Integrated Circuit Structure and Method for Reducing Polymer Layer Delamination

Abstract

An embodiment integrated circuit structure includes a substrate, a metal pad over the substrate, a post-passivation interconnect (PPI) structure over the substrate and electronically connected to the metal pad, a first polymer layer over the PPI structure, an under bump metallurgy (UBM) extending into an opening in the first polymer layer and electronically connected to the PPI structure, and a barrier layer on a top surface of the first polymer layer adjacent to the UBM.

Claims

1. A method for forming an integrated circuit structure comprising: forming a post-passivation interconnect (PPI) structure over a substrate, wherein the substrate comprises a metal pad and the PPI structure is electrically connected to the metal pad; forming a polymer layer over the PPI structure; forming an under bump metallurgy (UBM) extending into an opening in the polymer layer and electronically connected to the PPI structure; and performing a plasma treatment on the polymer layer.

2. The method of claim 1, wherein the plasma treatment comprises a hydrogen-containing plasma treatment.

3. The method of claim 1, wherein the performing the plasma treatment forms a barrier layer along a top surface of the polymer layer.

4. The method of claim 3, wherein the barrier layer has a thickness of about 1 nm to about 10 nm.

5. The method of claim 3, wherein the barrier layer is formed along the top surface of the polymer layer adjacent to the UBM.

6. The method of claim 1, further comprising forming a bump on the UBM.

7. The method of claim 1, further comprising forming another polymer layer between the PPI structure and the substrate.

8. The method of claim 1, wherein the polymer layer is selected from a group consisting of polyimide (PI), polybenzoxazole (PBO), benzocyclobuten (BCB), epoxy, silicone, acrylates, nano-filled pheno resin, siloxane, fluorinated polymer, polynorbornene, and combinations thereof.

9. A method for forming an integrated circuit structure comprising: forming a post-passivation interconnect structure in electrical contact with a metal pad; depositing a dielectric material over the post-passivation interconnect structure; removing a portion of the dielectric material to form a first opening and expose at least a portion of the post-passivation interconnect structure; forming an underbump metallization through the first opening, a portion of the underbump metallization extending over a surface of the dielectric material facing away from the post-passivation interconnect structure, while leaving a surface of the dielectric material exposed; and exposing the dielectric material to a plasma after the forming the underbump metallization, the exposing the dielectric material forming a barrier layer from the surface of the dielectric material.

10. The method of claim 9, wherein the plasma comprises hydrogen.

11. The method of claim 9, wherein the exposing the dielectric material is performed at least in part by exciting hydrogen gas using microwaves.

12. The method of claim 11, wherein the metal pad is located over a semiconductor substrate and wherein the exposing the dielectric material is performed at least in part by applying a voltage under the semiconductor substrate.

13. The method of claim 9, wherein the barrier layer has a thickness of between about 1 nm to about 10 nm.

14. The method of claim 9, further comprising forming an external connection on the underbump metallization after the exposing the dielectric material.

15. A method for forming an integrated circuit structure comprising: encapsulating a first semiconductor die and a second semiconductor die with an encapsulant; planarizing the encapsulant with the first semiconductor die and the second semiconductor die; forming a post-passivation interconnect in electrical contact with the first semiconductor die; depositing a passivation layer over the post-passivation interconnect; forming an underbump metallization through the passivation layer over the post-passivation interconnect; and exposing the passivation layer to a plasma while the underbump metallization protects a portion of the passivation layer, the exposing the passivation layer adding hydrogen to the passivation layer and forming a barrier layer from the passivation layer.

16. The method of claim 15, wherein the barrier layer extends over the encapsulant.

17. The method of claim 16, wherein the barrier layer also extends over a contact pad of the second semiconductor die.

18. The method of claim 15, wherein the encapsulant is planar with a first external connection of the first semiconductor die.

19. The method of claim 15, wherein the planarizing the encapsulant with the first semiconductor die and the second semiconductor die is performed at least in part with a chemical mechanical polishing process.

