AUTOMATIC LOCALIZED SUBSTRATE ANALYSIS DEVICE AND ANALYSIS METHOD

Abstract

An object of the present invention is to provide an analysis apparatus in which local analysis of a substrate with ICP-MS is automated. The present invention relates to an automatic analysis apparatus for a local region of a substrate, including: a nozzle for local analysis having: analysis-liquid supply means that ejects analysis liquid onto a substrate; analysis-liquid discharge means that takes the analysis liquid including an object to be analyzed from the substrate into the nozzle to feed the analysis liquid to a nebulizer; and exhaust means including an exhaust channel in the nozzle; automatic liquid-feed means that automatically feeds the collected analysis liquid to ICP-MS; flow adjustment means that adjusts the flow of the analysis liquid; and automatic control means that simultaneously performs local analysis and analysis of the object to be analyzed with the ICP-MS to perform automatic analysis to a plurality of adjacent predetermined regions, successively.

Claims

1. An automatic analysis apparatus for a local region of a substrate, comprising: a pump that supplies analysis liquid; a nozzle for local analysis that ejects the analysis liquid supplied from the pump onto a predetermined region of a substrate surface to transfer an object to be analyzed in the predetermined region to the analysis liquid, and takes in the analysis liquid to collect the object to be analyzed; a nebulizer that sucks the analysis liquid including the object to be analyzed, in the nozzle for local analysis by negative pressure; an inductively coupled plasma mass spectrometry apparatus that analyzes the object to be analyzed included in the analysis liquid fed from the nebulizer; the nozzle for local analysis having: an analysis-liquid supply that ejects the analysis liquid onto the substrate; an analysis-liquid discharge that takes the analysis liquid including the object to be analyzed from the substrate into the nozzle for local analysis to feed the analysis liquid to the nebulizer; and an exhaust including an exhaust channel in the nozzle for local analysis, an automatic liquid-feed that automatically feeds the analysis liquid including the object to be analyzed, taken into the nozzle for local analysis, to the inductively coupled plasma mass spectrometry apparatus; a flow adjustment that adjusts a flow of the analysis liquid to be supplied from the pump to the nozzle for local analysis and a flow of the analysis liquid to be fed from the nozzle for local analysis to the nebulizer; and automatic control that simultaneously perform the taking-in of the analysis liquid with the nozzle for local analysis and analysis of the object to be analyzed with the inductively coupled plasma mass spectrometry apparatus to perform automatic analysis to a plurality of the adjacent predetermined regions of the substrate, successively.

2. The automatic analysis apparatus according to claim 1, wherein the nozzle for local analysis includes an end portion that supplies the analysis liquid to the substrate, cylindrical in nozzle shape, and includes an internal space capable of retaining the analysis liquid along an internal wall of a cylindrical portion at the cylindrical end portion.

3. An automatic analysis method for a local region of a substrate surface by use of the apparatus defined in claim 1, comprising the steps of: performing local analysis by allowing the analysis-liquid supply of the nozzle for local analysis to eject the analysis liquid supplied from the pump into the nozzle for local analysis, onto the predetermined region of a substrate surface, then taking analysis liquid including the object to be analyzed from the substrate into the nozzle for local analysis by the analysis-liquid discharge, and collecting an object to be analyzed included in a predetermined region on a substrate into the nozzle for local analysis; and performing analysis of the object to be analyzed by sucking the analysis liquid including the object to be analyzed from an inside of the nozzle for local analysis to the nebulizer by the negative pressure, then feeding the analysis liquid to the inductively coupled plasma mass spectrometry apparatus, and subjecting the object to be analyzed included in the analysis liquid to the automatic analysis, wherein the step of performing the local analysis is performed with the exhaust exhausting the inside of the nozzle for local analysis, and the flow adjustment makes a flow of the analysis liquid to be supplied from the pump to the nozzle for local analysis equivalent to or more than a flow of the analysis liquid to be fed from the nozzle for local analysis to the nebulizer.

