APPARATUS AND METHOD FOR IRRADIATION
20230071898 · 2023-03-09
Inventors
- Jennifer Godwin Pagan (Charlotte, NC, US)
- Steven Franklin Pugh (Charlotte, NC, US)
- Richard Mark Simons (London, GB)
Cpc classification
A61L2202/14
HUMAN NECESSITIES
C02F2201/3228
CHEMISTRY; METALLURGY
C02F2201/3222
CHEMISTRY; METALLURGY
A61L2209/111
HUMAN NECESSITIES
C02F2201/3225
CHEMISTRY; METALLURGY
A61L2202/11
HUMAN NECESSITIES
International classification
Abstract
An apparatus and method for irradiating a fluid containing a material to be irradiated, comprising at least one irradiation chamber having at least one inlet port, one or more UV radiation sources inside the irradiation chamber(s) optically coupled to the fluid in the irradiation chamber(s) via at least one UV-transparent window in contact with the fluid; one or more seals or gaskets disposed adjacent to the radiation sources to protect them from the fluid; and at least one heat exchange mechanism inside the irradiation chamber(s) thermally coupled to the radiation sources and to the fluid. The UV radiation sources and the at least one heat exchange mechanism are at least partially submerged in the fluid in the irradiation chamber.
Claims
1. An irradiation apparatus comprising: at least one irradiation chamber for a fluid containing a material to be irradiated, said chamber having at least one inlet port for fluid flow into the chamber; one or more UV radiation sources inside the at least one irradiation chamber optically coupled to the fluid in the at least one irradiation chamber via at least one UV-transparent window in contact with the fluid in the irradiation chamber; one or more seals or gaskets disposed adjacent to the one or more radiation sources to protect the one or more radiation sources from the fluid in the irradiation chamber; and at least one heat exchange mechanism inside the at least one irradiation chamber thermally coupled to the one or more radiation sources and to the fluid in the at least one irradiation chamber; wherein the one or more UV radiation sources and the at least one heat exchange mechanism are at least partially submerged in the fluid in the irradiation chamber.
2. The irradiation apparatus of claim 1, wherein the heat exchange mechanism comprises one or more of a printed circuit board, a metal core printed circuit board, a thermoelectric cooling device, a vapor chamber, a heatsink, a heat dissipation structure, a thermal transfer material, a material thermally coupled to a fluid.
3. The irradiation apparatus of claim 2, wherein the heat exchange mechanism is a heatsink or a thermal transfer material, or combinations thereof.
4. The irradiation apparatus of claim 1, further comprising one or more sensors which is used to dynamically control the power to the one or more UV radiation sources based on one or more sensor readings.
5. The irradiation apparatus of claim 1 further comprising circuitry which monitors the status of the one or more UV radiation sources and provides feedback to monitoring circuitry.
6. The irradiation apparatus of claim 1, wherein the one or more UV radiation sources comprise one or more UV-C radiation sources, or a combination thereof.
7. The irradiation apparatus of claim 1, wherein the one or more UV radiation sources comprise a plurality of radiation sources arranged in an array.
8. The irradiation apparatus of claim 1, wherein one or more wavelengths of the one or more UV radiation sources are dynamically adjustable.
9. The irradiation apparatus of claim 1, wherein one or more wavelengths of the one or more UV radiation sources are selected based on an identification of a contaminant in the material to be irradiated.
10. The irradiation apparatus of claim 1, wherein the one or more UV radiation sources deliver one or more wavelengths to the material to be irradiated that induce fluorescence in the material to be irradiated thereby allowing for the identification of the contaminant in the material to be irradiated.
11. The irradiation apparatus of claim 1, wherein the one or more UV radiation sources deliver a combination of wavelengths to the material to be irradiated.
12. The irradiation apparatus of claim 1, wherein the one or more UV radiation sources comprise a micro plasma lamp.
13. The irradiation apparatus of claim 1, comprising a plurality of UV radiation sources and a plurality of irradiation chambers, each with at least one inlet and one outlet port, and all of the UV radiation sources are thermally coupled to the irradiation chambers.
14. The irradiation apparatus of claim 1, wherein a portion of the radiation from the one or more radiation sources is transmitted to surfaces of one or more irradiation chambers to inhibit biofilm formation on the surfaces.
15. A method for irradiating a fluid containing a material to be irradiated disposed in an irradiation chamber, the irradiation method comprising: (1) providing an irradiation apparatus comprising: at least one irradiation chamber for a fluid containing a material to be irradiated, said chamber having at least one inlet port for fluid flow into the chamber; one or more UV radiation sources inside the at least one irradiation chamber optically coupled to the fluid in the at least one irradiation chamber via at least one UV-transparent window in contact with the fluid in the irradiation chamber; one or more seals or gaskets disposed adjacent to the one or more radiation sources to protect the one or more radiation sources from the fluid in the irradiation chamber; and at least one heat exchange mechanism inside the at least one irradiation chamber thermally coupled to the one or more radiation sources and to the fluid in the at least one irradiation chamber; wherein the one or more UV radiation sources and the at least one heat exchange mechanism are at least partially submerged in the fluid in the at least one irradiation chamber; and (2) irradiating a fluid containing a material to be irradiated using said irradiating apparatus.
16. The irradiation method of claim 15, wherein the heat exchange mechanism comprises one or more of a printed circuit board, a metal core printed circuit board, a thermoelectric cooling device, a vapor chamber, a heatsink, a heat dissipation structure, a thermal transfer material, a material thermally coupled to a fluid.
17. The irradiation method of claim 15, wherein the heat exchange mechanism is coated with a water, medical or food safe material.
18. The irradiation method of claim 15, further comprising one or more sensors which is used to dynamically control the power to the one or more UV radiation sources based on one or more sensor readings.
19. The irradiation method of claim 15, further comprising circuitry which monitors the status of the one or more UV radiation sources and provides feedback to monitoring circuitry
20. The irradiation method of claim 15, wherein the one or more UV radiation sources comprise one or more UV-C radiation sources, or a combination thereof.
21. The irradiation method of claim 15, wherein the one or more UV radiation sources comprise a plurality of radiation sources arranged in an array.
22. The irradiation method of claim 15, wherein one or more wavelengths of the one or more UV radiation sources are dynamically adjustable.
23. The irradiation method of claim 15, wherein one or more wavelengths of the one or more UV radiation sources are selected based on an identification of a contaminant in the material to be irradiated.
24. The irradiation method of claim 15, wherein the one or more UV radiation sources deliver one or more wavelengths to the material to be irradiated that induce fluorescence in the material to be irradiated thereby allowing for the identification of the contaminant in the material to be irradiated.
25. The irradiation method of claim 15, wherein the one or more UV radiation sources deliver a combination of wavelengths to the material to be irradiated.
26. The irradiation method of claim 15, wherein the one or more UV radiation sources comprise a micro plasma lamp.
27. The irradiation method of claim 15, comprising a plurality of UV radiation sources and a plurality of irradiation chambers, each with at least one inlet and one outlet port, and all of the UV radiation sources are thermally coupled to the irradiation chambers.
28. The irradiation method of claim 15, wherein a portion of the radiation from the one or more radiation sources is transmitted to surfaces of one or more irradiation chambers to inhibit biofilm formation on the surfaces.
29. An irradiation apparatus comprising: at least one irradiation chamber for a fluid containing a material to be irradiated, said chamber having at least one inlet port for fluid flow into the chamber; one or more UV radiation sources inside the at least one irradiation chamber optically coupled to the fluid in the at least one irradiation chamber via at least one UV-transparent window in contact with the fluid in the irradiation chamber; one or more seals or gaskets disposed adjacent to the one or more radiation sources to protect the one or more radiation sources from the fluid in the irradiation chamber; and at least one heat exchange mechanism inside the at least one irradiation chamber thermally coupled to the one or more radiation sources and to the fluid in the at least one irradiation chamber; wherein the one or more UV radiation sources and the at least one heat exchange mechanism are at least partially submerged in the fluid in the irradiation chamber, and the UV lamp module assembly is constructed in such a way as to preferentially create convection currents in order to mix a stagnant tank volume.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0018] The invention is illustrated and described herein with reference to the various drawings, in which like reference numbers are used to denote like apparatus components, as appropriate, and in which:
[0019]
[0020]
[0021]
[0022]
DETAILED DESCRIPTION OF THE INVENTION
[0023] The present invention provides a UV irradiation apparatus, disinfection system and method comprising at least one irradiation chamber for fluid containing a material to be irradiated, and one or more UV radiation sources inside the irradiation chamber optically coupled to the fluid in the irradiation chamber via at least one UV-transparent window in contact with the fluid. One or more seals or gaskets are disposed adjacent to the radiation sources to protect them from the fluid in the irradiation chamber. At least one heat exchange mechanism inside the irradiation chamber is thermally coupled to the radiation sources and to the fluid in the irradiation chamber. The UV radiation sources and the heat exchange mechanism are at least partially submerged in the fluid in the irradiation chamber. Optionally, the heat exchange mechanism may not be of suitable material for contact with the fluid for human consumption or for fluid used in a medical process. In this case the portions of the heat exchange mechanism exposed to the fluid may be coated with a material approved for drinking water, food contact or medical material compatibility.
[0024] The UN irradiation apparatus, disinfection system and method are designed such that at least a portion of the radiation from the one or more radiation sources is transmitted to surfaces of the at least one irradiation chamber to provides a disinfection effect to inhibit the propagation of microbiological contamination thereon. Microbial attachment to surfaces of the irradiation apparatus, hereinafter referred to as “biofilm” formation, may increase risk to health due to possible transfer of such contaminants to a fluid flowing across such surfaces, or spontaneous transfer may be possible. The inhibition of biofilm within the disinfection system is desirable since the process of UV irradiation does not impart a residual biocide to the fluid treated. In one embodiment, a small portion of the radiation emitted by the UV source may be redirected to irradiate surfaces of the treatment apparatus and system. Since the fluid-contact surfaces of the reactor are static, the irradiation period of any segment is equal to the total period for which the UV source is emitting. Thus, far lower irradiances are required to achieve biofilm inhibition than would be necessary for transient irradiation, such as for a fluid passing through a reactor chamber. By requiring low irradiance and relatively low UV power, a small fraction of the power emitted by the source can be scavenged for biofilm inhibition without significantly impacting the fluid disinfection performance of the reactor. Thus, a portion of the radiation from the one or more radiation sources can be transmitted to surfaces of the one or more irradiation chambers to inhibit biofilm formation thereon.
