Handle substrates of composite substrates for semiconductors, and composite substrates for semiconductors

Abstract

A handle substrate of a composite substrate for a semiconductor is provided. The handle substrate is composed of polycrystalline alumina. The handle substrate includes an outer peripheral edge part with an average grain size of 20 to 55 m and a central part with an average grain size of 10 to 50 m. The average grain size of the outer peripheral edge part is 1.1 times or more and 3.0 times or less of that of the central part of the handle substrate.

Claims

1. A composite substrate for a semiconductor: said composite substrate comprising a handle substrate and a donor substrate, said handle substrate comprising polycrystalline alumina; wherein said handle substrate comprises an outer peripheral edge part and a central part, wherein said outer peripheral edge part has an average grain size of 20 to 55 m; and wherein said central part has an average grain size of 10 to 50 m; wherein said average grain size of said outer peripheral edge part of said handle substrate is 1.1 times or more and 3.0 times or less of said average grain size of said central part of said handle substrate, and wherein said handle substrate further comprises a single bonding face comprising a central face part on said central part and an outer peripheral edge face part on said outer peripheral edge part, and wherein said central face part and said outer peripheral edge face part of said bonding face of said handle substrate are bonded to said donor substrate.

2. The composite substrate of claim 1, wherein said donor substrate comprises single crystalline silicon.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) FIG. 1(a) is a front view of a handle substrate 1, FIG. 1(b) is a front view showing a composite substrate 6 for a semiconductor that includes the handle substrate 1 and a donor substrate 5 which are bonded together via a bonding layer 4, and FIG. 1(c) is a front view showing a composite substrate 6A for a semiconductor that includes the handle substrate 1 and the donor substrate 5 which are directly bonded together.

(2) FIG. 2 is a schematic diagram showing an example of a calculation method for an average grain size.

(3) FIG. 3(a) is a plan view showing a wafer-like substrate 1, and FIG. 3(b) is a diagram showing an outer peripheral edge part of the substrate 1.

(4) FIG. 4 is a schematic diagram showing a setter for sintering a molded body 11.

(5) FIG. 5 is a schematic diagram showing a state of a sintered body subjected to an annealing treatment.

DESCRIPTION OF EMBODIMENTS

(6) The present invention will be described in more detail below with reference to the accompanying drawings as appropriate.

(7) (Applications)

(8) A composite substrate of the invention can be used for light emitting elements for projectors, high-frequency devices, high-performance lasers, power devices, logic ICs, etc.

(9) (Donor Substrate)

(10) The composite substrate includes a handle substrate according to the invention and a donor substrate. Examples of materials for the donor substrate include, but not limited thereto, preferably, one selected from the group consisting of silicon, aluminum nitride, gallium nitride, zinc oxide, and diamond.

(11) The donor substrate contains the above-mentioned material, and may have an oxide film on its surface. This is because ion implantation through the oxide film can exhibit the effect of suppressing channeling of the implanted ions. The oxide film preferably has a thickness of 50 to 500 nm. The donor substrate with the oxide film is implied in the term donor substrate as used herein and will be referred to as the donor substrate unless otherwise specified.

(12) (Handle Substrate)

(13) As shown in FIGS. 1 and 3, a handle substrate 1 has, for example, a circular shape and is provided with a notch 7 in one position. The notch 7 shown in FIG. 3(a) has a U-character shape, but may have a V-character shape. Such a notch is used to detect the position or direction of wafer when performing various operations in manufacturing procedures of semiconductor devices. In particular, in a wafer having a size of 8 inches or more, the notch is introduced as a general detection means, in place of an orientation flat. It is obvious that an orientation flat may be provided instead of the notch.

(14) The so-called bevels 9 are provided at the edge of the outer peripheral edge part 8 of the wafer-like substrate 1 (see FIG. 3(b)). The bevels are formed on both sides of a bonding face 1a and a backside 1b. The term bevel as used herein means an inclined part at an end surface and a peripheral edge of the wafer.

(15) In the invention, the handle substrate is formed of polycrystalline alumina. The outer peripheral edge part 8 of the handle substrate has an average grain size of 20 to 55 m. A central part 20 of the handle substrate has an average grain size of 10 to 50 m. The average grain size of the outer peripheral edge part 8 of the handle substrate is 1.1 times or more and 3.0 times or less as large as that of the central part 20.

(16) The average grain size of the outer peripheral edge part of the handle substrate is set to 20 m or more, thereby improving the adhesion to the donor substrate. From this viewpoint, the average grain size of the outer peripheral edge part of the handle substrate is preferably 25 m or more, and more preferably, 30 m or more.

(17) The average grain size of the outer peripheral edge part of the handle substrate is set to 55 m or less, thereby enabling prevention of the occurrence of cracks. From this viewpoint, the average grain size of the outer peripheral edge part of the handle substrate is more preferably 50 m or less.

(18) The average grain size of the central part 20 of the handle substrate is set to 10 m or more, thereby improving the adhesion to the donor substrate. From this viewpoint, the average grain size of the central part of the handle substrate is preferably 15 m or more, and more preferably, 20 m or more. On the other hand, the average grain size of the central part 20 of the handle substrate is set to 50 m or less, thereby enabling prevention of the occurrence of cracks. From this viewpoint, the average grain size of the central part of the handle substrate is preferably 45 m or less, and more preferably, 35 m or less.

(19) The average grain size of the outer peripheral edge part 8 of the handle substrate is set 1.1 times or more of that of the central part 20, thereby enabling suppression of peeling-off of the handle substrate. From this viewpoint, the average grain size of the outer peripheral edge part 8 of the handle substrate is more preferably set 1.3 times or more of that of the central part 20. If the average grain size of the outer peripheral edge part 8 of the handle substrate is set excessively larger than that of the central part 20, micro cracks tend to occur in an intermediate part 21. Thus, the average grain size of the outer peripheral edge part 8 of the handle substrate is set 3.0 times or less of that of the central part 20. From this viewpoint, the average grain size of the outer peripheral edge part 8 of the handle substrate is more preferably set 2.8 times or less of that of the central part 20.

(20) Here, the average grain size of the crystal grain is measured as follows.

(21) (1) The section of the handle substrate is subjected to mirror face polishing and then thermal etching, emphasizing grain boundaries. Then, a microscopic photograph of the section (at 100 to 200-fold magnification) is taken, and the number of grains passing through a straight line with a unit length is counted. The microscopic photograph is taken within a range of 100 m from the bonding face. This measurement is performed at three different positions. Note that the unit length is set to a range of 500 m to 1000 m.

(22) (2) The numbers of grains performed at the three positions are averaged.

(23) (3) The average grain size is calculated by the following formula.
D=(4/)(L/n)[Calculation Formula]

(24) [D: Average grain size, L: Unit length of straight line, n: Average of the numbers of grains at three positions]

(25) An example of calculation of the average grain size is shown in FIG. 2.

(26) When the numbers of grains passing through the straight line with the unit length (e.g., 500 m) at the respective three different positions are 22, 23, and 19, the average grain size D is determined based on the above-mentioned calculation formula as follows.
D=(4/)[500/{(22+23+19)/3}]=29.9 m.

(27) The outer peripheral edge part 8 of the handle substrate indicates a ring-shaped part with a width of 5 mm extending from the edge of the handle substrate 1 to the center O thereof. The central part 20 of the handle substrate indicates a circular part having a radius of 5 mm from the center O. The intermediate part 21 is a ring-shaped intermediate part located between the central part 20 and the outer peripheral edge part 8.

(28) The average grain size of the intermediate part 21 is preferably in a range of 10 to 50 m. Further, the average grain size of the intermediate part 21 is more preferably 15 m or more, and much more preferably 20 m or more. On the other hand, the average grain size of the intermediate part 21 is preferably 45 m or less, and more preferably 35 m or less.

