wire form having a cylindrical or elliptical cross section.

    [0142] In addition, the path of the light incident vertically through the rear surface of the crystalline silicon solar cell 210 can be changed to an oblique direction, as a texture structure is introduced into the rear surface of the crystalline silicon substrate 211, and the rear electric field layer 213 and the rear passivation layer 240 sequentially formed on the rear surface of the crystalline silicon substrate 211 are formed along the texture structure. That is, it is advantageous that light scattering effect by the texture structure introduced on the rear surface of the crystalline silicon solar cell 210 can increase the path of light incident from the rear surface of the crystalline silicon solar cell 210.

    [0143] When the perovskite solar cell 230 is formed on the front surface of the silicon solar cell 210 by making the front surface of the crystalline silicon substrate 211 flat without introducing the texture structure as in the rear surface, it is possible to prevent the occurrence of defects in the perovskite solar cell 230.

    [0144] Then, on the front surface of the emitter layer 212 of the crystalline silicon solar cell 210, an inter-layer 220 for electrically connecting the crystalline silicon solar cell 210 and the perovskite solar cell 230 by tunnel junction is located.

    [0145] In this embodiment, the inter-layer 220 may be formed in a multi-layer structure in which an n+ type crystalline silicon layer and a p+ type crystalline silicon layer are alternately laminated at least once.

    [0146] On the front surface of the inter-layer 220 is positioned the perovskite solar cell 230. The perovskite solar cell 230 includes an electron transport layer 231 located on a front surface of the inter-layer 220, a perovskite absorption layer 232 located on a front surface of the electron transport layer, and a hole transport layer 233 positioned on a front surface of the perovskite absorption layer. In addition, a mesoporous layer 231a including the same or different metal oxide as the electron transport layer 231 may be further provided on the front surface of the electron transport layer 231.

    [0147] The electric charge generated from the perovskite solar cell 230 having the above-described structure is collected in the front transparent electrode 250 and the connection between the front transparent electrode 250 and an external terminal is made via the front metal electrode 270. Examples of the transparent conductive material for implementing the front transparent electrode 250 include a transparent conductive oxide, a carbonaceous conductive material, a metallic material, and a conductive polymer

    [0148] The tandem solar cell according to certain embodiments of the present disclosure reduces the reflectance of vertically incident light and changes the incidence direction of light to diagonal direction, such that it further includes a transparent electrode structure 260 having a Nano-sized structure or patterned to have a lattice pattern such as a grid or a mesh pattern on the front surface of the front transparent electrode 250 in order to increase a light path passing through the tandem solar cell.

    [0149] That is, by way of arranging the patterned transparent electrode structure 260 on the front surface of the front transparent electrode 250, it is possible to reduce the reflectance of the incident light by changing the incident angle of the light vertically incident on the tandem solar cell.

    [0150] As shown in FIGS. 9 and 10, the front transparent electrode 250 and the transparent electrode structure 260 are provided as separate layers, and the transparent electrode structure 260 has a grid, mesh, or concave-convex pattern, such that the front transparent electrode 250 can be exposed in some regions. Further, as shown in FIG. 11, the front transparent electrode 250 and the transparent electrode structure 260 may be integrally formed, wherein the transparent electrode structure 260 may be formed by depositing a transparent electrode and then patterning the transparent electrode structure 160 by a predetermined depth from the front surface.

    [0151] The front metal electrode 270 is provided on a part of the front surface of the front transparent electrode 250. The front metal electrode 270 includes a pad electrode 272 that contacts a portion of the front surface of the front transparent electrode 250. In addition, a grid electrode structure for collecting charges is formed on the front surface of the front transparent electrode 250, and the pad electrode 272 may be provided to contact a part of the front surface of the grid electrode structure. On the front surface of the pad electrode 272 is bonded by soldering method an electrode wire 273 for electrically connecting neighboring tandem solar cells, and the electrode wire 273 connected to the front surface of the pad electrode 272 of one cell is integrally provided with the electrode wire 283 connected to the rear surface of the pad electrode 282 of a neighboring cell.