[0025] The above considerations motivate the design of a system for mounting the UV radiation source such that both the UV-transparent window and the at least one thermal exchange mechanism are wetted by a liquid, which may or may not be the intended irradiation target fluid. In the specific case of disinfection of a water tank, the UV source and protective housing are at least partially submerged in the water, providing both good optical and thermal coupling of the UV source to the target fluid. However, the location of the UV source within a water volume or the structure of the irradiation chamber itself may result in a portion of the water volume not receiving sufficient UV radiation exposure for disinfection. Beneficially, the heat generated by the UV source, and any materials thermally connected to the UV source, may induce convective currents within the fluid volume in an otherwise stagnant tank. These currents may circulate the fluid from the occluded regions into those of greater UV exposure, as such producing a more uniform and effective disinfection effect. Further, the components of the UV source intended for protection of the source from the environment may be designed in such a way to enhance convective cooling and mixing of the fluid volume. Structures may be added to the housing of the UV source to preferentially direct or increase the velocity of the convection currents. This is similar in concept to how thermal chimneys work in buildings with air, except in this case the currents are being induced in the water. In one embodiment of the invention, this convection effect is shown in a model of flow velocity in a static tank in
[0026] The UV radiation source (or a plurality of UV radiation sources) may comprise one or more UV-C radiation sources, or a combination thereof. The UV radiation source (or plurality of UV radiation sources) is typically coupled to a support structure inside the at least one irradiation chamber. The support structure holds the UV radiation source(s) such that they selectively direct UV radiation into the interior of an irradiation chamber in which a material to be irradiated is disposed. Peak wavelengths may be (dynamically) selected and/or adjusted, and a plurality of wavelengths may be utilized such that the action spectrum of a given organism can be targeted, thus improving disinfection efficiency. For example, one or more wavelengths of the one more UV radiation sources may be selected based on an identification of a contaminant in the material to be irradiated. The one or more UV radiation sources may deliver one or more wavelengths, or a combination of wavelengths, to the material to be irradiated. The wavelengths may induce fluorescence in the material to be irradiated thereby allowing for the identification of the contaminant in the material to be irradiated. Optionally, the material to be irradiated may be disposed adjacent to an n-type single crystalline semiconductor to generate hydrogen peroxide at the semiconductor surface through bandgap electric photo-excitation for disinfection.
[0027] Heat in the irradiation apparatus is managed, and optionally recuperated, using a heat exchange mechanism, such as a one or more of a printed circuit board, a metal core printed circuit board, a thermoelectric cooling device, a vapor chamber, a heatsink, a heat dissipation structure, a thermal transfer material, and a material thermally coupled to a fluid, in contact to the UV radiation source(s). The irradiation apparatus may be made moisture resistant using a moisture seal coupled to and/or disposed within the support structure. The irradiation assembly can include a monitoring/detection mechanism and control circuitry for dynamically controlling the delivery of UV radiation to the material to be irradiated based on flow rate, water quality, user input, sensor readings, or other operating conditions. Finally, associated performance data may be stored in an onboard or external data storage unit and used to feedback signal to monitoring circuitry to deliver system status. The system status could be indicated by a current or voltage signal linked to a visible or audible alarm.
[0028] In various embodiments of the invention, a modular semiconductor UV LED mounting configuration may be provided including a UV radiation source package containing a single LED or multiple LED “dice” arranged in a matrix or array. The LED dice can be selected to provide multiple wavelengths in both the UV and visible radiation spectrum from about 200 nm to about 800 nm. In one exemplary embodiment, the matrix or array includes LED dice emitting wavelengths in the range of about 200-320 nm in order to saturate the absorption mechanism of nucleocapsids (with peak emission centered at around 280 nm), and at the same time to target the peak absorption of nucleic acid with its peak emission wavelength spanning about 250-280 nm. In another exemplary embodiment, with the intention of mimicking the optical output spectrum of low or medium pressure Hg-based UV lamps used to target various bacteria and viruses, the matrix or array of LED dice utilizes multiple wavelengths, including at least one of about 240-260 nm, about 260-344 nm, about 350-380 nm, about 400-450 nm, or about 500-600 nm. A further exemplary embodiment is a matrix or array of LED dice emitting germicidal wavelengths ranging from about 250 nm to 300 nm in conjunction with LED dice emitting wavelengths in the range of about 350 nm to 400 nm to enable photocatalytic oxidation of pathogens or pollutants in water in proximity of crystalline films of n-type semiconductors, such as TiO.sub.2, NiO, or SnO.sub.2. A still further exemplary embodiment is a modular mounting configuration containing multiple LED dice emitting about 250-320 nm and about 320-400 nm wavelengths arranged in a matrix or array to enable the fluorescence spectra of NADH, and tryptophan, of particles with biological origin. In another exemplary embodiment, a commercially available SETi UV Clean™ LED package is used. Individual LED dice or a single die bonded to a thermally conductive metal core circuit board (MCPCB), such as those available from The Bergquist Company™, may also be used.
[0029] A packaged UV LED, or a matrix or array of multiple UV LEDs, may be attached to the heatsink. Multiple UV wavelengths can be used to optimize the effect on specific microorganisms. Backside heat extraction may be aided by thermoelectric cooling (TEC) and/or a vapor chamber. Additionally, the UV LED package may be topside cooled by conduction through a highly thermally conductive over-layer, such as silicone polymer impregnated with diamond nanoparticles, which may have a single crystalline structure.
[0030] Components for the electrical and/or electronic control of the TV radiation source may optionally be included within the sealed unit as previously described, such that they may act upon the UV radiation source whilst maintaining protection from the external environment through such hermiticity, the use of desiccants, or a combination thereof as previously described. Further, the co-location of these components onto the MCPCB, or otherwise, and subsequent thermal union to the heat exchange mechanism may be used to extract heat generated by, for example, power conversion components. Additionally, these electrical and/or electronic components may include sensors by which the operating conditions and status of the UV radiation source may be determined, including but not limited to a photodiode, thermocouple, thermistor, acoustic sensor, hall probe, current probe, etc.
[0031] The radiation emitter module may be a user replaceable unit, optionally including attached electronics and desiccating materials in order to combat moisture and humidity. Attached electronics can include an individual identification number and telemetry tracking, as well as an interconnect for easy disconnect from a larger system.
[0032] The UV radiation may be transmitted from the LED dice through a transmissive window, polymer, air, and/or aperture into the irradiation chamber. The transmissive window has a transmission spectrum appropriate for the choice of LEDs used, for example the UV-C range.
[0033] Fused silica, fused quartz, or similar glasses, are commonly used for this purpose, as are UV-stable silicones (e.g. DOW Silastic, LEDiL VIOLET). These window materials therefore constitute part of the optical coupling system and their efficiency at transferring light from the source to the target medium will affect the overall system efficacy. The Fresnel equations are well understood in their description of the transmission efficiency across refractive index boundaries. In the case where a UV source is positioned such that the window is ‘dry’, i.e. not in contact with the water volume of a storage tank, the UV radiation must cross three large refractive index boundaries (air-quartz-air-water), and subsequently undergoes three substantial loses in transmitted power (due to the reflected portion). For such an air-quartz-air-water system, up to 9.8% of the UV radiation emitted by the source would not reach the water target volume (calculations made for monochromatic radiation at 280 nm, using literature values for refractive indices, and considering a normal ray incident upon a series of planar refractive index boundaries). However, if the quartz window is wetted by the target water volume, then this loss is reduced to just 4.1%. Thus, it is beneficial to the optical coupling to position and design a UV source such the UV window is wetted by a target water volume.
[0034] The interior surface of the irradiation chamber is typically constructed from a material which principally reflects the UV radiation from the UV source and minimally transmits or absorbs the UV radiation.
[0035] In another embodiment, the UV source is a LED which is in electrical and thermal connection to a thermal transfer material, such as a metal core printed circuit board (MCPCB), printed circuit board (PCB) or other dielectric material. The thermal transfer material is in direct contact with the fluid in cooling chamber 2, providing a thermal path between the LED and the fluid. In this case, the fluid will provide cooling to the LED if the fluid, e.g., water, temperature is lower than the junction temperature. The thermal transfer material functions as a heat exchange mechanism thermally connected or coupled to the radiation source and to the fluid in the cooling chamber.
