METHOD OF MANUFACTURING A LAYER CONTAINING QUANTUM DOTS

Abstract

A method of manufacturing a layer containing quantum dots, the layer including first regions where the quantum dots are active and second regions where the quantum dots are inactive, the method including: a) depositing on a support a first layer of a matrix containing quantum dots; b) depositing on the first layer a second resist layer; c) exposing the second layer to light through a mask delimiting the first and second regions, and then developing the resin of the second layer to remove the resin of the second layer opposite the second regions while keeping it opposite the first regions; and d) removing the resin of the second layer opposite the first regions without removing the first layer.

Claims

1. A method of manufacturing a layer containing quantum dots, the layer comprising first regions where the quantum dots are active, and second regions where the quantum dots are inactive, the method comprising the steps of: a) depositing on a support a first layer of a matrix having quantum dots incorporated into it; b) depositing on the first layer a second resist layer; c) exposing the second layer to light through a mask delimiting, in top view, the first and second regions, and then developing the resin of the second layer in order to remove the resin of the second layer opposite the second regions, and to keep the resin of the second layer opposite the first regions; and d) removing the resin of the second layer opposite the first regions without removing the matrix of the first layer opposite the first regions.

2. The method of claim 1, wherein the matrix of the first layer is a resist.

3. The method of claim 2, wherein the resist of the first layer is selected from one of the families of the assembly comprising the family of positive resists and the family of negative resists, and wherein the resist of the second layer is selected from the other family of said assembly.

4. The method of claim 1, wherein the matrix of the first layer is a negative resist and wherein the resin of the second layer is a positive resist.

5. The method of claim 1, wherein the matrix of the first layer is an SU8-type resist, and wherein the resin of the second layer is a TELR-type resist.

6. The method of claim 1, comprising no step of exposure to light of the matrix of the first layer before the deposition of the second layer.

7. The method of claim 1, wherein the step of developing the resin of the second layer comprises dipping the second layer into a TMAH-based solution.

8. The method of claim 1, wherein the quantum dots incorporated in the matrix of the first layer are quantum dots of CdSe/ZnS type.

9. The method of claim 1, wherein, at step d), the resin of the second layer is removed by oxygen plasma etching.

10. The method of claim 1, further comprising, after step d), a step of etching an upper surface portion of the first layer.

11. The method of claim 9, wherein said step of etching an upper surface portion of the first layer is carried out by oxygen and sulfur hexafluoride plasma etching.

12. The method of claim 1, wherein steps a), b), c), and d) are repeated a second time to form, on the first layer, a third layer containing quantum dots, the third layer comprising first regions where the quantum dots are active, and second regions where the quantum dots are inactive.

13. The method of claim 12, wherein the first regions of the third layer are arranged opposite second regions of the first layer, and wherein second regions of the third layer are arranged opposite first regions of the first layer.

14. A device comprising a light source and, opposite the light source, a layer containing quantum dots formed by the method of claim 1.

15. A device comprising a light source and, opposite the light source, a stack of a first layer containing quantum dots and of a second layer containing quantum dots, formed by the method of claim 12.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0023] FIGS. 1A, 1B, 1C, and 1D are cross-section views schematically illustrating steps of an embodiment of a method of manufacturing a layer containing quantum dots, the layer comprising first regions where the quantum dots are active, and second regions where the quantum dots are inactive; and

[0024] FIG. 2 is a cross-section view schematically illustrating an alternative embodiment of the method described in relation with FIGS. 1A to 1D.

DETAILED DESCRIPTION

[0025] The same elements have been designated with the same reference numerals in the different drawings and, further, the various drawings are not to scale. In the following description, when reference is made to terms qualifying the position and orientation such as above, under, upper, lower, etc., reference is made to the representation of the drawings, it being understood that, in practice, the described structures may be oriented differently. Unless otherwise specified, expressions substantially, almost, approximately, and in the order of mean to within 10%, preferably to within 5%.

[0026] FIG. 1A illustrates a step of depositing, on the upper surface of a support substrate 101, for example, a silicon substrate, a layer 103 comprising a matrix of transparent resist where quantum dots are incorporated. In this example, the resist of layer 103 belongs to the family of negative resists, that is, resins for which the portions exposed to a light radiation during a resin insolation step become non-soluble in a developer applied to the resin in a subsequent development step, and for which the portions which have not been exposed to light radiation are soluble in the developer. The resist of layer 103 is for example a resin based on polyepoxides, for example, a resin selected from the family of negative SU8-type resins, that is, having its elementary molecule comprising eight polyepoxide groups. As an example, the resist of layer 103 is a resin of the type designated by trade name SU8 1020PI by GERSELTEC ENGINEERING SOLUTIONS.