20. The method of claim 15, wherein the passivation layer is PBO.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0004] For a more complete understanding of the present embodiments, and the advantages thereof, reference is now made to the following descriptions taken in conjunction with the accompanying drawings, in which:

[0005] FIGS. 1-8 are cross-sectional views of intermediate stages of manufacture of an integrated circuit structure in accordance with various embodiments; and

[0006] FIGS. 9-11 are cross-sectional views of various stages of manufacture of an integrated circuit structure in accordance with alternate embodiments.

DETAILED DESCRIPTION OF ILLUSTRATIVE EMBODIMENTS

[0007] The making and using of the present embodiments are discussed in detail below. It should be appreciated, however, that the present disclosure provides many applicable inventive concepts that can be embodied in a wide variety of specific contexts. The specific embodiments discussed are merely illustrative of specific ways to make and use the disclosed subject matter, and do not limit the scope of the different embodiments.

[0008] Various embodiments will be described with respect to a specific context, namely a fan-out wafer level packaging (FO-WLP) technology. Other embodiments may also be applied, however, to other packaging technologies such as wafer level chip scale packaging (WLCSP) or interposers having redistribution layers (RDLs).

[0009] FIGS. 1-6 illustrate cross-sectional views of various stages of manufacturing an integrated circuit structure according to various embodiments. A post-passivation interconnect (PPI) structure is formed over a die or a wafer to redistribute or redirect I/O pads in the wafer to a larger or different area. A polymer layer is formed over the PPI structure, followed by the formation of under bump metallurgies (UBMs) electrically connected to the PPI structure. A barrier layer is then formed on the exposed polymer layer for blocking moisture and reducing delamination.

[0010] FIG. 1 illustrates a side view of a die 100, which includes a substrate 10. The substrate 10 may be a bulk silicon substrate although other semiconductor materials including group III, group IV, and group V elements may also be used. Active devices 12 such as transistors may be formed in and/or on the substrate 10. An inter-layer dielectric (ILD) 14 is formed over substrate 10, and various inter-metal dielectric layers (IMDs) 16 are formed over ILD 14. In some embodiments, the ILD 14 and/or IMDs 16 include at least one dielectric layer formed of low-k dielectric materials having k values, for example, lower than about 4.0. In some embodiments, the ILD 14 and/or the IMDs 16 may be made of, for example, silicon oxide, SiCOH, and the like.

[0011] Metal pads 18 are formed over the IMDs 16 and are electrically coupled to the active devices 12 through various metallic lines and vias (not shown) in the IMDs 16. The metal pads 18 may be made of aluminum, aluminum alloy, copper or copper alloy, although other metallic materials may be used. Passivation layer 20 is formed over the IMDs 16 and may be formed of non-organic materials such as silicon oxide, un-doped silicate glass, silicon oxynitride, and the like. Openings 21 are formed in portions of the passivation layer 20 to expose central portions of metal pads 18. Portions of passivation layer 20 may also cover edge portions of the metal pads 110. The formation details of the various features in FIG. 1 are well known in the art and not described herein.

[0012] FIG. 2 illustrates the formation of a first polymer layer 24 over the passivation layer 20. The first polymer layer 24 may be formed of a material such as polyimide (PI), polybenzoxazole (PBO), benzocyclobuten (BCB), epoxy, silicone, acrylates, nano-filled pheno resin, siloxane, fluorinated polymer, polynorbornene, and the like. The first polymer layer 24 is patterned to expose portions of the metal pads 18 using, for example, a combination of photolithographic techniques and etching. Post-passivation interconnect (PPI, so named because they are formed after the formation of passivation layer 20) pads 26 may be formed on and electrically connect to the metal pads 18 through the openings in passivation layer 20 and the first polymer layer 24. The PPI pads 26 may alternatively be referred to as redistribution layer (RDL) pads 26. The first polymer layer 24 may be formed using, for example, spin on coating techniques. The PPI pads 26, may be formed of copper or a copper alloy although other metals such as aluminum or gold may be used. The formation methods of PPI pads 26 may include plating, electroless plating, sputtering, chemical vapor deposition (CVD), and the like. Usually an opening is filled with the metal and surface of the substrate covered by the process. Excess metal is then removed. The surface may be planarized in a chemical mechanical polishing (CMP) process.