[0036] In another embodiment, the UV source is a LED which is in electrical and thermal connection to a thermal transfer material, such as a metal core printed circuit board (MCPCB), printed circuit board (PCB) or other dielectric material, which is in contact with a separate, second thermal transfer material in direct contact with the fluid in the irradiation chamber 1, providing a thermal path between the LED and the fluid. In this case, the fluid will provide cooling to the LED if the fluid, e.g., water, temperature is lower than the junction temperature. The second thermal transfer material may be a metal, dielectric, semiconductor, plastic or any other thermally conductive material. The thermal transfer material functions as a heat exchange mechanism thermally connected or coupled to the radiation source and to the fluid in the cooling chamber.
[0037] Radiation transmitted through the UV-transparent window to surfaces of the irradiation chamber inhibits biofilm formation on the surfaces and possible microbial contamination in downstream regions of the apparatus. If the apparatus has a fluidic outlet structure optically coupled to the irradiation chamber, either through direct illumination through one or more portholes or other openings in the irradiation chamber or via partial transmission through the material of the chamber, the surfaces of the outlet structure may be irradiated to inhibit biofilm formation thereon. The UV radiation may be used as a biofilm inhibitor within an integrated UV disinfection apparatus, system and method. This may include intelligent control of the apparatus, system, and method with periodic “on cycles” during periods of stagnation, such that a constant bacteriostatic effect may be imparted. On-board sensing of the UV source status could optionally be such as a thermistor, photodiode, or voltage detection scheme. In one embodiment, these sensors could be used to predict the lifetime or operating quality of the UV source. In one embodiment, optical coupling between the irradiation chamber and one or more additional chambers may be accomplished via at least one small porthole through the interior of irradiation chamber to allow for UV radiation to enter the additional chamber(s). The porthole(s) may also be in fluidic connection to the additional chamber(s) and increase fluid communication between the chambers. The radiation transmitted to surfaces of the additional chamber(s) through the porthole(s) and/or via partial transmission through the material of the chamber may inhibit biofilm formation on surfaces of the additional chamber(s) and possible microbial contamination in downstream regions of the apparatus.
[0038] In another embodiment, a UV radiation source provides radiation to the interior of the irradiation chamber. The radiation source has a thermal connection to the fluid in the irradiation chamber. This thermal connection is between the backside and/or frontside of at least one heat exchange mechanism thermally connected or coupled to the radiation source and to the fluid in the irradiation chamber. In one embodiment, the heat exchange mechanism is heatsink. A single, quartz optical window is placed over the UV radiation source to protect it from fluid in the irradiation chamber. The UV radiation source is sealed between the heat exchange mechanism and the window such that the window serves to segregate the UV radiation source from the fluid in the irradiation chamber. The irradiation chamber is constructed from a material which principally reflects the UV radiation from the UV source and minimally transmits or absorbs the UV radiation.
[0039] In another embodiment, the UV radiation source is thermally connected to a thermal transfer material that is partially or entirely coupled to or mounted inside the interior of the irradiation chamber. The thermal transfer material provides conductive heat transfer from the UV source to the fluid in the irradiation chamber via the interior of the chamber. In one embodiment, the UV source is an LED which is in electrical and thermal connection to the thermal transfer material, such as a metal core printed circuit board (MCPCB), printed circuit board (PCB) or other dielectric material. The thermal transfer material is in direct contact with the fluid in the irradiation chamber providing a thermal path between the LED and the fluid. In this case, the fluid will provide cooling to the LED if the fluid, e.g., water, temperature is lower than the junction temperature. The thermal transfer material functions as a heat exchange mechanism thermally connected or coupled to the radiation source and to the fluid in the cooling chamber.
[0040] In another embodiment, the UV source is an LED which is in electrical and thermal connection to the thermal transfer material, such as a metal core printed circuit board (MCPCB), printed circuit board (PCB) or other dielectric material, which is in contact with a separate thermal transfer material in direct contact with the fluid in the irradiation chamber, providing a thermal path between the LED and the fluid. In this case, the fluid will provide cooling to the LED if the fluid, e.g., water, temperature is lower than the junction temperature. The thermal transfer material may be a metal, dielectric, semiconductor, plastic or any other thermally conductive material. The thermal transfer material functions as a heat exchange mechanism thermally connected or coupled to the radiation source and to the fluid in the cooling chamber.
