LIGHT FIELD IMAGE CAPTURING APPARATUS
20170150120 ยท 2017-05-25
Assignee
Inventors
Cpc classification
G02B3/0056
PHYSICS
G02B13/00
PHYSICS
H04N25/00
ELECTRICITY
H04N13/229
ELECTRICITY
G06T7/80
PHYSICS
G02B3/04
PHYSICS
G03B41/00
PHYSICS
International classification
G02B13/00
PHYSICS
Abstract
A light field image capturing apparatus includes: a main lens, configured to transmit light of an object environment, and including an optical axis; a beam generation unit, configured to receive the light transmitted by the main lens and generate plurality Bessel-beams, where the beam generation unit includes plurality slits or conical lenses arranged in an array manner and configured to generate the Bessel-beam respectively; a micro-lens unit, configured to receive the Bessel-beam generated by the beam generation unit, and including plurality micro-lens elements corresponding to the beam generation unit, wherein each micro-lens element is configured to determine a focus point generated after the Bessel-beam passes through each micro-lens element, and a focal length of a distance between the focus point and the micro-lens element; and a light sensing unit, including a focal plane, and configured to enable the focus point to be focused on the focal plane.
Claims
1. A light field image capturing apparatus, comprising: a main lens, configured to transmit light of an object environment, and comprising an optical axis; a beam generation unit, configured to receive the light transmitted by the main lens and generate plurality Bessel-beams, wherein the beam generation unit comprises plurality slits or conical lenses arranged in an array manner and configured to generate the Bessel-beams respectively, and the slits or the conical lenses are arranged along a direction perpendicular to the optical axis of the main lens; a micro-lens unit, configured to receive the Bessel-beams generated by the beam generation unit, and comprising plurality micro-lens elements corresponding to the beam generation unit, wherein the micro-lens elements are also arranged along a direction perpendicular to the optical axis of the main lens, and each micro-lens element is configured to determine a focus point generated after the Bessel-beam passes through each micro-lens element, and a focal length of a distance between the focus point and the micro-lens element according to each focus point; and a light sensing unit, comprising a focal plane, and configured to enable the focus point to be focused on the focal plane.
2. The light field image capturing apparatus according to claim 1, wherein: the slits enable a beam to generate, after the beam passes through the slits, corresponding Bessel-beams respectively; and the micro-lens elements are arranged in an array manner and correspond to the slits respectively.
3. The light field image capturing apparatus according to claim 1, wherein: the conical lenses enable a beam to generate, after the beam passes through the conical lenses, corresponding Bessel-beams respectively; and the micro-lens elements are arranged in an array manner and correspond to the conical lenses respectively.
4. The light field image capturing apparatus according to claim 1, wherein the slits are completed by forming a metal film on a transparent substrate and then making the slits on a metal surface of the metal film.
5. The light field image capturing apparatus according to claim 4, wherein the slits are annular slits.
6. The light field image capturing apparatus according to claim 5, wherein an inner diameter width of each of the slits is between 16 m and 50 m, and a slit width of each of the slits is between 150 nm and 300 nm.
7. The light field image capturing apparatus according to claim 1, further comprising: an image capturing and analyzing unit, configured to analyze and calibrate at least one circle of confusion formed on the focal plane.
8. The light field image capturing apparatus according to claim 7, wherein the circles of confusion of different wavelength gains generated, by the Bessel-beams of different wavelengths generated by the slits of different sizes, on the focal plane of the light sensing unit after the Bessel-beams pass through the corresponding micro-lens elements.
9. The light field image capturing apparatus according to claim 1, wherein the light sensing unit is an image sensor.
10. The light field image capturing apparatus according to claim 9, wherein the image sensor is a complementary metal oxide semiconductor (CMOS) photosensitive element or a charge coupled device (CCD).
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0018]
[0019]
[0020]
[0021]
[0022]
DETAILED DESCRIPTION
[0023]
[0024] Referring to
[0025] The main lens 14 is configured to transmit light of an object environment 141 and includes an optical axis 142.
[0026] The beam generation unit 11 is configured to receive the light transmitted by the main lens, and generate plurality Bessel-beams 112 arranged along a direction perpendicular to the optical axis of the main lens. For example, in this embodiment, the beam generation unit 11 includes plurality slits 111 arranged in an array manner, and the slits 111 are arranged along a direction perpendicular to the optical axis 142 of the main lens 14, so that a beam 114 generates Bessel-beams 112 (with high directional electric field distribution) by the slits 111 (similar to far-field interference of plurality point light sources). Using the slits 111 to generate the Bessel-beams 112 is prior art, and is not described herein again. The beam generation unit 11 of this embodiment is formed by coating, by using a sputtering machine, a clear transparent substrate 113 (such as a glass substrate) with a metal film 116 (such as a silver film) less than 250 nm, and then making, by using a focused ion beam (FIB), plurality slits 111 with inner diameter widths W between 16 m and 50 m and slit widths D between 150 nm and 300 nm on a surface of the metal film 116, wherein the slits 111 are annular slits or ring slits.
[0027] The micro-lens unit 12 is configured to receive the Bessel-beams 112 generated by the beam generation unit 11 and includes plurality micro-lens elements 121 arranged in an array manner, wherein the micro-lens elements 121 are also arranged along a direction perpendicular to the optical axis 142 of the main lens 14 and correspond to the slits 111 respectively. In this embodiment, by means of controlling a distance between the micro-lens element 121 and the slit 111, a position of a focus point 122 generated after the Bessel-beam 112 passes through the micro-lens element 121, and a focal length F of a distance between the focus point 122 and the micro-lens element 121 are determined, as shown in
[0028] The light sensing unit 13 includes a focal plane 131. The light sensing unit 13 can be an image sensor (such as a complementary metal oxide semiconductor (CMOS) light sensing element or a charge coupled device (CCD)). The light sensing unit 13 is usually configured behind the micro-lens unit 12, and is mainly configured to focus the focus point 122 on the focal plane 131, thereby performing multi-angle domain three-dimensional scanning measurement.
[0029] The light field image capturing apparatus 1 according to this embodiment can be applied to the restoring of three-dimensional light field information (for example, being used with a 3D light field camera), wherein a beam passes through the slits 111 to generate Bessel-beam with high directional electric field distribution, thereby resolving the problem that spatial resolution cannot be improved due to a fact that a micro-lens array of the 3D light field camera may be easily subject to inter-pixel interference.
[0030] Further, focal lengths of the Bessel-beams 112 with respect to the slits 111 can be adjusted by using the micro-lens elements 121 of the micro-lens unit 12, so as to extend available focal lengths, that can extend depth of field of focusing work to a millimeter level, and improve assembly permissible precision, thereby effectively improving angular resolution and spatial resolution, obtaining a high quality image with more complete details and more detailed depth map information, and achieving means for mass production and integration of the elements.
[0031]
[0032] Referring to
[0033] In addition, the light field image capturing apparatus 1 further includes an image capturing and analyzing unit 15. Referring to
[0034] In this embodiment, the specific number of slits for calibrating the circles of confusion can be determined according to requirements as long as accurate positioning can be performed.
[0035] In another embodiment, in addition to rotating the beam generation unit or the micro-lens unit on a plane on which the X axis intersects with the Y axis, displacement (not shown in the drawings) in the direction of a Z axis (a direction perpendicular to the intersection of the X axis and the Y axis) also needs to be taken into consideration for calibrating circles of confusion.
[0036]
[0037] Referring to
[0038] Moreover, after the Bessel-beam with high directional electric field distribution are generated, the technology of adjusting focal lengths of the Bessel-beam with respect to the conical lenses according to the light field image capturing apparatus 1 of this embodiment are the same as those of the aforementioned embodiments, and are not described herein again.
[0039] The above descriptions are merely implementation manners or embodiments of technical means adopted by the present invention for resolving problems, but are not intended to limit the implementation scope of the present invention. That is, equivalent variations and modifications consistent with the meanings of the claims of the present invention or made according to the claims of the present invention shall fall within the scope the claims of the present invention.