Method for Generating Non-Classical Light from Classical Light
20240402570 ยท 2024-12-05
Inventors
Cpc classification
G02F1/0136
PHYSICS
G02F1/3542
PHYSICS
G02F1/353
PHYSICS
International classification
Abstract
Non-classical light is generated from classical light by providing a non-classical light generation stage with at least one waveguide; inputting classical light into the non-classical light generation stage; and converting at least part of the classical light into non-classical light. The classical light is in a non-fundamental propagation mode of a waveguide of the non-classical light generation stage, and the non-classical light is in a fundamental propagation mode a waveguide of the non-classical light generation stage. The converting does not involve quasi-phase-matching. An input adaptation stage obtains classical light for input into the non-classical light generation stage. In the input adaptation stage, classical light is converted into classical light of a different waveguide propagation mode. A system has a non-classical light generation stage for converting classical light at least partly into non-classical light, and an optical switch and/or an optical phase shifter, arranged on a single optical chip.
Claims
1. A method for generating non-classical light from classical light, the method comprising the steps of: providing a non-classical light generation stage comprising at least one waveguide, inputting classical light into the non-classical light generation stage, and converting in the non-classical light generation stage at least part of the classical light into non-classical light, wherein the classical light is in a non-fundamental propagation mode of a waveguide of the non-classical light generation stage and the non-classical light is in a fundamental propagation mode of a waveguide of the non-classical light generation stage.
2. A method for generating non-classical light from classical light, the method comprising the steps of: providing a non-classical light generation stage comprising at least one waveguide, inputting classical light into the non-classical light generation stage, and converting in the non-classical light generation stage at least part of the classical light into non-classical light, wherein the converting of at least part of the classical light into non-classical light in the non-classical light generation stage does not involve quasi-phase-matching.
3. The method of claim 1, wherein in the non-classical light generation waveguide, the classical light is of a first wavelength and the non-classical light is of a second wavelength different from the first wavelength.
4. The method of claim 1, wherein the non-classical light generation waveguide's effective refractive index for the classical light injected into the non-classical light generation waveguide is identical to the non-classical light generation waveguide's effective refractive index for the non-classical light.
5. A method for generating non-classical light from classical light, the method comprising the steps of: providing a non-classical light generation stage, inputting classical light into the non-classical light generation stage, and converting in the non-classical light generation stage at least part of the classical light into non-classical light, wherein the method further comprises the step of providing an input adaptation stage for obtaining the classical light to be input into the non-classical light generation stage, wherein in the input adaptation stage classical light is converted into classical light of a different waveguide propagation mode.
6. The method of claim 5, wherein the input adaptation stage and the non-classical light generation stage are combined.
7. The method of claim 5, wherein that it comprises the step of separating non-classical light exiting the non-classical light generation stage from classical light also exiting the non-classical light generation stage.
8. The method of claim 5, wherein that a waveguide of the non-classical light generation stage is of a nonlinear optical material.
9. The method of claim 8, wherein a waveguide in the non-classical light generation stage is of LiNbO.sub.3.
10. The method of claim 1, wherein a waveguide of the non-classical light generation stage has a thickness of between 300 and 500 nm.
11. An apparatus for generating non-classical light from classical light, the apparatus comprising a non-classical light generation stage for converting classical light at least partly into non-classical light, wherein a waveguide of the non-classical light generation stage is of a non-doped optical material.
12. An apparatus for generating non-classical light from classical light, the apparatus comprising a non-classical light generation stage for converting classical light at least partly into non-classical light, wherein the non-classical light generation stage does not comprise a periodically poled structure for the light to pass through periods of such periodically poled structure.
13. An apparatus for generating non-classical light from classical light, the apparatus comprising a non-classical light generation stage for converting classical light at least partly into non-classical light, wherein the apparatus comprises an input adaptation stage for converting classical light into classical light of a different waveguide propagation mode, the input adaptation stage being arranged upstream of the non-classical light generation stage such that the converted light obtained in the input adaptation stage can be input into the non-classical light generation stage for converting it at least partly into non-classical light.
