CMOS RF switch device and method for biasing the same
09762192 ยท 2017-09-12
Assignee
Inventors
Cpc classification
H03F1/0261
ELECTRICITY
H03F2203/21139
ELECTRICITY
H03F2200/411
ELECTRICITY
H03H11/30
ELECTRICITY
G05F1/468
PHYSICS
H02M3/1584
ELECTRICITY
H03F2203/21131
ELECTRICITY
H03F2200/18
ELECTRICITY
H03F1/34
ELECTRICITY
H03F1/56
ELECTRICITY
H03G3/3042
ELECTRICITY
H03F2203/7215
ELECTRICITY
H10D84/859
ELECTRICITY
H10D62/103
ELECTRICITY
G05F1/565
PHYSICS
International classification
H03F1/56
ELECTRICITY
H03F3/68
ELECTRICITY
H03F3/72
ELECTRICITY
H02M3/158
ELECTRICITY
G05F1/565
PHYSICS
H03F1/02
ELECTRICITY
H03H11/30
ELECTRICITY
H03F1/34
ELECTRICITY
H01L29/06
ELECTRICITY
G05F1/46
PHYSICS
Abstract
Disclosed are CMOS-based devices for switching radio frequency (RF) signals and methods for biasing such devices. In certain RF devices such as mobile phones, providing different amplification modes can yield performance advantages. For example, a capability to transmit at low and high power modes typically results in an extended battery life, since the high power mode can be activated only when needed. Switching between such amplification modes can be facilitated by one or more switches formed in an integrated circuit and configured to route RF signal to different amplification paths. In certain embodiments, such RF switches can be formed as CMOS devices, and can be based on triple-well structures. In certain embodiments, an isolated well of such a triple-well structure can be provided with different bias voltages for on and off states of the switch to yield desired performance features during switching of amplification modes.
Claims
1. A radio frequency switch comprising: a silicon substrate of a first-type; an isolation well formed in the substrate, the isolation well of a second-type; an isolated well separated from the substrate by the isolation well, the isolated well of the first-type; a source and a drain disposed in the isolated well; a gate disposed on the isolated well so as to allow switching on and off of electrical conduction between the source and the drain by application of different bias gate voltages; and a bias voltage control component electrically connected to the gate, the isolated well, and the isolation well, the bias voltage control component configured to facilitate application of the different bias gate voltages for on and off states of the switch, the bias voltage control component further configured to facilitate application of different bias voltages to at least one of the isolated well and the isolation well for the on and off states of the switch, the isolated well coupled to the source and the drain such that a bias voltage applied to the isolated well substantially tracks a bias voltage applied to the source and the drain.
2. The radio frequency switch of claim 1 wherein the first-type is a p-type and the second-type is an n-type.
3. The radio frequency switch of claim 2 wherein the isolation well includes an N-well and a deep N-well, such that in combination with the isolated well, the N-well and the deep N-well form a triple-well structure in the silicon substrate.
4. The radio frequency switch of claim 3 wherein the gate includes a gate terminal and an oxide layer between the gate terminal and the isolated well so as to form a complementary metal oxide semiconductor structure.
5. The radio frequency switch of claim 1 wherein the bias voltage control component includes a voltage distribution component configured to distribute the different bias voltages to the at least one of the isolated well and the isolation well based on the on or off state of the switch.
6. The radio frequency switch of claim 1 wherein the different bias voltages include a first bias voltage applied to the isolated well for the on state of the switch and a second bias voltage applied to the isolated well for the off state of the switch, and the different bias gate voltages include a first bias gate voltage applied to the gate for the on state of the switch and a second bias gate voltage applied to the gate for the off state of the switch.
7. The radio frequency switch of claim 6 wherein the first bias gate voltage applied to the gate is held at a substantially fixed amount above the first bias voltage applied to the isolated well.
8. The radio frequency switch of claim 6 wherein the second bias voltage applied to the isolated well is substantially equal to the second bias gate voltage applied to the gate.
9. The radio frequency switch of claim 1 wherein the bias voltage applied to the source and the drain is substantially equal to a voltage provided by a supply that is powering the switch such that the bias voltage applied to the isolated well substantially tracks the supply voltage even when the supply voltage changes.