    [0152] In this embodiment, the electrode wire 273 is preferably a wire form having a cylindrical or elliptical cross section. Accordingly, the light incident vertically toward the electrode wire 273 can be scattered and the probability of re-entering into the tandem solar cell can be increased.

    Method for Manufacturing a Tandem Solar Cell

    [0153] FIG. 12 shows a manufacturing procedure of the tandem solar cell depicted in FIG. 2, and FIG. 13 shows a manufacturing procedure of the tandem solar cell depicted in FIG. 9.

    Preparation of a Crystalline Silicon Solar Cell

    [0154] FIGS. 12A and 13A show the steps of preparing crystalline silicon substrates 111 and 211 for a crystalline silicon solar cell, and FIGS. 12B and 13B show a step of preparing crystalline silicon solar cells 110 and 210 from the crystalline silicon substrates 111 and 211, respectively.

    [0155] Referring to FIG. 12A, before the i-type amorphous silicon layer and the conductive amorphous silicon layer are formed on the front surface and the rear surface of the crystalline silicon substrate 111, respectively, the front surface of the crystalline silicon substrate 111 is chemically planarized and a texture structure is introduced to the rear surface thereof.

    [0156] Further, Referring to FIG. 13A, before the emitter layer and the rear electric field layer are formed on the front surface and the rear surface of the crystalline silicon substrate 211, respectively, the front surface of the crystalline silicon substrate 211 is chemically planarized and a texture structure is introduced to the rear surface thereof.

    [0157] The planarization and texture structure of the crystalline silicon substrate according to FIGS. 12A and 13A can be introduced by any one of a wet chemical etching method, a dry chemical etching method, an electrochemical etching method, and a mechanical etching method, but not limited thereto. For example, the front and rear surfaces of the crystalline silicon substrate are etched in a basic aqueous solution (wet chemical etching method) to introduce a texture structure on both sides, and then a silicon substrate having a flat front surface and a rear surface with a textured structure can be obtained through selective etching on the front side of the silicon substrate. The selective etching for the front surface of the silicon substrate may be performed by forming a passivation layer on the rear surface and then performing etching or spraying an etchant only on the front surface of the silicon substrate.

    [0158] Each of the layers sequentially formed on the rear surface of the crystalline silicon substrates 111 and 211 as a result of introducing the texture structure on the rear surface of the crystalline silicon substrates 111 and 211 may have a texture structure conforming to the texture structure formed on the rear surface of the crystalline silicon substrates 111 and 211. On the other hand, since the front surfaces of the crystalline silicon substrates 111 and 211 have undergone the planarization process, the respective layers sequentially formed on the front surfaces of the crystalline silicon substrates 111 and 211 can be formed flat. However, if necessary, the present disclosure may further include a patterning process such as etching an arbitrary layer among a plurality of layers formed on the front surface of the crystalline silicon substrates 111 and 211 to introduce irregularities.

    [0159] Subsequently, referring to FIG. 12B, a front i-type amorphous silicon layer 112 and a rear i-type amorphous silicon layer 113 are formed on the front surface and the rear surface of the crystalline silicon substrate 111, respectively, and then a first conductive amorphous silicon layer 114 is formed on the front surface of the front i-type amorphous silicon layer 112 and an amorphous silicon layer 115 is formed on the rear surface of the rear i-type amorphous silicon layer 113.

    [0160] In this embodiment, the i-type amorphous silicon layer, the first conductive amorphous silicon layer, and the second conductive amorphous silicon layer can be deposited by various known methods, and typically used is a chemical vapor deposition (CVD). The chemical vapor deposition method includes atmospheric pressure CVD, reduced pressure CVD, plasma CVD (PECVD), electron cyclotron resonance (ECR) plasma CVD, high temperature CVD, and low temperature CVD. In this embodiment, the i-type amorphous silicon layer may be deposited to a thickness of 2 to 10 nm, and the first conductive amorphous silicon layer and the second conductive amorphous silicon layer may be deposited to a thickness of 10 to 80 nm.

