Method of manufacturing a waveguide comprising stacking dielectric layers having aligned metallized channels formed therein to form the waveguide
11482767 · 2022-10-25
Assignee
Inventors
Cpc classification
H01P3/16
ELECTRICITY
International classification
Abstract
Waveguides and methods for manufacturing a waveguide that include forming a first channel in a first layer of dielectric material, the first channel comprising one or more walls; forming a second channel in a second layer of dielectric material, the second channel comprising one or more walls; depositing electrically conductive material on the one or more walls of the first channel; depositing electrically conductive material on the one or more walls of the second channel; arranging the first layer adjacent to the second layer to form a stack with the first channel axially aligned with and facing the second channel; and heating the stack so that the conductive material on the one or more walls of the first channel and the conductive material on the one or more walls of the second channel connect to form the waveguide.
Claims
1. A method of manufacturing a waveguide, the method comprising: forming a first channel in a first layer of first dielectric material, the first channel comprising one or more first channel walls; forming a second channel in a second layer of second dielectric material, the second channel comprising one or more second channel walls; depositing electrically conductive material on the one or more first channel walls of the first channel; depositing electrically conductive material on the one or more second channel walls of the second channel; arranging the first layer adjacent to the second layer to form a stack with the first channel axially aligned with and facing the second channel; and heating the stack so that the conductive material on the one or more first channel walls of the first channel and the conductive material on the one or more second channel walls of the second channel connect to form the waveguide, wherein the first dielectric material and the second dielectric material comprise ceramic material.
2. The method of claim 1, wherein forming the first channel comprises— boring a hole extending from a top surface of the first layer to the first channel; and depositing electrically conductive material in the hole or on a surface of the hole so that the electrically conductive material in the hole forms a via during the heating of the stack.
3. The method of claim 2, further comprising connecting a circuit component on the top surface of the first layer to the via.
4. The method of claim 1, further comprising electrically connecting a first end of the waveguide to a circuit component on a top surface of the first layer.
5. The method of claim 4, further comprising electrically connecting a second end of the waveguide to an antenna.
6. The method of claim 5, wherein the antenna is positioned on the top surface of the first layer.
7. The method of claim 1, wherein forming the first channel comprises— metallizing a portion of a first sheet of the first dielectric material; laminating a second sheet of the first dielectric material on the first sheet of the first dielectric material so that the metallized portion of the first sheet is between the first sheet and the second sheet to form the first dielectric layer; and removing a portion of the second sheet along a first axis to expose the metallized portion of the first sheet and to form the first channel, wherein the one or more first channel walls of the first channel comprise one or more side walls extending from the metallized portion of the first sheet.
8. The method of claim 7, wherein forming the second channel comprises— metallizing a portion of a third sheet of the second dielectric material; laminating a fourth sheet of the second dielectric material on the third sheet of the second dielectric material so that the metallized portion of the third sheet is between the third sheet and the fourth sheet to form the second dielectric layer; and removing a portion of the fourth sheet along a second axis to expose the metallized portion of the third sheet and to form the second channel, wherein the one or more second channel walls of the second channel comprise one or more side walls extending from the metallized portion of the third sheet.
9. The method of claim 8, wherein removing the portion of the second sheet and removing the portion of the fourth sheet comprise machining the second sheet and the fourth sheet.
10. The method of claim 8, wherein depositing the electrically conductive material on the one or more first channel walls and depositing the electrically conductive material on the one or more second channel walls comprise depositing electrically conductive material only on the one or more side walls of the first channel and on the one or more side walls of the second channel.
11. The method of claim 1, further comprising— metallizing an end of the waveguide; and attaching a metal flange to the metallized end of the waveguide.
12. A method of manufacturing a buried waveguide, the method comprising: metallizing a portion of a first sheet of first dielectric material; laminating a second sheet of second dielectric material on the first sheet of first dielectric material so that the metallized portion of the first sheet is between the first sheet and the second sheet to form a first dielectric layer; removing a portion of the second sheet along a first axis to expose the metallized portion of the first sheet and to form a first channel comprising one or more side walls extending from the metallized portion of the first sheet; metallizing a portion of a third sheet of third dielectric material; laminating a fourth sheet of fourth dielectric material on the third sheet of third dielectric material so that the metallized portion of the third sheet is between the third sheet and the fourth sheet to form a second dielectric layer; removing a portion of the fourth sheet along a second axis to expose the metallized portion of the third sheet and to form a second channel comprising one or more side walls extending from the metallized portion of the third sheet; depositing electrically conductive material on the one or more side walls of the first channel; depositing electrically conductive material on the one or more side walls of the second channel; depositing a secondary material in the first channel and in the second channel; positioning the first dielectric layer adjacent to the second dielectric layer with the first channel facing the second channel so that the first axis is parallel to the second axis to form a stack; and heating the stack so that the electrically conductive material in the first channel and the electrically conductive material in the second channel form the waveguide.