(29) The average grain size of the outer peripheral edge part 8 of the handle substrate is preferably set 1.1 times or more and 3.0 times or less of the intermediate part 21. The average grain size of the outer peripheral edge part 8 of the handle substrate is more preferably set 1.3 times or more of that of the intermediate part 21, and 2.8 times or less of that of the intermediate part 21. Further, the average grain size of the intermediate part 21 is preferably substantially same as that of the central part 20.

(30) In a preferred embodiment, the bonding face of the handle substrate has a surface roughness Ra of 2 nm or less. If the surface roughness is large, the bonding strength of the donor substrate is decreased due to an intermolecular force. Accordingly, most preferably, the surface roughness is 1 nm or less. Note that the surface roughness Ra of the bonding face is a numerical value obtained by taking an image of 70 m70 m as the vision range with AFM (Atomic Force Microscope) and by calculating based on JIS B0601.

(31) A relative density of alumina ceramics is preferably set to 98% or more, and more preferably to 99% or more in terms of durability and contamination prevention during the post-processing of the semiconductor.

(32) In the preferred embodiment, a polycrystalline ceramics sintered body forming the handle substrate is produced by sintering ceramic powder with a purity of 99.9% or higher as a raw material.

(33) In the case of producing transparent alumina, 100 ppm or more and 300 ppm or less of magnesium oxide powder is added to high-purity alumina powder that preferably has a purity of 99.9% or higher (more preferably 99.95% or higher). Such high-purity alumina powder can include high-purity alumina powder produced by Taimei Chemical Industries Corporation by way of example. Further, the magnesium oxide powder may preferably has a purity of 99.9% or higher and an average grain size of 0.3 m or smaller, respectively.

(34) In a preferred embodiment, 200 to 800 ppm of zirconia (ZrO.sub.2) and 10 to 30 ppm of yttria (Y.sub.2O.sub.3) as sintering aids are preferably added to the alumina powder.

(35) A method for forming a polycrystalline ceramic sintered body is not specifically limited, and may be any method including a doctor blade method, an extrusion process, a gel cast molding, and the like. In particular, preferably, a blank substrate is manufactured by the gel cast molding method.

(36) In the preferred embodiment, a slurry containing the ceramic powder, a dispersing agent and a gelling agent is produced and charged into a die to be gelatinized, thereby producing a molded body. Here, in the gel cast molding stage, a mold release agent is applied to die parts, the die parts are assembled, and then the slurry is charged into the die. Then, the gel is hardened in the die, thereby producing the molded body, which is removed from the die. Thereafter, the die is cleaned.

(37) Next, the gel molded body is dried, and preferably, calcined in air and then completely sintered in hydrogen. The sintering temperature in this sintering process is preferably in a range of 1700 to 1900 C., and more preferably in a range of 1750 to 1850 C. in terms of densification of the sintered body.

(38) In a preferred embodiment, as shown in FIG. 4, the molded body (or calcined body) 11 is mounted on a setter 12, and a lid 14 made of corrosion resistant material is placed to cover the molded body. A spacer 13 is disposed between the lid 14 and the setter 12, creating a gap 22 over the molded body 11, from which the discharge of the sintering aid (particularly, magnesium) is promoted. This suppresses grain coarsening.

(39) After generating the fully-dense sintered body in the sintering process, further an annealing treatment may be additionally performed, which can control or correct the warpage of the substrate. From the viewpoint of promoting the discharge of the sintering aids while preventing deformation and occurrence of abnormal grain growth, the annealing temperature is preferably within a range of the maximum temperature in the sintering 100 C., in which the maximum temperature is more preferably 1900 C. or lower. The annealing time period is preferably in a range of 1 to 6 hours.

(40) Here, in a preferred embodiment, the annealing treatment is performed with the outer peripheral edge part of the sintered body exposed to the atmosphere while the central part and the intermediate part of the sintered body are not exposed to the atmosphere. For example, as shown in FIG. 5, the sintered body 16 is mounted on a setter 15, and a cover 17 is mounted on the sintered body 16 to cover the central part and intermediate part of the sintered body. A weight 18 is mounted on the cover 17, thereby preventing the formation of a gap between the cover 17 and the sintered body 16. In this state, the sintered body is subjected to the annealing treatment, which promotes the discharge of the sintering aids (especially, magnesium) from an exposed part 19 of the outer peripheral edge part into the atmosphere, promoting the grain growth at the outer peripheral edge part, resulting in relative increase in grain size. Since the central part and the intermediate part of the sintered body are not exposed to the atmosphere, the grain growth at the central and intermediate parts is suppressed without discharging the sintering aids.

(41) Materials for the setter, cover, and weight are any material having durability to the atmosphere and temperature in the treatment, and includes, for example, molybdenum, tungsten, cermet, boron nitride, and carbon.

(42) The thus-obtained blank substrate is subjected to precise polishing, resulting in a reduced surface roughness Ra of the bonding face. A general precise polishing is, for example, chemical mechanical polishing (CMP). A polishing slurry suitable for use in this process is one obtained by dispersing abrasive grains having a grain size of 30 nm to 200 nm into alkali or neutral solution. Examples of materials for the abrasive grains can include silica, alumina, diamond, zirconia, and ceria. They are used either alone or in combination. Examples of the polishing pads can include a rigid urethane pad, a non-woven pad, and a suede pad.

(43) The anneal treatment is desirably performed after executing a rough polishing process, before the final precise polishing process. Atmospheric gases suitable for the annealing treatment can include, for example, atmosphere, hydrogen, nitrogen, argon, and vacuum. The annealing temperature is preferably in a range of 1200 to 1600 C., and the annealing time period is preferably in a range of 2 to 12 hours. In this way, an affected layer that would otherwise cause warpage or pits can be removed without degrading the smoothness of the surface.

(44) (Composite Substrate)

(45) The composite substrate is obtained by bonding the handle substrate and the donor substrate together. Techniques suitable for use in the bonding include, but not limited to, for example, direct bonding through surface activation, and a substrate bonding technique using an adhesive layer.

(46) In the direct bonding, a low-temperature bonding technique through surface activation is suitably used. After the surface activation is performed using Ar gas in vacuum of about 10.sup.6 Pa, a single crystalline material, such as Si, can be bonded to the polycrystalline material via an adhesive layer, such as SiO.sub.2, at ambient temperature.

(47) Materials suitable for use in the adhesive layer can include, for example, SiO.sub.2, Al.sub.2O.sub.3, and SiN, in addition to resin for the adhesion.

(48) Specifically, in an example shown in FIG. 1(b), the donor substrate 5 is bonded to the bonding face 1a of the handle substrate 1 via the bonding layer 4, thereby producing the composite substrate 6. Further, in an example shown in FIG. 1(c), the donor substrate 5 is directly bonded to the bonding face 1a of the handle substrate 1, thereby producing the composite substrate 6A.

EXAMPLES

(49) Slurry containing the mixture of the following components was prepared.

(50) TABLE-US-00001 (Powdery raw material) -alumina powder having a 100 weight parts specific surface area of 3.5 to 4.5 m.sup.2/g and an average primary grain size of 0.35 to 0.45 m: MgO (magnesia) 200 ppm ZrO.sub.2 (zirconia) 400 ppm Y.sub.2O.sub.3 (yttria) 15 ppm (Dispersing medium) Dimethyl glutarate 27 weight parts Ethylene glycol 0.3 weight parts (Gelatinizer) MDI resin 4 weight parts (Dispersing agent) High molecular surfactant 3 weight parts (Catalyst) N,N-dimethylamino hexanol 0.1 weight parts

(51) This slurry was charged into the die made of aluminum alloy at room temperature and was allowed to stand at room temperature for one hour. Then, the slurry was allowed to stand at 40 C. for 30 minutes, causing the solidification of the slurry to progress, followed by removal of a solidified body from the die. Further, the solidified body was allowed to stand at room temperature for 2 hours, and then at 90 C. also for 2 hours, thereby producing a plate-shaped powder-molded body.

