Catheterized plasma X-ray source
09681846 ยท 2017-06-20
Assignee
Inventors
Cpc classification
H05G2/003
ELECTRICITY
A61B6/4057
HUMAN NECESSITIES
H05G2/006
ELECTRICITY
International classification
A61N5/10
HUMAN NECESSITIES
A61B6/00
HUMAN NECESSITIES
Abstract
A radiation generator useful for medical applications, among others, is provided. The radiation generator includes a catheter; a plasma discharge chamber situated within a terminal portion of the catheter, a cathode and an anode positioned within the plasma discharge chamber and separated by a gap, and a high-voltage transmission line extensive through the interior of the catheter and terminating on the cathode and anode so as to deliver, in operation, one or more voltage pulses across the gap.
Claims
1. An x-ray-generating apparatus, comprising: a catheter; a plasma discharge chamber situated within a terminal portion of the catheter; a cathode and an anode positioned within the plasma discharge chamber and separated by a gap; and a high-voltage transmission line extensive through the interior of the catheter and terminating on the cathode and anode so as to deliver, in operation, one or more voltage pulses across the gap; wherein the x-ray-generating apparatus comprises a nozzle situated within the plasma discharge chamber, and wherein the nozzle is conformed to inject a flow of plasma-forming fluid into the gap at a velocity in the range Mach 0.5 to Mach 10.
2. The apparatus of claim 1, further comprising a fill tube extensive through the interior of the catheter and terminating at the plasma discharge chamber so as to deliver, in operation, a flow of plasma-forming fluid to the plasma discharge chamber; and an exhaust tube extensive through the interior of the catheter and terminating at the plasma discharge chamber so as to permit the removal of gas from the plasma discharge chamber.
3. The apparatus of claim 1, further comprising an inlet tube and an outlet tube for circulating a coolant within the catheter.
4. The apparatus of claim 1, wherein the nozzle is coextensive with the cathode or the anode.
5. The apparatus of claim 1, further comprising a valve situated within the catheter, coupled to a fill tube so as to receive in-flowing plasma-forming fluid therefrom, and coupled to the nozzle so as to controllably discharge the in-flowing plasma-forming fluid thereinto.
6. The apparatus of claim 5, wherein the valve is a silicon microfabricated valve.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
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DETAILED DESCRIPTION
(8) As described, e.g., in the above-cited U.S. Pat. No. 8,530,854 and depicted in
(9) Source 100 further includes a micro-scale gas supply 110 adapted to inject a jet of gas, i.e. the gas puff, between the anode 104 and the cathode 106 within the chamber 108. In at least some implementations, the micro-scale gas supply 110 is further adapted to shape the gas puff to form a quasispherical density profile. For example, x-pinches are generally quasispherical in nature. The symmetry of typical z-pinches is generally more cylindrical than spherical in nature, but as z-pinch configurations are made shorter they may approach quasispherical behavior. Dense plasma focus configurations can dynamically approach quasispherical behavior.
(10) In some implementations, the micro-scale gas supply 110 may be embedded in the anode 104. In other implementations, the micro-scale gas supply 110 may be embedded in the cathode 106. In fact, one electrode may be made coextensive with the nozzle. The choice of which polarity (relative to the direction of the gas jet) to use may depend, at least in part, on what are expected to be the most damaging accelerated particles in a given application. That is, if a high, energetic flux of electrons is expected, it is advantageous to accelerate the electrons from the nozzle toward an opposing electrode having a perforation through which the electrons can proceed toward a stop plate. On the other hand, if a high, energetic flux of positive ions is expected, it is advantageous to use a similar configuration, but with the opposite polarity.
(11) It should be noted in this regard that although the micropuff is referred to throughout this discussion as constituted by a gas, the invention is by no means so limited. Instead, the substance that forms the micropuff should more generally be regarded as a fluid that may be either liquid or gas. In fact, it may even be the case that cooling due to adiabatic expansion of, e.g., a liquified gas as it emerges from the nozzle may solidify it, so that the micropuff is initially constituted by a suspension of solid particles.
