Method for avoiding the microbial attack of a cleaning apparatus for a metering unit, and cleaning apparatus
12201739 · 2025-01-21
Assignee
Inventors
- Ingo Hörsting (Drensteinfurt, DE)
- Dietmar Erber (Münster, DE)
- Rainer Storb (Nottuln, DE)
- Sven Fels (Münster, DE)
Cpc classification
B01F33/841
PERFORMING OPERATIONS; TRANSPORTING
B01F35/146
PERFORMING OPERATIONS; TRANSPORTING
B01F35/121
PERFORMING OPERATIONS; TRANSPORTING
B08B1/50
PERFORMING OPERATIONS; TRANSPORTING
B01F2101/30
PERFORMING OPERATIONS; TRANSPORTING
International classification
B01F33/841
PERFORMING OPERATIONS; TRANSPORTING
Abstract
What is presented and described is a method for avoiding the microbial attack of a cleaning apparatus, in particular a cleaning apparatus for a metering system, wherein the cleaning apparatus has at least one mechanical cleaning element with at least one cleaning surface, wherein the method is characterized in that the at least one cleaning surface of the at least one mechanical cleaning element is exposed, at least temporarily, to an oxidizing agent. The present invention further relates to a method for cleaning a metering system, in particular for a dispersion, especially a paint-metering system, to a cleaning apparatus, and to a metering system.
Claims
1. A liquid metering system comprising a plurality of containers arranged on a rotatable circular plate comprising a perimeter, each container operably connected to a metering unit arranged along the perimeter, wherein each metering unit is configured to receive a liquid from the container to which it is connected, and wherein each metering unit comprises a pump head configured, in a dispensing position, to dispense the liquid into a receiving container disposed below the rotatable circular plate; and wherein the rotatable circular plate is configured to rotate each metering unit between the dispensing position and a cleaning position; and at the cleaning position, a rotatable brush with bristles is disposed below the rotatable circular plate wherein the rotatable brush with bristles is configured to contact the pump head, wherein a gas comprising ozone is applied essentially radially to a plurality of bristles of the rotatable brush with bristles.
2. The liquid metering system of claim 1 wherein the rotatable brush with bristles is rotatably mounted in a container proximate to the perimeter and partially immersed in a water bath.
3. The liquid metering system of claim 2 wherein a gas comprising ozone is applied radially to a plurality of bristles of the rotatable brush with bristles.
4. The liquid metering system of claim 2, wherein a gas comprising ozone is applied to the bristles by an ozone gas supply line mounted proximate to a plurality of bristles and parallel to an axis of the rotatable brush with bristles, which rotatable brush with bristle is cylindrical.
5. The liquid metering system of claim 4 wherein the ozone gas supply line comprises an outlet region comprising a plurality of apertures out of which the gas comprising ozone exits the supply line.
6. The liquid metering system of claim 5 wherein the plurality of a bristles is treated with the gas comprising ozone, rotated through the water bath, and afterward a allowed to contact a pump head.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
(1) The present invention is explained in the following by means of a drawing representing an exemplary embodiment of the invention. The following is shown:
(2)
(3)
(4)
(5)
(6)
(7)
DETAILED DESCRIPTION
(8)
(9) The metering system of
(10) As also shown schematically in
(11) The metering unit X1, which is adjacent to the metering unit X1 positioned above the bucket 9 in the clockwise direction, is positioned above a cleaning apparatus X2 in such a way that the cleaning apparatus X2, which is described in detail in
(12) When the metering system is in operation, the control computer 12 calculates the proportions of the primary paints stored in the containers 1, after the customer has entered a desired color tone and the desired volume, and controls the drive of the plate X4 in such a way that the metering units X1 of the container 1 with the required basic colors are positioned over the bucket 9, and the calculated amount is dispensed into the bucket 9 so as to obtain the desired color tone in the bucket 9. This is monitored by means of the scales 10 connected to the control computer via the line L2. The drive of the plate X4 is controlled in such a way that it always rotates clockwise. As a result, the pump head X6 of each metering unit X1 involved in the paint mixing process is cleaned by the cleaning apparatus X2 immediately after use and thus cleared of dispersion residue. The appropriate label for the paint mixture is printed via the label printer 13.
(13)
(14) According to
(15) As can be seen in
(16) The fastening rail X22 together with the supply line X24 for the ozone-containing gas flow is shown again in two perspective views in
(17) The particular advantage of the cleaning apparatus and the cleaning method is that there is no risk of microbial attack with bacteria and fungi in either the cleaning bath X34 or in the brush X29, as this is effectively prevented by the ozone being blown in as an oxidizing agent by the supply line X24. Accordingly, the method according to the invention for avoiding the microbial attack of the cleaning apparatus X2 has proven to be extremely effective. In addition, the risk of a contamination of other pump heads X6 is minimized by the cleaning apparatus X2, even if it cleans a microbially contaminated pump head X6and thus corresponding contaminants collect on the bristles of the cylindrical brush surface X31 and in the cleaning bath X34and then further pump heads X6 are cleaned.