Additive for preparing suede on monocrystalline silicon chip and use method thereof

Abstract

The invention provides an additive for preparing suede on a monocrystalline silicon chip, which comprises: polyethylene glycol, sodium benzoate, citric acid, hydrolytic polymaleic anhydride, sodium acetate and water. The invention also provides a suede preparation liquid for preparing suede on a monocrystalline silicon chip, which contains the foregoing additive for preparing suede on a monocrystalline silicon chip and an aqueous alkali in a mass ratio of 0.2-5:100, wherein the aqueous alkali is the aqueous solution of an inorganic or organic alkali. The invention also provides a method for preparing suede on a monocrystalline silicon chip, by using which suede can be prepared on the surface of a monocrystalline silicon chip with the foregoing suede preparation liquid.

Claims

1. An additive comprising: polyethylene glycol, sodium benzoate, citric acid, hydrolytic polymaleic anhydride, sodium acetate and water; wherein the mass percent of each component of the additive is as follows: polyethylene glycol: 1-20%, sodium benzoate: 1.0-2.0%, citric acid: 1.0-5.0%, hydrolytic polymaleic anhydride: 1.0-5.0%, sodium acetate: 0.1-1.0%, and water: the remaining percentage.

2. The additive according to claim 1, wherein the water is deionized water.

3. A preparation liquid, comprising: the additive of claim 1 and an aqueous alkali in a mass ratio of 0.2-5:100, wherein the aqueous alkali is the aqueous solution of an inorganic or organic alkali.

4. The preparation liquid according to claim 3, wherein the aqueous alkali is 0.5-3 wt % of aqueous sodium hydroxide or potassium hydroxide solution.

5. The method for preparing a monocrystalline silicon chip comprising the following steps: 1) preparing a preparation additive: adding 1-20% by mass of polyethylene glycol, 0.1-2% by mass of sodium benzoate, 1.0-5.0% by mass of citric acid, 1.0-5.0% by mass of hydrolytic polymaleic anhydride and 0.1-1.0% by mass of sodium acetate into the rest percent by mass of water, mixing the components uniformly into the preparation additive; 2) preparing a preparation liquid: adding the suede preparation additive prepared in step 1) into an aqueous alkali, uniformly mixing the preparation additive mixture and the aqueous alkali into the preparation liquid, wherein the mass ratio of the preparation liquid to the aqueous alkali is 0.2-5:100, and the aqueous alkali is the aqueous solution of an inorganic or organic alkali; 3) immersing a monocrystalline silicon chip into the preparation liquid prepared in step 2) at a temperature of 75-90 degrees centigrade for a time of 500-1500 s.

6. A preparation liquid, comprising: the additive of claim 1 and an aqueous alkali in a mass ratio of 0.2-5:100, wherein the aqueous alkali is the aqueous solution of an inorganic or organic alkali.

7. A preparation liquid, comprising: the additive of claim 2 and an aqueous alkali in a mass ratio of 0.2-5:100, wherein the aqueous alkali is the aqueous solution of an inorganic or organic alkali.

8. A method for preparing a monocrystalline silicon chip with the preparation liquid of claim 4.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) FIG. 1 is a planer view illustrating the suede on the surface of a silicon chip obtained in embodiment 3 of the invention and observed under a scanning electron microscope.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

(2) The specific implementation mode of the invention is described below in detail with reference to accompanying drawings when read in conjunction with embodiments. The embodiments are merely illustrative of the technical solution of the invention more readily but are not to be construed as limiting the protection scope of the invention.

(3) The specific technical solution of the invention is as follows:

Embodiment 1

(4) A method for preparing suede on a monocrystalline silicon chip specifically includes the following steps:

(5) 1) preparing a suede preparation additive: adding 1 g polyethylene glycol-600, 0.1 g sodium benzoate, 1 g citric acid, 1 g hydrolytic polymaleic anhydride, 0.1 g sodium acetate into deionized water to obtain 100 g suede preparation additive solution;

(6) 2) preparing a suede preparation liquid: dissolving 250 g NaOH in deionized water to obtain 50 kg aqueous alkali, and dissolving the 100 g suede preparation additive prepared in step 1) in the aqueous alkali to obtain the suede preparation liquid;

(7) 3) preparing suede: immersing a monocrystalline silicon chip into the suede preparation liquid prepared in step 2) to prepare suede on the surface of the monocrystalline silicon chip at a suede preparation temperature of 75 degrees centigrade for a suede preparation time of 1500 s.

Embodiment 2

(8) A method for preparing suede on a monocrystalline silicon chip specifically includes the following steps:

(9) 1) preparing a suede preparation additive: adding 20 g polyethylene glycol-200, 2 g sodium benzoate, 5 g citric acid, 5 g hydrolytic polymaleic anhydride, 1 g sodium acetate into deionized water to obtain 100 g suede preparation additive solution;

(10) 2) preparing a suede preparation liquid: dissolving 60 g NaOH in deionized water to obtain 2 kg aqueous alkali, and dissolving the 100 g suede preparation additive prepared in step 1) into the aqueous alkali to obtain the suede preparation liquid;

(11) 3) preparing suede: immersing a monocrystalline silicon chip into the suede preparation liquid prepared in step 2) to prepare suede on the surface of the monocrystalline silicon chip at a suede preparation temperature of 90 degrees centigrade for a suede preparation time of 500 s.

Embodiment 3

(12) A method for preparing suede on a monocrystalline silicon chip specifically includes the following steps:

(13) 1) preparing a suede preparation additive: adding 15 g polyethylene glycol-400, 1 g sodium benzoate, 2.5 g citric acid, 3 g hydrolytic polymaleic anhydride, 0.5 g sodium acetate into deionized water to obtain 100 g suede preparation additive solution;

(14) 2) preparing a suede preparation liquid: dissolving 100 g KOH into deionized water to obtain 10 kg aqueous alkali, and dissolving the 100 g suede preparation additive prepared in step 1) into the aqueous alkali to obtain the suede preparation liquid;

(15) 3) preparing suede: immersing a monocrystalline silicon chip into the suede preparation liquid prepared in step 2) to prepare suede on the surface of the monocrystalline silicon chip at a suede preparation temperature of 80 degrees centigrade for a suede preparation time of 700 s.

(16) FIG. 1 shows a planer picture of the suede on the surface of a silicon chip obtained in embodiment 3 of the invention and observed under a scanning electron microscope, it can be seen from FIG. 1 that the surface of the silicon chip is uniformly covered by pyramids, wherein most of the surface of the silicon chip is covered by the pyramids having a small size of 1-4 um.

(17) The mentioned above is only preferred embodiments, it should be appreciated that various modification and variations can be devised by those skilled in the art without departing from the technical principle of the invention and such modification and variations should fall within the protection scope of the invention.