10. The radio frequency switch of claim 1 further comprising one or more diodes formed between the isolated well and one of the source and the drain disposed in the isolated well.
11. The radio frequency switch of claim 1 further comprising a diode formed between the isolation well and one of the isolated well or the silicon substrate.
12. The radio frequency switch of claim 1 wherein the on state of the radio frequency switch results in an radio frequency signal being amplified by a first circuit configured to amplify the radio frequency signal so as to provide a first gain, and the off state of the switch results in the radio frequency signal being amplified by a second circuit configured to amplify the radio frequency signal so as to provide a second gain.
13. The radio frequency switch of claim 12 wherein each of the first and second circuits comprises one or more power amplifiers, and the radio frequency switch is connected in series to the one or more power amplifiers of the first circuit.
14. The radio frequency switch of claim 13 wherein the first gain provided by the one or more power amplifiers of the first circuit is lower than the second gain provided by the one or more power amplifiers of the second circuit.
15. A die comprising the radio frequency switch of claim 1.
16. A wireless device comprising the die of claim 15.
17. A radio frequency switch comprising: a silicon substrate of a first-type; an isolation well formed in the substrate, the isolation well of a second-type; an isolated well separated from the substrate by the isolation well, the isolated well of the first-type; a source and a drain disposed in the isolated well; a gate disposed on the isolated well so as to allow switching on and off of electrical conduction between the source and the drain by application of different bias gate voltages; and a bias voltage control component electrically connected to the gate, the isolated well, and the isolation well, the bias voltage control component configured to facilitate application of the different bias gate voltages for on and off states of the switch, the bias voltage control component further configured to facilitate application of different bias voltages to at least one of the isolated well and the isolation well for the on and off states of the switch, the different bias voltages including a first bias voltage applied to the isolated well for the on state of the switch and a second bias voltage applied to the isolated well for the off state of the switch, and the different bias gate voltages including a first bias gate voltage applied to the gate for the on state of the switch and a second bias gate voltage applied to the gate for the off state of the switch, the first bias voltage applied to the isolated well substantially equal to a bias voltage applied to the source and the drain when the switch is in the on state.
18. A die comprising the radio frequency switch of claim 17.
19. A wireless device comprising the die of claim 18.
20. A radio frequency switch comprising: a silicon substrate of a first-type; an isolation well formed in the substrate, the isolation well of a second-type; an isolated well separated from the substrate by the isolation well, the isolated well of the first-type; a source and a drain disposed in the isolated well; a gate disposed on the isolated well so as to allow switching on and off of electrical conduction between the source and the drain by application of different bias gate voltages; a bias voltage control component electrically connected to the gate, the isolated well, and the isolation well, the bias voltage control component configured to facilitate application of the different bias gate voltages for on and off states of the switch, the bias voltage control component further configured to facilitate application of different bias voltages to at least one of the isolated well and the isolation well for the on and off states of the switch; and a coupling element that electrically connects the isolated well to a reference voltage representative of a supply voltage via one of the source or the drain.
21. The radio frequency switch of claim 20 wherein, when the radio frequency switch is in the on state, the one of the source or the drain electrically connected to the coupling element is provided with a voltage that substantially matches the reference voltage.
22. A die comprising the radio frequency switch of claim 20.
23. A wireless device comprising the die of claim 22.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
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DETAILED DESCRIPTION OF CERTAIN EMBODIMENTS
(22) The headings provided herein, if any, are for convenience only and do not necessarily affect the scope or meaning of the claimed invention.
(23) Provided herein are various non-limiting examples of devices and methods for facilitating amplification of a radio frequency (RF) signal.
(24)
(25) By way of examples, Global System for Mobile (GSM) communication standard is a mode of digital cellular communication that is utilized in many parts of the world. GSM mode mobile phones can operate at one or more of four frequency bands: 850 MHz (approximately 824-849 MHz for Tx, 869-894 MHz for Rx), 900 MHz (approximately 880-915 MHz for Tx, 925-960 MHz for Rx), 1800 MHz (approximately 1710-1785 MHz for Tx, 1805-1880 MHz for Rx), 1900 MHz (approximately 1850-1910 MHz for Tx, 1930-1990 MHz for Rx). Variations and/or regional/national implementations of the GSM bands are also utilized in different parts of the world.