4. An automatic analysis method for a local region of a substrate surface by use of the apparatus defined in claim 2, comprising the steps of: performing local analysis by allowing the analysis-liquid supply of the nozzle for local analysis to eject the analysis liquid supplied from the pump into the nozzle for local analysis, onto the predetermined region of a substrate surface, then taking analysis liquid including the object to be analyzed from the substrate into the nozzle for local analysis by the analysis-liquid discharge, and collecting an object to be analyzed included in a predetermined region on a substrate into the nozzle for local analysis; and performing analysis of the object to be analyzed by sucking the analysis liquid including the object to be analyzed from an inside of the nozzle for local analysis to the nebulizer by the negative pressure, then feeding the analysis liquid to the inductively coupled plasma mass spectrometry apparatus, and subjecting the object to be analyzed included in the analysis liquid to the automatic analysis, wherein the step of performing the local analysis is performed with the exhaust exhausting the inside of the nozzle for local analysis, and the flow adjustment makes a flow of the analysis liquid to be supplied from the pump to the nozzle for local analysis equivalent to or more than a flow of the analysis liquid to be fed from the nozzle for local analysis to the nebulizer.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0033] FIG. 1 is a schematic sectional view of an automatic analysis apparatus in an embodiment.

[0034] FIG. 2 is a sectional view of a nozzle for local analysis in the embodiment.

[0035] FIG. 3 is a view illustrating a local contamination condition and nozzle operation during analysis in the embodiment.

[0036] FIG. 4 is a graphical representation of an ICP-MS analysis result in the embodiment.

[0037] FIG. 5 is a schematic view of a conventional nozzle for substrate analysis.

DESCRIPTION OF EMBODIMENTS

[0038] An embodiment of the present invention will be described below.

[0039] In the present embodiment, local analysis of a substrate was performed by use of an automatic analysis apparatus illustrated in FIG. 1. A nozzle for local analysis 100 is coupled to a syringe pump 200, and analysis liquid can be fed into the nozzle 100 by the syringe pump 200. The analysis liquid in the nozzle 100 is fed to a nebulizer 300 to be automatically feedable to ICP-MS. Note that, an inert gas supply channel capable of supplying Ar gas is coupled to the nebulizer 300, separately from a discharge tube (not illustrated).

[0040] FIG. 2 is a sectional view of the nozzle for local analysis 100. As illustrated in FIG. 2, the nozzle for local analysis 100 includes a substantially cylindrical nozzle body, a supply tube 120 coupled to the syringe pump 200, and the discharge tube 130 coupled to the nebulizer 300. The supply tube 120 supplies the analysis liquid from the syringe pump 200 into the nozzle 100 so that the analysis liquid can be ejected onto a substrate W. The discharge tube 130 collects analysis liquid D from the substrate W so that the analysis liquid D can be fed to the nebulizer 300. Exhaust means 160 capable of exhausting in a direction of an arrow is provided inside the nozzle for local analysis 100, and is coupled to an exhaust pump (not illustrated).

[0041] A specific analysis method by the use of the analysis apparatus will be described. A wafer substrate including a 12-inch silicon was used as a substrate to be analyzed. Contamination solution including Sr, Ba, Cd, Li, Mo, and Pb, each element having a quantity of 10 ppb(ng/mL) mixed, was locally dropped every 5 L onto the wafer substrate as illustrated in FIG. 3 so that a locally contaminated substrate was prepared.