(12) The micro-scale gas supply 110 includes a nozzle and a valve formed, e.g., by MEMS techniques. As depicted in
(13) A pulsed power source 114 is coupled to the anode and cathode to apply the voltage discharge that causes compression of the gas puff and thereby generate the plasma. One example of a pulsed power source useful in this regard is a Marx generator. Another example is a linear transformer driver (LTD).
(14) With reference to
(15) Micro-scale gas supplies and their components, as well as micro-scale plasma pinch devices, are known. For example, G. Papadopoulos et al., Air Entrainment Studies for a Supersonic Micro-Ejector System, Proc. FEDSM2008 ASME Fluids Eng. Conf. (Aug. 10-14, 2008), Jacksonville, Fla., FEDSM2008-55220, pp. 1-7 describes a supersonic nozzle made using silicon microfabrication techniques. F. Santoni et al., Micropropulsion Experiment on UNISAT-2, 2002 IEEE Aerospace Conference Proc. (2002), Vols. 1-7, pp. 1-479 to 1-486, describes a submillimeter microthruster nozzle manufactured on a silicon chip. M. Krishnan et al., A Fast Pulsed Neutron Source for Time-of-Flight Detection of Nuclear Materials and Explosives, Applications of Nuclear Techniques: Eleventh Int. Conf., M. E. Hamm and R. W. Hamm, eds., Vol. 1412 (2011), pp. 1-4, describes a dense plasma focus (DPF) device constructed on a spatial scale of tens of millimeters. L. Soto et al., Nanofocus: an ultra-miniature dense pinch plasma focus device with submillimetric anode operating at 0.1 J, Plasma Sources Sci. Technol. 18 (2009) 015007 (5 pp.), describes a pinch plasma focus device constructed on a millimeter spatial scale. M. S. Derzon et al., Analytical estimation of neutron yield in a micro gas-puff X pinch, J. Appl. Phys. 112, 114516 (2012) (14 pp.), provides a conceptual design of a micro-scale x-pinch device and includes a review of pertinent nozzle technology. P. Galambos et al., Passive MEMS Valves With Preset Operating Pressures for Microgas Analyzer, J. Microelectromechanical Syst. 18 (February 2009) 14-27, describes a valve made using silicon microfabrication techniques. P. Galambos et al., Active MEMS Valves for Flow Control in a High-Pressure Micro-Gas-Analyzer, J. Microelectromechanical Syst. 20 (October 2011) 1150-1162, also describes a valve made using silicon microfabrication techniques. All of the publications listed above are hereby incorporated herein by reference.
(16) Those skilled in the art will understand that design details of plenum 202, valve 204, nozzle 206, and chamber 108, as well as the input gas pressure and the control of individual gas loads and the timing of their injection, can be selected to control the shape of the gas puff and in particular to produce a quasispherical density profile if desired.
(17) Valve 204 can be implemented, e.g., as an electrostatically actuated MEMS valve. Such implementations can operate at repetition rates up to 1 kHz or more. Implementations of nozzle 206 as e.g. a Laval nozzle can be fabricated by MEMS techniques on a silicon-on-insulator (SOI) wafer. Nozzles having any of various Mach numbers ranging from the subsonic to the supersonic are intended to fall within the scope of the invention. As mentioned above, Laval nozzles, among others, can be designed for Mach numbers up to 8, and possibly even up to 10 or more.
(18) For x-ray generation, Mach numbers in the range of 0.5 to 10 are expected to be most preferable, with the higher Mach numbers in that range generally better than those at the low end of the range. The reason is that the higher Mach numbers will generally correspond to plasmas of lower density and lower stability, which conditions are expected to lead to more x-pinch-like behavior and a greater component of high-energy x-rays.
(19) It should be noted in this regard that although x-ray generation is the most likely use for a device as described here, it may also have applications in which it is used to generate neutrons from fusion plasmas. Accordingly, our device should be broadly regarded as a device for radiation generation, with more specialized implementations being used for x-ray generation.
(20) For x-ray generation, the injected gas is advantageously one or more of the noble gases, particularly xenon and krypton. For some applications, other gases, such as uranium hexafluoride, may also be useful. As those skilled in the art will understand, the energy of generated x-rays is readily tuned by selection of the gas to be injected.