(26) Code division multiple access (CDMA) is another standard that can be implemented in mobile phone devices. In certain implementations, CDMA devices can operate in one or more of 900 MHz and 1900 MHz bands.
(27) One or more features of the present disclosure can be implemented in the foregoing example modes and/or bands, and in other communication standards. For example, 3G and 4G are non-limiting examples of such standards.
(28) In certain embodiments, the wireless device 11 can include a transceiver component 13 configured to generate RF signals for transmission via an antenna 14, and receive incoming RF signals from the antenna 14. It will be understood that various functionalities associated with the transmission and receiving of RF signals can be achieved by one or more components that are collectively represented in
(29) Similarly, it will be understood that various antenna functionalities associated with the transmission and receiving of RF signals can be achieved by one or more components that are collectively represented in
(30) In
(31) In
(32)
(33)
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(35) In certain embodiments, these computer program instructions may also be stored in a computer-readable memory (19 in
(36)
(37) In one example architecture 22, a first RF input indicated as LB IN and corresponding to a first band (e.g., a low band) can be amplified by one or more power amplifiers disposed and/or formed on a die 24a. Such amplified output RF signal is indicated as LB OUT, and can be subjected to impedance matching (e.g., to approximately 50) by a component depicted as 30a. Similarly, a second RF input indicated as HB IN and corresponding to a second band (e.g., a high band) can be amplified by one or more power amplifiers disposed and/or formed on a die 24b. Such amplified output RF signal is indicated as HB OUT, and can be subjected to impedance matching by a component depicted as 30b (e.g., to approximately 50).
(38) In certain embodiments, amplification for a given RF band can include two or more amplification modes. For the example low RF band, the RF input LB IN can be routed to a high power amplification mode or a low/medium power amplification mode via a switch depicted as 32a. If the switch 32a is set for the high power mode, the RF signal can undergo amplification by one or more power amplifiers (e.g., by staged amplifiers 29a and 29b) so as to yield a high power output. If the switch 32a is set for the low/medium power mode, the RF signal can undergo amplification by one or more power amplifiers.
(39) In certain embodiments, the switch 32a need not be employed. For example, the input impedance of the staged amplifiers 29a and 30a can be substantially matched, and the RF input LB IN can be provided to both staged amplifiers 29a and 30a.
(40) In the example shown, a low power mode can be achieved by utilizing a power amplifier 30a; and a medium power mode can be achieved by amplifying the RF signal in stages by the power amplifier 30a and a second power amplifier 30b. Examples of switching and routing of the RF signals to allow selection of the low, medium and high power operating modes are described herein in greater detail. The low/medium amplified output RF signal can be subjected to impedance matching by a component depicted as 31a prior to being output in a manner similar to that of the high power output signal.
(41) Similarly, for the example high RF band, the RF input HB IN can be routed to a high power amplification mode or a low/medium power amplification mode via a switch depicted as 32b. If the switch 32b is set for the high power mode, the RF signal can undergo amplification by one or more power amplifiers (e.g., by staged amplifiers 29c and 29d) so as to yield a high power output.
(42) If the switch 32b is set for the low/medium power mode, the RF signal can undergo amplification by one or more power amplifiers. In the example shown, a low power mode can be achieved by utilizing a power amplifier 30c; and a medium power mode can be achieved by amplifying the RF signal in stages by the power amplifier 30c and a second power amplifier 30d. Examples of switching and routing of the RF signals to allow selection of the low, medium and high power operating modes are described herein in greater detail. The low/medium amplified output RF signal can be subjected to impedance matching by a component depicted as 31b prior to being output in a manner similar to that of the high power output signal.
(43) In the example architecture 22 depicted in
(44) In the example configuration 22 shown in
(45) In certain embodiments, various switches and power amplifiers associated with the dies depicted as 24a, 24b can be fabricated on substrates such as gallium arsenide (GaAs) utilizing devices such as pseudomorphic high electron mobility transistors (pHEMT) or bipolar field effect transistors (BiFET). In certain embodiments, the dies depicted as 24a, 24b in
(46) In certain embodiments, various switches (e.g., 27a, 27b, 28a, 28b) associated with operation of various PAs (e.g., 29a, 29b, 30a, 30b of the low band portion, and 29c, 29d, 30c, 30d of the high band portion) can be fabricated as complementary metal-oxide-semiconductor (CMOS) devices. In certain embodiments, at least some of the PA bias control component 25 can be implemented on a CMOS die. In the example shown in
(47) In certain embodiments, at least one power amplifier and one or more switches associated with its operation can be implemented on a CMOS die.
(48) In
(49) Similar to
(50) It will be understood that the configurations 22 and 34 of
(51) In the context of switches for RF power amplifiers,
(52) In a signal path configuration 40b of
(53) In the context of power amplifiers that can be included in portable and/or wireless devices (e.g., mobile phones), a power amplifier system can be subjected to varying processes and operating conditions such as voltage and temperature variations. For example, a power amplifier system can be powered using a variable supply voltage, such as a battery of a mobile phone.
(54) In certain situations, it can be important for a power amplifier system to switch between power modes so that the power amplifier switch can control power consumption. For example, in a mobile device embodiment, having a plurality of power modes allows the power amplifier to extend battery life. Control signals, such as mode input signals received on a pin or pad, can be used to indicate a desired mode of operation. The power amplifier system can include a plurality of RF signal pathways, which can pass through power amplification stages of varying gain. Switches can be inserted in and/or about these pathways, and switch control logic can be used to enable the switches and power amplifiers associated with the selected power amplifier RF signal pathway.
(55) Placing a switch in a signal path of a power amplifier (e.g., in the example signal path 42b of
(56) In certain embodiments, switches can be integrated on a mixed-transistor integrated circuit (IC) having power amplification circuitry, such as a BiFET, BiCMOS die employing silicon or GaAs technologies. Additionally, switches can be provided on a discrete die, such as a pHEMT RF switch die, and can be configured to interface with a mixed-transistor power amplifier die to implement a configurable power amplifier system. However, these approaches can be relatively expensive and consume significant amounts of area as compared to a silicon CMOS technology. Power consumption and the area of a power amplifier system can be important considerations, such as in mobile system applications. Thus, there is a need for employing a CMOS switch in a RF signal power amplifier system.
(57) In certain embodiments, CMOS RF switches can be relatively large, so that the switch resistance in an ON-state can be relatively small so as to minimize RF insertion loss. However, large CMOS RF switches can have undesirable parasitic components, which can cause significant leakages and cause damage to RF signal fidelity. Additionally, the wells and active areas of the CMOS RF switches can have associated parasitic diode and bipolar structures. Without proper control of the wells of a CMOS RF switch, parasitic structures may become active and increase the power consumption of the power amplifier system and potentially render the system dysfunctional. Furthermore, CMOS devices are susceptible to breakdown, such as gate oxide breakdown, and other reliability concerns, so it can be important to properly bias a CMOS RF switch during operation.
(58) In certain embodiments, one or more switches described herein can be selectively activated depending on a variety of factors, including, for example, a power mode of the power amplifier system. For example, in a high power mode a CMOS RF switch may be positioned in an OFF state and configured to be in a shunt configuration with the active RF signal path. The isolated P-well voltage of such a switch can be controlled to both prevent overvoltage or other stress conditions which may endanger the reliability, while optimizing or improving the linearity of the switch. The linearity of the RF signal pathway having a shunt CMOS switch in an OFF-state can be improved by keeping the isolated P-well voltage at a selected voltage (e.g., relatively low voltage) so as to avoid forward biasing of parasitic diode structures formed between the P-well and the N-type diffusion regions of the source and drain. By preventing the forward-biasing of parasitic diode structures, the injection of unintended current into the active RF signal pathway can be avoided, thereby increasing linearity of the power amplifier system.
(59) In certain embodiments, some or all of the foregoing example properties can be addressed by one or more features associated with a CMOS RF switch, such as a switch 50 depicted in
(60) The switch 50 further includes a source terminal 56 and a drain terminal 59. An oxide layer 65 is disposed on the P-well 53, and a gate 58 is disposed on top of the oxide layer 65. An N-type source diffusion region and an N-type drain diffusion region corresponding to the source and drain terminals (56, 59) are depicted as regions 57 and 60, respectively. In certain embodiments, formation of the triple-well structure and the source, drain and gate terminals thereon can be achieved in a number of known ways.
(61) In certain operating situations, an input signal can be provided to the source terminal 56. Whether the switch 50 allows the input signal to pass to the drain terminal 59 (so as to yield an output signal) can be controlled by application of bias voltages to the gate 58. For example, application of a first gate voltage can result in the switch 50 being in an ON state to allow passage of the input signal from the source terminal 56 to the drain terminal 59; while application of a second gate voltage can turn the switch 50 OFF to substantially prevent passage of the input signal.
(62) In certain embodiments, the switch 50 can include a P-well terminal 54 connected to the P-well 53 by a P-type diffusion region 55. In certain embodiments, the P-type diffusion region 55 and the N-type diffusion regions 57 and 60 can be all formed substantially in the P-well 53. In certain embodiments, the P-well terminal 54 can be provided with one or more voltages, or held at one or more electrical potentials, to facilitate controlling of an isolated voltage of the P-well. Examples of such P-well voltages are described herein in greater detail.
(63) In certain embodiments, the switch 50 can include an N-well terminal 61 connected to the N-well 52 by an N-type diffusion region 62. In certain embodiments, the N-type diffusion region 62 can be formed substantially in the N-well 52. In certain embodiments, the N-well terminal 61 can be provided with one or more voltages, or held at one or more electrical potentials, to provide the switch 50 with one or more desired operating performance features. One or more examples of such N-well voltages are described herein in greater detail.
(64) In certain embodiments, the switch 50 can include a P-type substrate terminal 63 connected to the P-type substrate 51 and having a P-type diffusion region 64. In certain embodiments, the P-type diffusion region 64 can be formed substantially in the P-type substrate 51. In certain embodiments, the P-type substrate terminal 63 can be provided with one or more voltages, or held at one or more electrical potentials, to provide the switch 50 with one or more desired operating performance features. One or more examples of such N-well voltages are described herein in greater detail.
(65) In the example CMOS device shown in
(66) In certain embodiments, the N-type diffusion regions 57 and 60 can be held at substantially the same DC voltage. In certain embodiment, such a configuration can be achieved by providing a relatively large value shunt resistor (e.g., polysilicon resistor) 75 across the source and the drain.
(67) In the context of triple-well CMOS devices, the N-well 52 can substantially isolate the P-well 53 from the P-type substrate 51. In certain embodiments, the presence of the N-well 52 between the P-well 53 and the P-type substrate 51 can result in two additional diodes. As shown in
(68) In certain embodiments, the switch 50 can be operated so as to reverse-bias one or more of the diodes shown in
(69) Although
(70) Performance of a silicon CMOS switch such as a triple-well CMOS switch can be affected by electrical potentials of various parts of the switch. For the purpose of description, it will be understood that a voltage at a given location refers to a difference in electrical potential between the given location and a reference (e.g., a system ground). Thus, it will also be understood that providing of a voltage can include a situation where a desired electrical potential is held so as to yield a desired potential relative to a reference.
(71)
(72) In certain embodiments, gate bias voltage can be controlled by a control component 114. Similarly, P-well, N-well, and P-substrate bias voltages can be controlled by components 112, 116, and 118, respectively. For the purpose of description, bias voltage control functionalities provided by the components 112, 114, 116 and 118 are sometimes collectively referred to as a switch bias control component 110. It will be understood that such bias voltage controlling functionalities can be achieved individually, in some combination of one or more control components, or together by a single integrated control component.