13. The method of claim 12, further comprising— boring a hole extending from a top surface of the first sheet to the metallized portion; and depositing electrically conductive material in the hole.
14. The method of claim 12, wherein the secondary material comprises a fifth dielectric material.
Description
BRIEF DESCRIPTION OF THE DRAWING FIGURES
(1) Embodiments of the present invention are described in detail below with reference to the attached drawing figures, wherein:
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(20) The drawing figures do not limit the present invention to the specific embodiments disclosed and described herein. The drawings are not necessarily to scale, emphasis instead being placed upon clearly illustrating the principles of the invention.
DETAILED DESCRIPTION OF THE EMBODIMENTS
(21) The following detailed description of the invention references the accompanying drawings that illustrate specific embodiments in which the invention can be practiced. The embodiments are intended to describe aspects of the invention in sufficient detail to enable those skilled in the art to practice the invention. Other embodiments can be utilized and changes can be made without departing from the scope of the present invention. The following detailed description is, therefore, not to be taken in a limiting sense. The scope of the present invention is defined only by the appended claims, along with the full scope of equivalents to which such claims are entitled.
(22) In this description, references to “one embodiment”, “an embodiment”, or “embodiments” mean that the feature or features being referred to are included in at least one embodiment of the technology. Separate references to “one embodiment”, “an embodiment”, or “embodiments” in this description do not necessarily refer to the same embodiment and are also not mutually exclusive unless so stated and/or except as will be readily apparent to those skilled in the art from the description. For example, a feature, structure, act, etc. described in one embodiment may also be included in other embodiments, but is not necessarily included. Thus, the present technology can include a variety of combinations and/or integrations of the embodiments described herein.
(23) Turning to
(24) Turning to
(25) As shown in
(26) An embedded waveguide 10A constructed in accordance with another embodiment of the invention is shown in
(27) The waveguide 10A (implemented in circuit board 12A having a circuit component 14A connected to the waveguide 10A through via 60A) includes all the features of waveguide 10 except that instead of having an end wall 52 terminate one of the ends 54A (
(28) The flow chart of
(29) Referring to step 201, a portion of a first sheet 64 of dielectric material is metallized to form a metallized strip 66, as depicted in
(30) Referring to step 202, a second sheet 68 of dielectric material is laminated on the first sheet 64. The second sheet 68 may be laminated on the first sheet 64 so that the metal strip 66 is between the first sheet 64 and the second sheet 68 to form a first dielectric layer 70, as depicted in
(31) Referring to step 203, a portion of the second sheet 68 may be removed to expose at least a portion of the metallized strip 66. The portion of the second sheet 68 may be removed along a first axis to form a first channel 72, as depicted in
(32) Referring to step 204, the one or more walls 74, 76 of the first channel 72 (as depicted in
(33) Referring to step 205, a portion of a third sheet 82 of dielectric material is metallized to form a metallized strip 84, as depicted in
(34) Referring to step 206, a fourth sheet 86 of dielectric material is laminated on the third sheet 82. The fourth sheet 86 may be laminated on the third sheet 82 so that the metal strip 84 is between the third sheet 82 and the fourth sheet 86 to form a second dielectric layer 88, as depicted in
(35) Referring to step 207, a portion of the fourth sheet 86 may be removed to expose at least a portion of the metallized strip 84. The portion of the fourth sheet 86 may be removed along a second axis to form a second channel 90, as depicted in
(36) Referring to step 208, the one or more walls 92, 94 of the second channel 90 (as depicted in
(37) Referring to step 209, a secondary material 100 may be deposited in the first channel 72 and the second channel 90, as depicted in
(38) Referring to step 210, the first dielectric layer 70 as depicted in
(39) Referring to step 211, the stack 102 is heated, or sintered/cofired, so that the metallized strips 66, 84 and walls 78, 80, 96, 98 (as depicted in
(40) The method 200 may include additional, less, or alternate steps and/or device(s), including those discussed elsewhere herein. For example, the method 200 may include a step of adding end walls 50, 52 to the waveguide 10, as depicted in
(41) Although the invention has been described with reference to the embodiments illustrated in the attached drawing figures, it is noted that equivalents may be employed and substitutions made herein without departing from the scope of the invention as recited in the claims.
(42) Having thus described various embodiments of the invention, what is claimed as new and desired to be protected by Letters Patent includes the following: