Image sensor with micro lens including a plurality of layers each of different thickness
09673242 ยท 2017-06-06
Assignee
Inventors
- Hae Wook HAN (Gyeongsangbuk-do, KR)
- Young Woong DO (Daegu-si, KR)
- Won Jun Lee (Incheon-si, KR)
- Sang Dong Yoo (Seoul, KR)
- Kyoung In Lee (Gyeonggi-do, KR)
- Cha Young Lee (Gyeonggi-do, KR)
Cpc classification
International classification
Abstract
An image sensor includes a color filter configured to pass a specific color of light; a micro lens formed under the color filter and configured with a plurality of layers in which an upper layer has a smaller area than a lower layer; and a photo device formed under the micro lens and configured to receive light passing through the micro lens and convert the received light into an electrical signal.
Claims
1. An image sensor comprising: a color filter suitable to pass a specific color of light; a micro lens formed under the color filter and including a plurality of layers, wherein the plurality of layers includes an upper layer and a lower layer, wherein the lower layer has a larger area than the upper layer; and a photo device formed under the micro lens and suitable to receive light passing through the micro lens and convert the received light into an electrical signal, wherein the lower layer has a larger thickness than the upper layer in a first direction which is perpendicular to the lower layer in order to reduce a reflection factor of a surface of the photo device and concentrate the light on one spot of the surface of the photo device.
2. The image sensor according to claim 1, wherein the micro lens includes silicon nitride (SiN), silicon oxide, or a combination thereof.
3. The image sensor according to claim 1, further comprising: an oxide layer provided between the micro lens and an adjacent micro lens and isolating the micro lenses from each other.
4. The image sensor according to claim 1, wherein the micro lens comprises: a first layer as the upper layer; a second layer as an intermediate layer, wherein the second layer is formed under the first layer and has a larger area than the first layer; and a third layer as the lower layer, wherein the third layer is formed under the second layer and has a larger area than the second layer.
5. The image sensor according to claim 4, wherein the second layer has a larger thickness than the first layer, and wherein the third layer has a larger thickness than the second layer.
6. The image sensor according to claim 1, wherein the upper layer is positioned substantially over a center of the lower layer.
7. The image sensor according to claim 1, further comprising: an anti-reflection film formed between the micro lens and the photo device and suitable to guide light emitted from the micro lens into the photo device.
8. The image sensor according to claim 1, wherein each of the upper and the lower layers is formed in a rectangular shape.
9. An image sensor including: a micro lens formed over a photo device, wherein the micro lens is suitable to condense the incident light and transmit the condensed light to the photo device, wherein the micro lens comprises: a circular first layer; a circular second layer formed under the first layer and having a larger area than the first layer; and a rectangular third layer formed under the second layer and having a larger area than the circular second layer, wherein the circular second layer has a larger thickness than the circular first layer, and wherein the rectangular third layer has a larger thickness than the circular second layer in a first direction which is perpendicular to the rectangular third layer in order to reduce a reflection factor of a surface of the photo device and concentrate the light on one spot of the surface of the photo device.
10. The image sensor according to claim 9, wherein the first layer is positioned substantially over a center of the second layer, and wherein the second layer is positioned substantially over a center of the third layer.
11. An image sensor comprising: a color filter that receives light; a micro lens formed under the color filter and condensing the light; and a photo device that converts the light into an electrical signal, wherein the micro lens includes a multi-layered structure, wherein the multi-layered structure includes a lower layer and an upper layer, wherein the upper layer is formed over the lower layer, wherein the lower layer and the upper layer are different from each other in size so that the micro lens is configured in a multi-step structure, and wherein the lower layer has a larger thickness than the upper layer in a first direction which is perpendicular to the lower layer in order to reduce a reflection factor of a surface of the photo device and concentrate the light on one spot of the surface of the photo device.
12. The image sensor of claim 11, wherein the light enters through the top of the multi-step structure and exits through the bottom of the multi-step structure.
13. An image sensor comprising: a photo device converting light into an electrical signal; a micro lens formed over the photo device and including a plurality of layers, wherein the plurality of layers includes a lower layer and an upper layer, wherein the lower layer has a larger area than the upper layer, wherein the lower layer has a larger thickness than the upper layer in a first direction which is perpendicular to the lower layer in order to reduce a reflection factor of a surface of the photo device and concentrate the light on one spot of the surface of the photo device; an oxide layer provided between the micro lens and an adjacent micro lens and isolating the micro lenses from each other; and a color filter formed over the oxide layer and the micro lens and suitable to pass a specific color of light, wherein the color filter and the lower layer of the plurality of layers of the micro lens have a same width as each other.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
(1) The above objects, and other features and advantages of the embodiments will become more apparent from the following detailed description taken in conjunction with the drawings, in which:
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DETAILED DESCRIPTION OF PREFERRED EMBODIMENTS
(18) Reference will now be made in greater detail to embodiments, examples of which are illustrated in the accompanying drawings. Wherever possible, the same reference numerals will be coed throughout the drawings and the description to refer to the same or like parts.
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(20) The pixel array 111 includes a plurality of light sensing devices, that is, a plurality of photo devices. The photo device may be configured with a photo transistor, a photo diode, a photo gate, a pinned photo diode or the like. The plurality of photo devices is arranged in a matrix form. The structure of the pixel array will be described in detail with reference to
(21) The address decoder 121 decodes an address signal received from the controller 151 and designates a photo device corresponding to the address signal among the plurality of photo devices included in the pixel array 111.
(22) The column buffer 131 buffers a signal outputted in a column-wise manner from the pixel array 111 subject to control by a signal outputted from the controller 151, and outputs the buffered signal.
(23) The ADC 141 receives the signal outputted from the column buffer 131, converts the received signal into a digital signal, and transmits the digital signal to the controller 151.
(24) The controller 151 receives a signal inputted from outside and controls the address decoder 121, the column buffer 131, and the ADC 141. Furthermore, the controller 151 receives a digital signal outputted from the ADC 141, transmits the received digital signal to an external device such as a display to store or display an image.
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(26) The active pixel region 211 senses light incident from outside, converts the sensed light into an electrical signal, and outputs the electrical signal to the column buffer 131 of
(27) The optical block region 221 is disposed to surround the active pixel region 211. The optical block region 221 is used to block light from entering from outside and test and evaluate electrical characteristics of the active pixel region 211. For example, the optical block region 221 tests and evaluates the dark noise caused by the dark current, and compensates for current values corresponding to the dark current of the main photo devices in the active pixel region 211 based on an evaluation result, thereby preventing dark noise from occurring in the image sensor.
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(29) The color filter 311 has a filter configured to block ultraviolet light and infrared light from light incident from outside and pass only visible light. The color filter may include a red filter to pass only a red color of visible light, a green filter to pass only a green color of visible light, a blue filter to pass only a blue color of visible light, or a combination thereof. In another embodiment, the color filter 321 may include a cyan filter, a yellow filter, a magenta filter, or a combination thereof.
(30) The micro lens 321 serves to condense a specific color of light passed through the color filter 311. The micro lens 321 may be formed of an insulator 327, for example, silicon nitride (SiN) or silicon oxide (SiO.sub.2). The micro lens 321 will be described in detail with reference to
(31) Between the micro lens 321 and an adjacent micro lens (not illustrated), an oxide layer 327 is formed. The oxide layer 327 partially isolates the micro lenses 321 such that the adjacent micro lenses 321 do not interfere with each other.
(32) The anti-reflection film 331 serves to prevent light emitted from the micro lens 321 from reflecting from a surface of the photo device 341. Thus, light which is reflected from the surface of the photo device 341 can be redirected to the photo device 341. The anti-reflection film 331 may be applied onto the surface of the photo device 341 in order to increase light condensing efficiency of the photo device 341 by reducing light reflecting from the surface of the photo device 341 and remove interference or diffusion caused by the reflected light. The anti-reflection film 331 may be formed by coating the surface of the photo device 341 with a dielectric material having a small refractive index using a vacuum deposition method or the like. The anti-reflection film 331 may be formed of oxide or silicon nitride, and has a thickness of 60 nm, for example.
(33) The photo device 341 receives light passing through or reflected by the anti-reflection film 331, converts the received light into an electrical signal, and outputs the electrical signal to the controller 151 of
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(35) Referring to
(36) The first layer 323 is formed in a circular shape and has the smallest area among the three layers 323 to 325.
(37) The second layer 324 is formed in a circular shape and has a larger area than the first layer 323 and a smaller area than the third layer 325.
(38) The third layer 325, which is serving as, for example, a guiding layer, is formed in a rectangular shape and has the largest area among the three layers 323 to 325.
(39) The second layer 324 may be formed to have a larger thickness T2 than the thickness T1 of the first layer 323, and the third layer 325 may be formed to have a larger thickness T3 than the thickness T2 of the second layer 324. As such, when the second layer 324 has a larger thickness than the first layer 323, optical characteristics of the micro lens may be improved.
(40) The thicknesses of the first and second layers 323 and 324 are inversely proportional to the thickness of the third layer 325. That is, when the first and second layers 323 and 324 have a large thickness, the third layer 325 needs to have a small thickness, and when the first and second layers 323 and 324 have a small thickness, the third layer 325 needs to have a large thickness. That is because when the first and second layers 323 and 324 have large thicknesses, the focal length of light incident from outside decreases, and when the first and second layers 323 and 324 have small thicknesses, the focal length of the light incident from outside increases.
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(43) The length or a width L2 of the second layer 324 is larger than the length or width L1 of the first layer 323, and the length or width L3 of the third layer 325 is larger than the length or width L2 of the second layer 324.
(44) The color filter 311 has the same length as the third layer 325.