(52) The thus-obtained powder-molded body was calcined (preliminarily sintered) in air at 1100 C. Then, as shown in FIG. 4, the calcined body was mounted on the setter 12 made of molybdenum, and the lid 14 was placed to cover the calcined body with the gap 22 of 0.1 to 0.5 mm formed over there. In this state, the calcined body was sintered in atmosphere of hydrogen 3:nitrogen 1 at 1700 to 1800 C., thereby producing a sintered body. Then, as shown in FIG. 5, the plate 17 made of molybdenum was mounted on the central part and the intermediate part of the sintered body except for the outer peripheral edge part thereof, and then the weight 18 made of molybdenum was mounted on the plate 17. The sintered body was subjected to the annealing treatment in atmosphere of hydrogen 3:nitrogen 1 at 1700 to 1800 C.

(53) The thus produced blank substrate was subjected to high-precision polishing. First, the blank substrate was subjected to double-sided lapping using green carbon to adjust the shape of both sides of the substrate. Then, the blank substrate was subjected to additional double-sided lapping using diamond slurry. The grain size of the diamond was set to 3 m. Finally, the substrate was subjected to a CMP process using SiO.sub.2 abrasive grains and diamond abrasive grains, and then was washed. Note that this washing process employed RCA washing, which is used for a general semiconductor washing process (specifically, the RCA washing was performed by alternately immersing the substrate in ammonia peroxide, hydrochloric acid peroxide, sulfuric acid, fluoric acid, aqua regia and pure water.) As a result of measurement of the surface roughness of the bonding face with the AFM, the Ra value was 1.0 nm (in 70 m vision range)

(54) These substrates were examined for the grain size of each part thereof, the peeling in the etching process, and the presence or absence of occurrence of cracks, and the results were shown in Tables 1 and 2. It is noted that the grain sizes of the central parts and the outer peripheral edge parts of the respective substrates were adjusted by changing the temperature of the sintering process, the size of the gap from above the substrate, and the size of the cover placed over the substrate in the annealing treatment after the sintering (range covering the substrate). In any examples, the grain size of the intermediate part was the same as that of the central part.

(55) TABLE-US-00002 TABLE 1 Examples 1 2 3 4 5 6 7 Grain size in outer 20 20 45 55 55 25 45 peripheral edge part (m) Grain size in 10 18 15 20 50 22 35 central part (m) Magnification 2.0 1.1 3.0 2.8 1.1 1.1 1.3 (Outer/inner) Ratio of occurrence of 20% 10% 0% 0% 0% 10% 0% peeling (n = 10) Ratio of occurrence of 0% 0% 0% 10% 20% 0% 10% cracks (n = 10) Examples 8 9 10 11 12 13 Grain size in outer 45 45 45 30 25 30 peripheral edge part (m) Grain size in 26 16 40 27 10 15 central part (m) Magnification 1.7 2.8 1.1 1.1 2.5 2.0 (Outer/inner) Ratio of occurrence of 0% 0% 0% 0% 20% 10% peeling (n = 10) Ratio of Occurrence of 10% 0% 20% 10% 0% 0% cracks (n = 10)

(56) TABLE-US-00003 TABLE 2 Comparative Examples 1 2 3 4 5 6 Grain size in outer 20 60 10 55 55 17 peripheral edge part (m) Grain size in 20 15 10 55 15 15 central part (m) Magnification 1.0 4.0 1.0 1.0 3.7 1.1 (Outer/inner) Ratio of occurrence of 50% 0% 50% 0% 0% 50% peeling (n = 10) Ratio of occurrence of 0% 70% 0% 50% 60% 0% cracks (n = 10)

(57) In all Examples of the invention, the peeling occurrence rate was low, and the crack occurrence rate was also low at the same time. It is found out that Examples have significant effects, compared to the comparative example.