(73) In certain embodiments, various voltages applied to the triple-well CMOS switch can be selected so as to maintain the reverse-bias configuration of the various diodes (e.g., 70, 71, 72, 73) formed at various p-n junctions. For example, if the P-substrate portion is held at ground potential, following voltages can maintain the desired reverse-bias of the diodes:
(74) TABLE-US-00001 TABLE 1 Approx. voltage (ON state) Approx. voltage (OFF state) P-substrate 0 0 N-well 11.8 11.8 P-well 4.2 1.4 Source/Drain 4.2 4.2 Gate 7.0 1.4
(75) As described herein in reference to
(76) For the purpose of description, Path 1 can represent a first power mode, and Path 2 can represent a second power mode. For example, Path 1 can represent a medium-power (e.g., PAs 38a and 38b in
(77) For the purpose of description,
(78) As shown in
(79)
(80)
(81) In
(82) In
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(84) In certain embodiments, the P-well bias voltage (V.sub.Pw) for the triple-well CMOS switch 122 can be controlled to have different values for the switch's ON and OFF states. Such different bias voltages can be selected to provide advantageous features such as manufacturability and robustness of the switch, and improved linearity of the amplification circuit 120 (e.g., during the high-power mode).
(85) For example, when the amplification circuit 120 is in the high-power mode (132 in
(86) To address such an effect, the P-well bias voltage (V.sub.Pw) for the OFF state of triple-well CMOS switch 122 can be selected to be relatively low or as low as possible to avoid forward bias of either or both of the P-well (53)/N-type diffusion region (57 and/or 60) junction (e.g., represented by the diode 72 and/or 73 in
(87) In certain embodiments, a lower limit of the P-well bias voltage (V.sub.Pw) for the OFF state of triple-well CMOS switch 122 can be selected so as to avoid a gate oxide (65 in
(88) When the amplification circuit 120 is in the low-power mode (130 in
(89)
(90) In certain embodiments, the example set of voltages described herein in reference to Table 1 can address some or all of the various operating features and functionalities described herein in reference to
(91) In certain embodiments, a process 150 shown in
(92) In certain embodiments, the first and second states referenced in the process 150 of
(93) In block 162, first values for V.sub.Pw, and V.sub.G can be provided to a given triple-well CMOS switch for operating the switch in an ON state. In block 164, a second value for V.sub.Pw, can be selected so as to be lower than its first value for operating the switch in an OFF state. In certain embodiments, a second value for V.sub.G can also be selected so as to be lower than its first value for the OFF state. In block 166, the respective selected values of V.sub.Pw, and V.sub.G can be applied to the switch based on the state of the switch.
(94) In certain embodiments, an amplification circuit such as the circuit 120 (
(95) In certain embodiments, the P-well bias voltage (V.sub.Pw), and in some situations the gate bias voltage (V.sub.G), for a triple-well CMOS switch can be controlled to provide one or more of the foregoing performance features.
(96)
(97)
(98) In certain embodiments, the gate bias voltage (V.sub.G) for the ON switch can be made to be above the P-well bias voltage (V.sub.Pw) by a selected amount. Such a gate bias voltage can then remain above V.sub.Pw substantially by the selected amount even if the supply voltage varies. In such embodiments, the gate bias voltage can also track the supply voltage by being offset by the selected amount from V.sub.Pw, (which can substantially track the supply voltage as shown in
(99) In certain embodiments, the selected amount of difference between V.sub.G and V.sub.Pw, can be designed to be NV.sub.ts, where N is a positive integer and V.sub.ts represents a threshold voltage value. Accordingly, by simply changing the multiplier N, a single threshold voltage value can provide a desired difference for between V.sub.G and V.sub.Pw, to provide a strong inversion of the NMOS RF switch channel.
(100)
(101) As shown in
(102) In certain embodiments, one or more features associated with
(103)
(104) In an example coupling circuit 180, the gate can be provided with V.sub.G, OFF and V.sub.G, ON voltages for OFF and ON states. In certain embodiments, such voltages can be selected as described in reference to
(105) In certain embodiments, the N-well can be provided with V.sub.Nw, OFF and V.sub.Nw, ON voltages for OFF and ON states. Although these voltages are substantially constant in the various examples disclosed herein, they may be selected to be different for the OFF and ON states.
(106) In certain embodiments, bias voltages provided to the source and drain terminals from respective supply sources I.sub.ref, HPM (via a transistor 184) and I.sub.ref, XPM (via a transistor 188) can be made to be at substantially the same voltage by use of a relatively large shunt resistor 190 across the source and drain.