    [0161] Referring to FIG. 13B, an emitter layer 212 and a rear electric field layer 213 are formed on the front and rear surfaces of the crystalline silicon substrate 211, respectively.

    [0162] The emitter layer 212 and the rear electric field layer 213 may be formed through an implantation process, wherein the emitter layer 212 is doped with boron as an impurity and the rear electric field layer 213 is doped with phosphorous as an impurity. When the emitter layer 212 and the rear electric field layer 213 are formed by the implantation process, it is preferable to carry out a heat treatment at 700 to 1,200 C. for activation of impurities. It is also possible to form the emitter layer 212 and the rear electric field layer 213 through a high temperature diffusion process using for example BBr.sub.3or POCl.sub.3instead of the implantation process.

    [0163] Referring to FIG. 12C, a rear transparent electrode 140 is formed on the rear surface of the crystalline silicon solar cell 110, and an inter-layer 120 is formed on the front surface thereof.

    [0164] The inter-layer 120 and the rear transparent electrode 140 may be formed from a variety of transparent conductive materials. Examples of the transparent conductive material for forming the inter-layer 120 and the rear transparent electrode 140 include a transparent conductive oxide, a carbonaceous conductive material, a metallic material, or a conductive polymer.

    [0165] For example, when a transparent conductive oxide such as ITO (Indium Tin Oxide), ICO (Indium Cerium Oxide), or IWO (Indium Tungsten Oxide) is used as a transparent conductive material for forming the inter-layer 120 and the rear transparent electrode 140, the inter-layer 120 and the rear transparent electrode 140 may be deposited by sputtering. It is also possible to deposit an n-type amorphous silicon layer instead of a transparent conductive oxide as the inter-layer 120 by PECVD.

    [0166] Referring to FIG. 13C, a rear passivation layer 240 is formed on the rear surface of the crystalline silicon solar cell 210, and an inter-layer 220 is formed on the front surface thereof.

    [0167] In this embodiment, before the inter-layer 220 is formed, in order to reduce the surface defects of the emitter layer 212 and to secure the conductivity for the tunnel junction, an inter-layer 220 may be formed after a 0.5 to 10 nm thick passivation layer 221 is formed on the front surface of the emitter layer 212. For example, the passivation layer may be made of SiO.sub.x and may be formed through a wet process, ozone treatment, or PECVD. Then, the inter-layer 220 may be formed by sequentially depositing a p+ type crystalline silicon layer and an n+ type crystalline silicon layer having a thickness of 50 to 500 nm on the front surface of the passivation layer. The rear passivation layer 240 may be formed through a deposition with PECVD from silicon oxide (SiO.sub.x), silicon nitride (Si.sub.xN.sub.y), or silicon oxynitride (SiO.sub.xN.sub.y).

    [0168] Referring to FIG. 13D, a pad electrode 281 penetrating the rear passivation layer 240 is formed. The pad electrode 281 may be formed by patterning Ag, Al or AgAl paste on the rear surface of the rear passivation layer 240 through screen printing, followed by drying and heat treatment. The pad electrode 281 patterned through the heat treatment can be in contact with the rear electric field layer 213.

    [0169] Referring to FIGS. 12D, 12E and 13E, perovskite solar cells 130 and 230 are formed on the front surfaces of the inter-layers 120 and 220.

    [0170] First, the electron transfer layers 131 and 231 are formed on the front surfaces of the inter-layers 120 and 220, and then mesoporous layers 131a and 231a are formed on the front surfaces of the electron transfer layers 131 and 231. In this embodiment, the electron transport layers 131 and 231 and the mesoporous layers 131a and 231a may be formed of a same metal oxide.

