MULTI-JUNCTION SOLAR CELL
20170170354 ยท 2017-06-15
Assignee
Inventors
Cpc classification
H10F10/161
ELECTRICITY
Y02P70/50
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
H10F10/163
ELECTRICITY
Y02E10/544
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
H10F77/80
ELECTRICITY
H10F77/1248
ELECTRICITY
International classification
Abstract
A stacked multi-junction solar cell having a first subcell and second subcell, the second subcell having a larger band gap than the first subcell. A third subcell has a larger band gap than the second subcell, and each of the subcells include an emitter and a base. The second subcell has a layer which includes a compound formed at least the elements GaInAsP, and a thickness of the layer is greater than 100 nm, and the layer is formed as part of the emitter and/or as part of the base and/or as part of the space-charge zone situated between the emitter and the base. The third subcell has a layer including a compound formed of at least the elements GaInP, and the thickness of the layer is greater than 100 nm.
Claims
1. A stacked multi-junction solar cell comprising: a first subcell including germanium; a second subcell having a larger band gap than the first subcell; a third subcell having a larger band gap than the second subcell, the first, second and third subcells having an emitter and a base; a metamorphic buffer formed between the first subcell and the second subcell, the metamorphic buffer having a sequence of at least three layers, and a lattice constant increasing from layer to layer in a sequence in a direction of the second subcell, wherein the second subcell comprises a layer formed of a compound that includes at least the elements GaInAsP, a thickness of the layer being greater than 100 nm, the layer being formed as part of the emitter and/or as part of the base and/or as part of a space-charge zone situated between the emitter and the base, and a lattice constant of the layer is less than 5.84 , wherein the third subcell includes a layer having a compound formed of at least the elements GaInP, a thickness of the layer being greater than 100 nm, the layer being formed as part of the emitter and/or as part of the base and/or as part of the space-charge zone situated between the emitter and the base, a lattice constant of the layer of the third subcell differing from the lattice constant of the layer of the second subcell by less than 0.2%, wherein no semiconductor bond is formed between two subcells, and wherein, in the second subcell, a phosphorus content of the layer is greater than 1% and less than 45%, and an indium content of the layer of the second subcell is less than 50%.
2. The multi-junction solar cell according to claim 1, wherein the multi-junction solar cell includes exactly three subcells, and/or wherein the layer of the second subcell have an energy gap in a range of 1.2 eV to 1.3 eV.
3. The multi-junction solar cell according to claim 1, wherein two directly consecutive subcells include different elements.
4. The multi-junction solar cell according to claim 1, wherein a fourth subcell is disposed between the second subcell and the third subcell, a layer of the fourth subcell has a compound which includes at least the elements AlGaInAs or GaInAsP, a thickness of the layer is greater than 100 nm, the layer is formed as part of the emitter and/or as part of the base and/or as part of the space-charge zone situated between the emitter and the base; or wherein the fourth subcell is disposed between the first subcell and the second subcell, and the layer of the fourth subcell if formed of a compound which includes at least the elements GaInAs or GaInNAs, and a thickness of the layer is greater than 100 nm, and is formed as part of the emitter and/or as part of the base and/or as part of the space-charge zone situated between the emitter and the base.
5. The multi-junction solar cell according to claim 1, wherein the layer of the third subcell is formed of a compound which includes at least the elements AlGaInP.
6. The multi-junction solar cell according to claim 1, wherein a semiconductor mirror is provided, and the semiconductor mirror is disposed between the first subcell and the second subcell or between the first subcell and the fourth subcell.
7. The multi-junction solar cell according to claim 1, wherein the layer of the second subcell or the layer of the fourth subcell is formed of a compound having at least the elements AlGaInAsP.
8. The multi-junction solar cell according to claim 1, wherein the multi-junction solar cell includes exactly four subcells, and/or the layer of the second subcell has an energy gap in the range of 1.43 eV to 1.6 eV.
9. The multi-junction solar cell according to claim 1, wherein a fifth subcell is disposed between the second subcell and the third subcell, and the fifth subcell comprises a layer including a compound of at least the elements AlGaInAs or AlGaInAsP or GaInP, and a thickness of the layer is greater than 100 nm, and the layer is formed as part of the emitter and/or as part of the base and/or as part of the space-charge zone situated between the emitter and the base, or wherein the fifth subcell is disposed between the second subcell and the fourth subcell, and the layer of the fifth subcell is formed of a compound which includes at least the elements GaInAs, and the thickness of the layer of the fifth subcell is greater than 100 nm and is formed as part of the emitter and/or as part of the base and/or as part of the space-charge zone situated between the emitter and the base.
10. The multi-junction solar cell according to claim 1, wherein the multi-junction solar cell includes exactly five subcells and/or the layer of the second subcell has an energy gap in the range of 1.3 eV to 1.4 eV or in the range of 1.43 eV to 1.7 eV.
11. The multi-junction solar cell according to claim 1, wherein, in the second subcell, a phosphorus content of the layer is less than 35%, and an indium content of the layer is less than 45%, and/or the lattice constant of the layer is less than 5.81 .
12. The multi-junction solar cell according to claim 1, wherein, in the second subcell, a phosphorus content of the layer is less than 25%, and an indium content of the layer is less than 45%, and/or the lattice constant of the layer is less than 5.78 .
13. The multi-junction solar cell according to claim 1, wherein, in the second subcell, the thickness of the layer is greater than 0.4 m or greater than 0.8 m.
14. The multi-junction solar cell according to claim 1, wherein the second subcell does not include a multi-junction quantum well structure.
15. The multi-junction solar cell according to claim 1, wherein the lattice constant of the layer of the fourth subcell differs from the lattice constant of the layer of the second subcell by less than 0.2%.
16. The multi-junction solar cell according to claim 1, wherein the lattice constant of the layer of the fifth subcell differs from the lattice constant of the layer of the second subcell by less than 0.2%.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0045] The present invention will become more fully understood from the detailed description given hereinbelow and the accompanying drawings which are given by way of illustration only, and thus, are not limitive of the present invention, and wherein:
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DETAILED DESCRIPTION
[0057] The illustration in
[0058] A metamorphic buffer MP1 and a semiconductor mirror HS1 are formed between first subcell SC1 and second subcell SC2. Buffer MP1 is formed of a large number of layers, which are not illustrated individually, the lattice constant within buffer MP1 generally increasing from layer to layer of buffer MP1 in the direction of second subcell SC2. An introduction of buffer MP1 is advantageous if the lattice constant of second subcell SC2 does not match the lattice constant of first subcell SC1.
[0059] The reflection profile of first semiconductor mirror HS1 is matched to the band gap of second subcell SC2. In other words, the wavelengths absorbable by second subcell SC2 are reflected back to the absorption area of second subcell SC2.
[0060] The thickness of the absorption area of second subcell SC2 may be significantly reduced and the radiation stability increased thereby.
[0061] It is understood that a tunnel diodenot illustratedis formed between individual subcells SC1, SC2 and SC3.
[0062] It is also understood that each of the three subcells SC1, SC2 and SC3 includes an emitter and a base, the thickness of second subcell SC2 being greater than 0.4 m.
[0063] In that the band gap of first subcell SC1 is smaller than the band gap of second subcell SC2, and the band gap of second subcell SC2 is smaller than the band gap of third subcell SC3, the sunlight shines through the surface of third subcell SC3.
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[0074] The invention being thus described, it will be obvious that the same may be varied in many ways. Such variations are not to be regarded as a departure from the spirit and scope of the invention, and all such modifications as would be obvious to one skilled in the art are to be included within the scope of the following claims.