[0042] The local analysis was performed to the contaminated substrate by the use of the analysis apparatus illustrated in FIG. 1. First, the analysis liquid including 3% HF and 4% H.sub.2O.sub.2, in a quantity of 1500 L was filled in a PFA tube coupled between the syringe pump and the nozzle. Then, the analysis liquid was supplied to the nozzle by the syringe pump, and the analysis liquid in a quantity of 100 L was ejected on the substrate through the supply tube. In this case, the exhaust pump exhausted at an exhaust speed from 0.3 to 1.0 L/min in the direction of the arrow in FIG. 2. Accordingly, after the objects to be analyzed present on a substrate surface were transferred into the analysis liquid, the analysis liquid D was sucked and taken into the nozzle through the discharge tube. Then, the Ar gas in a quantity of 1.0 L per minute was supplied to the nebulizer through the inert gas supply channel so that negative pressure occurred. The analysis liquid including the objects to be analyzed in the nozzle, was fed to the nebulizer at a flow of approximately 100 L/min. Next, analysis was performed by the ICP-MS. In the analysis, while the nozzle is moved at 10 mm/sec on the substrate to draw a line illustrated by the arrow in FIG. 3, the analysis liquid is ejected and sucked so that the local analysis was successively performed. The element analysis by the ICP-MS was performed to the analysis liquid fed from the inside of the nozzle to the nebulizer, simultaneously with taking of the analysis liquid into the nozzle. The analysis liquid equivalent to or more than the feeding to the nebulizer was supplied to the nozzle by the syringe pump, and was ejected onto the substrate so that the quantity of the analysis liquid on the substrate remained in a quantity of approximately 100 L. FIG. 4 illustrates an analysis result of the ICP-MS.

[0043] As illustrated in FIG. 4, strong intensity peaks of the respective analysis elements were detected at analysis times of approximately 190, 290, 360, and 420 seconds. Checking the moving speed and moving position of the nozzle with detecting times of the element peaks, revealed that the element peaks were detected at analysis times corresponding to the positions at which the contamination solution dropped. Accordingly, the analysis apparatus could ascertain that the contamination positions of the respective analysis elements could be specified.

[0044] An analyzing limit with respect to the respective elements based on the analysis result in the present embodiment above, was compared to an analysis limit analyzed by a conventional nondestructive analysis apparatus. In the present embodiment, the substrate enforcedly contaminated by dropping 5 L including the respective metal elements each in a quantity of 10 ppb(ng/mL), was analyzed. The number of metal atoms of, for example, Fe included in the solution is approximately 5E+11 atoms. Here, the detecting limit of a total reflection X-ray fluorescence apparatus is approximately 1E+11 atoms/cm.sup.2 and the area of a measuring portion is 1 cm.sup.2, resulting in being substantially the same as the enforcedly contaminated contamination liquid in a quantity of 5 L (one spot). Thus, the Fe atoms are difficult to be detected from the analysis substrate in the present embodiment. In contrast, in the present embodiment, as illustrated in the result of the ICP-MS in FIG. 4, the Fe atoms can be detected and the detecting limit calculated based on pulse intensity measured by the ICP-MS, is approximately 5E+6 atoms in a spot of 5 L. The diameter of the nozzle is reduced and a contact area with the wafer is further reduced in size so that an element further minute in quantity can be detected. In this manner, the result in the present embodiment showed that detection sensitivity was higher than the case where the total reflection X-ray fluorescence apparatus was used, and the detection sensitivity for, for example, Fe was higher by approximately 4 digits.

INDUSTRIAL APPLICABILITY

[0045] In the present invention, local analysis with ICP-MS can be automated and additionally the automatic analysis can be successively performed to a plurality of adjacent predetermined regions. Accordingly, even for an impurity element minute in contamination quantity on a substrate surface, a present position and the type of the element can be specified. Specifically, in the present invention, an element in a quantity from 10.sup.5 to 10.sup.7 atoms/cm.sup.2 can be analyzed. Additionally, the quantity of analysis liquid is reduced less than a conventional case, and element analysis with high precision can be achieved.

REFERENCE SINGS LIST

[0046] 100 nozzle for local analysis [0047] 120 analysis-liquid supply means [0048] 130 analysis-liquid discharge means [0049] 150 nozzle leading end [0050] 160 exhaust means [0051] 200 pump [0052] 300 nebulizer [0053] D analysis liquid [0054] W substrate