(21) The response time of the gas supply can be minimized by incorporating the valve 204 in a nozzle chip. According to an example, the valve 204 can be actuated in less than 50 s with a 75 to 100 V actuation signal. Accordingly, in one scenario the valve 204 is opened and flow established prior to pulsed power source 114 firing an electrical pulse, exemplarily of 10-100 ns pulse width, to create the plasma pinch. Valve 204 is then closed, and a vacuum pump purges chamber 108.
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(23) A typical Mach number for the gas puff in this arrangement is 0.5. Gas injection at such a low Mach number can lead to formation of a puff that exhibits a quasispherical density profile.
(24) Spectral studies of the emission from compressed plasmas have provided evidence of a high-energy tail in which the spectral radiance is significantly greater than that predicted by the blackbody radiation curve. According to our current belief, this phenomenon is attributable to the acceleration of electrons in the plasma by a structure, driven by the Raleigh-Taylor instability, that consists of regions of relatively high electric field and low pressure, in alternation with regions of low field and high pressure.
(25) For at least some applications, the enhanced spectral radiance at high energy is desirable because, among other things, it makes parts of the x-ray spectrum accessible, for a given input voltage, that would not be accessible in a system characterized by equilibrium emission. Hence there may be applications for which it is advantageous to excite the plasma with disturbances that are designed to feed the Raleigh-Taylor instability.
(26) To provide one such disturbance, a pulsed electron beam is generated using a tungsten emitter tip or sharp edge microfabricated, e.g., as part of the cathode, and an accelerating screen placed between the cathode and the anode.
(27) Another type of disturbance that may be useful for feeding the Rayleigh-Taylor instability is resonant optical excitation provided by a laser such as a vertical cavity surface-emitting laser (VCSEL). For example, light at a resonant frequency of the plasma instability may be directed from a VCSEL external to the catheter to the reaction chamber by an optical fiber threaded through the catheter.
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(29) Although element 460 is described, above, as a vacuum seal, it should be understood that in some of the contemplated implementations, the reaction chamber may be filled to an overpressure with a plasma-forming gas. In such implementations, element 460 is a pressure seal. In other implementations, the reaction chamber may simply be filled at atmospheric pressure, in which cases the seal is merely an isolation seal.
(30) As mentioned above, the optical fiber is for the optional purpose of supplying light at a resonant wavelength for driving a Rayleigh-Taylor instability in the plasma. We believe that for applications in which only a limited number of pulses are required, the fill and exhaust tubes may also be optional. That is, we believe that a sealed reaction chamber may be satisfactory in a disposable unit intended for a single treatment requiring only a few pulses of x-radiation. Of course in a sealed implementation, the valve is not needed and the anode may wholly or partly occupy the space otherwise occupied by the nozzle.
(31) With further reference to
(32) An exemplary transmission line is designed to support a voltage pulse in the range 1-50 kV, or more particularly the range 5-10 kV, with a pulse width in the range 50-1000 ns, or more particularly about 100 ns, and a peak current in the range 1-50 amperes, or more particularly about 5 amperes. We believe that an appropriate cable containing such a transmission line can be made with an outer diameter of a few millimeters, which would be small enough to fit within a medical catheter. For some applications, it may be advantageous to combine the functions of transmission line and fill tube by introducing gas to the reaction chamber through a capillary bore that extends through the center of the central conductor of the transmission line. In such an arrangement, the central conductor would terminate concentrically on a valve-and-nozzle assembly.
(33) If separate capillary tubes are to be used for gas fill and exhaust, one suitable choice would be glass tubes having, e.g., a 100 m internal diameter. Both larger and smaller tubes are commercially available.
(34) Typical gas pressures will be in the range 1-10 atm, but in implementations may be as low as 0.01 atm or less, and in other implementations may be as high as 100 atm or even somewhat more.
(35) The nozzle and electrodes are advantageously made from silicon or related materials, such as silicon carbide, using known techniques of silicon microfabrication. Under high thermal loading conditions, however, it may for some applications be more desirable to make the nozzle and electrodes from tungsten or other refractory electrically conductive materials.
(36) A cable for transmitting the signal needed to operate the valve is not shown in the figure. Diagnostics devices and their cables may optionally also be included within the catheter, but for simplicity are omitted from the figure.
(37) Active cooling of the reaction chamber may be desirable in some cases, particularly for applications in which loss of x-ray generation efficiency due to heating would be unacceptable.