    [0171] For example, the electron transport layers 131 and 231 may be formed to a thickness of 5 to 100 nm, and the mesoporous layers 131a and 231a may be formed with a TiO2 layer having a thickness of 500 nm or less. Perovskite absorption layers 132 and 232 are formed on the mesoporous layers 131a and 231a, and the perovskite absorption layers 132 and 232 may be formed to a thickness of 100 to 500 nm after filling mesopores in the mesoporous layers 131a and 231a. The hole transport layers 133 and 233 may be formed to a thickness of 5 to 100 nm by using a conductive polymer on the front surface of the perovskite absorption layers 132 and 232.

    [0172] The respective layers constituting the perovskite solar cells 130 and 230 may be formed through for example physical vapor deposition, chemical vapor deposition, printing, or the like. In certain embodiments, the printing method includes ink jet printing, gravure printing, spray coating, doctor blade, bar coating, gravure coating, brush painting, slot-die coating, or the like.

    [0173] Referring to FIGS. 12F and 13F, the crystalline silicon solar cells 110 and 210 and the perovskite solar cells 130 and 230, which are tunnel functioned via the inter-layers 120 and 220 are prepared, and then the front transparent electrodes 150 and 250 and the transparent electrode structures 160 and 260 are formed on the front surfaces of the perovskite solar cells 130 and 230.

    [0174] In these embodiments, the front transparent electrodes 150 and 250 and the transparent electrode structures 160 and 260 may be formed using various transparent conductive materials as other layers to which transparent electrodes are applied. In addition, the front transparent electrodes 150 and 250 and the transparent electrode structures 160 and 260 may be formed of the same or different transparent conductive materials.

    [0175] For example, when a transparent conductive oxide such as ITO (Indium Tin Oxide) is used as the transparent conductive material for forming the front transparent electrodes 150 and 250, the front transparent electrodes 150 and 250 may be deposited through sputtering.

    [0176] The method of patterning the transparent electrode structures 160 and 260 on the front surface of the front transparent electrodes 150 and 250 may be appropriately selected in consideration of the pattern shape of the transparent electrode structures 160 and 260 and the number of processes.

    [0177] For example, the transparent electrode structures 160 and 260 shown in FIGS. 2 and 9 may be formed by depositing the front transparent electrodes 150 and 250 and the transparent electrode structures 160 and 260 as separate layers by sputtering, and then introducing a Nano-sized structure into the transparent electrode structures 160 and 260 deposited in the form of a single layer or etching to form a lattice pattern such as a grid or a mesh pattern. In these embodiments, the front transparent electrodes 150 and 250 may be exposed in the region where the transparent electrode structures 160 and 260 are etched. According to another embodiment, an appropriate amount of the Nano-spherical solution is applied on the front surface of the front transparent electrode 150, and then the transparent electrode structures 160 and 260 can be formed to have a grid or a mesh pattern through a self-assembly induction method as an energy such as ultrasonic waves is applied.

    [0178] The transparent electrode structures 160 and 260 shown in FIGS. 3 and 10 are formed to have a concave-convex pattern by controlling the degree of etching of the transparent electrode structure 160. The transparent electrode structures 160 and 260 shown in FIGS. 4 and 11 are integrally formed with the front transparent electrodes 150 and 260. That is, the patterned transparent electrode structures 160 and 260 can be introduced on the front surfaces of the front transparent electrodes 150 and 250 by depositing the front transparent electrodes 150 and 250 and then etching them to a predetermined depth.

    [0179] Although all of the above-described methods have been described for planarizing the front surface of a silicon substrate to form a perovskite layer and a transparent electrode, it can also be prepared in such a way that the front surface of the silicon substrate is finely etched and a perovskite solar cell layer is formed thereon, to thereby transfer its shape to the transparent electrode.