[0013] FIG. 3 shows the formation of a second polymer layer 28 over the first polymer layer 24. The second polymer layer 28 may be formed of the same material as the first polymer layer 24 using the same methods, or may be formed of a different material and/or using different methods. The second polymer layer 28 may be patterned to expose portions of the PPI pads 26 using the same methods as the methods used in patterning the first polymer layer 24.

[0014] FIG. 4 shows the formation of a PPI structure 30 along sidewalls and bottom of the opening 29 in the second polymer layer 28, electrically connected to the PPI pad 26. The PPI structure 30 may extend to the surface of the second polymer layer 28 adjacent to the opening 29. The PPI structure 30 may also be referred to as an RDL structure because it allows I/O pads on the die 100 to be redistributed to a greater area than the die 100. The PPI structure 30 may alternatively be used to route electrical connections to a different region of die 100. The PPI structure 30 may be formed of copper or a copper alloy although other metals such as aluminum or gold may be used. The formation methods of PPI structure 30 may include plating, electroless plating, sputtering, chemical vapor deposition (CVD), and the like. Usually an opening is filled with the metal and surface of the substrate covered by the process. Excess metal is then removed. The surface may be planarized in a chemical mechanical polishing (CMP) process. In some embodiments, the PPI structure 30 and PPI pad 26 may be formed in the same process step. While FIG. 4 shows PPI structure 30 having only one PPI line; however in alternative embodiments, the PPI structure 30 may include multiple PPI lines formed in multiple polymer layers.

[0015] FIG. 5 shows the formation of a third polymer layer 32 over the PPI structure 30 and the second polymer layer 32. The third polymer layer 32 may be formed of the same materials and using the same techniques as the polymer layers 24 and 28 (e.g., a PBO layer using spin-on coating techniques), or may be formed of a different material and/or using different methods. The third polymer layer 32 is patterned to form openings 33 exposing the PPI structure 30, typically using the same methods as the methods used in patterning the first polymer layer 24 and/or the second polymer layer 28.

[0016] FIG. 6 illustrates the formation of under bump metallurgies (UBMs) 126 to extend into the openings 33 in the third polymer layer 32 and contact the PPI structure 30. The UBMs 34 may be formed of conductive materials such as copper, copper alloys, titanium, titanium alloys, or the like. In an embodiment, the UBM 126 include a titanium layer and a copper layer.

[0017] FIG. 7 illustrates a plasma treatment 36 performed on the resulted structure. The exposed surface of the third polymer layer 32 is condensed, and therefore the top surface of the third polymer layer 32 adjacent to the UBMs 34 forms a barrier layer 38 which can block moisture. In an embodiment, the plasma treatment 36 utilizes hydrogen containing plasma. The top surface of the third polymer layer 32 may be exposed to a hydrogen containing plasma. This may be done by exciting hydrogen gas using, for example, microwaves to ionize hydrogen gas and form hydrogen radicals. Therefore, the creation of hydrogen plasma introduces hydrogen ions on the top surface of the third polymer layer 32. A voltage may be applied under the substrate attracting the hydrogen ions and causing the hydrogen ions to react with the polymer material in the third polymer layer 32. Thus, a condensation layer, referred to as a barrier layer herein, is formed. In an embodiment, the barrier layer 38 is a polymer layer including hydrogen. In some embodiments, the barrier layer 38 has a thickness in a range of about 1 nm to about 10 nm. For example, the barrier layer 38 is about 7 nm thick. By performing the plasma treatment 36 and forming the barrier layer 38 on the third polymer layer 32, moisture that would otherwise penetrate into the third polymer layer 32 is blocked by the barrier layer 38 and delamination of the third polymer layer 32 is reduced or eliminated. For example, after subjecting various integrated circuits to the same PCT-168 hour reliability test as previously described, substantially fewer delamination issues between third polymer layer 32 and the PPI structure 30 were observed in integrated circuits having a thin oxide film layer.