(38) It will be understood from the preceding discussion that in our exemplary implementations, the nozzle is either coextensive with an electrode, exemplarily the anode, or is concentric with the anode and either surrounded by it or offset from it in the axial direction. In particular, therefore, it will be understood that in such examples, the gas jet is principally directed in an axial direction toward the cathode. The, e.g., cathode is typically of an annular conformation having a central hole. A portion of the positive ions that are generated in the plasma discharge and accelerated toward the cathode will pass through the central hole and may be collected on a separate stop plate, or beam dump, which in at least some implementations may also be useful as a heat sink.
(39) For the dissipation of mechanical shock induced by the electric discharges, it will be useful to employ, within the catheter, a combination of ductile and brittle materials in at least partial alternation. Appropriate choices of material, both for the elements already mentioned and also as additional packing and structural materials, will be known to those skilled in the art.
(40) Those learned in the art of gaseous discharges will understand that plasmas are often characterized by their temperature and by a non-equilibrium temperature-correction factor represented by the Greek letter (kappa). This parameter is used to model the non-Maxwellian velocity distribution of high-energy electrons in the plasma. Our computational modeling studies have shown that the x-ray spectra of the plasma discharges produced by devices such as we describe here tend to become richer in high-energy x-rays as decreases. For example, when we modeled one representative fixed-energy plasma, we found, neglecting the x-ray line radiation, that the fraction of total x-radiation that exceeded 10 keV in energy was 6.8% at a value of 1.6, decreasing to only 0.0072% at a of 2, and decreasing still further to 0.00038% at a of 3.
(41) For the x-rays generated by our device to be effective, they must be sufficiently penetrating to escape from the plasma reaction chamber and the catheter. As a general rule, we therefore believe that the useful part of the x-ray spectrum will be approximately the portion above 10 keV in energy.
(42) Hence, it will be desirable according to our calculations to generate plasmas for which is approximately 1.6 or less. To generate such plasmas, the device parameters should, as a general rule, be set to provide a high-density plasma, and in particular a high-density plasma region slightly displaced from a region of high electromagnetic field. The injection of a dense fluid such as liquefied xenon may be useful in this regard, as may be the use of an annular nozzle, because the annular geometry tends to make the plasma more unstable. A relatively long pulse width may also be useful to afford more time for instability growth.
(43) The treatment of tumors is one exemplary application for our device. The total x-ray energy dose deposited in the target tissue per exposure may, for example, fall within an order of magnitude of 0.025 Joule. The total dose may be contained within a single pulse, or it may be cumulative over a sequence of pulses. For such a purpose, the transmission line might deliver, for example, 0.1 Joule of electrical energy in a pulse 100 ns long at 10 kV and 100 amperes. A train of ten such pulses would therefore deliver a total of 1 Joule to the reaction chamber.
(44) We have estimated that the efficiency of converting electrical energy to x-rays of energies exceeding 10 keV in the emission from a plasma of 1 keV temperature and of 1.6 is 0.35% to 1.4%. Hence to deliver a deposited dose of 0.025 Joule would call for a train of 18-90 pulses of the type described above.
(45) Radiological imaging is another exemplary application for our device. To form an x-ray image, the device would be placed within the subject's body, and an imaging detector or detector array would be placed externally or, under special circumstances, at an appropriate position within the subject's body. X-ray doses for imaging are typically three orders of magnitude smaller than those required for tumor treatment. Hence an exemplary imaging exposure might be generated by a single electrical pulse 100 ns long at 10 keV and 10 ampere.
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(48) A valve similar to that depicted in
(49) Another application for our device is for flash radiography in which, for example, the catheter is positioned near a moving mechanical object and a burst of x-rays is generated for collection by an imaging detector or imaging detector array after transmission through or scattering by the object. It is noteworthy in this regard that, according to our present belief, pulses ranging in length from several milliseconds down to a nanosecond or less will be achievable by the techniques described here.
(50) Yet another application is for phase-contrast imaging. In one possible approach to phase-contrast imaging, the device is pulsed multiple times while incrementally shifting in position along a scan pattern between pulses. Resulting differences in the radiation intercepted by the detector or detector array are processed and interpreted as image information.