    [0180] Then, referring to FIG. 12G, a front metal electrode 170 is formed on the front surface of the front transparent electrode 150 and a rear metal electrode 180 is formed on the rear surface of the rear transparent electrode 140. In particular, it is preferable that the rear metal electrode 180 is formed only on a part of the rear surface of the rear transparent electrode 140 so that the light of a longer wavelength not absorbed by the crystalline silicon solar cell 110 can be emitted to the rear surface.

    [0181] In this embodiment, the front metal electrode 170 and the rear metal electrode 180 include grid electrodes 171 and 181, and may selectively include pad electrodes (not shown). The front metal electrode 170 and the rear metal electrode 180 including the grid electrodes 171 and 181 and the pad electrodes may be formed by screen printing Ag, Al, or Ag-Al paste, followed by heat treatment at 100 to 150 C. to be in contact with the front transparent electrode 150 and the rear transparent electrode 140, respectively.

    [0182] Referring to FIG. 13G, a front metal electrode 270 is formed on the front surface of the front transparent electrode 250 in the same manner as in FIG. 12G.

    Solar Cell Module

    [0183] FIG. 14 schematically shows a tandem solar cell according to the present disclosure connected in series. Each solar cell is subjected to a modularization step of electrically connecting and packaging a plurality of cells in order to increase the output and protect the solar cell from moisture or external impact.

    [0184] Accordingly, according to another aspect of the present disclosure, the tandem solar cell disclosed herein can be modularized by connecting two neighboring tandem solar cells in series using a conductor.

    [0185] Referring to FIG. 14, two adjacent tandem solar cells C1 and C2 are connected to each other by electrode wires 173 and 183. In this embodiment, two neighboring tandem solar cells can be connected to each other by a multi wire tabbing method.

    [0186] For example, one of the electrode wires 173 and 273 is soldered to the pad electrodes 172 and 272 located on the front surface of the arbitrary tandem solar cell C1, and the other of the electrode wires 173 and 273 is soldered to the pad electrodes 182 and 282 located on the rear surface of the other tandem solar cell C2.

    [0187] An electrode wire made of Cu, Ag, Ni or Al coated with a solder material (e.g., Pb, Sn, SnIn, SnBi, SnPb, Sn, SnCuAg or SnCu) can be used as a conductor for connecting two neighboring tandem solar cells in series. The electrode wires 173 and 183 may be attached on the pad electrodes 172 and 182 through various methods such as soldering.

    [0188] In this embodiment, the electrode wires 173 and 183 are preferably a wire form having a cylindrical or elliptical cross section. Accordingly, the light incident vertically toward the electrode wires 173 and 183 can be scattered to increase the probability of re-entering into the tandem solar cell, thereby improving the photoelectric conversion efficiency.

    [0189] Additionally, the front transparent substrate 190 and the rear transparent substrate 200 are bonded to each other with gaps 195 and 205, respectively, on the front and rear surfaces of the tandem solar cell module in which a plurality of cells is electrically connected to each other. In this embodiment, the gaps 195 and 205 may be sealing layers filled with an encapsulating material such as a sealant. Further, according to another embodiment, a module may be provided in which gaps 195 and 205 between the tandem solar cell and the front transparent substrate 190 and the rear transparent substrate 200 are formed with an air layer filled with a gas such as air without filling with an encapsulating material.

    [0190] In this embodiment, a glass substrate, a transparent polymer substrate, or the like may be used, as the front transparent substrate 190 and the rear transparent substrate 200. In this embodiment, the corner portion of the tandem solar cell module may be sealed using an encapsulating material and another sealing member.

    [0191] Although the foregoing disclosure has been described in some detail by way of illustration and example for purposes of clarity of understanding with reference to exemplary embodiments thereof, it will be obvious that certain changes and modifications may be practiced within the scope of the appended claims. Moreover, even though the embodiments of the present disclosure have been described, while the functional effects based on the constitution of the present disclosure have not been explicitly described, it should be appreciated that predictable effects should also be recognized by the constitution.