[0041]
[0042]
[0043] Heat generated by the UV radiation sources 17 induce convective currents 11 (
[0044] In another embodiment, the UV source is a micro plasma lamp which is in direct contact with the fluid in the reactor irradiation chamber providing a direct thermal path between the lamp and the fluid. In this case, the fluid will provide cooling to the lamp. A micro plasma lamp UV radiation source provides radiation to the interior of the irradiation chamber. Because the micro plasma lamp is in direct contact with the fluid in the irradiation chamber, it provides a direct thermal path between the lamp and the fluid, thereby cooling the lamp. In one embodiment, the micro plasma lamp is in thermal connection with a thermal transfer material which is in direct contact with the fluid in the irradiation chamber, providing a thermal path between the lamp and the fluid. The thermal transfer material may be a metal, dielectric, semiconductor, plastic or any other thermally conductive material. The thermal transfer material may reflect a portion of the IN radiation from the lamp. In another embodiment, the thermal transfer material is in contact with a separate thermal transfer material which is in direct contact with the fluid in the irradiation chamber, providing a thermal path between the lamp and the fluid. In these cases, the fluid will provide cooling to the lamp. As such, the embodiment may be used as an irradiation chamber in the other irradiation apparatus shown and described herein.
[0045] In another embodiment, the invention provides a plurality of UV radiation sources and a plurality of irradiation chambers, each with at least one inlet and one outlet port. Each UV radiation source is primarily optically coupled to a single irradiation chamber. All irradiation chambers are fluidically coupled such that all fluid that passes through any irradiation chamber also passes through the other irradiation chambers. In this way, the fluidic flux through the irradiation chambers is equal to the sum of fluidic fluxes through all the irradiation chambers. In addition, all UV sources are thermally coupled to the fluidic flux via the interior of the irradiation chambers.
[0046] In another embodiment, the invention provides a plurality of UV radiation sources and a plurality of irradiation chambers, each with at least one inlet and one outlet port. Each UV radiation source is primarily optically coupled to a single irradiation chamber. All of the UV radiation sources are thermally coupled to all the irradiation chamber. One or more of the irradiation chambers is in fluidic connection, where the outlet of one chamber is the inlet for another chamber.
[0047] In the embodiments described above, the plurality of irradiation chambers may be fluidically coupled such that all fluid that passes through any irradiation chamber also passes through the other irradiation chambers. Just as multiple irradiation chambers may be fluidically coupled, forming a single unit, sets of these individual units may be arrayed in parallel or series combinations where the inlet to each unit is composed of a fraction of the total inlet flow (parallel case) or the entire flow (series case), or a blend of series and parallel configurations of each unit.
[0048] In another embodiment, the transfer of heat from the UV source to the fluidic flux is accomplished via conductive heat transfer through a nominally flat surface that is incorporated into the surface of a chamber, in thermal contact with the fluidic flux within that chamber. For example, in the embodiments shown in
[0049] In another embodiment, the transfer of heat from the UV source to the fluidic flux is accomplished via conductive heat transfer through a porous structure placed in the flow path of some or all of the fluidic flux. The porous structure may be designed such that the surface area is maximized to provide for efficient conductive heat transfer to the fluidic flux. The porous structure used for maximizing conductive heat transfer may also promote turbulent mixing of the fluidic flux and/or laminar flow characteristics in the fluidic flux.
[0050] In yet another embodiment, two three-dimensional chambers have at least one inlet and at least one outlet port for the flow of a fluid into and out of the chamber. The UV source is a planar source such as a micro plasma lamp, emitting UV radiation from both sides. The UV source is situated between the irradiation chambers and provides radiation to both chambers. In one embodiment, the two chambers are in fluidic connection, where the inlet of one of the chambers is the outlet for the other chamber. In another embodiment, each side of the planar UV source serves as a portion of the sidewall of each chamber.