(107) In
(108) In
(109) In another example coupling circuit 200 shown in
(110)
(111)
(112)
(113) As described herein, various voltages can be provided to different parts of a triple-well CMOS switch so as to yield one or more performance features. At least some of such voltages can include different values for ON and OFF states of the switch.
(114)
(115) In certain embodiments, the voltage distribution component 242 can be configured to receive one or more voltages from sources such as supply, charge pump, regulator, and/or other analog voltage sources; and also receive digital logic enable signals. In certain embodiments, input voltages can have relatively low current to facilitate enabling and disabling of one or more triple-well CMOS switches in manners that yield one or more performance features for amplification of RF signals as described herein.
(116) In certain embodiments, the voltage distribution component 242 can be configured such that various voltage distribution functionalities can be achieved via components such as level shifters, combinational logic circuits, transmission gates, and/or voltage buffers. In certain embodiments, design and operation of such components can be achieved by a number of known ways.
(117)
(118)
(119) Some of the embodiments described herein have provided examples in connection with wireless devices and/or mobile phones. However, one or more features described herein can be used for any other systems or apparatus that have needs for switching of RF signals, and more particularly, for switching of RF signals to provide different amplifications.
(120) Such one or more features can be implemented in various electronic devices. Examples of the electronic devices can include, but are not limited to, consumer electronic products, parts of the consumer electronic products, electronic test equipment, etc. Examples of the electronic devices can also include, but are not limited to, memory chips, memory modules, circuits of optical networks or other communication networks, and disk driver circuits. The consumer electronic products can include, but are not limited to, a mobile phone, a telephone, a television, a computer monitor, a computer, a hand-held computer, a personal digital assistant (PDA), a microwave, a refrigerator, an automobile, a stereo system, a cassette recorder or player, a DVD player, a CD player, a VCR, an M3 player, a radio, a camcorder, a camera, a digital camera, a portable memory chip, a washer, a dryer, a washer/dryer, a copier, a facsimile machine, a scanner, a multi functional peripheral device, a wrist watch, a clock, etc. Further, the electronic devices can include unfinished products.
(121) Unless the context clearly requires otherwise, throughout the description and the claims, the words comprise, comprising, and the like are to be construed in an inclusive sense, as opposed to an exclusive or exhaustive sense; that is to say, in the sense of including, but not limited to. The word coupled, as generally used herein, refers to two or more elements that may be either directly connected, or connected by way of one or more intermediate elements. Additionally, the words herein, above, below, and words of similar import, when used in this application, shall refer to this application as a whole and not to any particular portions of this application. Where the context permits, words in the above Detailed Description using the singular or plural number may also include the plural or singular number respectively. The word or in reference to a list of two or more items, that word covers all of the following interpretations of the word: any of the items in the list, all of the items in the list, and any combination of the items in the list.
(122) The above detailed description of embodiments of the invention is not intended to be exhaustive or to limit the invention to the precise form disclosed above. While specific embodiments of, and examples for, the invention are described above for illustrative purposes, various equivalent modifications are possible within the scope of the invention, as those skilled in the relevant art will recognize. For example, while processes or blocks are presented in a given order, alternative embodiments may perform routines having steps, or employ systems having blocks, in a different order, and some processes or blocks may be deleted, moved, added, subdivided, combined, and/or modified. Each of these processes or blocks may be implemented in a variety of different ways. Also, while processes or blocks are at times shown as being performed in series, these processes or blocks may instead be performed in parallel, or may be performed at different times.
(123) The teachings of the invention provided herein can be applied to other systems, not necessarily the system described above. The elements and acts of the various embodiments described above can be combined to provide further embodiments.
(124) While certain embodiments of the inventions have been described, these embodiments have been presented by way of example only, and are not intended to limit the scope of the disclosure. Indeed, the novel methods and systems described herein may be embodied in a variety of other forms; furthermore, various omissions, substitutions and changes in the form of the methods and systems described herein may be made without departing from the spirit of the disclosure. The accompanying claims and their equivalents are intended to cover such forms or modifications as would fall within the scope and spirit of the disclosure.