14. A system comprising a non-classical light generation stage for converting classical light at least partly into non-classical light, and an optical switch and/or an optical phase shifter, the non-classical light generation stage and the optical switch and/or optical phase shifter being arranged on a single optical chip.
15. A device for performing the method according to claim 1.
16. A device for performing the method according to claim 2.
17. A device for performing the method according to claim 5.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0083] In the following, further preferred embodiments of invention are illustrated by means of examples. The invention is not limited to these examples, however.
[0084] The drawings schematically show:
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DETAILED DESCRIPTION OF AN EMBODIMENT OF THE INVENTION
[0112] In the following description of preferred embodiments of the invention, identical reference numerals refer to identical or similar components.
Stages of Non-Classical Light Generation
[0113] A method for generating squeezed vacuum in a nanophotonic .sup.(2) waveguide is shown in
[0117] The three different sections 2, 3 and 7 can be designed to have different waveguide cross sectionseg to avoid unwanted nonlinear light generation in the first and third stage. In this case, to connect these sections, intermediate transition regions can be present in between the main three stages, where the waveguide dimensions are adapted by means of adiabatic tapers.
Example 1: System for Generating Single Mode Squeezed Vacuum in a Non-Doped Single Pass LNOI Nanophotonic Waveguide
General Considerations
[0118] We designed a system in non-doped, non-poled LNOI that can generate squeezed vacuum at a wavelength of 1 550 nm using the aforementioned method for generating squeezed vacuum in a .sup.(2) nanophotonic waveguide without the need of periodic poling. The current example is designed for X-cut non-doped LNOI substrates. It is possible to apply the current invention to other types of LNOI substrates-such as Z-cut LNOI or doped LNOIas well as other types of .sup.(2) substrates. However, the specific design will need to be adapted, depending on the refractive index of the chosen substrate. The schematic of the system is shown in the following
[0123] The detailed top view and cross section of the device is shown in
[0124] The design of the individual sections can vary, depending on the fabrication equipment and on the substrate used. In the following, we will provide a set of fabrication parameters for each component, given the usage of a specific substrate, namely non-doped X-cut LNOI. The device has been designed in agreement with the fabrication method detailed by Zihan Li et al in the section Fabrication process with DLC hard mask, pages 3 to 4 of Tightly confining lithium niobate photonic integrated circuits and lasers, arXiv: 2208.05556 (2022). This disclosure of the fabrication process in this document is incorporated into the present disclosure by reference.
[0125] Common properties of the geometry of the system discussed in this Example 1
[0126] The layer stack, ie the thickness and order of the layers that compose the material platform before etching, can be seen in
[0130] is provided as-is by the LNOI supplier. For the scope of the current invention, the handle 14 can be made of lithium niobate, silicon or sapphire, and its thickness 15 is irrelevant; yet, for reasons of convenient handling it, the thickness 15 is typically greater than 1 m. The substrate layer 13 is made of silicon dioxide (SiO.sub.2) and its thickness 16 is greater than 2 m.
[0131] The LN thin film 12 is non-doped X-cut LN. The propagation direction is the crystallographic Y-axis, ie the waveguides need to be parallel to the crystallographic Y-axis. The simulations, discussed below, revealed that thicknesses t between 300 nm and 500 nm yield suitable MPM conditions. Therefore, in the design of Example 1 considers a film thickness t=400100 nm. From here onwards, all physical dimensions relative to Example 1 are calculated assuming a film thickness of 400 nm. For a different film thickness, the specified quantities will need to be slightly changed, to account for the different film thickness. The method for calculating the new quantities is specified below. The etching depth h of the LN film needs to be at least 75% of the film thickness, according to the simulation method discussed below. The sidewall angle indicated in
[0132] The cladding layer 17 is deposited on top of the waveguides, after the fabrication of the device. The deposition method is described Cheng Wang et al in the section 3, 3 Device fabrication, of the above-mentioned publication Second harmonic generation in nano-structured thin-film lithium niobate waveguides, Opt. Express 25, 6963-6973 (2017). Any thickness 22 that is greater than 1 m is sufficient.