[0027] Quantum dots mixed with the resin of layer 103 are for example quantum dots based on cadmium selenide (CdSe), for example, quantum dots having a CdSe/ZnS-type core-shell structure. As a variation, the quantum dots of layer 103 are quantum dots having a core-shell structure, of InP/ZnS or CdS/ZnS or CdSe/ZnSe or PbS/CdS type.

[0028] As an example, the incorporation of the quantum dots in the resist may comprise a step of mixing the quantum dots initially in the form of powder in a solvent, for example, chloroform. The solution thus obtained may then be mixed with resin. As an example, the quantum dots may be mixed in the solvent at a concentration in the range from 1 to 100 mg/ml, after which the obtained solution may be mixed with the resin, for example, according to a ratio in the order of 2 for 1 by volume (2 volumes of solution for 1 volume of resin).

[0029] Prior to the deposition of layer 103, the upper surface of support substrate 101 may be prepared, for example, by means of an oxygen plasma, to improve the adherence and/or the uniformity of layer 103.

[0030] Resin layer 103 may be spread on the upper surface of substrate 101, for example, by spin coating. An anneal of the structure, for example, at a temperature in the range from 80 to 150 C. for a time period in the range from 30 to 120 seconds, may then be carried out to harden resin layer 103 to reinforce its mechanical resistance.

[0031] As an example, the thickness of layer 103 is in the range from 0.5 to 50 m, for example, in the order of 0.9 m. As an illustration, the calculations performed by the inventors have shown that a thickness in the order of 1 m enables to absorb 99% of the blue light emitted by a gallium nitride light-emitting diode for a volume filling rate of layer 103 in the order of 50%.

[0032] FIG. 1B illustrates a step of depositing, on the upper surface of layer 103, a resist layer 105. In this example, the resist of layer 105 belongs to the family of positive resists, that is, resins for which the portions exposed to a light radiation during a resin insolation step become soluble in a developer applied to the resin in a subsequent development step, and for which the portions which have not been exposed to the light radiation are non-soluble in the developer. As an example, the resist of layer 105 is a resin of the type designated by trade name TELR by TOK EUROPE. Unlike layer 103, resin layer 105 contains no quantum dots. It should further be noted that no step of exposure of layer 103 to light, that is, of exposure of layer 103 to a light radiation likely to modify its structure, between the step of forming layer 103 and the step of depositing layer 105, is not provided.

[0033] Resin layer 105 may be spread on the upper surface of substrate 101, for example, by spin coating. An anneal of the structure, for example, at a temperature in the range from 80 to 150 C. for a time period in the range from 30 to 120 seconds, may then be carried out to harden resin layer 105 to reinforce its mechanical resistance.

[0034] FIG. 1B further illustrates a step subsequent to the deposition of resin layer 105, during which layer 105 is exposed to light through a mask 107 arranged above its upper surface. Mask 107 covers first regions 105a of layer 105 and comprises openings opposite second regions 105b of layer 105. During the insolation step, the upper surface of the assembly is exposed to a light radiation 109 capable of modifying the chemical structure of the resin of layer 105 in the regions of layer 105 exposed to this radiation. The radiation applied to expose the resin of layer 105 to light is for example a violet or ultraviolet radiation, for example, a radiation having a wavelength in the range from 350 to 450 nm.

[0035] After the insolation step, mask 107 is removed, and an anneal for stabilizing the structure, for example, at a temperature in the range from 80 to 150 C. for a time period in the range from 30 to 120 seconds, may be carried out.

[0036] FIG. 1C illustrates a step of developing resin layer 105, subsequent to the insolation step described in relation with FIG. 1B. During this step, the assembly formed by substrate 101 and by layers 103 and 105 is dipped into a development bath capable of developing in resin layer 105 the pattern exposed through mask 107 during the insolation step. The development bath for example comprises a solution based on tetramethylammonium hydroxide (TMAH), for example, a solution designated with trade name TMAH238 by MICROCHEMICALS. During this step, the regions 105b of resin layer 105 which have been previously exposed during the insolation step are removed by dissolution in the developer. Thus, at the end of the development step, there only remain of layer 105 the regions 105a masked during the insolation step.

[0037] As an example, during the development step, the structure is dipped into the development bath for from 30 to 120 seconds to obtain clear patterns in layer 105, and then rinsed with water and dried.

[0038] Surprisingly, the inventors have observed that at the end of the development step of FIG. 1C, the quantum dots contained in regions 103b of layer 103 above which the resin of layer 105 is fully removed during the development step are inactive, while the quantum dots contained in regions 103a of layer 103 above which the resin of layer 105 is not removed during the development step have remained active. Inactive here means that the quantum dots contained in regions 103b of layer 103 have lost their photoluminescent properties, and that regions 103b of layer 103 are now substantially transparent for visible light, that is, they transmit with no significant modifications, particularly of color, the light that they receive. Further, active here means that the quantum dots contained in regions 103a of layer 103 have kept their initial photoluminescent properties.