[0051] In another embodiment, the irradiation apparatus includes two three-dimensional irradiation chambers, each having an inlet port and an outlet port for the flow of a fluid into and out of the chambers. The irradiation chambers are in fluidic connection and in fluid communication, with a port functioning as the outlet port for one chamber and the inlet port for the other irradiation chamber. The UV radiation source is a micro plasma lamp that provides radiation to the interior of both irradiation chambers. The UV source is situated between the irradiation chambers and provides radiation to both chambers. Each side of the planar UV source serves as a portion of the sidewall of each chamber. The UV radiation source has a quartz sleeve or optical window covering each of its sides to protect it from fluid in the irradiation chambers. The UV radiation source is sealed between the windows such that the windows serve as a portion of the pressure vessel for the disinfection system and to segregate the UV radiation source from the fluid in the irradiation chambers.
[0052] In another embodiment of the invention, the UV source described herein may comprise a UV emitter embedded inside an environmentally sealed housing which partially or completely encloses the UV emitter between a thermal transfer material or conductor such as a metal core printed circuit board, and a UV transparent window. In another embodiment, the sealed housing comprises a principally UV transparent window and a heatsink, such as a principally thermally conducting cup, that combine to form an enclosed volume in which one or more UV LEDs on a circuit board is located and which is in thermal connection to the cup. A potting compound fills the void between the thermally conductive cup and the window, less a small keep out area around the perimeter of the LEDs. In one embodiment, the thermally conductive cup is created by deformation of a single metal sheet. The thermally conductive cup may have one or more ports for electrical connection entry and/or exit and/or for the injection of a liquid potting compound. In another embodiment, the thermally conductive cup comprises at least one face intended principally for thermal transfer to/from the UV emitter.
[0053] In other embodiments of the invention, the optically transparent window is made of quartz or sapphire or a principally UV transparent polymer. The potting compound may principally retain the optically transparent window in the thermally conductive cup and serve as a structural component to the assembly. The UV emitter may comprise a UV radiation source mounted on a substrate with a control system further mounted on the substrate. The UV radiation source may comprise at least one of an LED, a plasma discharge source, or a solid-state phosphor emission device, or combinations thereof. The substrate may comprise a printed circuit board. The substrate may be designed to create an efficient thermal path between the UV radiation source and an external thermal reservoir. The substrate may provide a means of preventing contact between the potting compound and UV radiation source. The substrate may provide a means to fix relative positioning of the UV radiation source and the optically transparent window. A control system may comprise a constant-current source or a constant-current sink.
[0054] The present invention has numerous potential applications. Primarily, this may be considered as a means for treating or maintaining microbial quality of potable water tanks; however, the breadth of application is far more substantial. The storage of water and other fluids is required for numerous processes, including but not limited to, crop irrigation, coolant loops & injection systems, greywater, cleaning fluids, humidifiers, dehumidifiers, flushing & quenching systems, wastewater treatment, food processing and dispensing, pharmaceutical production, etc. In such applications, the objective may be to control microbial contamination for the purposes of avoiding disease, or for the avoidance of other unfavorable effects of bacterial or mold growth such as aesthetics, clogging, corrosion, rotting, digestion, etc. Further, the application of an in-tank disinfection system may be desired during nominal operation, e.g. when the tank is full of a target fluid, or as a means of maintaining operational readiness during dormancy, when the tank surfaces themselves may become the primary disinfection target.
[0055] Although the invention is illustrated and described herein with reference to certain embodiments and examples thereof, it will be readily apparent to those skilled in the art that other embodiments and examples may perform similar functions and/or achieve like results. Likewise, it will be apparent that other applications of the disclosed technology are possible. All such equivalent embodiments, examples, and applications are within the spirit and scope of the invention and are intended to be covered by the following claims.