[0133] In this example design, we considered generation of squeezed light at 1 550 nm. The design methods and fabrication can be adapted to address other wavelengths. However, for different target wavelengths, the fabrication parameters will vary.
[0134] For the non-doped X-cut LNOI substrate discussed in this Example 1, simulations show that the critical parameters are the film thickness t and the etching depth. For a film thickness t between 300 and 500 nm, it is always possible to achieve MPM by varying the waveguide width and/or the sidewall angle. Regarding the etching depth, our simulations show that a film etched by at least 75% entails geometries that led themselves to MPM. The sidewall angle is defined by the etching process, and varying the sidewall angle requires adapting the waveguide width to ensure MPM. However, we found no practical restrictions for the admissible sidewall angles . Similarly, we found that the presence of a cladding layer 17 on top of the LN film is not required to obtain MPM. However, it is commonly present, to protect the waveguides and the electrodes.
Design of the Input Adaptation Stage
Introductory Notes
[0135] We start describing the design of the input adaptation stage 2. In the design process, one must first design the non-classical light generation stage 3, which is the more critical one. The design of the non-classical light generation stage 3 provides the design constraints for the input adaptation stage 2, namely the waveguide width w.sub.top and the necessary non-fundamental mode 18in this case the TE.sub.20 mode. For this reason, in this section we assume known the results of the design of the non-classical light generation stage 3, namely the target waveguide top width w.sub.top=810 nm and the shape of the non-fundamental mode 18 shown in
Design Principles and Properties
[0136] The input adaptation stage 2 is an integrated component used to efficiently convert single mode 775 nm pump light 1 from the fundamental TE.sub.00 mode of the input waveguide into the TE.sub.20 mode in a different output waveguide. It means that, ideally, 100% of the light in the TE.sub.00 mode is converted into the TE.sub.20 mode.
[0137] The input adaptation stage 2 consists of an asymmetrical directional coupler. The device has two inputs, two outputs and three sections: the input section 19, the coupling section 20 and the output section 21. The scheme of the device is shown in
[0138] The design of the asymmetric directional coupler proceeds as detailed in the following ALGORITHM 1, a procedure described in
Design Specifications
[0142] For the layer stack discussed above, the design of the non-classical light generation stage 3 requires a waveguide top with w.sub.top=810 nm, corresponding to the target TE.sub.20 mode 18 shown in
[0143] We carried out the simulation detailed in step 2 of ALGORITHM 1 using the FDE solver contained in ModeSolution in Ansys Lumerical, and obtained the plot in
[0144] After determining the properties of the input mode, we proceeded with the step 3 of ALGORITHM 1 to determine the optimal inter-waveguide distance d.sub.a and coupling length L.sub.a. To this aim, we employed the eigenmode expansion (EME) solver in ModeSolution of the Ansys Lumerical. We injected the TE.sub.00 mode in the narrower waveguide and varied the parameters d.sub.a and L.sub.a to maximise the power transferred to the TE.sub.20 mode. The results of this procedure are shown in
[0145] Using the EME solver in Ansys Lumerical, it is possible to estimate the wavelength acceptance bandwidth of this device. The simulations show that >90% mode conversion is possible in the range between 758 nm and 795 nm, as shown in
Design of Non-Classical Light Generation Stage
Design Principles and Properties
[0146] The non-classical light generation stage 3 is an integrated component able to split one pump photon at 775 nm into one photon pair at 1 550 nm. This process is called spontaneous parametric downconversion (SPDC). In the present example, the component is a straight waveguide 25 that uses a type 0 process, where one pump photon at 775 nm in the TE.sub.20 mode 18 (
[0147] The design of the non-classical light generation stage 3 consists in finding the correct waveguide top width w.sub.top, such that the effective refractive index of the TE.sub.20 pump mode is the same as the effective refractive index of the TE.sub.00 mode at 1 550 nm, if possible. The procedure to find the correct waveguide top width w.sub.top is described in the following ALGORITHM 2 outlined in
Design Specification
[0151] Following the procedure of ALGORITHM 2, we identified that it is possible to perform MPM between the fundamental TE.sub.00 mode at 1 550 nm and the non-fundamental TE.sub.20 mode at 775 nm in a waveguide with a top width w.sub.top of around 82020 nm. By varying this width w.sub.top, it is possible to down convert photons into the whole telecom C-band (1 530 nm to 1 570 nm), as shown in
[0152] The waveguide length 27 is arbitrarythe longer the waveguide 25, the higher the efficiency. The normalised conversion efficiency is about 60%/Wcm.sup.2, according to the above-mentioned publication by Cheng Wang et al Second harmonic generation in nano-structured thin-film lithium niobate waveguides, Opt. Express 25, 6963-6973 (2017), which has a comparable design.