[0039] FIG. 1D illustrates a step subsequent to the development step of FIG. 1C, during which the remaining regions 105a of resin layer 105 are removed, without having previously removed and without simultaneously removing regions 103b of layer 103. In other words, the removal of remaining regions 105a of resin layer 105 is selective over the resin of layer 103. As an example, the removal of regions 105a of resin layer 105 is removed by dry etching by means of an oxygen plasma.

[0040] The measurements performed show that after the removal of regions 105a of layer 105, the quantum dots contained in regions 103a of layer 103 are still active, and the quantum dots contained in regions 103b of layer 103 are still inactive.

[0041] Thus, the provided method provides a layer 103 of substantially constant thickness containing quantum dots, the layer comprising first regions 103a where the quantum dots are active, and second regions 103b where the quantum dots are inactive.

[0042] After the step of removing regions 105a of layer 105, an additional step of physical etching of an upper surface portion of layer 103, for example, by means of an oxygen and sulfur hexafluoride plasma (SF.sub.6), may be implemented. This additional etch step enables to enhance the contrast of the photoluminescent pattern defined in layer 103.

[0043] In a subsequent step, layer 103 where the photoluminescent pattern is formed may for example be placed opposite an illumination device, for example, an array of light-emitting diodes, after which support substrate 101 may be removed. As a variation, support substrate 101 may be made of a transparent material, for example, glass, in which case the assembly comprising support substrate 101 and layer 103 may be arranged opposite the illumination device. As a variation, support substrate 101 may directly be a semiconductor substrate where light-emitting diodes have been previously formed, layer 103 being then directly formed above the light-emitting diodes.

[0044] An advantage of the provided method especially is that the obtained color conversion layer 103 has a constant or almost constant thickness, which gives it a relatively high robustness, and makes the assembly with a possible additional optical element easier.

[0045] Another advantage of the provided method is that the layer of quantum dots 103, due to its morphology and to its stability, is compatible with placing, bonding, and alignment techniques standard in microelectronics.

[0046] Another advantage of the provided method is due to the fact that the incorporation of quantum dots in a resin layer provides a relatively thick layer 103, which is particularly adapted for color conversion applications in luminous display screens.

[0047] Another advantage of the provided method is that the photoluminescent patterns may be defined in layer 103 with a relatively high resolution. As an illustration, the provided method enables to define in layer 103 photoluminescent pads having lateral dimensions in the range from 1 to 10 m and a spacing in the range from 1 to 10 m, which is compatible with the forming of a luminous display screen based on light-emitting diodes.

[0048] FIG. 2 is a cross-section view schematically illustrating an alternative embodiment of the method described in relation with FIGS. 1A to 1D.

[0049] In the example of FIG. 2, the method described in relation with FIGS. 1A to 1D is repeated a second time to form, on the upper surface of layer 103, a resin layer 103 where quantum dots are incorporated, this layer comprising regions 103a where the quantum dots are active, and regions 103b where the quantum dots are inactive.

[0050] As an example, the active quantum dots of layer 103 are capable of converting the light of a luminous excitation source into light of a first color, for example, into red light, and the active quantum dots of layer 103 are capable of converting the light of the luminous excitation source into light of a second color different from the first color, for example, into green light. The quantum dots of layer 103 are for example of same nature as the quantum dots of layer 103, but of different dimensions.

[0051] Active regions 103a of layer 103 are for example arranged opposite inactive regions 103b of layer 103. Although this is not shown in FIG. 2, inactive regions 103b of layer 103 may be arranged opposite inactive regions 103b of layer 103, to transmit with no significant modification the light emitted by the luminous source.

[0052] Specific embodiments have been described. Various alterations, modifications, and improvements will occur to those skilled in the art. In particular, the described embodiments are not limited to the above-mentioned specific examples of dimensions and materials.

[0053] Further, although an example of a method where the matrix of layer 103 is a negative resist and the resin of layer 105 is a positive resist has been described hereabove, the two types of resin may be inverted, that is, the matrix of layer 103 may be selected from the family of positive resists, the resin of layer 105 then being selected from the family of negative resists.

[0054] More generally, the matrix of layer 103 may be made of a material other than a resist, for example, a non-photosensitive resin, silicone, or any other adapted polymer material.

[0055] Further, the described embodiments are not limited to the above-mentioned specific example of application to color conversion in a luminous display device. More generally, the provided method enabling to delimit active areas and inactive areas in a layer of a matrix incorporating quantum dots may be used in other fields.

[0056] Such alterations, modifications, and improvements are intended to be part of this disclosure, and are intended to be within the spirit and the scope of the present invention. Accordingly, the foregoing description is by way of example only and is not intended to be limiting. The present invention is limited only as defined in the following claims and the equivalents thereto.