[0018] FIG. 8 illustrates the formation of bumps 40 formed on the UBMs 34. In some embodiments, the bumps 40 are solder balls, copper pillars, and the like. The bumps 40 are formed to electrically connect and bond to other package components such as a device die, an interposer, a printed circuit board (PCB), and the like.

[0019] FIGS. 9-11 show various stages of manufacturing an integrated circuit structure according to alternative embodiments.

[0020] FIG. 9 illustrate multiple dies 200 and 300 disposed over a carrier 400 via an adhesive layer 500. Each of the multiple dies 200 and 300 includes the substrate 10, active devices 12, ILD 14, IMDs 16, metal pads 18, passivation layer 20, first polymer layer 24 and PPI pads 26, which are substantially similar to the features in FIG. 1-2. A pick and place machine may be used to place the dies 200 and 300 in predetermined locations on the carrier 400, for example. In some embodiments, the dies 200 and 300 are mounted face-up on the carrier wafer 200. The adhesive layer 500 may be formed of a glue, and carrier 400 may be made of silicon or glass in a wafer form.

[0021] FIG. 10 illustrates the filling of molding compound 600 filling spaces 450 between dies 200 and 300. The molding compound 600 may be an organic material such as an epoxy, which may be filled between dies 200 and 300 in liquid form. Subsequently, a curing process may be performed to solidify molding compound 600. A planarization, such as a grinding may be performed on molding compound 600 so that its top surface may be substantially level with the dies 200 and 300.

[0022] FIG. 11 illustrates the formation of subsequent polymer layers 28 and 32, PPI structure 30, UBMs 34, barrier layer 38, and bumps 40. These features are substantially similar to those previously discussed in FIGS. 3-8. Carrier 400 and adhesive layer 500 may be removed in a subsequent process step. In this manner, multiple dies may be packaged together to form FO-WLP including a thin oxide film layer that advantageously improves adhesion between the RDLs and an overlaying polymer layer.

[0023] In accordance with an embodiment, an method for forming an integrated circuit structure includes forming a post-passivation interconnect (PPI) structure over a substrate, wherein the substrate includes a metal pad and the PPI structure is electrically connected to the metal pad; forming a polymer layer over the PPI structure; forming an under bump metallurgy (UBM) extending into an opening in the polymer layer and electronically connected to the PPI structure; and performing a plasma treatment on the polymer layer.

[0024] In accordance with another embodiment, an integrated circuit structure includes a substrate, a metal pad over the substrate, a post-passivation interconnect (PPI) structure over the substrate and electronically connected to the metal pad, a first polymer layer over the PPI structure, an under bump metallurgy (UBM) extending into an opening in the first polymer layer and electronically connected to the PPI structure, and a barrier layer on a top surface of the first polymer layer adjacent to the UBM.

[0025] In accordance with yet another embodiment, an integrated circuit structure includes a first die, a second die and a molding compound filling a space between the first die and the second die, in which the first die includes a metal pad. The integrated circuit structure includes a post-passivation interconnect (PPI) structure overlying the first die and electrically connected to the metal pad, a first polymer layer over the PPI structure, a under bump metallurgy (UBM) formed in an opening in the first polymer layer and electrically connected the PPI structure, and a barrier layer on the top surface of the first polymer layer adjacent to the UBM.

[0026] Although the present embodiments and their advantages have been described in detail, it should be understood that various changes, substitutions and alterations can be made herein without departing from the spirit and scope of the disclosure as defined by the appended claims.

[0027] Moreover, the scope of the present application is not intended to be limited to the particular embodiments of the process, machine, manufacture, composition of matter, means, methods and steps described in the specification. As one of ordinary skill in the art will readily appreciate from the disclosure, processes, machines, manufacture, compositions of matter, means, methods, or steps, presently existing or later to be developed, that perform substantially the same function or achieve substantially the same result as the corresponding embodiments described herein may be utilized according to the present disclosure. Accordingly, the appended claims are intended to include within their scope such processes, machines, manufacture, compositions of matter, means, methods, or steps.