Tunability of the MPM Process
[0153] The structure can be tuned by employing electrodes 28 on the side of the waveguide 25, as shown in
[0154] The modulator design considered here was studied on the 400 nm-thick LNOI waveguide. Design of the modulator can be performed using the following ALGORITHM 3 [0155] 1. Design the target waveguide using ALGORITHM 2. [0156] 2. Using a suitable solver, simulate the distribution of the electric field inside the waveguide 25, for a given choice of electrodes 28 metal, thickness, distance and position, relative to the waveguide. [0157] 3. For each computed electric field, calculate the overlap integral .sub.pump between the electric field and the pump mode, and the overlap integral .sub.SPDC between the electric field and the SPDC mode. The overlap integral between the electric field E.sub.RF generated by the electrodes and the electric field E.sub.opt.field of the optical mode is given by
where r.sub.eo is the relevant electrooptic coefficient, V is the voltage between the electrodes 28 and d is the distance between the electrodes 28. The choice of r.sub.eo depends on the polarisations of the optical mode and of the modulator. For the system considered here, it is the r.sub.33 of lithium niobate, which is equal to 31 pm/V. [0159] 5. With the updated refractive indices, calculate the new wavelengths where the modified effective refractive indices of the 775 nm and the 1 550 nm modes are identical.
[0160] In our design, we found that the optimal structure consists in a modulator with gold (Au) electrodes 28 with a thickness of 100 nm. The bottom side of the electrode 28 is located 200 nm above the base of the waveguide, to align with the vertical centre of the waveguide. The distance between the two electrodes is 2 m. With these electrode parameters, the overlap integral between the RF field and the TE.sub.20 pump mode at 775 nm is .sub.pump=0.637, while the overlap integral between the RF field and the TE.sub.00 SPDC mode at 1 550 nm is .sub.SPDC=0.587. With these values, the estimated phase matching shift due to the electro-optic effect is 2 to 6 pm/V, depending on the exact position of the electrodes with respect to the waveguide.
[0161] Using numerical simulations, we also calculated the effect of a temperature variation to the refractive indices of the guided modes at 1 550 nm and at 775 nm, to calculate the phase matching shift due to temperature. In the range 20 to 50 C., the phase matched wavelength changes by 20 pm/K, as shown in
Design of the Separation Stage
Design Principles and Properties
[0162] The separation stage 7 is an integrated component to remove the 775 nm pump light from the waveguide 25 where the down converted non-classical 1 550 nm light is generated. In this example, we designed a symmetrical directional coupler that separates the TE.sub.00 SPDC mode at 1 550 nm into a new waveguide 29 as shown in
Design Specification
[0163] The specific design for the circuitry developed in this invention consists in a system analogous to the asymmetrical directional coupler of the exemplary input adaptation stage 2 discussed above. The main difference is that the coupler is now symmetrical, meaning that the two waveguides have the same widths. Using the design principles discussed by Amnon Yariv and Pochi Yeh in section 13.3 of their before-mentioned publication, considering two waveguides with top widths w.sub.1=w.sub.2=810 nm, it is found using step 3 of ALGORITHM 1 that the optimal inter-waveguide distance is d.sub.s1.2 m and optimal coupling length L.sub.s=37.91.5 m. These parameters allow transfer of more than 99.5% of the light (23 dB of extinction ratio).