(45) The first layer 323 may extend in parallel to the second, layer 324.
(46) The first to third layers 323 to 325 may include silicon nitride (SiN) or silicon oxide (SiO). For example, the first and second layers 323 and 324 may include SiN, and the third layer 325 may include oxide. When the third layer 325 is formed of SiN, light absorption may be reduced by 2.2% red colored light, by 1.4% for green colored light, or by 4.0% for blue colored light, compared to when the third layer 325 is formed of oxide. Also, light transmission may be reduced by 1.8% for red colored light, by 1.5% for green color of light, or by 3.8% for blue colored light, compared to when the third layer 325 is formed of oxide.
(47) The anti-reflection layer 331 may be formed to have a smaller thickness T5 than the thickness T1 of the first layer 323 or the thickness T2 of the second layer 324.
(48) The first layer 323 is formed substantially in the center of the second layer 324, the second layer 324 is formed substantially in the center of the third layer 325. The third layer 325 is formed substantially over the entire surface of the photo device 341 of
(49) The numerical values for the micro lens 211 according to an embodiment are not limitative.
(50) In another embodiment, the numerical values such as the thickness and length presented above may be modified depending on the environment, design, and applications. Furthermore, the material used in the micro lens may also be replaced with another material depending on applications.
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(52) The first layer 423 is formed in a rectangular shape and has the smallest area among the three layers 423, 424, and 325.
(53) The second layer 424 is formed in a rectangular shape and has a larger area than the first layer 423 and a smaller area than the third layer 325.
(54) The third layer 325 is formed in a rectangular shape and has the largest area among the three layers 423, 424, and 325.
(55) The first to third layers 423, 424, and 325 may be formed to have the same thicknesses as those illustrated in
(56) The first layer 423 is formed substantially in the center of the second layer 424, the second layer 424 is formed substantially in a center of the third layer 325, and the third layer 325 is formed substantially over the entire surface of the photo device 341 of
(57) The first layer 423 may disposed in parallel to the second layer 424.
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(59) The first layer 523 is formed in a diamond shape and has the smallest area among the three layers 523, 524, and 325.
(60) The second layer 524 is formed in a diamond shape and has a larger area than the first layer 523 and a smaller area than the third layer 325.
(61) The third layer 325 is formed in a rectangular shape and has the largest area among the three layers 523, 524, and 325.
(62) The first to third layers 523, 524, and 325 may be formed to have the same thicknesses as those illustrated in
(63) The first layer 523 is formed in the center of the second layer 524, the second layer 524 is formed in the center of the third layer 325, and the third layer 325 is formed over the entire surface of the photo device 341 of
(64) The first layer 523 may be in parallel to the second layer 524, respectively.
(65) In another embodiment, the first and second layers of the micro lens 321 may be formed in various shapes such as triangle and hexagon.
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(69) As such, when external light is incident on the front side of the image sensor 211, the transmittances of blue light, green light, and red light in the image sensor 211 according to an embodiment are higher than those in the image sensor of the related art.
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(72) As such, even when external light is obliquely incident on the image sensor 211, that is, even when external light is incident at a specific incident angle, the transmittances of blue light, green light, and red light in the image sensor 211 according to an embodiment are higher than those in the image sensor of the related art.
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(74) Referring to
(75) As such, the transmission characteristics of the image sensor 211 according to an embodiment are more favorable than the transmission characteristics of the image sensor of the related art.
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(77) transmission characteristics of red light,
(78) Referring to
(79) As such, even when external light enters obliquely, the transmission characteristics of the image sensor 211 according to an embodiment are more favorable than the transmission characteristics of the image sensor of the related art.
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(81) Referring to
(82) As such, the light concentration characteristics of the image sensor 211 according to an embodiment are more favorable than that of the image sensor of the related art. That is, the image sensor 211 according to an embodiment has much higher light condensing efficiency than the image sensor of the related art.
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(84) Referring to
(85) As such, light concentration of the image sensor 211 according to an embodiment is more favorable than that of the image sensor of the related art. That is, the image sensor 211 according to an embodiment has much higher light condensing efficiency than the image sensor of the related art.
(86) According to embodiments, the micro lens provided in the image sensor may be formed with a multilayer structure.
(87) Thus, light condensing efficiency may be improved to more reliably condense light incident from outside into one spot of the surface of the photo device. Furthermore, although angle of incidence increases, light condensing efficiency of the photo device may be significantly improved.
(88) Furthermore, as the micro lens is formed, with a multilayer structure, a complex pattern does not need to be implemented while the image sensor is designed. Thus, the fabrication process of the image sensor may be simplified. As a result, fabrication cost of the image sensor may be significantly reduced.
(89) Furthermore, since the structure of the micro lens is not complex, the degree of freedom in design (or a design margin) may be improved. Thus, since existing processes may be used to fabricate the image sensor according to an embodiment, additional costs are not incurred in the fabrication of the image sensor according to an embodiment.