INTEGRATED RF LIMITER
20180019714 ยท 2018-01-18
Inventors
Cpc classification
H03F2200/444
ELECTRICITY
H03F2200/211
ELECTRICITY
H03G11/00
ELECTRICITY
International classification
Abstract
A limiter circuit is integrated into an RF power amplifier. The limiter circuit automatically starts adding attenuation at the input of the RF power amplifier after a predetermined input power level threshold is exceeded, thereby extending the safe input drive level to protect the amplifier. In a preferred embodiment of the invention, the limiter circuit is implemented using a pseudomorphic high electron mobility transistor (PHEMT) device or a metal semiconductor field effect transistor (MESFET) device. Diode connected transistors or Schottky diodes may also be used in the limiter circuit.
Claims
1-24. (canceled)
25. A power amplifier comprising: a power amplifier stage; and a limiter circuit connected to an input of the power amplifier stage, the limiter circuit including at least a first pseudomorphic high electron mobility transistor and at least a first diode connected between the first pseudomorphic high electron mobility transistor and an output of the power amplifier stage.
26. The power amplifier of claim 25 wherein, responsive to an input power level threshold being satisfied, the limiter circuit adds attenuation at the input of the power amplifier stage.
27. The power amplifier of claim 25 wherein the power amplifier stage includes at least one heterojunction bipolar transistor.
28. The power amplifier of claim 27 wherein the first pseudomorphic high electron mobility transistor is connected between a base of the at least one heterojunction bipolar transistor and the input of the power amplifier stage.
29. The power amplifier of claim 25 wherein the power amplifier stage is one stage of a multi-stage power amplifier.
30. The power amplifier of claim 25 wherein the limiter circuit includes at least one metal semiconductor field effect transistor.
31. The power amplifier of claim 25 wherein the first diode is a Schottky barrier diode.
32. The power amplifier of claim 25 wherein the first diode is a second pseudomorphic high electron mobility transistor configured as a diode.
33. The power amplifier of claim 32 wherein the first diode is connected in series with a third pseudomorphic high electron mobility transistor configured as a diode.
34. The power amplifier of claim 25 wherein the power amplifier stage is configured to amplify a radio frequency signal.
35. The power amplifier of claim 25 wherein the power amplifier stage is associated with a communication path of a first power level and the power amplifier further comprises a second power amplifier stage associated with a communication path of a second power level.
36. The power amplifier of claim 35 further comprising a second limiter circuit connected to an input of the second power amplifier stage.
37. The power amplifier of claim 36 wherein, responsive to a second input power level threshold being satisfied, the second limiter circuit adds attenuation at the input of the second power amplifier stage.
38. The power amplifier of claim 25 wherein the limiter circuit includes at least one field effect transistor and at least one heterojunction bipolar transistor integrated on a single die.
39. The power amplifier of claim 38 wherein the single die is formed using an epitaxial growth process.
40. A cellular phone comprising: an antenna; and a power amplifier including a power amplifier stage and a limiter circuit connected to an input of the power amplifier stage, the limiter circuit including at least a first pseudomorphic high electron mobility transistor and at least a first diode connected between the first pseudomorphic high electron mobility transistor and an output of the power amplifier stage.
41. The cellular phone of claim 40 wherein, responsive to an input power level threshold being satisfied, the limiter circuit adds attenuation at the input of the power amplifier stage.
42. The cellular phone of claim 40 wherein the power amplifier stage includes at least one heterojunction bipolar transistor and the first pseudomorphic high electron mobility transistor is connected between a base of the at least one heterojunction bipolar transistor and the input of the power amplifier stage.
43. The cellular phone of claim 40 wherein the first diode is a second pseudomorphic high electron mobility transistor with a source and a drain of the second pseudomorphic high electron mobility transistor connected together.
44. The cellular phone of claim 40 wherein the power amplifier includes one or more additional power amplifier stages associated with a different power level than the power amplifier stage.
45. The cellular phone of claim 40 wherein the limiter circuit includes at least one metal semiconductor field effect transistor.
46. The cellular phone of claim 40 wherein the first diode is a Schottky barrier diode.
47. The cellular phone of claim 40 wherein the power amplifier stage is associated with a communication path of a first power level and the power amplifier further comprises a second power amplifier stage associated with a communication path of a second power level.
48. The cellular phone of claim 47 wherein the power amplifier further includes a second limiter circuit connected to an input of the second power amplifier stage, and responsive to a second input power level threshold being satisfied, the second limiter circuit adds attenuation at the input of the second power amplifier stage.
Description
BRIEF DESCRIPTION OF DRAWING
[0004] These and other objects, features and advantages of the invention will be more readily apparent from the following detailed description in which:
[0005]
[0006]
[0007]
[0008]
DETAILED DESCRIPTION
[0009]
[0010]
[0011] With RF applied to RFIN in the normal operational input power range, M2 is biased to be in a fully on low loss state. When the input level reaches a certain power level determined by the combination of the diodes, resistors and the RF gain of the first stage (Q6), the source and drain voltage of M2 will increase to become more positive relative to the gate causing M2 to start pinching off or go into a high loss state.
[0012]
[0013] As shown in
[0014] Illustratively, the HBT and field effect transistor (FET) devices are formed in a III-V semiconductor material such as Gallium Nitride, Indium Phosphide, or Gallium Arsenide/Indium Gallium Phosphide. In some applications, it may be advantageous to integrate the HBT and the FET device in a single semiconductor crystal by epitaxially growing the HBT device on an epitaxially grown FET device. Such a device and the process for making it in a GaAs/InGaP epitaxial growth process is described in U.S. Pat. No. 7,015,519, which is incorporated herein by reference. Other materials may also be used.
[0015] As will be apparent to those skilled in the art, numerous variations may be practiced within the spirit and scope of the present invention.