Alternative Designs of the Input Adaptation Stage 2
Variation 1Tapered Asymmetric Directional Coupler Resilient to Fabrication Errors
[0164] In this variation, the output, wider waveguide 10 is tapered to compensate for the fabrication errors present on the narrower waveguide 9, as discussed by Yunhong Dinget al in On-chip two-mode division multiplexing using tapered directional coupler-based mode multiplexer and demultiplexer, Opt. Express 21, 10376-10382 (2013) and Z Zhang et al in their previously mentioned publication On-chip optical mode exchange using tapered directional coupler, Sci Rep 5, 16072 (2015), the relevant parts of which publications are incorporated into the present disclosure by reference.
Variation 2Tapered Mode Converter
[0165] In this variant, mode conversion is performed using a tapered waveguide 30, as discussed by Daoxin Dai et al in their previously mentioned publication Mode conversion in tapered submicron silicon ridge optical waveguides, Opt. Express 20, 13425-13439 (2012). The principle behind this device is that a slow transition between two waveguide widths can allow a smooth transition between two light fields with different spatial distribution. An example of this is shown in
Alternative Designs of the Non-Classical Light Generation Stage 3
[0166] Regardless of the type of material chosen, there are two different types of structures that can be used to generate squeezed light, namely single-pass waveguides 31 as shown in
[0167] The non-classical light generation stage can also consist of multiple straight waveguides 33, with propagation along the crystallographic Y-axis, connected by suitable straight and/or bent junctions as shown in
[0168] The non-classical light generation stage can employ a type II process, with input photons in the TM polarisation, and output photons in the TE and TM polarisation.
[0169] For Z-cut LNOI, the non-classical light generation stage could be a spiral 34 as shown in
Alternative Designs for the Separation Stage 7
[0170] There are several possible filtering options for the separation stage 7. One possible way is the use of Bragg grating filters in reflection and/or transmission. In these systems, the refractive index of the 775 nm mode is modulated by means of eg doping or waveguide cross section variation. A second possible option is the usage of filtering cavities. These comprise ring resonators, integrated Fabry Perot cavities, photonic crystal cavities, or similar. A third possible option is the usage of a cascade of the components above (including directional couplers).
Example 2: Gaussian Boson Sampling with On-Chip Single-Mode Squeezed Vacuum Sources
[0171] An example of how to use the apparatus of Example 1 is detailed in
[0172] By way of example, we consider a GBS device acting on n=4 modes. The first section of the chip for implementing GBS is based on a device design described in Example 1. Input pump light at 775 nm is injected via edge-coupling into a single mode waveguide, having a top width of 145 nm. This waveguide is used to route the pump light. A cascade of two Y splitters is used to split the input pump into four different waveguides. Each of these waveguides is then used as input for the four single mode squeezed vacuum sources with a design as described above in Example 1. We recall that they consist of an asymmetric directional coupler, which converts the fundamental pump mode (TE.sub.00) into the non-fundamental (TE.sub.20) mode, in a waveguide with 810 nm top width. This mode is the correct pump mode for the generation of single-mode squeezed vacuum (SMSV) in the straight waveguide section.
[0173] This first section is followed by a symmetric directional coupler for the separation of the generated SMSV and the leftover of the pump light. The leftover pump radiation is sent to grating couplers 36 for efficient extraction. Suitable grating couplers can be designed via a process similar to those described by I Krasnokutska et al in section II of their publication High coupling efficiency grating couplers on lithium niobate on insulator, Opt. Express 27 (13), 17681-17685 (2019), but instead using X-cut LNOI; the relevant parts of the publication by I Krasnokutska is incorporated into the present disclosure by reference. The generated SMSV is then used as input of the four-mode optical interferometer. The four-mode optical interferometer consists of a cascade of 6 beam splitters 37 and twelve electro optical phase shifters 38, arranged as in
[0174] Each beam splitter 37 in turn consists of a symmetric directional coupler. The waveguides with 810 nm top width are coupled at a distance d=1.2 m and for an optimal coupling length of L=17.51.0 m. The phase shifters consist of electro optical phase shifters, which can be fabricated as described in the previously-mentioned publication by Zihan Li et al Tightly confining lithium niobate photonic integrated circuits and lasers, arXiv: 2208.05556 (2022), in the section Fabrication process with DLC hard mask on pages 3 and 4. Such an interferometer, consisting of tuneable beam splitters 37 and phase shifters 38 can be used to realise an arbitrary linear optics transformation, which allows performing arbitrary GBS computations. Photon-number resolving detection is performed on the output light. The detection could be performed either using superconducting nanowire single-photon detectors or using transition edge sensors. These detectors can be integrated on the waveguides in the photonic chip itself or be present off-chip.
[0175] The input of the GBS computation is the settings of the chip that describe the squeezing amounts and the settings of the interferometer including the beam splitter 37 and phase shifter 38 settings. The output of the GBS computation is the set of photon numbers measured on the different detectors.
[0176] The present invention enables the realisation of a GBS apparatus on a single photonic chip made of non-doped LNOI. Such a chip could include the sources, switches and potentially also the detectors on one platform, thus offering unmatched scalability and ease of fabrication.
Example 3: Deterministic Heralded Single Photon Source for Universal Photonic Quantum Computing
[0177] An example of the usage of the apparatus of Example 1 as a source of heralded single photons is shown in
[0178] The first section of the chip is based on an apparatus of Example 1. Input pump light at 775. nm is injected via edge-coupling into a single mode waveguide, having a top width of 145 nm. This waveguide is used to route the pump light. A cascade of two Y splitters is used to split the input pump into four different waveguides. Each of these waveguides is then used as input for the four single mode squeezed vacuum sources of Example 1. They consist of an asymmetric directional coupler 2, which converts the fundamental pump mode (TE.sub.00) into the non-fundamental (TE.sub.20) mode, in a waveguide with 810 nm top width. This mode is the correct pump mode for the generation of SMSV in the straight waveguide section 25. This section is followed by a symmetric directional coupler 7 for the separation of the generated SMSV and the leftover of the pump light. For efficient extraction, the leftover pump radiation is sent to grating couplers 36 as described by I Krasnokutska et al in section II of their above-mentioned publication High coupling efficiency grating couplers on lithium niobate on insulator, Opt. Express 27 (13), pages 17681-17685 (2019). The generated SMSV needs to be manipulated, in order to separate the two photons that, probabilistically, populate the state. This can be performed using a frequency-selective beam splitter 40, in order to separate the photons according to their wavelength. Photons with a wavelength shorter than 1 550 nm are coupled out of the waveguide, into a different output. These photons will be routed to single photon detectors 41, as shown in
[0179] The frequency-dependent beam splitters 40 can be designed using the technique presented by E S Magden et al in Transmissive silicon photonic dichroic filters with spectrally selective waveguides, Nat Commun 9, 3009 (2018).
[0180] After separation, the photons that have a wavelength smaller than 1 550 nm are coupled off-chip to external single photon detectors 41 that detect the number of photons impinging on them. Only the detection events constituted by one single photon are considered successful detection events. These successful detection events herald the presence of the sibling photon, ie, a photon with wavelength greater than 1 550 nm.
[0181] The photons with wavelength greater than 1 550 nm are guided to a delay network 42, which could be either on chip or off-chip in optical fibre. Such a network needs to impart a delay sufficient to wait for the successful detection of the single photons and the analysis of the detection event. Therefore, these delays will need to provide delays of between approximately 100 ns and 1 s. The delayed signals are then injected into a network consisting of electro optic switches 43, as seen in
[0182] Deterministic heralded single photons are a crucial resource for universal photonic quantum computing. While a single SMSV source along with a single-photon detector functions as a non-deterministic single-photon source, many such non-deterministic sources as described above can function as a deterministic or near-deterministic single-photon source. The present invention opens the possibility of fabricating several such SMSV generators and fast optical switches on a single chip, thus enhancing the prospects of fabricating deterministic single-photon sources for universal photonic quantum computing.